The invention discloses a high-temperature in-situ
diffuse reflection infrared device applied to low-temperature
plasma, and relates to the technical field of in-situ
diffuse reflection infrared measurement. The
ceramic cover plate is detachably arranged at the opening of the stainless steel tank body, and a sealed high-temperature accommodating cavity is formed when the
ceramic cover plate covers the opening of the stainless steel tank body; the
ceramic fixing
flange penetrates through a bottom plate of the stainless steel tank body and is in sealed connection with the stainless steel tank body, the top of the ceramic fixing
flange is located at the position, close to the center, of the high-temperature containing cavity, and a material containing space with the
diameter larger than that of a through hole in the ceramic fixing
flange is formed in the top of the ceramic fixing flange; the high-
voltage electrode is arranged in the ceramic fixing flange in a penetrating mode, the top of the high-
voltage electrode extends into the material containing space, and the top end of the high-
voltage electrode is lower than the top of the ceramic fixing flange. The beneficial effects are that the central high-voltage electrode and the annular electrode are cooperatively designed, the central high-voltage electrode is used as a
discharge electrode, and the glow-like
discharge phenomenon is generated between the central high-voltage electrode and the annular electrode, so that a uniform
discharge area is formed.