970 results about "Micro mirror" patented technology

The invention relates to the technical field of defect detection, and discloses an integrated circuit mask plate defect multispectral cooperative detection method, which comprises the following steps: carrying out preliminary scanning on a mask plate by using a multispectral camera, selecting an optimal wave band combination, switching to a target wave band through a liquid crystal adjustable optical filter, and obtaining a high-confidence multispectral image; the optical path offset is calculated through the linear relation, the deflection angle of the micro-mirror is dynamically adjusted, and images are collected for the second time after imaging offset is compensated; image filtering and registration are completed in the FPGA, and a high-contrast fusion image is generated; if the confidence coefficient is insufficient, triggering a wave band reselection mechanism to recheck; dynamically optimizing a defect type-spectrum mapping table based on real-time detection data; when the environment fluctuation exceeds the limit, an anti-interference mode is automatically switched, and micro-mirror calibration is triggered; and monitoring performance degradation of the optical assembly in real time, switching redundant optical paths, cleaning damaged parts, triggering manual reinspection when conflicts occur, and finally generating a visual report. According to the invention, the detection accuracy of the integrated circuit mask plate can be improved.

The invention relates to the technical field of three-dimensional measurement, and discloses a double-zoom system and a three-dimensional information acquisition method thereof, and the three-dimensional information acquisition method comprises the steps: adjusting a projection unit and a first micromirror array, and enabling a projection end to work in a coaxial light mode; controlling the second micromirror array to zoom by adopting a preset second zoom parameter, and processing the two-dimensional image data of the imaging unit in real time to generate a two-dimensional ultra-depth-of-field image; adjusting the parameters of the second micromirror array until the image acquired by the imaging unit is clear; a preset first zooming parameter is adopted to control zooming of the first micromirror array, and scanning information and image data are obtained in real time and processed to obtain surface height information; generating three-dimensional information containing texture information in combination with the two-dimensional super field depth image and the surface height information; according to the method disclosed by the invention, the problem of high calculation error in the absence of 2D texture information in the traditional 3D imaging technology is solved, and the height information can be accurately acquired even in an area with scarce texture information.

The invention discloses a quantum computing chip based on a vertical micromirror, a system on a crystal and a simulator correction method thereof, a vertical micromirror structure with the roughness of less than 5nm can be formed by performing side wall smoothing on a deep etching vertical structure, and the loss of light irradiated on a side wall interface of a silicon-based optical device can be greatly reduced; a quantum computing chip is developed on a silicon wafer, another optical computing chip structure except macroscopic space optics and silicon-based optoelectronics is realized, the technological process is completely compatible with an advanced packaging technology, and photoelectric wafer level system integration of sensing, storage and computing can be realized. For an on-crystal system integrated with a quantum computing chip and an integrated circuit chip (and an optical sensing chip), crosstalk, loss and delay of TSV transmission signals are reduced through a vertical micro-mirror technology, indirect measurement of side wall roughness is realized through Fabry-Perot interference, an ideal on-crystal system simulator is corrected, and the measurement precision of the on-crystal system simulator is improved. And the simulation result of the simulator is closer to the real measurement result of the on-chip system.

The invention provides a manufacturing and processing photoetching method and system of a display panel, and relates to the technical field of photoetching processing. According to the method, the display panel substrate is subjected to cleaning, prime coating and partition division to form an imageable micro-mark covering all exposure partitions, and the thickness and the uniformity are measured after lower-layer supporting glue and upper-layer imaging glue are sequentially formed; carrying out in-situ acquisition and modeling by taking the micro-mark as an imaging object, and generating an exposure correction instruction and an overlapping energy table; performing partition exposure and real-time correction by using a digital micromirror, and completing development to obtain an anti-etching window with a steep side wall; and setting an etching window according to the exposure record and the window quality data, and executing low-damage etching and defect recovery to form stability evaluation data. According to the method, comprehensive improvement of high-precision exposure, pattern consistency and electrical stability is realized.

The invention discloses a preparation method of a vertical comb-driven MEMS (Micro Electro Mechanical System) micromirror, which comprises the following steps of: forming a through alignment mark and a pre-etched comb structure on a device layer by using a first composite mask, and forming the through alignment mark and the pre-etched comb structure on the back surface of the device layer on a first substrate through a composite mask process, after the first substrate and the second substrate are bonded, the self-alignment composite mask of the comb tooth structure is aligned with the back face pre-etched comb tooth structure through the through alignment mark, high-precision alignment of the comb tooth structure is achieved, accumulated errors are avoided, and the yield of device preparation is improved.

The invention is suitable for the field of imaging, and discloses a micro lens array zoom module zoom method and an imaging system, and the method comprises the steps: obtaining a mapping relation table between a deviation objective lens working distance and a micro lens array state of a micro lens array zoom module; acquiring a laser spot image formed by irradiating the to-be-measured object with laser, and calculating the position of the to-be-measured object to the focal plane of the objective lens; determining an adjustment reference distance of the micro-lens array zoom module based on the position from the object to be measured to the focal plane of the objective lens, and comparing the adjustment reference distance with the mapping relation table to determine the micro-lens array state of the micro-lens array zoom module; and on the basis of the determined state of the microlens array, a focusing instruction is generated so as to realize automatic zooming of the microlens array zooming module, automatic zooming of the microlens array zooming module is realized, and the method has the advantages of extremely high focusing speed and high precision.

The invention discloses an electromagnetic micromirror output feedback tracking control method and device based on adaptive Q learning, and the method comprises the steps: constructing an electromagnetic micromirror model based on a physical structure of an electromagnetic micromirror; combining the electromagnetic micro-mirror model with a reference trajectory to construct an augmentation system so as to convert a trajectory tracking problem into a state adjustment problem; based on the augmented system, designing a Q function Bellman equation to establish a data-driven performance evaluation framework; based on the augmented system, the state of the augmented system is reconstructed through historical input and output data, so that angular velocity measurement is avoided; obtaining an optimal control input and a new Q function Bellman equation based on the reconstructed augmented system state and the Q function Bellman equation; and based on the optimal control input and the new Q function Bellman equation, solving a control problem by using an adaptive Q learning algorithm. The method breaks through the limitation that a traditional model depends on a control method, and achieves optimal tracking control only through historical input and output data.

The illumination system comprises a light source and a digital micro-mirror device used for generating different phase modulation images, an aberration-eliminating combined lens is arranged between the digital micro-mirror device and a microscope main body, the digital micro-mirror device is arranged at the front focus position of the aberration-eliminating combined lens, and the digital micro-mirror device is arranged at the front focus position of the aberration-eliminating combined lens. The rear focus of the aberration-eliminating combined lens coincides with the focus of the objective lens of the microscope main body in the direction of the digital micro-mirror device, the aberration-eliminating combined lens comprises an aberration-eliminating lens group, the focal length f of the aberration-eliminating lens group is 45-70mm, f and the diagonal length X of the digital micro-mirror device meet the following relation: X is greater than or equal to 0.125 * f, the digital micro-mirror device has the advantages that a larger area can be imaged during single imaging while the digital micro-mirror device is used for stably switching modulation images with different phases, and more accurate analysis and measurement are facilitated.

The invention belongs to the field of particulate matter optical sensing, and particularly relates to a particulate matter light scattering signal acquisition method and device, and the method comprises the steps: controlling scattered light with different scattering angles generated by particulate matter to be detected to reach a digital micromirror device DMD; enabling scattered light of different scattering angle combinations to reach a photoelectric detector by utilizing an on state and an off state of each micromirror in the DMD so as to realize multiple acquisition of scattered light signal intensity by the photoelectric detector and obtain a measurement signal vector S; wherein when a single micro-mirror is turned on, scattered light reaching the micro-mirror is focused on the photoelectric detector through the micro-mirror according to a preset light path, and when the single micro-mirror is turned off, the scattered light reaching the micro-mirror is diffused to an area outside the photoelectric detector; 1 norm minimization is carried out on X = (phi psi)-1S, and X and a sparse domain psi are determined; and performing inversion according to P = psi X to obtain the scattered light intensity P of different scattering angles generated by the particulate matter to be measured. According to the invention, the collection efficiency of scattered light intensity spatial distribution can be improved.

The invention relates to the technical field of preparation of medical supplies, in particular to a surgical membrane and a preparation process. During specific use, firstly, a polyurethane base membrane is selected and subjected to plasma treatment; spraying a nano SiO2 dispersion liquid containing a photoinitiator on the surface of the treated polyurethane base film, and then performing ultraviolet patterning irradiation to form a micro-bulge structure to obtain a base material layer; projecting the colloidal fluid to a temperature gradient mask through a digital micromirror device, so that the colloidal fluid is subjected to regional thermal polymerization on the substrate layer to form an intelligent adhesive layer with viscosity gradient; by adopting an aerosol jet printing technology, super absorbent fibers and polyvinyl alcohol-borax dynamic crosslinking hydrogel are co-deposited to form a drainage layer, so that the technical problems that a surgical membrane prepared by a surgical membrane preparation mode in the prior art is inflexible in adhesion and poor in surface structure performance, and a preparation process is difficult to accurately control are solved.

The invention provides an MEMS (Micro Electro Mechanical System) micromirror array chip, a module and optical scanning equipment. The MEMS micromirror array chip comprises a plurality of micromirror structures, a substrate, a vertical lead structure and a capacitance angle sensing structure, according to the micro-mirror array chip integrated with the capacitive sensor, array-level real-time angle detection, feedback control and high-precision scanning angle detection are realized, and the micro-mirror array chip is fast in driving and resistant to interference; meanwhile, the wiring density is reduced by frequency division multiplexing isolation signals; in addition, the application of a monolithic integrated capacitance angle sensor in a high-density micro-mirror array chip is realized by a thick substrate with a silicon through hole; and finally, the micromirror array chip of the monolithic integrated capacitance angle sensor is used for precision optical scanning equipment, a photoelectric angle detector is omitted, optical scanning high-precision real-time angle detection and feedback control, high-precision angle detection and high-speed scanning are realized, the use design is convenient, and the cost is low.

The invention provides a large-mirror-surface MEMS two-dimensional scanning micromirror which comprises a fast scanning shaft, a slow scanning shaft, a balance frame with multiple turns of coils, a micromirror surface and reinforcing ribs on the back face of the micromirror, the fast scanning shaft extends in the first direction, one end of the fast scanning shaft is connected with the micromirror surface, the slow scanning shaft extends in the second direction, and the other end of the fast scanning shaft is connected with the micromirror surface. The other end is connected with a balance frame with a plurality of turns of coils; the slow scanning shaft extends in a second direction perpendicular to the first direction, one end of the slow scanning shaft is connected with the balance frame with the multi-turn coil, and the other end of the slow scanning shaft is used for being connected with an external substrate; the balance frame with a plurality of turns of coils is of a hollow structure and is arranged around the mirror surface of the micro-mirror; the reinforcing ribs on the back face of the micro-mirror are of an oval hollow structure and are fixedly arranged on the lower surface of the mirror face of the micro-mirror, and the reinforcing ribs are connected in the first direction and the second direction to form a supporting structure. According to the structure, the rigidity of the mirror surface is greatly improved, and the capability of resisting external force interference is remarkably enhanced.

The invention discloses an electrostatic comb tooth driving MEMS micromirror with an independent electrode structure and a manufacturing method, and belongs to the field of micro-optical electro-mechanical systems, and the electrostatic comb tooth driving MEMS micromirror comprises a mirror surface, comb tooth electrodes, a comb tooth supporting structure, a torsion beam, a bonding pad, a cavity and a fixed frame. And the driving movable comb tooth electrode and the detection movable comb tooth electrode are connected with the bonding pad through the torsion beam. According to the micro-mirror, comb electrodes are divided into detection comb electrodes and driving comb electrodes by filling isolation channels, and parasitic capacitance is reduced by removing silicon substrates at the bottoms of the comb electrodes, so that feed-through interference of driving signals on detection signals is avoided, and the capacitance detection precision of the electrostatic MEMS micro-mirror is improved. According to the back cavity etching priority sequence, the invention further discloses two manufacturing methods of the electrostatic MEMS micromirror with the independent electrode structure, and according to the manufacturing methods of the electrostatic MEMS micromirror, the isolation and interconnection of different comb teeth electrodes are realized by filling a channel, an insulating layer and a metal wire with a polymer.

The invention provides a multi-physical field compensation method and system for an exposure machine, and the method comprises the following steps: constructing a dynamic error transfer model, and obtaining a coupling parameter based on the output of a coupling function; carrying out eigenvalue decomposition on the coupling parameters, screening principal component vectors to obtain a mapping matrix, modulating the mapping matrix through a thermal weight matrix to obtain a modulation matrix, and carrying out space-time weight reconstruction based on the modulation matrix to obtain a four-dimensional compensation parameter matrix; the control parameters of the air supply pressure of the air floating guide rail, the deflection angle of the DMD micromirror and the power of the laser are adjusted. A dynamic error transfer model containing mechanical-thermal-optical coupling characteristics is constructed, a vibration spectrum, temperature field distribution and light intensity energy data are fused in real time, compensation parameters are subjected to space-time weight reconstruction to obtain a four-dimensional compensation parameter matrix, the real-time performance of matching correction is improved, and therefore the parameter compensation effect and the machining precision are improved.

An optical construction includes a lens film having an outermost structured first major surface and an opposing outermost substantially planar second major surface. The first major surface includes a plurality of microlenses. A radiation cured optically opaque mask layer is disposed on the second major surface of the lens film. The mask layer has an average thickness of less than about 10 microns and defines a plurality of laser-ablated through openings therein. The through openings are aligned to the microlenses in a one-to-one correspondence, such that for a light incident on the structured first major surface along an incident direction forming an incident angle with the second major surface, an optical transmittance of the optical construction as a function of a transmitted angle includes a first transmitted peak having a first peak transmittance T1≥40%. The first transmitted peak can be within about 10 degrees of the incident angle.

The invention relates to the field of wafer defect detection, in particular to a rapid zooming wafer detection microscope based on MEMS and a detection method. The microscope comprises an illumination part, a sample stage, a spectroscope, a microscope objective, an MEMS micromirror array zoom module, a CMOS image sensor, a laser interference distance measuring sensor and a synchronous control and processing module based on an FPGA. The MEMS micro-mirror array zoom module composed of a plurality of micro-mirror units is introduced into a light path, the deflection state of each micro-mirror unit is adjusted, a dynamic reflecting surface with a controllable equivalent curvature is formed, focusing regulation and control of imaging light beams are achieved, electronic focusing without mechanical movement is completed, the response speed is superior to that of traditional mechanical adjustment, and the imaging quality is improved. And the method is suitable for high-speed online detection.

The invention relates to the technical field of semiconductors, in particular to a preparation method of an MEMS micromirror, and the preparation method comprises the steps: providing a wafer substrate which is provided with a front surface and a back surface which are opposite to each other, and the front surface is a functional surface used for forming the MEMS micromirror; a conductive column and a first mark are formed on the wafer substrate, the conductive column penetrates through the wafer substrate, and the first mark is located on the back face of the wafer substrate; forming a second mark and a first functional structure on the front surface of the wafer substrate; forming a bonding layer on the front side of the wafer substrate, wherein the bonding layer is located above the conductive columns, the second marks and the first functional structures; forming a mark window for exposing the second mark on the bonding layer by taking the first mark as an overlay alignment point; and forming a second functional structure on the bonding layer by taking the second mark as an overlay alignment point, and aligning the second functional structure with the first functional structure in an overlay manner. Based on the technical scheme, the alignment precision in the MEMS micromirror preparation process can be effectively improved.

The invention relates to an eyewear display system (1) for displaying a virtual image in a field of view of a user, the eyewear display system comprising: a display unit (14) for emitting light (163", 161'', 162'') as computer-generated image information in an emission direction; a deflection unit (17) for deflecting the light (163", 161'', 162'') emitted by the display unit (14) as computer-generated image information into an eye (10) of the user; and a plurality of micromirror elements (12, 12', 12"), each of which can be tilted in a support structure (200) and each of which has a reflective surface (25) for deflecting the light (163", 161", 162") emitted by the display unit (14) as computer-generated image information; wherein the micromirror elements (12, 12', 12'') and the support structure (200) are arranged in a sealed housing element (17a) of the deflection unit (17), said housing element being filled with a liquid (23), in order to provide an eyewear display system (1) which offers improved immersion.

The invention provides a structured light projector calibration method and system and a medium, and the method comprises the steps: projecting a multi-frequency stripe pattern to a target region based on an MEMS micromirror array module, obtaining a distorted image sequence, and carrying out the phase decoding, and obtaining a phase diagram corresponding to each frequency; resolving the phase diagram based on a phase shift method and an optical path triangulation principle to obtain a preliminary three-dimensional point coordinate; constructing a neural network model and a calibration sample set, obtaining a real three-dimensional coordinate by using a standard calibration plate or a known curved surface, and calculating the deviation between the initial three-dimensional point coordinate and the real three-dimensional coordinate to obtain a training sample set; and training the neural network model according to a training sample set based on an Euclidean distance loss function, outputting a three-dimensional offset compensation amount according to the neural network model, correcting the initial three-dimensional point coordinates, and realizing an end-to-end error self-compensation mechanism through the neural network model, so that deviation compensation is effectively performed on the three-dimensional point coordinates, and the accuracy of the three-dimensional point coordinates is improved. And the three-dimensional reconstruction precision is improved.

The invention relates to a two-dimensional biaxial piezoelectric MEMS (Micro Electro Mechanical System) micromirror, belongs to the technical field of semiconductor equipment, and solves the problem that the MEMS micromirror in the prior art cannot be overturned at a large angle. The MEMS micromirror comprises a silicon wafer substrate, and a reflecting mirror surface and N cantilever beams which are formed by etching on the silicon wafer substrate, and N is 2 or 4; the N cantilever beams are symmetrically arranged on the periphery of the reflecting mirror surface, the fixed ends of the N cantilever beams are integrally connected with the silicon wafer substrate, and the free ends of the N cantilever beams are integrally connected with the reflecting mirror surface; the fixed ends are uniformly distributed on the silicon wafer substrate, and the free ends are uniformly distributed on the reflecting mirror surface; each cantilever beam is provided with a piezoelectric driving block, after the piezoelectric driving blocks are powered on, the piezoelectric driving blocks drive the cantilever beams to bend, and the bending of the cantilever beams drives the reflection mirror surface to turn over. And the large-angle overturning of the MEMS micro-mirror during working is realized.

According to the micro-mirror array based on the electric control deformable micro-nano structure provided by the invention, the micro-mirror array with remarkable size advantage and cost benefit can be manufactured by innovatively fusing the electric control deformable suspended nano structure and the mirror surface design of the supporting column body; the suspended nano-structure can generate surface shape deformation through potential regulation and control so as to drive the mirror surface array to generate displacement, so that optical phase regulation and control or optical display are carried out through the mirror surface array, and the key technical bottlenecks of complex manufacturing process, low duty ratio, insufficient dynamic performance and the like of existing market products are effectively solved; performance limitation of a traditional micro-mirror device is broken through, and meanwhile localization breakthrough of a core device is achieved.

The invention discloses a raster scanning correction method and system for an electromagnetic MEMS micromirror, and belongs to the technical field of raster scanning correction, and the method comprises the steps: collecting the real-time three-axis attitude information of an electromagnetic MEMS micromirror product in a three-dimensional space, and the fast and slow axis piezoresistive signals of the micromirror; carrying out PID control by taking the angle difference value as an error signal, outputting a driving voltage of a fast axis and a slow axis of the MEMS micro-mirror after the scanning view field correction, and further mapping to obtain a correction angle of micro-mirror scanning; and taking the correction angle as the input of PID control, and correcting the rotation angle of the micromirror by minimizing the tracking error between the rotation angle of the micromirror and the correction angle. Three-axis attitude information of an electromagnetic MEMS micro-mirror product is collected, and an angle difference value between the three-axis attitude information and standard three-axis attitude information is introduced into PID control to adjust a fast-slow axis driving signal, so that the rotation angle of the micro-mirror is corrected, and correction and compensation of grating distortion in grating scanning are realized. And the accuracy of the reconstruction quality of the three-dimensional point cloud is ensured.

The invention discloses a semiconductor etching end point detection method and a multi-channel detection system, and the detection method comprises the following steps: outputting detection light; expanding the detection light into a continuous spectrum band; imaging the continuous spectral band to a modulation surface of a digital micromirror device, and establishing a pixel group corresponding to each narrow-band wavelength of the continuous spectral band; performing spatial sampling on the continuous spectrum band, and distributing and writing a unique radio frequency modulation frequency f for each pixel group; respectively executing vibration type switch modulation on each pixel group at a radio frequency modulation frequency f so as to convert wavelength information of a continuous spectrum band into a time domain frequency optical signal; converting the time domain frequency optical signal into a time domain electric signal; performing frequency domain analysis on the time domain electric signal, and demodulating gas absorption light intensity corresponding to each modulation frequency; and judging the etching end point of the semiconductor according to the change trend of the gas absorption light intensity. According to the invention, parallel detection of a plurality of spectrum channels can be realized through a single detector so as to judge an etching end point.

The invention concerns an image projection device (15) comprising: a light source (24), preferably comprising a light-emitting diode, and an optical engine (35) including a digital micromirror device (36), the optical engine (35) being located downstream of the light source (24) and containing data information corresponding to a main image (30), so as to project said main image along a predetermined light path. The main image is formed by the reunion of a first image and a second image, different from the first image, that are adjoined to each other. The light projection device (15) further comprises an optical device (40) arranged on the light path of the main image (20) such that it receives the first image and the second image, and is configured to project said first image in a first direction and to project said second image in a second direction, different from the first direction.

The invention discloses a calibration method of a polarization focal plane imaging system and an imaging system, relates to the field of photoelectric imaging and remote sensing detection imaging, and solves the problems of low correction efficiency and difficulty in correcting a system with a changed polarization state in the conventional polarization error correction technology. According to the calibration method, a plurality of coding patterns and corresponding polarization modulation matrixes are obtained based on the collected uniform light field and serve as calibration results. The polarization error correction method comprises the steps of obtaining an observation intensity vector based on a target scene; a corresponding polarization modulation matrix is obtained based on the coding pattern according to a coding polarization modulation matrix lookup table, and then a down-sampling Stokes vector after polarization error correction is obtained; and completing the correction of the polarization error through an imaging reconstruction method. A polarization focal plane imaging system comprises an imaging lens, a DMD digital micromirror array coding module, a focal plane DoFP polarization detector and an imaging reconstruction module. The method is suitable for the fields of remote sensing detection, target identification, environment monitoring and the like.

The invention relates to an optical waveguide coupler based on a hard substrate and a preparation method thereof, and belongs to the technical field of couplers. The method comprises the following steps: preparing a lower rectangular waveguide core layer on a hard substrate through an ultraviolet lithography technology; preparing a lower reflecting micro-mirror through an excimer laser technology, and plating a reflecting film on the surface of the lower reflecting micro-mirror; then preparing an upper rectangular waveguide core layer through an ultraviolet lithography technology on the basis; preparing an upper reflecting micro-mirror at a corresponding vertical position of the lower reflecting micro-mirror through an excimer laser technology, and plating a reflecting film on the surface of the upper reflecting micro-mirror; the optical waveguide coupler prepared by the method realizes high-density interlayer interconnection, and is relatively high in application flexibility and high in interlayer coupling efficiency.

Laser-scanning systems for augmented reality glasses displays and LiDAR (light detection and ranging) use photonic integrated circuits to generate multiple collimated (or low-divergence) modulated laser beams. Laser light is guided on the photonic chip, expanded, and emitted from the surface of the chip (using grating coupler devices) as one or more large-diameter (e.g., millimeter-scale), collimated or low-divergence beams. These gratings may be integrated onto movable microelectromechanical systems (MEMS) plates to steer the beam along two angular axes. Alternatively, the beam(s) from the grating(s) may be steered by a separate MEMS mirror integrated onto the photonic chip or on another chip. Such systems enable multi-beam laser scanning systems without collimation lenses, reducing the size and packaging complexity of high-performance laser scanning systems for augmented reality glasses and LiDAR.

The invention provides an angle detection device and a laser radar scanning system, and relates to the field of optical detection, the device is used for detecting the inclination angle of an MEMS micromirror based on a first rotating shaft and a second rotating shaft, and the device comprises a light source; the photoelectric detector matrix comprises N photoelectric detector arrays, the photoelectric detector matrix and the light source are located on the same plane, N is larger than or equal to 4, and the light source is located in the center of the photoelectric detector matrix. Based on the device, angle detection of the MEMS micromirror based on biaxial inclination can be realized, light spot distribution of reflected laser is detected through a detection array formed by a plurality of photoelectric detectors, the response time of a sensor can be shortened so as to realize real-time detection of angle change of the MEMS micromirror, and the photoelectric detectors are arranged in a matrix form, so that the detection accuracy is improved. The MEMS micro-mirror angle detection device is compact in overall structure arrangement and small in occupied space, so that the device can be arranged in a laser radar scanning system more easily, and angle detection can be directly carried out on the MEMS micro-mirror.

The invention discloses a self-adaptive endoscope system and method based on photoacoustic image structure feature recognition, and relates to the technical field of photoacoustic endoscopic imaging, the system comprises a control system, a light source system, an endoscope probe, a feedback system, a signal processing system and a computing terminal; the control system synchronously triggers the light source system and the signal processing system, the light source system comprises a white light source and a laser, laser exciting light enters the endoscope probe through a single-mode optical fiber, scanning is controlled by a micro-electro-mechanical system (micro-electro-mechanical system scanning micro-mirror) scanning micro-mirror in the probe, scanning light enters the focusing lens group through the relay lens, and the focusing lens group is connected with the signal processing system through the relay lens. A to-be-imaged tissue surface is irradiated by the liquid lens, echo signals are acquired and processed by the signal processing system, photoacoustic image reconstruction is completed, the feedback system is connected with the liquid lens in the probe, and optical signals of optical images are acquired and reconstructed by an eyepiece at the top of the endoscope and a matched CMOS (complementary metal oxide semiconductor).

The invention discloses a scanning type exposure method and system adopting a parallel digital micromirror array, and relates to the technical field of photoetching exposure and maskless direct writing of mask.The scanning type exposure method comprises the steps that parallel digital micromirror initial mapping is established through a reference target exposure detection registration method; generating a block distortion field parameter table according to the initial mapping of the parallel digital micromirror, determining a micro-mark insertion position based on the block distortion field parameter table, and generating an expected coordinate; performing micro-mark exposure on the expected coordinate position, acquiring imaging data of the inserted micro-mark position, extracting an actual measurement coordinate from the imaging data of the micro-mark position, calculating a residual error by taking the expected coordinate and the actual measurement coordinate as an input difference, and writing the residual error into a residual error set; incremental fitting is carried out according to the residual set, the block distortion field parameter table is updated, and the exposure controller controls the parallel digital micromirror array to remap the pattern according to the updated block distortion field parameter table and triggers exposure. The method provided by the invention has better effects in coordinate mapping consistency and block parameter manageability.