36 results about "Pupil shape" patented technology

An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field (65) with the light from an assigned light source (11) comprises a pupil shaping unit (15, 30) for receiving light from the assigned light source (11) and for generating a predeterminable basic light distribution in a pupil plane (31) of the illumination system and a transmission filter (36) assigned to the pupil shaping unit (15, 30) and having at least one array of individually drivable individual elements for the spatially resolving transmission filtering of the light impinging on the transmission filter in or in proximity to a pupil plane (31, 35) of the illumination system, the transmission filter (36) being designed for generating a predeterminable correction of the basic light distribution. An illumination system of this type can generate a multiplicity of location-dependent intensity distributions in a pupil plane of the illumination system, a high transmittance being ensured. The location-dependent intensity distribution in the pupil plane generates an angle-dependent intensity distribution on the illumination field of the illumination system which can be optimized for a mask structure to be imaged.

A system for multiple mode imaging is disclosed herein. The system is a catadioptric system preferably having an NA greater than 0.9, highly corrected for low and high order monochromatic aberrations. This system uses unique illumination entrances and can collect reflected, diffracted, and scattered light over a range of angles. The system includes a catadioptric group, focusing optics group, and tube lens group. The catadioptric group includes a focusing mirror and a refractive lens / mirror element. The focusing optics group is proximate to an intermediate image, and corrects for aberrations from the catadioptric group, especially high order spherical aberration and coma. The tube lens group forms the magnified image. Different tube lens groups can be used to obtain different magnifications, such as a varifocal tube lens group to continuously change magnifications from 20 to 200×. Multiple imaging modes are possible by varying the illumination geometry and apertures at the pupil plane. Imaging modes include bright-field, full sky, ring dark-field, inverted ring dark-field, directional dark-field, double dark-field, Manhattan geometry, confocal bright-field, confocal dark-field, conoscopic, etc. Illumination can enter the catadioptric optical system using an auxiliary beamsplitter or mirror, or through the catadioptric group at any angle from 0 to 85 degrees from vertical. Multiple beams at multiple angles may be used for illumination. The high NA catadioptric system can also have a relayed pupil plane, used to select different imaging modes, providing simultaneous operation of different imaging modes, Fourier filtering, and other pupil shaping operations.

The lithography illumination system provided by the invention relates to an illumination system for a semiconductor lithography machine. The lithography illumination system includes in turn: a light source for generating an illumination beam; a pupil shaping module for receiving the illumination beam generated by the light source and forming an illumination beam with a specific cross-sectional shape; a microlens array module for receiving the illumination beam from the pupil shaping module. the illumination beam of the module, and form an illumination beam with a one-dimensional trapezoidal light intensity distribution; and a condenser, receiving the illumination beam from the microlens array module, and projecting the converged illumination beam onto an illumination field; The module includes at least two microlens arrays and two pairs of knife-edge arrays. The lithography lighting system of the invention has simple structure and high transmittance, and can generate a one-dimensional trapezoidal light intensity distribution lighting field whose size can be adjusted and meets the requirement of telecentricity. The lithography illumination system of the present invention can be used on 248nm, 193nm or other wavelength lithography machines.

The invention provides a method and a device for analyzing the complex pupil imaging of a segmented primary mirror. The method comprises: establishing a data transmission passage to an optical design simulation module; sending an pupil description command to the optical design simulation module; sending position error parameters and surface shape error parameters of segment mirrors to the opticaldesign simulation module through the data transmission passage; and receiving the wavefront errors of exit pupils fed back by the optical design simulation module through the data transmission passage, wherein the wavefront errors of the exit pupils are obtained through image quality analysis performed by an image quality analysis subunit in the optical design simulation module according to the position error parameters and the surface shape error parameters of the segment mirrors of the primary mirror and the models of the segment mirrors after the image quality analysis subunit simulates the transmission of light rays in the mirror and an actual optical system. The method and the device for analyzing the complex pupil imaging provided by the invention can analyze the pupil shapes of thesegment mirrors of the primary mirror and the influences of the position errors and shape errors of the segment mirrors of the primary mirror on image quality.

The invention relates to a pupil shaping device for photoetching illumination. The pupil shaping device for the photoetching illumination is characterized in by comprising a rotating disc mechanism, a continuous zoom lens group and a controller, wherein the rotating disc mechanism is circumferentially uniformly provided with a plurality of diffractive optical elements; the diffractive optical elements of the rotating disc mechanism and the continuous zoom lens group are sequentially arranged along the direction of square incident light beams generated by a photoetching machine illuminating system; the diffractive optical elements are positioned on the front focal plane of the continuous zoom lens group and are perpendicular to the optical axis of the pupil shaping device; the controller accurately controls the rotation of the rotating disc mechanism and the movement of the diffractive optical elements through an encoder; and the focal distance of the continuous zoom lens group is regulated, and needed illuminating pupil distribution is formed on the image space focal plane, namely a pupil plane, of the continuous zoom lens group. The pupil shaping device disclosed by the invention has the advantages of simple optical system and high optical transmission rate, and can be used for solving the problem of pupil degradation, which is caused by a tapered lens group, of the existing pupil shaping device.