An apparatus is provided for focusing electrons being emitted from a field emission device. The apparatus comprises a substrate (12,41,51) having first and second portions, and a cathode metal layer (20,44,52) formed over the substrate (12,41,51) in the first portion to partially define a sidewall (23) for a trench (25) in the second portion. A ballast layer (22,46,53) is formed over the substrate (12,41,51) in the second portion, the cathode metal layer (20,44,52), and the sidewall (23). A first dielectric layer (24,47,54) is formed over the ballast layer (22,46,53) in the first portion. A gate extraction metal layer (26,48,55) is formed over the first dielectric layer. At least one emitter (30) comprising a high aspect ratio conductive material is formed above the substrate and in the trench (25) having a sidewall (23) defined by the first dielectric layer (24,47,54) and the cathode metal layer (20,44,52). The ballast layer (22,46,53) extends along the sidewall and conductively contacts the cathode metal layer and the at least one emitter. An anode (32) is positioned to receive electrons from the at least one emitter (30). The ballast layer (22,46,53) provides a force that counteracts the sidewise pull of the gate extraction metal layer (26,48,55).