407 results about "Micro mirror" patented technology

The invention discloses a preparation method of a vertical comb-driven MEMS (Micro Electro Mechanical System) micromirror, which comprises the following steps of: forming a through alignment mark and a pre-etched comb structure on a device layer by using a first composite mask, and forming the through alignment mark and the pre-etched comb structure on the back surface of the device layer on a first substrate through a composite mask process, after the first substrate and the second substrate are bonded, the self-alignment composite mask of the comb tooth structure is aligned with the back face pre-etched comb tooth structure through the through alignment mark, high-precision alignment of the comb tooth structure is achieved, accumulated errors are avoided, and the yield of device preparation is improved.

The invention provides a large-mirror-surface MEMS two-dimensional scanning micromirror which comprises a fast scanning shaft, a slow scanning shaft, a balance frame with multiple turns of coils, a micromirror surface and reinforcing ribs on the back face of the micromirror, the fast scanning shaft extends in the first direction, one end of the fast scanning shaft is connected with the micromirror surface, the slow scanning shaft extends in the second direction, and the other end of the fast scanning shaft is connected with the micromirror surface. The other end is connected with a balance frame with a plurality of turns of coils; the slow scanning shaft extends in a second direction perpendicular to the first direction, one end of the slow scanning shaft is connected with the balance frame with the multi-turn coil, and the other end of the slow scanning shaft is used for being connected with an external substrate; the balance frame with a plurality of turns of coils is of a hollow structure and is arranged around the mirror surface of the micro-mirror; the reinforcing ribs on the back face of the micro-mirror are of an oval hollow structure and are fixedly arranged on the lower surface of the mirror face of the micro-mirror, and the reinforcing ribs are connected in the first direction and the second direction to form a supporting structure. According to the structure, the rigidity of the mirror surface is greatly improved, and the capability of resisting external force interference is remarkably enhanced.

The invention relates to the field of wafer defect detection, in particular to a rapid zooming wafer detection microscope based on MEMS and a detection method. The microscope comprises an illumination part, a sample stage, a spectroscope, a microscope objective, an MEMS micromirror array zoom module, a CMOS image sensor, a laser interference distance measuring sensor and a synchronous control and processing module based on an FPGA. The MEMS micro-mirror array zoom module composed of a plurality of micro-mirror units is introduced into a light path, the deflection state of each micro-mirror unit is adjusted, a dynamic reflecting surface with a controllable equivalent curvature is formed, focusing regulation and control of imaging light beams are achieved, electronic focusing without mechanical movement is completed, the response speed is superior to that of traditional mechanical adjustment, and the imaging quality is improved. And the method is suitable for high-speed online detection.

The invention provides a structured light projector calibration method and system and a medium, and the method comprises the steps: projecting a multi-frequency stripe pattern to a target region based on an MEMS micromirror array module, obtaining a distorted image sequence, and carrying out the phase decoding, and obtaining a phase diagram corresponding to each frequency; resolving the phase diagram based on a phase shift method and an optical path triangulation principle to obtain a preliminary three-dimensional point coordinate; constructing a neural network model and a calibration sample set, obtaining a real three-dimensional coordinate by using a standard calibration plate or a known curved surface, and calculating the deviation between the initial three-dimensional point coordinate and the real three-dimensional coordinate to obtain a training sample set; and training the neural network model according to a training sample set based on an Euclidean distance loss function, outputting a three-dimensional offset compensation amount according to the neural network model, correcting the initial three-dimensional point coordinates, and realizing an end-to-end error self-compensation mechanism through the neural network model, so that deviation compensation is effectively performed on the three-dimensional point coordinates, and the accuracy of the three-dimensional point coordinates is improved. And the three-dimensional reconstruction precision is improved.

The invention discloses a semiconductor etching end point detection method and a multi-channel detection system, and the detection method comprises the following steps: outputting detection light; expanding the detection light into a continuous spectrum band; imaging the continuous spectral band to a modulation surface of a digital micromirror device, and establishing a pixel group corresponding to each narrow-band wavelength of the continuous spectral band; performing spatial sampling on the continuous spectrum band, and distributing and writing a unique radio frequency modulation frequency f for each pixel group; respectively executing vibration type switch modulation on each pixel group at a radio frequency modulation frequency f so as to convert wavelength information of a continuous spectrum band into a time domain frequency optical signal; converting the time domain frequency optical signal into a time domain electric signal; performing frequency domain analysis on the time domain electric signal, and demodulating gas absorption light intensity corresponding to each modulation frequency; and judging the etching end point of the semiconductor according to the change trend of the gas absorption light intensity. According to the invention, parallel detection of a plurality of spectrum channels can be realized through a single detector so as to judge an etching end point.

The invention discloses a calibration method of a polarization focal plane imaging system and an imaging system, relates to the field of photoelectric imaging and remote sensing detection imaging, and solves the problems of low correction efficiency and difficulty in correcting a system with a changed polarization state in the conventional polarization error correction technology. According to the calibration method, a plurality of coding patterns and corresponding polarization modulation matrixes are obtained based on the collected uniform light field and serve as calibration results. The polarization error correction method comprises the steps of obtaining an observation intensity vector based on a target scene; a corresponding polarization modulation matrix is obtained based on the coding pattern according to a coding polarization modulation matrix lookup table, and then a down-sampling Stokes vector after polarization error correction is obtained; and completing the correction of the polarization error through an imaging reconstruction method. A polarization focal plane imaging system comprises an imaging lens, a DMD digital micromirror array coding module, a focal plane DoFP polarization detector and an imaging reconstruction module. The method is suitable for the fields of remote sensing detection, target identification, environment monitoring and the like.

The invention discloses a scanning type exposure method and system adopting a parallel digital micromirror array, and relates to the technical field of photoetching exposure and maskless direct writing of mask.The scanning type exposure method comprises the steps that parallel digital micromirror initial mapping is established through a reference target exposure detection registration method; generating a block distortion field parameter table according to the initial mapping of the parallel digital micromirror, determining a micro-mark insertion position based on the block distortion field parameter table, and generating an expected coordinate; performing micro-mark exposure on the expected coordinate position, acquiring imaging data of the inserted micro-mark position, extracting an actual measurement coordinate from the imaging data of the micro-mark position, calculating a residual error by taking the expected coordinate and the actual measurement coordinate as an input difference, and writing the residual error into a residual error set; incremental fitting is carried out according to the residual set, the block distortion field parameter table is updated, and the exposure controller controls the parallel digital micromirror array to remap the pattern according to the updated block distortion field parameter table and triggers exposure. The method provided by the invention has better effects in coordinate mapping consistency and block parameter manageability.

The invention relates to a structured light illumination confocal super-resolution measurement system and method, and relates to the technical field of optical measurement. The system comprises a digital micromirror device (DMD), a sample platform, an electric displacement platform, a microscopic imaging assembly, a complementary metal oxide semiconductor (CMOS) imaging assembly and computer equipment, and the DMD is used for adjusting the point light source array and the structured light field. According to the DMD-based confocal super-resolution measurement method, a structured light field and a signal-noise separation technology are combined, and high-precision and high-resolution three-dimensional surface reconstruction can be realized. By using the flexibility of the DMD and the advantages of the super-resolution technology, the spatial resolution and speed of confocal imaging are effectively improved, so that the measurement process is more accurate. In addition, low-rank decomposition and self-supervised deep learning methods are fused, the image reconstruction process is optimized, noise interference is suppressed, and the overall performance of the system is further improved.

The invention relates to a micromirror element (200) as it can be used in micro-electro-mechanical systems (100), in particular for use in equipment (1) for semiconductor technology, and to a corresponding micro-electro-mechanical system (100) with at least one micromirror element (200). The micromirror element (200) comprises a mirror substrate (210) and a reflective coating (220) applied to the mirror surface (215) of the mirror substrate (210) which is intended to reflect, wherein at least one intermediate layer (230) is provided between the mirror substrate (210) and the reflective coating (220), wherein the at least one intermediate layer (230) is designed such that the at least one intermediate layer (230) together with the reflective coating (220) can be regarded as a combined layer (240) in relation to the mirror substrate (210) and the combined coefficient of thermal expansion of the reflective coating (220) and the at least one intermediate layer (230) corresponds essentially to the coefficient of thermal expansion of the mirror substrate (210) at least for a predetermined temperature.

The invention discloses a moving target identification and tracking system based on an analog micromirror array (AMA), belongs to the technical field of photoelectric tracking and machine vision, and aims to solve the technical problems of slow response, large inertia and complex structure of a traditional mechanical tracking system. According to the technical scheme, an AMA composed of a plurality of MEMS micromirror units which can be independently controlled and have the static or quasi-static two-dimensional deflection capacity is adopted as a non-mechanical light beam deflection actuator, the AMA can be composed of micromirror arrays in various forms, digital image data are analyzed in real time to solve the target offset, and the non-mechanical light beam deflection actuator is obtained. And an instruction is generated to drive the AMA to deflect at a high speed so as to compensate the deflection, so that continuous and stable locking and tracking imaging of the moving target are realized. The system has the advantages of being high in response speed, high in tracking precision, free of mechanical inertia and compact in structure, supports flexible switching of various working modes such as wide-area scanning and long-distance tracking, and is high in application flexibility.

The invention relates to a MEMS mirror array module (100) for use in semiconductor technology equipment. The MEMS mirror array module (100) comprises at least one MEMS micromirror unit (200) with a MEMS mirror array structure (210) and an elongated interface element (250) over which the MEMS mirror array structure (210) projects laterally, and a higher-level assembly (300) with at least one receptacle (350) for the interface element (250) of the MEMS micromirror unit (200), wherein the MEMS micromirror unit (200) is mounted in a receptacle (350) of the higher-level assembly (300) such that the MEMS mirror array structure (210) of the MEMS micromirror unit (200) abuts the higher-level assembly (300). A gas atmosphere with a thermal conductivity of more than 0.05 W / (m·K) is introduced into a gap (400) between the interface element (250) and the receptacle (350).

The invention relates to a method for producing at least one micromirror element (200) as it can be used in micro-electro-mechanical systems (100), in particular for use in semiconductor technology equipment (1), and to a micro-electro-mechanical system (100) comprising corresponding micromirror elements (200). The process includes the following steps: - Providing a flat, two-sided mirror substrate (210); - Incorporating a predetermined shape at least on the side (215) of the provided mirror substrate (210) intended to be reflective; and - Applying a reflective coating (220) at least to the side (215) of the provided mirror substrate (210) intended to be reflective.

The invention relates to the technical field of intelligent peripherals, in particular to a user-oriented interaction information expansion method, which comprises the following steps that: each keycap acquires displacement and pressure, generates an event packet, uploads the event packet through an optical wireless link, and obtains a clock and supplies power; constructing a keycap graph by a master controller, obtaining an intention vector through graph convolution and pooling, inputting the intention vector into a cyclic network to generate a pixel matrix and a phase matrix, and downlink after Bernoulli sparse coding; performing key cap side orthogonal matching pursuit decoding and four-round gradient optimization, and outputting a differential pixel set, a differential phase set and a synchronization mark; the master control refreshes the digital micromirror array and the ultrasonic phased array in a differential manner, locks a frame-level time sequence through a synchronization pulse, compensates link delay and hardware drift in real time based on Kalman filtering, and keeps an optical-acoustic alignment error to be less than 100 microseconds; degradation monitoring enables a link to be automatically switched to a pre-carved character layer and to be quickly recovered when the link is abnormal, and a keyboard interaction information expansion scheme with low delay and high consistency is provided.

The invention relates to the technical field of optical waveguide preparation, and discloses an optical waveguide mother set splicing-free preparation method based on a DMD dynamic mask, and the method comprises the steps: obtaining the layout data of an optical waveguide mother set as initial design information, and generating a mask pattern sequence which comprises a plurality of partition mask patterns; establishing a pixel mapping relationship between the on-off state of the micro-mirror unit and the partition mask pattern; driving the transparent substrate to execute partition positioning movement on the platform, and controlling the current exposure area of the photosensitive material layer to be aligned with the projection area of the partition mask pattern; on the basis of the pixel mapping relation and the partition positioning movement result, activating the mask pattern, and carrying out non-interval continuous exposure to form a full-page latent image pattern; the whole latent image pattern is subjected to developing treatment, the embossment structure of the optical waveguide master mask is treated and transferred into the transparent substrate, a waveguide core layer pattern is formed, the effects of non-interval continuous exposure and no segmented splicing are achieved, the preparation period of the surface embossment optical waveguide master mask is shortened, and the processing efficiency and the batch preparation yield are improved.

The invention relates to a MEMS mirror array module (100) for use in semiconductor technology equipment. The MEMS mirror array module (100) comprises at least one MEMS micromirror unit (200) with a MEMS mirror array structure (210) and a higher-level assembly (300), wherein the MEMS micromirror unit (200) is attached to the higher-level assembly (230) such that the MEMS mirror array structure (210) of the MEMS micromirror unit (200) is in contact with the higher-level assembly (300). The MEMS mirror array module (100) is configured such that sufficient heat conduction from the MEMS mirror array structure (210) to the higher-level assembly (300) is achieved to prevent an undesirably high temperature rise in or on the MEMS mirror array structure (210).

The application provides a microelectronic element and a preparation method thereof and an electronic device, and relates to the technical field of integrated circuits. The microelectronic element comprises a substrate, at least two adjusting members, a support structure and a micro-mirror structure; the at least two adjusting members are arranged along a first direction, the first end of each adjusting member is arranged on the substrate, and the second end of each adjusting member is arranged in an extendable and retractable manner along a second direction; the support structure comprises a support beam, a support column and a rotating beam, the support beam is connected to the second end of the adjusting member, the surface of the support beam away from the substrate is connected to the rotating beam through the support column, and the surface of the rotating beam away from the support beam is connected to the micro-mirror structure. The application can solve the problems that the structure of the microelectronic element is complex and the adjustment process of the deflection angle of the micro-vibration mirror is difficult.

Lamp (10) with: a light source (100) designed to emit a first light; and a beam splitter (200) exposed to the first light beam and configured to transmit part of the first light beam to form a transmitted light beam and to reflect another part of the first light to form a reflected light beam, wherein the luminaire (10) produces an output beam pattern that includes the transmitted light beam and the reflected light beam, and a reflector (300) configured to further reflect the first light beam reflected by the beam splitter (200) to form a second reflected light beam, wherein the output beam pattern includes the second reflected light beam, characterized by a digital micromirror device (DMD, 400) configured to further reflect the second reflected light beam to form a third reflected light beam, wherein the output beam pattern includes the third reflected light beam, and a common circuit board (PCB, 800) on which the light source (100) and the digital micromirror device (400) are mounted.

The present invention presents improved systems and methods for performing multi-photon lithography. A line-scanning temporally focused two-photon lithography (LS-TFTPL) technique is capable of patterning three-dimensional structures with high throughput. An example LS-TFTPL system may include a pulsed laser, first optical components for expanding light pulses into an elongated or line cross section, a digital micromirror device for modulating the light pulses with a linear pattern and dispersing spectral components of the modulated light pulses, and second optical components for focusing the dispersed spectral components of the modulated light pulse at a line in or on a target material. The focused spectral components may alter the target material within selected voxels along the line, where the selected voxels spatially correspond to the linear pattern.

The invention relates to the technical field of micro-electro-mechanical systems, in particular to an MEMS micromirror structure and a preparation method thereof, and a supporting structure is bonded to the top surface of a substrate; the torsion beam is fixedly connected with the supporting structure, and the reflector is fixed in the middle of the torsion beam and divided into a first part and a second part by the torsion beam; the first interdigital electrodes are located on the side, away from the torsion beam, of the first part and comprise first fixed electrodes and first movable electrodes which are sequentially and alternately distributed in the direction away from the first part, and the top faces of the first fixed electrodes and the top faces of the first movable electrodes are not flush. The second interdigital electrode is located on the side, away from the torsion beam, of the second part and comprises a second fixed electrode and a second movable electrode which are sequentially and alternately distributed in the direction away from the second part, and the top faces of the second fixed electrode and the second movable electrode are not flush; the first movable electrode and the second movable electrode are used for being inclined by applying opposite driving force and driving the reflecting mirror to rotate around the torsion beam by a preset angle. The driving voltage for driving the micromirror structure can be reduced at least under the condition that the same driving force is provided.

This application discloses a calibration method, apparatus, electronic device, and storage medium for a circuit board exposure machine, relating to the field of circuit board manufacturing. According to a first aspect of this application, a calibration method for a circuit board exposure machine is proposed, applied to a circuit board exposure machine including a camera, a platform, and a digital micromirror. The method includes: moving the camera based on a standard target point on a test board to calibrate the camera; moving the platform based on the standard target point to calibrate the platform; acquiring a first exposure result from the digital micromirror and calibrating the digital micromirror based on the first exposure result; acquiring a second exposure result from the digital micromirror and calibrating the circuit board exposure machine based on the second exposure result. The circuit board exposure machine calibration method according to the first aspect of this application allows for step-by-step inspection of each key component of the circuit board exposure machine, enabling rapid identification of problematic components and reducing repair time.

This application provides a detection device, a control method and control unit for the detection device, a lidar system, and a terminal. The detection device includes at least one laser, at least one area array detector, at least one lens assembly, at least one photodetector, and at least one microelectromechanical system (MEMS) micromirror. The lens assembly focuses the reflected light from at least one first laser beam onto the area array detector, with the reflected light from the at least one first laser beam located within the detection range of the lens assembly. The MEMS micromirror reflects the reflected light from at least one second laser beam onto the photodetector, with the reflected light from the at least one second laser beam located within the detection range of the MEMS micromirror. Specifically, the at least one first laser beam and the at least one second laser beam are emitted by at least one laser. The MEMS micromirror and lens assembly in the detection device receive the reflected light from lasers in different areas, achieving long-distance ranging through this dual-range mode.

The invention discloses a DMD dynamic area activation three-dimensional imaging system based on camera visual positioning, and relates to the technical field of optics. Aiming at the problems of low activation efficiency, poor light spot adaptability and insufficient dynamic scene adaptation of an existing system DMD full panel, the position and the size of a laser light spot on a DMD panel are captured in real time through camera visual positioning, a micro-mirror area just surrounding the light spot is dynamically activated through image preprocessing, boundary extraction and coordinate mapping, and the laser light spot is accurately activated. A matched measurement matrix is generated according to the size of the activation area and is loaded to the DMD to realize spatial coded modulation, a single-pixel detector synchronously acquires modulation signals, a phase difference is calculated in combination with a four-step phase shift method, and a three-dimensional depth map is reconstructed. According to the method, DMD full panel activation is not needed, the micromirror utilization rate and imaging efficiency are remarkably improved, meanwhile, the three-dimensional imaging precision is guaranteed, and the method is suitable for industrial part detection, small and medium-sized target modeling and other scenes.

The present application relates to the technical field of furniture detection, and relates to a device for detecting the smoothness of the inner wall of a hole in solid wood furniture, comprising a support and a detection unit, the support being used for arranging and adjusting the direction and angle of the detection unit, the detection unit comprising a fiber bundle probe and a main component, the fiber bundle probe being used for emitting light and receiving reflected light of the inner wall of the hole in the solid wood furniture to detect the smoothness, the fiber bundle probe comprising one emitting fiber and a plurality of receiving fibers, the emitting fiber being located at the center and the plurality of receiving fibers being uniformly distributed around the emitting fiber; the main component being connected with the fiber bundle probe and being used for providing a light source and processing reflected light signals, the main component comprising a laser diode, a programmable laser drive circuit, a MEMS micromirror array, a photodiode array and a microprocessor, the present application realizes non-contact detection through emitting and receiving light, completely avoids physical damage to the hole wall of the wood, and is particularly suitable for quality control of high-grade solid wood furniture.

The application discloses a kind of diffractive light neural network computing systems and methods for realizing pure optical nonlinearity, belong to photonic computing and artificial intelligence hardware technical field.Its system includes coherent light source, linear light computing unit, nonlinear light activation unit and optical detection unit arranged in order along optical path, wherein linear light computing unit is programmable phase modulation using spatial light modulator, nonlinear light activation unit is programmable binary amplitude modulation using digital micromirror device, and both are directly coupled to form pure optical computing path without photoelectric conversion on optical path.Its method trains neural network through customized loss function, drives nonlinear activation function output to binary convergence, and maps the parameters obtained by training into phase map and binary mask respectively and loads to hardware.The application realizes true all-optical nonlinear computation, with the advantages of high energy efficiency, extremely low delay, compact structure and strong parallel processing capability.

This invention relates to an optical Ising calculation method and system based on dual digital micromirror devices (DMDs). First, the combinatorial optimization problem is mapped to an Ising model. Multiple mask vectors are constructed, and each mask vector is decomposed into multiple binary bit planes. A spin configuration matrix is ​​constructed and loaded into DMD-A. For each mask vector, its binary bit planes are sequentially loaded into DMD-B. The light intensity modulated by the two DMDs is collected and processed. The optical inner product is obtained by combining the bit-weighted components, and then the energy contribution value of the mask vector is calculated. The total Hamiltonian is obtained by summing all contributions. The energy difference is calculated by randomly flipping the spins and repeating the above steps. The probability of accepting the current flip is calculated based on the energy difference. This process is iterated until the maximum number of iterations is reached to obtain the final solution. The system is used to implement the above method. Compared with the prior art, this invention can achieve a high-speed, stable, and coherently independent optical Ising solution method.

Methods and apparatuses disclosed herein use an outward-facing display of an eye-worn device (10) to provide indications (42) to an observer device (120) having line-of-sight to the eye-worn device (10). Example indications (42) include solid colors or patterns, which may or may not use color, serving as authentication symbols. In one or more embodiments, the eye-worn device (10) displays or updates an indication (42) on a responsive basis, as part of authentication procedure. Various display types may be used, with one or more embodiments relying on the use of microelectromechanical system (MEMS) mirrors, and the indications (42) may be provided using visible light or light in other wavelengths.

Variable-angle ellipsometry is performed using a high speed polarization state modulator, a photodetector, and a digital micromirror device or spinning disk to encode the angle of incidence of light with a high sampling rate in a time domain or frequency domain. A variable-angle ellipsometer uses a high speed, axially stationary polarization state modulator, such as a photoelastic modulator, and a high speed detector, such as a photodiode, for high speed data acquisition. To acquire data at a plurality of incident angles, a lens is used to generate a large incident angle distribution along an optical axis that is at an oblique angle of incidence and discrete or combinations of incident angles of light are selected in a sequence in the time domain or modulated over a plurality of incident angles in the frequency domain.

The invention belongs to the technical field of electronic manufacturing, and particularly relates to a patterning preparation method of a flexible circuit board, which comprises the following steps of: pre-processing and precisely positioning a flexible substrate; through an integrated multi-point optical deformation sensing system, structured light projection and high-resolution image acquisition are utilized, and a substrate surface deformation field function is sensed and constructed in a real-time and high-resolution manner; calculating an inverse deformation field in real time and reconstructing a compensation pattern through a high-speed digital pattern compensation processor based on the deformation field function; a high-resolution micro-mirror array digital light processor (DMD) is adopted as a dynamic mask, an ultraviolet light source and a projection optical system are combined, and the compensated pattern is exposed to a photoresist layer on the flexible substrate in real time; and finally, carrying out post-treatment such as developing, etching and photoresist removing. The problem of inherent deformation of the flexible substrate is fundamentally solved, the patterning precision, the preparation reliability and the yield are remarkably improved, and the preparation requirements of complex patterns and large-area flexible circuit boards are met.

The invention relates to an MEMS micromirror, in particular to a self-alignment MEMS micromirror based on electrostatic driving, which comprises an inner layer structure and an outer layer structure, the inner layer structure comprises a rectangular mirror surface, a rectangular inner frame and a rectangular outer frame, the left side surface and the right side surface of the rectangular mirror surface are respectively provided with a mirror surface boss in an extending manner, and the side surface of each mirror surface boss is provided with two comb tooth beams A in an extending manner; the inner side face of the rectangular inner frame is provided with four rows of driving comb teeth A in an extending mode, the front outer side face and the rear outer side face of the rectangular inner frame are each provided with an inner frame boss in an extending mode, the side face of each inner frame boss is provided with two comb tooth beams B in an extending mode, and the inner side face of the rectangular outer frame is provided with four rows of driving comb teeth B. The outer layer structure comprises four comb tooth beams C and a rectangular bottom frame. A rectangular anchor block is fixed to the upper surface of each frame edge of the rectangular bottom frame, and a row of driving comb teeth C are arranged on the inner side face of each rectangular anchor block in an extending mode. The MEMS micro-mirror solves the problem that an existing MEMS micro-mirror is low in light source utilization rate, and is suitable for the fields of projection display, laser radar, optical communication and the like.

The invention discloses a geometric phase metasurface high-flux laser direct writing system and method, and the system comprises a femtosecond laser, a beam expander, a angular dispersion compensation module, a digital micromirror array, a second 4F system, a spatial light modulator, a fifth lens and an objective lens according to the light advancing direction. Wherein the spatial light modulator is used for performing phase modulation on each unit light spot from the digital micromirror array based on a loaded holographic phase diagram to form a rod-shaped light spot array, and the rod-shaped light spot array forms parallel light transmitted at different angles through the fifth lens and converges at an entrance pupil of the objective lens together. And finally, a parallel direct-writing light spot array is formed in the two-photon photoresist, and geometric phase metasurface unit structure array printing is completed. According to the system, high-flux and high-flexibility direct-writing manufacturing of the geometric phase type metasurface is finally realized.