This invention discloses a method, substrate, and
system for detecting
laser beam-induced current in the PN junction region profile of an InGaAs
photodetector, belonging to the field of
semiconductor optoelectronic device characterization technology. The method includes: cleaving a
chip with completed front-side
processing along the natural cleavage surface of InP to obtain a smooth profile; fixing the
chip with the profile facing upwards onto a composite
sapphire bonding substrate, and extracting electrodes through conductive
silver paste and
ultrasonic bonding; performing a two-dimensional step-scan of the profile using a 900-1100nm
laser, simultaneously acquiring
photocurrent signals to obtain a two-dimensional
photocurrent distribution map of the profile; and quantitatively extracting
junction depth,
lateral diffusion width, and uniformity parameters based on the
photocurrent peak position. This invention can directly obtain the longitudinal two-dimensional electrical activity distribution of the PN junction region, effectively avoiding interference between the surface
passivation layer and the InP cap layer, and achieving a
visual assessment of
junction depth,
lateral diffusion, and defects, providing a realistic and efficient detection method for device
process optimization.