The invention discloses a
size measurement method, device and equipment based on a through-focus scanning image and a medium, and relates to the technical field of nanometer device measurement. The method comprises the following steps: determining a
size value set according to the prior morphology size of a to-be-measured
nano device; establishing a
simulation focus-through scanning image of each size in the
size value set; performing principal component
decomposition on the
simulation focus-through scanning image to obtain a principal component
coefficient matrix; establishing a regression matrix according to the
size value set and the principal component
coefficient matrix; performing principal component
decomposition on the actually-measured focus-through scanning image of the to-be-measured
nano device to obtain an actually-measured principal component
coefficient matrix; and performing reverse inversion on the actually measured principal component coefficient matrix according to the regression matrix to obtain a measurement result. According to the method, the problem of out-of-focus
image noise interference is effectively solved, the
technical performance of the TSOM method is remarkably optimized in the aspects of precision, robustness, efficiency and the like, and key support is provided for large-scale application of the TSOM method in advanced nanometer manufacturing.