12results about "Wave amplification devices" patented technology

The application relates to a liquid sheet injection system and method for X-ray free electron laser experiments, which comprises a pneumatic nozzle device, a flow control device, a signal acquisition device and a vacuum device; the pneumatic nozzle device and the signal acquisition device are respectively arranged in the vacuum device, the pneumatic nozzle device comprises a tube assembly, a gas capillary and a liquid capillary are respectively arranged in the tube assembly, and the gas capillary and the liquid capillary are connected with the flow control device; the end of the liquid capillary comprises two symmetrically arranged flow guide inclined surfaces, two symmetrically arranged abutting inclined surfaces and a bottom surface, the flow guide inclined surfaces and the abutting inclined surfaces are alternately distributed around the bottom surface, and a first outlet is arranged on the bottom surface; a gas micro-flow channel is formed between the end inner wall of the tube assembly and the flow guide inclined surface, and a second outlet is arranged at the end of the tube assembly. The application utilizes the compression and shearing effect of high-speed gas on liquid to generate a free-flowing liquid sheet with a sub-micron thickness under vacuum.

The invention provides an adjustable tapering undulator and device based on beat frequency superposition and a method for broadening a spectrum, and is applied to the technical field of synchrotron radiation and the technical field of free electron laser. The undulator comprises a first magnetic array structure which comprises a plurality of groups of first permanent magnet units and is used for generating a first magnetic field; the second magnetic array structure comprises a plurality of groups of second permanent magnet units and is used for generating a second magnetic field; the phase shift driving structure is used for responding to a target superposed magnetic field after the beat frequency superposition of the first magnetic field and the second magnetic field, and determining the beat frequency magnetic period length of the target superposed magnetic field according to the first magnetic period length and the second magnetic period length; and according to the tapering requirement of the undulator, determining a target phase shift from a target beat frequency envelope constructed based on the attribute parameters of the adjustable tapering undulator and the beat frequency magnetic period length, and driving the phase shift driving structure to enable the first magnetic array structure and / or the second magnetic array structure to translate along the advancing direction of the electron beam.

This invention discloses a method for analyzing soft X-ray gain phenomena in trapped ions and the cavity type of the X-ray laser, mainly relating to the field of soft X-ray gain phenomena. The method includes: S1, calculating the small-signal gain coefficient α of the X-ray gain medium to obtain numerical information about the gain coefficient α; S2, the above calculation in S1 requires simulating ion source conditions, selecting different electron densities and incident electron energy points; S3, considering the differences between the ion source and the plasma environment, calculating the small-signal gain coefficient at the center frequency; and S4, analyzing the obtained data. The beneficial effects of this invention are: through the X-ray resonant cavity structure, the output beam can achieve high coherence and good beam quality similar to conventional lasers. It supports high repetition rates and even continuous wave operation, and through continuous collisional excitation and ion reuse in ultra-high vacuum, it eliminates the dependence on driving lasers and target materials, thereby improving peak gain.

This invention relates to an X-ray free-electron laser shutter system, comprising a vacuum chamber. The vacuum chamber has an entrance flange on its front side and an exit flange on its rear side. The light beam enters the vacuum chamber through the entrance flange and exits outwards through the exit flange. The key feature is that the vacuum chamber is equipped with a front light-blocking arm and a rear light-blocking arm. Another technical solution of this invention provides a control method for the X-ray free-electron laser shutter system. This invention achieves both damage resistance and radiation blocking by combining a damage-resistant light-blocking plate with a heavy metal light-blocking plate. The easily removable damage-resistant light-blocking plate acknowledges its potential for damage and utilizes its working lifespan to achieve light blocking. An interlocking mechanism that burns through the detector ensures that the shutter will not damage downstream equipment due to failure. The use of dual light-blocking arms and an electromagnet to control the on / off time difference between the two light-blocking arms achieves a millisecond-level window time, greatly reducing the requirements for light-blocking arm movement control.

The application relates to a seed laser focusing and delaying device and method of a free electron laser, the free electron laser comprising an electron beam generating device, a first modulation section, a first dispersion section, a second modulation section, a second dispersion section and a radiation section, the seed laser focusing and delaying device being integrated in a vacuum chamber of the first dispersion section, the seed laser focusing and delaying device comprising a delay plate, a first lens and a second lens, the delay plate being used for time matching of an optical delay amount of the seed laser and an electron beam delay amount of the first dispersion section, and the first lens and the second lens being used for spatial matching of the seed laser and the electron beam in the second modulation section.

In one example in accordance with the present disclosure, a printhead cap system is described. The printhead cap system includes a cap having an elastomer seal to surround a printhead die on a print cartridge. The printhead cap system also includes a variable force capping station to retain the cap. The variable force capping station is to move the cap to 1) a first position wherein the cap exerts a first force on a substrate on which the printhead die is disposed and 2) a second position wherein the cap exerts a second force on the substrate. In an example, the second force is greater than the first force. The printhead cap system also includes a control system to raise the cap from an uncapped position through the first position and the second position.

The application provides a method for undulator correction and orbit collimation of a free electron laser device, comprising: providing an experimental device; observing spectral characteristics of spontaneous radiation of a single undulator unit by using a spectrometer; decoupling and correcting an electron beam orbit and an undulator parameter of the single undulator unit based on the observed spectral characteristics, taking a central wavelength of the radiation as a core criterion to obtain an optimal working point; staggering the current undulator unit, adding a next undulator unit, and repeating the correction step until all the undulator units are corrected; and restoring all the undulator units to the optimal working point so that the free electron laser device outputs a required free electron laser. The method of the application separately corrects each undulator, takes the central wavelength position of the radiation of a single undulator as a core criterion, is suitable for a free electron laser device in a soft X-ray wave band, and does not depend on complete spot imaging.

The diaphragm type water-cooling vacuum differential mechanism is characterized in that an observation window is fixedly mounted at the upstream of a differential diaphragm, a camera is assembled on one side, far away from the differential diaphragm, of the observation window, and the observation window and the camera jointly form the monitoring system for monitoring the state of a differential hole; the water-cooling copper seat is a main body of the differential diaphragm; the thermocouple is inserted into the water-cooling copper seat of the differential diaphragm; a sealed cooling water path is arranged on the radial outer side of the water-cooling copper seat and is connected with an external cooling water circulation system to realize cooling water circulation; cylindrical grooves are respectively formed in the front end and the rear end; boron carbide is mounted in a cylindrical groove in the front end of the water-cooling copper seat; and the differential hole and the silicon carbide sheet are mounted in a cylindrical groove at the rear end of the water-cooling copper seat together after being attached. The vacuum differential mechanism is simple in structure and high in integration degree, thermal protection and monitoring functions can be achieved in a small space, the vacuum transition function can be stably achieved, and the operation stability and maintenance efficiency of light beam lines are effectively improved.

The application discloses a linear plasma laser double-amplifier and a light-splitting observation system thereof, and belongs to the technical field of laser observation. The laser double-amplifier comprises a reflecting device, a laser amplification system, a laser light-splitting system and a laser observation system. The laser light-splitting system is arranged at a position where laser light is emitted after the laser light passes through a laser amplification medium. The laser light is reflected by a reflecting mirror and then passes through the laser amplification medium again to be amplified. The laser light is reflected by a compound curved mirror and then forms a linear light spot on a back-illuminated CCD camera. The application solves the technical problems of the prior art, such as being limited by space, having poor laser intensity gain and being difficult to observe.

The application discloses a kind of ultra-high vacuum four-knife slits suitable for soft X-ray free electron laser beam collimation, characterized in that, including ultra-high vacuum cavity and the four-knife slit completely located in ultra-high vacuum cavity, after soft X-ray free electron laser pulse enters ultra-high vacuum cavity from the front CF100 flange of ultra-high vacuum cavity, from the rear CF100 flange of ultra-high vacuum cavity, wherein: four-knife slit includes vertical direction double-knife slit and horizontal direction double-knife slit, respectively, to form constraint from horizontal and vertical direction to X-ray free electron laser beam.The application has the characteristics of high precision, high reliability, compact, simple structure, can work in ultra-high vacuum environment, etc.

The invention discloses a light source device, a light source system and a water window wave band full-coherence free electron laser generation method. The device comprises a harmonic generation unit used for accessing an electron beam and seed laser and generating low-order harmonics; and the at least two stages of cascaded amplifier units are connected with the harmonic generation unit, and are used for accessing low-order harmonic radiation, generating coherent harmonic radiation and tuning the coherent harmonic laser into high-order harmonic radiation so as to obtain the water window wave band full-coherent free electron laser pulse. According to the invention, the multi-stage amplifier units are constructed at the rear stage of the harmonic generation unit, and each subsequent amplifier unit is configured to resonate on a higher harmonic output and radiated by the previous amplifier unit, so that the harmonic radiation of the previous stage is used as an effective seed of the next stage, and the step-by-step up-conversion of the frequency is realized; and converting the frequency of the coherent radiation to a target higher harmonic step by step to obtain the water window wave band full-coherent free electron laser.

Methods and apparatus reduce chucking abnormalities for electrostatic chucks by ensuring proper planarizing of ceramic surfaces of the electrostatic chuck. In some embodiments, a method for planarizing an upper ceramic surface of an electrostatic chuck assembly may comprise placing the electrostatic chuck assembly in a first planarizing apparatus, altering an upper ceramic surface of the electrostatic chuck assembly, and halting the altering of the upper ceramic surface of the electrostatic chuck assembly when an Sa parameter is less than approximately 0.1 microns, an Sdr parameter is less than approximately 2.5 percent, an Sz parameter is less than approximately 10 microns for any given area of approximately 10 mm2 of the upper ceramic surface, or a pit-porosity depth parameter of greater than 1 micron is less than approximately 0.1 percent of area of the upper ceramic surface.