20 results about "Angular distribution" patented technology

Variable-angle ellipsometry is performed using a high speed polarization state modulator, a photodetector, and a digital micromirror device or spinning disk to encode the angle of incidence of light with a high sampling rate in a time domain or frequency domain. A variable-angle ellipsometer uses a high speed, axially stationary polarization state modulator, such as a photoelastic modulator, and a high speed detector, such as a photodiode, for high speed data acquisition. To acquire data at a plurality of incident angles, a lens is used to generate a large incident angle distribution along an optical axis that is at an oblique angle of incidence and discrete or combinations of incident angles of light are selected in a sequence in the time domain or modulated over a plurality of incident angles in the frequency domain.

The invention belongs to the technical field of proton radiation therapy planning, and provides a planning method and system for realizing proton arc therapy, and the method comprises the steps: calculating the corresponding rotation speed of a rack during the delivery of each irradiation field beam spot based on a proton multi-field intensity modulated therapy plan; based on the calculation result, the angle distribution of the irradiation fields is optimized and adjusted, so that the rotation speed of the rack in each irradiation field is close to the constant speed, and the speed fluctuation is effectively reduced; and on the basis that the rack is approximately rotated at a constant speed, a self-adaptive beam intensity control system is designed, so that the rack is rotated at a constant speed in the whole treatment process. According to the technical scheme, the mechanical burden of the rack is relieved, the treatment time is remarkably shortened, the overall treatment efficiency is improved, and a new technical breakthrough and development direction is brought to the field of proton treatment.

A method for improving imaging of a feature on a mask to a substrate during scanning operation of a lithographic apparatus. The method includes obtaining a dynamic pupil representing evolution of an angular distribution of radiation exposing a mask during a scanning operation of a lithographic apparatus and determining a variation of shift of a feature at a substrate during the scanning operation due to interaction of the dynamic pupil with the mask. The method includes configuring a mask parameter and / or or a control parameter of the lithographic apparatus to reduce the variation of shift of the feature.

To determine the imaging quality of the optical system (13) when illuminated by the illumination light (1) within the entrance pupil or exit pupil (11) to be measured, the test structure (5) is initially arranged in the object plane (4) of the optical system (13) and an illumination angular distribution is specified for illuminating the test structure (5) with the illumination light (1). The test structure (5) is illuminated at different distance positions (z m ) of the test structure (5). The intensity I(x, y, z m ) of the illumination light (1) is measured in the image plane (15) of the optical system (13). The spatial image measured in this way is compared with the simulated spatial image, the fitting parameters of the function set used to describe the simulated spatial image are adjusted, and the wavefront of the optical system (13) is determined on the basis of the result of minimizing the difference. The specified illumination angular distribution corresponds to a sub-aperture (10 i ) within the entrance pupil (11) to be measured. For another specified sub-aperture, the steps from "specify" to "determine" are repeated. The wavefront of the optical system is determined by combining the results obtained for the measurement sub-apertures (10 i ) within the entrance pupil (11) to be measured.

An X-ray source is disclosed, comprising: an electron source configured to provide an electron beam; an aperture configured to limit the angular distribution of the electron beam; a secondary emission limiting aperture configured to limit the angular distribution of the secondary X-ray emission, wherein the electron beam causes secondary X-ray emission to be emitted from a region surrounding the aperture; a first deflector located downstream of the electron beam limiting aperture and configured to deflect the electron beam toward the secondary emission limiting aperture; a target located downstream of the secondary emission limiting aperture and configured to generate primary X-ray emission through interaction with the electron beam; and an exit window located to transmit the primary X-ray emission, wherein the secondary emission is prevented from reaching the exit window by the secondary emission limiting aperture. A corresponding method is also disclosed.

A radio wave reflector includes a first flat surface and first inclined surface that reflect radio waves. The first inclined surface is connected to at least part of the outer edges of the first flat surface and is inclined with respect to the first flat surface. The areas of the first flat surface and first inclined surface have a relationship in which the difference between the maximum value of the strengths of reflected waves from the first flat surface and that for the first inclined surface is equal to or smaller than a predetermined value. In an angular distribution of reflected waves with respect to a normal passing through the center of the first flat surface, the first inclined surface is inclined with respect to the first flat surface so that an overlap is formed between angular ranges in which their respective reflected waves have a predetermined strength or higher.

The invention discloses a Compton scattering imaging device based on focusing collimation and a defect detection method. The Compton scattering imaging device comprises a ray source used for generating X-rays or gamma-rays with certain energy and angle distribution; the front collimator is used for collimating rays output by the ray source to form a beam to perform point-by-point scanning on a measured object; the rear collimator with the focusing structure is formed by splicing a plurality of focusing collimation structures which are distributed and arranged, effective light-passing axes of the focusing collimation structures are converged in the same focusing area, and the rear collimator with the focusing structure is used for receiving scattering signals generated in the effective light-passing axis direction within the range of the focusing area with the set depth of the measured object; the focusing area covers the scanning point; the large-area detector is used for receiving the scattering signal output by the rear collimator and converting the scattering signal into an analog electric signal; and the electronics acquisition system is used for receiving the analog electric signal, converting the analog electric signal into a digital signal, processing the digital signal and transmitting the processed digital signal to the upper computer to generate an internal structure image of the measured object. According to the invention, the spatial resolution capability is greatly improved.

The invention relates to a device for replicating a hologram from a master hologram. The device preferably comprises an intensity-modulating unit and a beam-shaping unit, wherein the intensity-modulating unit is configured for setting the intensity distribution of a light wave with which the beam-shaping unit is subsequently irradiated. The beam-shaping unit is configured for generating a free-form wave with a spatially varying angular distribution for illuminating the master hologram, wherein the angular distribution of the free-form wave can be predetermined by the intensity distribution of the light wave from the intensity-modulating unit incident on the beam-shaping unit.

Variable-angle ellipsometry is performed using a high speed polarization state modulator, a photodetector, and a digital micromirror device or spinning disk to encode the angle of incidence of light with a high sampling rate in a time domain or frequency domain. A variable-angle ellipsometer uses a high speed, axially stationary polarization state modulator, such as a photoelastic modulator, and a high speed detector, such as a photodiode, for high speed data acquisition. To acquire data at a plurality of incident angles, a lens is used to generate a large incident angle distribution along an optical axis that is at an oblique angle of incidence and discrete or combinations of incident angles of light are selected in a sequence in the time domain or modulated over a plurality of incident angles in the frequency domain.

The utility model relates to the technical field of nuclear radiation, in particular to a neutron angle correlation distribution information acquisition system, which comprises a neutron detector, a time position sensitive detector module, a time flight measurement module, a synchronous trigger control module, a signal processing module, a data acquisition module and a spherical support frame, the system adopts a structure in which multiple neutron detectors are uniformly distributed, is combined with a time position sensitive detector module and a time flight measurement module, is distributed on a spherical framework, and can collect neutron angle correlation distribution in a 4pi space angle, including neutron energy, time and angle; and angle distribution, time difference distribution, energy association, event counting and direction association information are obtained, and data information support is provided for radionuclide identification.

The invention relates to a spectrometer device (130) for obtaining at least one item of spectral information about at least one object (110) by means of spectral measurement, the spectrometer device (130) comprising: (1) at least one sample interface (132), the sample interface (132) being configured to define a measurement pose of the object (110), in particular during the spectral measurement, the measuring surface further defines an x-y plane and thereby defines an x-axis and a y-axis; (2) at least one light emitting element (138) wherein the light emitting element (138) is configured for emitting illumination light (140) onto the at least one object (110) in order to generate detection light (142) from the at least one object (110); (3) at least one detector (144), where the detector (144) comprises a plurality of light sensitive elements (164), where each of the light sensitive elements (164) is configured to generate at least one detector (144) signal when the detection light (142) is received from the object (110) in order to obtain the spectral information item; wherein the spectrometer device (130) is configured such that the received detection light (142) of at least two light-sensitive elements (164) of the plurality of light-sensitive elements (164) each exhibit an angular distribution over the sample interface, and wherein at least two angular distributions of the at least two light-sensitive elements (164) at least partially overlap.

The invention discloses a method and a device for detecting obstacles in a laser radar blind area, a medium and equipment, and the method comprises the steps: determining the model of a laser radar main body, and enabling an angle region scanned by the laser radar to be a concentric fan-shaped or circular region; obtaining a non-blind area laser radar point cloud and removing noise to obtain effective point cloud data; an angle distribution array is constructed, elements of the angle distribution array are point cloud numbers in one-to-one correspondence with the angle intervals, the angle distribution array is traversed and indexed, and the point cloud numbers of the elements are counted; and if an angle interval corresponding to the number of the elements in the array is judged to be an obstacle angle interval, outputting an angle value of the obstacle angle interval. The obstacle is determined through the number of the point clouds in the angle interval, the distance and angle distribution between the obstacle and the laser radar are obtained, and the distance and angle distribution can be used as reference information for the robot to avoid the obstacle later.

There is provided an illumination uniformity correction apparatus for use in an illumination system comprising at least a first and a second transmissive correction plate. The transmissive correction plates are arranged to be moveable relatively to each other. At least one of the at least first and second transmissive correction plates comprising a varying parameter profile configured to make a local angular redistribution of radiation transmitted through said at least one transmissive correction plate.

The invention relates to a method for the replication of a hologram into a replication assembly with an exposure module. The exposure module has at least one light source and a master element comprising a master hologram to be replicated, and is designed to bring the replication assembly into optical contact with the master element. The at least one light source exposes the master hologram to obtain a replicated hologram on a region of the replication assembly. The method comprises providing a beam-shaping unit, setting an intensity distribution of a light wave with which the beam-shaping unit is irradiated, and generating a free-form wave by means of the beam-shaping unit with a spatially variable angular distribution, wherein the angular distribution is specified by the intensity distribution of the light wave. The invention further relates to a method for determining an intensity distribution of a light wave, an intensity-modulating unit for exposing a master hologram to a desired free-form wave, and the use thereof for replicating a master hologram in a replication assembly.

The invention relates to a spectrometer device (130) for obtaining at least one item of spectral information about at least one object (110) by means of spectral measurement, the spectrometer device (130) comprising: (1) at least one sample interface (132), the sample interface (132) defining a measurement surface, the measurement surface being configured to define a measurement pose of the object (110), the measurement pose being configured to define a measurement pose of the object (110); wherein the measurement surface further defines an x-y plane and thereby defines an x-axis (134) and a y-axis (136), in particular during spectral measurement; (2) at least one light emitting element (138), where the light emitting element (138) is configured to emit illumination light (140) to illuminate the at least one object (110) in order to generate detection light (142) from the at least one object (110), where the incident illumination light (140) has an angular distribution over the sample interface (132) that results in an angular distribution of specular Fresnel reflected light over the sample interface (132); wherein the angle is an angle between a projection of a projection of a specified light ray of the light, described by the respective angular distribution, in the x-z plane and a projection of a normal on the measurement surface, in the x-z plane, the angle is an angle between a projection of a specified light projection of the light described by the corresponding angle distribution in the y-z plane and a projection of a normal on the measurement surface in the y-z plane; (3) at least one detector (144), where the detector (144) is configured to generate at least one detector signal when detection light (142) is received from the object (110) in order to obtain a spectral information item, where the detection light (142) received by the detector (144) has an angular distribution over the sample interface (132); wherein the spectrometer device (130) is configured for at least partially separating the angular distribution and the angular distribution.

Disclosed is an X-ray source comprising: an electron source configured to provide an electron beam; an aperture configured to limit an angular distribution of the electron beam, where the electron beam causes emission of secondary X-ray radiation from a region around the aperture; a secondary radiation limiting aperture configured to limit an angular distribution of secondary X-ray radiation, where the secondary radiation limiting aperture is disposed downstream of the electron beam limiting aperture; a first deflector configured to deflect the electron beam toward the secondary radiation limiting aperture; a target disposed downstream of the secondary radiation limiting aperture and configured to generate primary X-ray radiation by interacting with the electron beam; and an exit window arranged to transmit the primary X-ray radiation; wherein secondary radiation is prevented from reaching the exit window by the secondary radiation limiting aperture. A corresponding method is also disclosed.

The invention relates to a device for replicating a holograms from a master hologram. The device preferably comprises an intensity-modulating unit and a beam-shaping unit, wherein the intensity-modulating unit is configured for adjusting an intensity distribution of a light wave with which the beam-shaping unit is subsequently irradiated. The beam-shaping unit is configured for generating a free-form wave having a spatially variable angular distribution for exposure of the master hologram, wherein the angular distribution of the free-form wave can be specified by the intensity distribution of the light wave from the intensity-modulating unit, which is incident on the beam-shaping unit.

The invention relates to an electron imaging apparatus (23) configured to be connected to an energy analyzer apparatus. The electron imaging apparatus comprises a receiving aperture (22), a control unit, and a field generating unit (65). The receiving aperture is configured for receiving electrons from a focal volume (200) which form an electron beam (25). The control unit is configured for providing a control signal to the field generating unit based on a desired height of the electron beam in an energy dispersive direction (y) of the energy analyzer apparatus at a proximal end (90) of the electron imaging apparatus and a desired angular distribution (α p ) in the energy dispersive direction at the proximal end. The field generating unit is configured for generating at least one electrostatic, magnetic, or electrostatic and magnetic field based on the at least one control signal such that the at least one electrostatic, magnetic, or electrostatic and magnetic field is configured for exerting a force on the electrons of the electron beam in the energy dispersive direction such that a height of the electron beam in the energy dispersive direction at the proximal end corresponds to the desired height in the energy dispersive direction at the proximal end and an angular distribution in the energy dispersive direction at the proximal end corresponds to the desired angular distribution in the energy dispersive direction at the proximal end.

A transmission-type X-ray source is disclosed, comprising an electron source for providing an electron beam; a target configured to generate X-ray radiation by interaction with the electron beam; an X-ray transparent exit window; a plurality of electron beam limiting apertures, each configured to limit an angular distribution of the electron beam; a secondary radiation limiting aperture; a first deflector arranged to deflect the electron beam from the secondary radiation limiting aperture towards the target; a second optional deflector arranged to deflect the electron beam from a selected one of the electron beam limiting apertures towards the secondary radiation limiting aperture; and an aperture selector configured to make the selected one of the electron beam limiting apertures and the electron beam path coincide; wherein each of the electron beam limiting apertures and the secondary radiation limiting aperture are arranged so that there is no direct line of sight for secondary X-ray radiation from the electron beam limiting apertures to the exit window. The aperture selector may comprise a third deflector arranged to deflect the electron beam towards the selected one of the electron beam limiting apertures, or an actuator arranged to bring the selected one of the electron beam limiting apertures into the electron beam path.

The application provides a particle size distribution detection device for particles, comprising a first vibrating screen assembly, a first optical structure, a first tray and a first screen; the first optical structure is used for emitting first laser to irradiate particles to be detected in a detection space, generating a first detection signal; the first tray is used for weighing the first mass of the particles to be detected; a second vibrating screen assembly is formed with a second detection space, used for obtaining the second mass of part of the particles to be detected passing through the first screen, and generating a second detection signal according to the part of the particles to be detected; a controller is used for obtaining the light intensity angle distribution of the first detection light according to the first detection signal, obtaining the light intensity angle distribution of the second detection light according to the second detection signal, and obtaining the particle size-volume distribution information of at least part of the particles to be detected according to the light intensity angle distribution, the first mass and the second mass based on a normal distribution curve. The application also provides a particle size distribution detection method.