588 results about "Angular distribution" patented technology

A nitride semiconductor substrate having properties preferable for the manufacture of various nitride semiconductor devices is made available, by specifying or controlling the local variation in the off-axis angle of the principal surface of the nitride semiconductor substrate. The substrate, being misoriented, is manufactured to have an off-axis angle distribution across its principal surface such that variation Δθ in the off-axis angle is continuous within a predetermined angular range.

Lighting devices are provided for efficiently distributing light over an area to provided uniform illumination over a wide angle or other tailored illumination patterns. Each light device has at least one light source, at least one collimator for partially collimating light from the light source, and at least one diffuser for diffusing light from the collimator. The diffuser provides diffused light over an area from the diffuser having an intensity that is angularly dependent in accordance with the angular distribution intensity of light outputted from the collimator, so as to provide a predetermined illumination pattern from the device. The light sources and collimators may be provided in one or two-dimensional arrays, and a single diffuser may be formed on each collimator or the diffuser may be along a plate spaced from the collimators.

An apparatus and method for generating electronically steerable beams of sequential penetrating radiation. Charged particles from a source are formed into a beam and accelerated to a target. Electromagnetic radiation generated by the target is emitted with an angular distribution which is a function of the target thickness and the energy of the particles. A beam of particles is produced by allowing the radiation to exit from an apparatus through a collimator proximal to the target. The direction of the beam is determined by the point of radiation production and the corresponding array of transmission regions of the collimator.

A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system comprises an inspection station for receiving a workpiece and a scanner positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner includes a light source arranged to project a beam of P-polarized light and a scanner positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides for detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.

The present invention provides an illumination optical system that enables the direction and mixing of light from light emitting devices. The optical system comprises a plurality of light emitting devices that are spatially arranged in an array, wherein this array comprises one or more sections, such that the light emitting devices in a particular section emit light within a predetermined wavelength range. Through the use of a combination of macroscopic and microscopic optical systems, the illumination created by the array can be manipulated such that a desired illumination distribution is created. The macroscopic optical system provides a means for redirecting the illumination in one or more desired directions, wherein this redirection is provided by a collection of appropriately shaped and positioned reflective optics. Subsequent to its interaction with the macroscopic optical system, the illumination is manipulated by a microscopic optical system that enables the diffusion of the illumination in a predetermined manner, while retaining the desired angular distribution of the illumination created by the macroscopic optical system. Through the appropriate design and orientation of both the macroscopic and microscopic optical systems, a desired illumination effect can be created.

The present invention relates to a laser device comprising at least one large area VCSEL (101) and at least one optical feedback element (201, 301) providing an angular-selective feedback for laser radiation emitted from the laser. The angular-selective feedback is higher for at least one portion of laser radiation emitted at angles θ>0 to the optical axis (601) of the laser than for laser radiation emitted on said optical axis (601). The invention also refers to a method of stabilizing a laser emission of a large area VCSEL in a desired angular distribution (501, 502). With the proposed device and method, the intensity distribution of a large area VCSEL can be stabilized in a desired shape, for example a ring shape.

A projection exposure device, in particular for micro-lithography, serves to produce an image of an object in an image plane positioned in an object plane. This happens with the aid of a light source emitting projection light and illumination optics positioned in the ray path between the light source and the object plane. In addition projection optics positioned in the ray path between the object plane and the image plane serve to guide the projection light. A filter (7) is positioned in a filter plane which lies in the vicinity of a pupil plane between the light source and the object plane. This has a moveable filter element (22') which has at least in certain areas (24) for the projection light a transmission factor which is greater than zero and less than 100%. The moveable filter element (22') is moveable in the filter plane and has a distribution of the transmission factor over the filter face, in such a way that the intensity distribution of the projection light perpendicular to the optical axis (14) in the ray path after the filter (7) changes with the movement of the filter element (22'). With such a filter (7) an illumination angle distribution can be adapted to a pre-set value (FIG. 5).

A light fixture may include LEDs that each emits light into a particular zone on a lens, where each zone has its own focal properties. Each LED may be grouped into one (or more) subset(s) that corresponds to the zone(s) struck by its emitted light. The LEDs may be selectively electrically controllable, so that the amount of light transmitted through each zone may be controllable by the electrical control system of the fixture. Because light transmitted through different zones emerges from the fixture having different widths, the electrical control system can directly control the amount of light emerging at each width. By mixing relatively narrow light with relatively wide light in the proper proportions, the electrical control system of the fixture may produce light having any desired angular profile between “narrow” and “wide”. One may think of the fixture having a controller that features both a dimmer, which can control the optical power or brightness of the fixture 1, and a “width” controller, which can dial in values between “narrow” and “wide” light. By varying the relative contributions of the different beam widths, the angular profile of the total output may be varied, and may advantageously be varied electronically, without any moving parts.

A hyper-spectral imaging filter has serial stages along an optical signal path in a Solc filter configuration. Angularly distributed retarder elements of equal birefringence are stacked in each stage, with a polarizer between stages. The retarders can include tunable (such as abutted liquid crystals tuned in unison), fixed and/or combined tunable and fixed birefringences. Although the retardations are equal within each stage, distinctly different retardations are used for two or more different stages. This causes some stages to pass narrow bandpass peaks and other stages to have widely spaced bandpass peaks. The transmission functions of the serial stages are superimposed with selected preferably-tunable peaks coinciding. The resulting conjugate filter has a high finesse ratio, and good out of band rejection.

An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

A stop collar is assembled using a method including the steps of receiving a bore of a base having a set of fingers extending along an exterior of a tubular, receiving a bore of a sleeve onto the tubular adjacent the set of fingers, and receiving the sleeve onto the set of fingers in an interference-fit. In alternate embodiments, the base comprises a plurality of angularly distributed fingers and/or the base comprises a gap to permit conformance of the base to the tubular. A fingerless base may cooperate with one or more separate fingers to form a base. In an embodiment of the method, the sleeve may be thermally expanded prior to the step of receiving the sleeve onto the set of fingers. The sleeve may be heated to expand the bore prior to being received onto the set of fingers.

Airfoils are provided having non-monotonic meanline angle distributions and local negative camber along a length of the meanline between a point on a leading edge of the airfoil and a point on the trailing edge of the airfoil. The improved airfoil shape decreases the peak of a Mach number of a shock wave that develops in a passage between adjacent airfoils and attenuates or eliminates the shock wave at the suction surface of the airfoil within the passage. A blade constructed by this type of airfoil provides improved fluid flow in the passages between the airfoils, increased efficiency and an improved stall margin, among other benefits.

An image-based measurement technique that directly measures the crepe pattern on a moving sheet employs a suitable arrangement of illumination, optical elements, and an imaging device to obtain digital images of the sheet surface. The image resolution is sufficient to represent tissue crepe folds at the scale of the crepe. A spectral analysis of some or of all the images reveals the crepe folding pitch. Further analysis of the image optionally reveals other crepe structural parameters, such as the distribution of crepe fold orientation angles and distribution of linear fold lengths. Corrective actions can be implemented in response to changes in the crepe structure. The pitch of creping is the primary parameter for describing the crepe pattern; in addition, analyzing the images with a gradient operator can yield information regarding the orientation of the crepe folds and distribution of angles of the crepe furrows on the hood side or equivalently of the crepe seams on the cylinder side.

A polarizer device, for converting an entry light beam into an exit light beam with a defined spatial distribution of polarization states, has an angle varying input device for receiving the entry light beam and for generating a first light beam with a predeterminable first angular distribution of light rays; an angle-selectively active polarization influencing device for receiving the first light beam and for converting the first light beam into a second light beam according to a defined angle function of the polarization state variation; and an angle varying output device for receiving the second light beam and for generating the exit light beam with a second angular distribution from the second light beam. In particular, polarization states with a radial or tangential polarization can be provided cost-effectively in this way.

The liquid crystal display device has red, green, and blue LEDs, each emitting a different color light, as a light source. An acrylic lens is mounted on the emission surface of the LED to change angular distributions of light from the LED. The shape of the acrylic lens varies depending on the color of the LED. The angular distribution of emitting light thereby differs by the color of LED to cancel out wavelength dependency of transmittance at each viewing direction in a liquid crystal panel.

Various embodiments include a multi-color micro-LED array light source that enables well-overlapped light beams of different colors. The multi-color micro-LED array light source includes a thermally conductive substrate and multiple arrays of different color micro-LEDs integrated on the thermally conductive substrate. The micro-LEDs within each array are electrically connected so that they can all be driven in unison. The multi-color array light source also includes a controller that is electrically coupled to and that drives the arrays of micro-LEDs. The controller drives the micro-LEDs in a manner that produces an output light distribution with a spatial wavelength and angular distribution that is suitable for use as a light source.

A lithographic apparatus includes an illumination system to provide a beam of radiation; a support structure to support a patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section; a substrate table to hold a substrate; and a projection system to project the patterned radiation beam onto a target portion of the substrate. The illumination system includes a first spatial light modulator including a first array of individually controllable elements controllable to control the field size of the radiation beam, the field position of the radiation beam or the uniformity of the radiation beam, and a second spatial light modulator arranged to apply a desired angular distribution to the radiation beam.

An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

A position sensing device comprises a light source that radiates diffuse source light along an optical axis direction to a detector, and a moving aperture arrangement positioned between the source and detector, to move perpendicular to the optical axis direction. The moving aperture arrangement comprises first and second limiting apertures, which angularly filter and transmit the diffuse source light to form a measurement spot on the detector. At least one signal output by the detector is indicative of a position of the movable member along a measurement axis. The angular intensity distribution of the angularly filtered rays of light which form the measurement spot is more consistent as a function of position along the measurement axis than the angular intensity distribution of the source light. The resulting consistent intensity distribution within the measurement spot throughout the measurement range enhances measurement linearity and accuracy.