The invention discloses a non-contact measurement
system and method for the longitudinal distance between objects, and the method comprises the steps: measuring the position distance between an object and an adjacent object in a size-limited space: placing a
light source on the surface of a workpiece, projecting an electromagnetic beam with a set
divergence angle to a reference object, and forming an amplified
light spot; image information, especially
light intensity information, of the
light spot and a part of reference object where the
light spot is located at the projection position is received through a light
receiver; and then the processor processes the image information to obtain geometric data of the light spots, including the positions of the light spots on the reference object, the lengths of the obtained light spots or the distances between different light spots, namely the projection lengths, the projection height from the
light source to the reference object is calculated in combination with the
divergence angle, and the longitudinal distance between the workpiece and the reference object is obtained in combination with the height of the
light source. As long as the size of the light source is small enough and the light source can be placed into the chamber for
processing the
wafer, the longitudinal distance between the
wafer and the top of the chamber can be accurately measured at any time, and the measurement accuracy related to
wafer manufacturing is greatly guaranteed.