The invention relates to the technical field of
semiconductor lasers, in particular to a high-speed communication vertical-cavity surface-emitting
laser and a preparation method thereof.The high-speed communication vertical-cavity surface-emitting
laser comprises a substrate, an epitaxial structure is arranged on the substrate and comprises an active area, a transition DBR layer is arranged on the active area, and a
tunnel junction is arranged in the center of the transition DBR layer; the
tunnel junction comprises a P-type high-concentration C
doping layer and an N-type high-concentration Te
doping layer, and a top DBR layer is arranged on the transition DBR layer. The
tunnel junction is used for replacing an
oxide layer of a traditional oxidizing VCSEL and is used for providing current limitation and optical limitation. According to a traditional
oxide layer, the oxidation depth is controlled by oxidizing Al0. 98Ga0. 02As to achieve current and optical limitation of the oxidation
caliber, Al interface oxidation can be avoided by replacing the traditional
oxide layer with a tunnel junction structure, and the problem of further growth of defects can be prevented. An oxide layer is replaced by a tunnel junction limiting structure, higher emission uniformity and higher
repeatability manufacturing can be achieved, the size of an oxidation aperture can be accurately defined, and the stability of a mode can be controlled.