Exposure device and method

The technology of an exposure device and an exposure method is applied in the direction of exposure device of photoengraving process, printing device, microlithography exposure equipment, etc., and can solve the problem of low illumination and the like

Inactive Publication Date: 2003-04-02
NIKON CORP
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  • Claims
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Problems solved by technology

Also, although there is still a proposal to configure a conical axicon system in the optical path between the diffractive optical element and the fly-eye lens, h

Method used

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  • Exposure device and method
  • Exposure device and method
  • Exposure device and method

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Embodiment Construction

[0112] In the exposure apparatus, due to the progress in the miniaturization of the pattern size, when the k1 factor (line width=k1×λ / NA, λ is the wavelength, and NA is the numerical aperture) becomes smaller, the analytical size will diverge from the target size. There is an abnormal line width phenomenon, or a phenomenon in which the fidelity to the screen pattern of the photoresist pattern is deteriorated, or a phenomenon in which the dependency of the type of the resolving power is significantly increased. For example, in the design, the pattern angle of a 90-degree image may become rounded, or the end of the line may become shorter, or the width of the line may increase or become thinner. These phenomena are collectively referred to as Optical Proximity Effect (OPE: Optical Proximity Effect).

[0113] This OPE originally refers to the effect of light caused by transfer, however, recently, with the increase of optical effects, it is also used for photoresist processes incl...

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Abstract

An exposure apparatus with optimum illumination conditions without dependence on the directionality of the fine pattern on a reticle comprises an illumination optical system for illuminating a reticle having a pattern to be transferred and a projection optical system for projecting and transforming the reticle pattern on a substrate. The illumination optical system has pupil shape forming unit for forming four substantially planar light sources on the plane in the vicinity of its pupil, wherein the four planar light sources are arranged at each substantial vertices of a narrow rectangle whose barycenter is located on the optical axis so as to adjust a resist pattern to be transferred or a substrate pattern formed via a process to a predetermined size and a predetermined shape.

Description

technical field [0001] The present invention relates to an illumination optical device, an exposure device and an exposure method provided with the illumination optical device, and in particular, to the fabrication of micro-elements such as semiconductor elements, imaging elements, liquid crystal display elements, thin-film magnetic heads, etc. by a lithography process The exposure device, the exposure method, and the adjustment of the preferred illumination optical device for the exposure device. Background technique [0002] A typical exposure device, in which the light beam emitted from the light source is incident on a fly eye lens as an optical integrator, and on its rear focal plane, a plurality of light sources constitute a secondary secondary light source as a substantial surface light source light source. The light beam of this secondary light source is restricted by an aperture diaphragm arranged in the vicinity of the rear focal plane of the fly-eye lens, and the...

Claims

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Application Information

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IPC IPC(8): H01L21/027G03B27/54G03F7/20
CPCG03F7/70058G03B27/54H01L21/027
Inventor 豊田光纪谷津修竹内裕一郎蛭川茂诹访恭一中岛利治
Owner NIKON CORP
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