624 results about "High transmittance" patented technology

The invention relates to the technical field of flexible transparent electrodes, in particular to a Cu / Al laminated metal grid flexible transparent electrode and a preparation method thereof. The Cu / Al laminated metal grid flexible transparent electrode comprises a flexible substrate, a copper layer arranged on the flexible substrate and an aluminum layer arranged on the copper layer, and the aluminum layer located on the outer layer spontaneously forms an Al2O3 passivation layer with the thickness of 2-5 nm in air. The Al2O3 passivation layer can effectively prevent oxygen and moisture from permeating inwards, so that oxidation of the copper layer in a humid or high-temperature environment is fundamentally inhibited, long-term stability of the electrical property of the electrode is ensured, and meanwhile, due to the fact that the thickness of the copper layer is 150-250 nm, excellent conductivity is provided, and low square resistance is achieved; the latticed structure maintains high light transmittance of the electrode while ensuring a high conductive path. Finally, the structure has excellent oxidation resistance, high light transmittance, low sheet resistance and flexible stability under the support of a flexible transparent substrate with the thickness of 50-200 [mu] m, and meets the harsh requirements of a new generation of flexible optoelectronic devices on electrode performance.

The invention relates to the technical field of protective film preparation, and particularly discloses an antistatic silica gel protective film and a preparation method thereof.The protective film comprises a base material layer and an antistatic coating coated on the surface of the base material layer; the base material layer is prepared from methyl vinyl silicone rubber, modified fumed silica, a compound antistatic agent A and a vulcanizing agent, and the antistatic coating is prepared from a compound antistatic agent B and water-based acrylic resin. The preparation method comprises the following steps: banburying, calendering and vulcanizing a compound antistatic agent A, methyl vinyl silicone rubber and modified fumed silica to form the base material layer; and finally, mixing the compound antistatic agent B with water-based acrylic resin to prepare an antistatic coating solution, coating the surface of the base material layer with the antistatic coating solution, and drying and curing to obtain a finished product. The silica gel protective film prepared by the invention has excellent antistatic property, mechanical property, adhesive force and high light transmittance, and is suitable for the fields of electronic equipment screens, optical lenses and the like.

The invention relates to the technical field of photovoltaic packaging materials, and discloses a modified POE photovoltaic packaging adhesive film, a preparation method thereof and a photovoltaic module. The modified POE photovoltaic packaging adhesive film is prepared from 60 to 100 parts of POE resin, 8 to 50 parts of barrier master batch, 0.5 to 2 parts of composite silane coupling agent, 0.5 to 1.5 parts of cross-linking agent and 0.2 to 2 parts of assistant cross-linking agent, the barrier master batch comprises 5-30 parts of polar functionalized grafted POE and 3-20 parts of a barrier agent; the blocking agent is a cycloolefin copolymer COC with Tg less than or equal to 120 DEG C. The modified POE photovoltaic packaging adhesive film has the advantages of high light transmittance, PID resistance and the like of the existing POE adhesive film, and also has high bonding strength and low water vapor transmittance to photovoltaic glass; the problems of adhesion, water resistance and light transmittance of the POE adhesive film are solved synergistically, the inherent processing compatibility problem between COC and a POE substrate is solved, and a foundation is laid for improving the long-term reliability of a photovoltaic module.

The invention relates to the field of glass, in particular to lithium-free alkali aluminosilicate glass as well as a preparation method and application thereof. According to the glass, SiO2, Al2O3, Na2O, K2O, MgO and ZrO2 serve as main components, the content of Li2O is lower than 100 ppm, a nitrate-sulfate-carbon powder composite clarifying agent is adopted, the number of bubbles and the content of residual sulfur are effectively reduced, and use of a toxic or ultraviolet absorption type clarifying agent is avoided. ZrO2 is obtained by calcining a zirconium-based metal-organic framework material and is good in dispersity, and the devitrification resistance is improved. During float forming, through micro-positive pressure, high-purity protective atmosphere and four-zone gradient temperature control, the tin penetration depth is controlled within 15 microns, and the surface tin content is smaller than or equal to 4 micrograms / cm < 2 >. The obtained glass has high light transmittance, high hardness and excellent chemical strengthening performance, and is suitable for the high-end fields of electronic display cover plates, vehicle-mounted screens, touch panels, photovoltaic substrates and the like.

The invention belongs to the technical field of photocuring coatings, and discloses a high-light-transmittance skin-touch coating and a preparation method thereof.The preparation method comprises the steps that a photoinitiator, a diluent, a cross-linking agent and a prepolymer are mixed, and a photocuring coating is obtained; the photoinitiator is a macromolecular photoinitiator with a surface anti-oxidation polymerization inhibition effect, or is a macromolecular photoinitiator and a micromolecular photoinitiator with a surface anti-oxidation polymerization inhibition effect; the photocureable coating is coated on a base material to obtain a wet film, and the wet film is exposed under ultraviolet light to obtain the high-light-transmittance skin-touch coating. The preparation method effectively solves the problems that the surface of a photocuring system is sticky in air and the internal stress of the curing system is released, the skin-touch coating is prepared through one-time exposure, the surface is not sticky, hydrolysis resistance is achieved, the light transmittance of the coating is high, and the skin-touch coating can be used for product outer packaging.

The invention discloses a double-layer acrylic acid OCA optical adhesive for a folding screen and a structural characterization method of the double-layer acrylic acid OCA optical adhesive, and belongs to the technical field of optical adhesives. The OCA optical cement comprises an upper high-creep layer and a lower high-recovery layer, and an intersoluble cross-linked structure is formed on the interface of the two layers through a gradient curing process. The upper layer formula contains 70-90 parts of 2-ethylhexyl acrylate and 10-30 parts of hydroxy butyl acrylate; the formula of the lower layer comprises 20-35 parts of isobornyl acrylate, 50-70 parts of 2-ethylhexyl acrylate and 5-15 parts of hydroxy butyl acrylate. And the longitudinal crosslinking density gradient is represented by adopting a unilateral nuclear magnetic resonance depth analysis technology. The contradiction between high adhesion and high resilience of the folding screen OCA is solved, high light transmittance, low haze, high stripping force and high creep recovery rate are achieved, and the resistance change rate is remarkably reduced after dynamic folding.

The application relates to the technical field of C09D5 / 03, in particular to a high-transmittance acrylic powder resin and a preparation method thereof, raw materials for preparing the acrylic powder resin by weight percentage at least include: 80-100 parts of soft monomers, 400-600 parts of hard monomers, 0-10 parts of carboxyl functional monomers, 200-400 parts of ester functional monomers, 20-100 parts of hydroxyl functional monomers, 10-30 parts of initiators, 5-20 parts of chain transfer agents, 800-1200 parts of solvents and 1-10 parts of nano additives; the nano additives are added, and the synthesis process of the acrylic resin is optimized, so that the prepared acrylic powder resin has high transmittance and good weather resistance, and can meet the actual use requirements in the fields of automobile hubs and photovoltaics.

The present application relates to the technical field of target material, in particular to a preparation method of high-density tin-zinc-zirconium oxide target material. The preparation method comprises the following steps: preparing tin oxide powder, zirconium oxide powder and zinc oxide powder into a mixed slurry, and then performing sand milling, granulation, molding, sintering to obtain the high-density tin-zinc-zirconium oxide target material, wherein the mass ratio of the tin oxide powder, the zirconium oxide powder and the zinc oxide powder is 100:0.1-0.5:9-11. The high-density tin-zinc-zirconium oxide target material prepared by the preparation method has high relative density and low resistivity, and the sputtered film thereof has high transmittance in the visible light range, can replace the traditional indium tin oxide target material, and can be widely applied in the fields of semiconductor integrated circuits, LEDs, displays, touch screens, solar photovoltaics and chemical industry.

The application discloses a physical vapor deposition device, an electrochromic device and a preparation method thereof, and relates to the technical field of electrochromic devices. The preparation method comprises the following steps: sputtering and depositing an electrochromic layer of WO3 on the surface of a first ITO layer, and the oxygen content is any value in the range of 42.5% to 52.5%; sputtering and depositing a pre-set thickness of a tungsten oxide ion conduction layer on the electrochromic layer, and the oxygen content of the corresponding chamber is any value in the range of 35% to 45%; sputtering and depositing an ion storage layer containing lithium ions on the ion conduction layer; depositing a second ITO layer on the ion storage layer, and obtaining the electrochromic device after vacuum annealing treatment and cooling treatment; wherein the deposition temperature of the second ITO layer is any value in the range of 350 DEG C to 400 DEG C, and the annealing temperature of the vacuum annealing treatment is any value in the range of 450 DEG C to 500 DEG C. The electrochromic device prepared by the application has the characteristics of high transmittance and low sheet resistance.

The invention discloses an optical film, a preparation method thereof and a display device, and relates to the technical field of optical functional films. The optical film comprises a base film layer and an antistatic coating arranged on the surface of at least one side of the base film layer. The antistatic coating comprises the following raw material components: water-dispersible polyester resin, water-soluble resin, a cross-linking agent and an antistatic agent; the antistatic agent is obtained by compounding a single-walled carbon nanotube modified with a hydrophilic group and polyaniline acid, the antistatic agent comprises an inner core and a coating layer at least partially coating the inner core, the inner core comprises the single-walled carbon nanotube modified with the hydrophilic group, and the coating layer comprises the polyaniline acid. According to the optical film, the single-walled carbon nanotubes and the polyaniline acid form a composite conductive structure, and then the composite conductive structure is crosslinked with the water-soluble resin and the crosslinking agent to form a three-dimensional conductive network structure, so that the optical film obtains lasting and efficient antistatic performance with extremely low environmental humidity dependence on the premise of keeping high light transmittance, low haze and good coating adhesiveness.

This liquid crystal panel comprises a first substrate, a second substrate, a liquid crystal layer, and an electrode layer. An insulating layer is formed on the electrode layer of at least one substrate, from among the first substrate and the second substrate, provided with the electrode layer. The direction of the transmission axis of a first polarizing plate provided on the first substrate side and the direction of the transmission axis of a second polarizing plate provided on the second substrate side are perpendicular or parallel to each other. Light emitted from the light source passes through the second polarizing plate, the second substrate, the liquid crystal layer, and the first substrate, in this order, provided on the second substrate side. While the electrode layer is applying an electric field to the liquid crystal layer, the transmittance of the light emitted from the first polarizing plate is modulated to an impulse type between a low transmittance and a high transmittance.

The invention provides application of an anti-fog and anti-frost high-light-transmittance coating with self-repairing performance in anti-counterfeiting and an anti-counterfeiting product. The anti-counterfeiting product comprises a solid substrate; the first anti-counterfeiting coating covers at least one part of the surface of the solid substrate and is formed by an anti-fog and anti-frost high-light-transmittance coating with self-repairing performance. The cross-linking is controlled by optimizing the ratio of the amount of substance of hydroxyl in the polymer containing hydroxyl in the main chain or side chain to the amount of substance of the organosilane reagent serving as the cross-linking agent and the polymer containing carboxyl in the main chain or side chain; a cross-linked transparent coating with self-repairing performance, water resistance, long-acting fog resistance, frost resistance and high light transmittance is obtained on a solid substrate by adopting a coating method, and the transparent coating is applied to the anti-counterfeiting field and is directly used as an anti-counterfeiting coating; therefore, the application of the long-acting anti-fog and anti-frost high-light-transmittance coating with the self-repairing performance in the anti-counterfeiting field is developed, and the coating is particularly suitable for anti-counterfeiting of exit-entry certificates with transparent windows.

The invention relates to the technical field of polyimide film preparation, in particular to a high-light-transmittance polyimide film and a preparation method thereof.The preparation method comprises the following steps that aromatic diamine monomers are subjected to vacuum drying and then dissolved in an organic solvent, dianhydride monomers are slowly and dropwise added after the temperature is increased, a polyamide acid solution is obtained through segmented temperature control curing, and a polyimide film is obtained; performing vacuum defoaming on the solution, coating a substrate with the solution, performing gradient heating imidization treatment to obtain a film crude product, and performing plasma surface treatment and inert atmosphere annealing to obtain the high-light-transmittance polyimide film. According to the preparation method, conventional monomers are adopted, through optimization of drying, polymerization, defoaming, film forming, imidization and post-treatment process parameters, introduction of special structural monomers or external filler adding is not needed, the process is simple, the cost is low, the preparation method is suitable for large-scale production, and the prepared polyimide film is high in light transmittance at the wavelength of 550 nm and high in transparency. The optical uniformity, the surface flatness, the thermal stability and the mechanical property are excellent.

This invention belongs to the field of optical functional thin film materials, specifically relating to a silicon-oxygen-aluminum ternary composite optical coating material and its preparation method. Addressing the problem in existing technologies of achieving high transmittance, high hardness, and corrosion resistance synergistically within a single ternary material system, this invention utilizes a single-crystal thin film with a completely ordered single-phase structure epitaxially grown on a MgAl2O4 spinel single-crystal substrate, co-doped with transition metal ions and protons. Employing a combined laser molecular beam epitaxy and low-temperature proton implantation technique, alternatingly ablates the silicon target, aluminum target, and doped target, and simultaneously irradiating with a low-energy hydrogen ion beam under ultra-high vacuum, atomic-level epitaxial growth and in-situ proton embedding are achieved, resulting in a unified high transmittance, high hardness, and corrosion resistance.

This invention provides an infrared thermal imaging method, relating to the field of infrared thermal imaging technology. The method utilizes a germanium infrared lens in an infrared thermal imaging system, whose surface is sequentially composed of subwavelength micro / nano structures and an anti-reflection film structure from the inside out. The infrared thermal imaging method includes: focusing target infrared radiation through the germanium infrared lens onto an infrared detection array; the infrared detection array converting the target infrared radiation into an electrical signal matrix; performing noise reduction and gain correction on the electrical signal matrix to obtain a preprocessed electrical signal matrix; performing temperature compensation on the preprocessed electrical signal matrix based on a temperature compensation formula and a transmittance temperature model to obtain a corrected signal matrix; and sequentially performing non-uniformity correction, image enhancement, and pseudo-color mapping on the corrected signal matrix before outputting and displaying the result. Using the method of this invention, higher transmittance, lower reflection loss, and more stable thermal imaging can be achieved.

The present invention provides a polyimide film and a method for manufacturing the polyimide film, wherein the polyamic acid solution is obtained by imidizing a dianhydric acid component comprising two or more selected from the group consisting of benzophenone tetracarboxylic dianhydride (BTDA), biphenyltetracarboxylic dianhydride (BPDA), and pyromellitic dianhydride (PMDA), and a diamine component comprising paraphenylene diamine (PPD), wherein, based on a total content of 100 mol% of the diamine component, the content of paraphenylene diamine is 70 mol% or more and 100 mol% or less, and based on a total content of 100 mol% of the dianhydric acid component, the content of biphenyltetracarboxylic dianhydride is 50 mol% or more and less than 100 mol%, the dielectric loss rate (Df) is 0.003 or less, and the light transmittance at a wavelength of 550 nm is 15% or more and 50% or less.

The utility model provides a display panel and a display device, and belongs to the technical field of display. The display panel comprises a substrate and a light-emitting device arranged on the substrate. The light-emitting device comprises a first electrode, a light-emitting unit and a second electrode which are sequentially arranged in the direction away from the substrate. A second electrode of the second light-emitting device comprises a first sub-electrode and a second sub-electrode which are arranged in a laminated mode in the direction away from the substrate base plate. The light transmittance of one of the first sub-electrode and the second sub-electrode is greater than that of the other one; the sub-electrode with high light transmittance in the first sub-electrode and the second sub-electrode is marked as a first light-transmitting film, and the sub-electrode with low light transmittance is marked as a second light-transmitting film; one of the second electrode of the first light-emitting device and the second electrode of the second light-emitting device is a third light-transmitting film, and the other one at least comprises a fourth light-transmitting film; the light transmittance of the third light-transmitting film and the light transmittance of the fourth light-transmitting film are both larger than the light transmittance of the second light-transmitting film.

The invention discloses a preparation method of a chalcogenide glass dual-band wide-spectrum antireflection film. The method comprises the steps of substrate cleaning, vacuum baking, ion source cleaning, sequential deposition of nine layers of thin films with specific materials and thicknesses, constant-temperature treatment after plating, cooling and workpiece taking, and double-sided plating. According to the invention, by optimizing the film system design and key process parameters, especially selectively using the ion source to assist deposition, the anti-reflection film with high transmittance (higher than 91.7% and 94.6% respectively) at the two wavebands of 3-5 [mu] m and 8-12 [mu] m is successfully prepared on the chalcogenide glass substrate. The film layer is strong in adhesive force, high in compactness, capable of passing multiple strict environmental reliability tests, excellent in comprehensive performance, good in process repeatability and suitable for a high-performance infrared optical system.

The invention relates to automobile film surface protection, and provides a scratch-resistant coating composition and a preparation method thereof. The composition is prepared from polymer resin containing an acrylate group, polysiloxane acrylate containing a hydrolyzable alkoxy silicon group, composite silane modified double-particle-size nano silicon dioxide, a photoinitiator, an organic silicon cross-linking agent and an auxiliary agent, wherein the nano silicon dioxide is composed of a small-particle-size group and a large-particle-size group; and gamma-methylacryloyloxypropyl silane and gamma-glycidoxypropyl silane are respectively grafted to the two monomers. A micro-thin transparent hard coating is formed on the surface of a polyester base material through staged ultraviolet curing and damp-heat curing, so that the coating has high surface hardness and abrasion resistance and excellent damp-heat aging adhesive force and whitening resistance while keeping high light transmittance and low haze.

The present disclosure provides a film for enhancing the growth of plants in the Cannabaceae family, the film being capable of blocking solar spectrum in the range 430-550 nm. The present disclosure also provides a single- or multi-layer plastic greenhouse film for enhancing cannabis plant growth, where the single- or multi-layer plastic greenhouse film (a) has at least one blue light blocking layer for blocking solar spectrum in the range of 430-500 nm; (b) has a high transmittance for red light in the solar spectrum in the range of 600-750 nm.

The application relates to the field of four-silver coated glass, and particularly discloses a colorless four-silver LOW-E glass, which comprises a glass substrate and a composite film layer deposited on the surface of the glass substrate; the composite film layer is a four-layer silver coating structure formed by compounding SiNx, AZO, NiCr, Ag, ZnAlOx and ZnSnOx in a predetermined order; the thickness of each film layer is accurately controlled; the glass obtained has the following parameters: the glass surface color parameters are Rg=5.7, a*=-0.8 and b*=0.8; the film surface color parameters are Rf=3.9, a*=-1.4 and b*=-0.7; the visible light transmittance T is 67.5%; and the transmittance color parameters are a*=-4.5 and b*=-4.5. The glass surface and the film surface are both colorless, the glass has high light transmittance, and the colorless appearance and the optical transmittance performance are both considered.

The application relates to the field of optical films, in particular to a preparation method of an optical diffusion film. The preparation method of the optical diffusion film comprises the following steps: uniformly mixing a curing agent with polydimethylsiloxane, curing, then performing oxygen plasma treatment and room temperature aging treatment to obtain a polydimethylsiloxane flat plate; dissolving PET particles and PMMA particles in a solvent to obtain a polymer solution; placing the polydimethylsiloxane flat plate above the polymer solution and standing to obtain the optical diffusion film. In the application, PMMA is used as a high glass transition temperature component to be blended with PET, the overall glass transition temperature of the blended system is improved, and the practicability of the optical diffusion film in a high-temperature environment is improved; strong scattering is provided by the difference between the refractive indexes of air holes and a polymer phase, a refractive index gradient is formed by using the refractive index difference between PET and PMMA, a secondary scattering interface is formed, high haze is ensured, light absorption is reduced, and high transmittance is maintained.

The invention relates to a glass-based photoelectric volume pulse wave cover plate material as well as a preparation method and application thereof. The cover plate material comprises: a glass substrate; the annular structural part is embedded in the glass substrate; the annular structural member and the glass substrate are made of the same material; the glass substrate comprises the following components in percentage by mass: 0.1 wt%-0.2 wt% of BaO; 0.1 wt% to 0.6 wt% of PbO; 0.1 wt% to 0.7 wt% of Sb2O3; 25 wt%-61 wt% of SiO2; 16 wt% to 18 wt% of B2O3; 10 wt% to 15 wt% of Al2O3; 8 wt% to 12 wt% of R2O; wherein R2O is composed of Li2O, Na2O and K2O, and the content of K2O is smaller than that of Na2O. The technical problem to be solved is to provide the cover plate material with a large number of sensor optical channels, so that the cover plate material has high transmittance and high crosstalk resistance, a plurality of optical paths can be formed in the cover plate material, and the problems of scattering and the like in the light propagation process are reduced by selecting single glass with a specific formula, so that the light transmission efficiency is improved. The energy loss in the light ray propagation process is reduced, and the propagation distance of the light rays in the glass cover plate is increased; meanwhile, the glass cover plate also has higher mechanical strength.

The present invention relates to a xylylene diisocyanate composition and a photopolymerizable composition including the same. The xylylene diisocyanate composition according to an exemplary example includes a xylylene diisocyanate (XDI) and an acidity adjuster having a boiling point of 110°C or more, wherein the acidity of the composition is greater than 100 ppm and 1,000 ppm or less with respect to the total weight of the xylylene diisocyanate (XDI). The polymerization reaction rate is controlled by adjusting the acidity, so that an optical lens having high transmittance and improved optical uniformity can be manufactured.

The invention discloses physical vapor deposition equipment, an electrochromic device and a preparation method of the electrochromic device, and relates to the technical field of electrochromic devices. The preparation method comprises the following steps: sputtering and depositing the WO3 electrochromic layer on the surface of the first ITO layer, wherein the oxygen content is any one of 42.5-52.5%; sputtering and depositing a tungsten oxide ion conducting layer with a preset thickness on the electrochromic layer, wherein the oxygen content of the corresponding chamber is any one of 35%-45%; sputtering and depositing an ion storage layer containing lithium ions on the ion conduction layer; a second ITO layer is deposited on the ion storage layer, and the electrochromic device is prepared after vacuum annealing treatment and cooling treatment; wherein the deposition temperature of the second ITO layer is any one value from 350 DEG C to 400 DEG C, and the annealing temperature of the vacuum annealing treatment is any one value from 450 DEG C to 500 DEG C. The electrochromic device prepared by the invention has the characteristics of high transmittance and low sheet resistance.

The invention discloses a glass surface multifunctional coating structure as well as a preparation method and application thereof, and belongs to a functional inorganic thin film technology. The method specifically comprises the following steps: firstly, coating a glass substrate with hollow silicon dioxide nanosphere sol to form an initial coating; the acidified hard component sol and the acidified hydrophilic component sol are uniformly mixed, the hard component sol adopts aluminum oxide sol, zirconium dioxide sol or cerium dioxide sol, and the hydrophilic component sol adopts titanium dioxide sol, zinc oxide sol or tin dioxide sol; and coating the surface of the glass substrate containing the initial coating with the mixed sol, carrying out heat treatment annealing, and finally obtaining a compact and stable multifunctional composite coating structure on the surface of the glass. Through a porous framework and inorganic binding phase composite structure, high light transmittance, high mechanical strength and a self-cleaning function are synergistically realized, and the problem that the performances are difficult to balance in the prior art is solved.

To provide a photosensitive resin composition capable of forming a cured product which hardly becomes cloudy even in a high-temperature and high-humidity environment and can maintain high transmittance, a cured product obtained by curing the photosensitive resin composition, a cured film or a microlens composed of the cured product, and an image display device including the cured product or the microlens.SOLUTION: The photosensitive resin composition contains (A) an alkali-soluble resin, (B) a photopolymerizable compound and (C) a photopolymerization initiator, wherein the alkali-soluble resin (A) is a reaction product of a bisarene fluorene compound (A1), an ethylenically unsaturated group-containing monomer (A2) and an acid anhydride (A3), and the acid anhydride (A3) contains two or more compounds selected from compounds represented by the following general formulae (A3-1) to (A3-3).SELECTED DRAWING: None

Disclosed in the present application are a Huygens-metasurface-based transparent transmission unit and a manufacturing method therefor, and a Huygens-metasurface-based transparent transmission array. The unit comprises intermediate dielectric layers, a first metal layer, and a second metal layer. The array comprises a plurality of Huygens-metasurface-based transparent transmission units that are arranged in a rectangular layout. The method comprises: on the basis of the generalized Snell's Law, determining the phase distribution of a Huygens metasurface unit, and adjusting parameters of a double-arc structure, so as to obtain double-arc structure parameters; on the basis of the structure parameters, manufacturing metal layers and performing etching to make the metal layers form on surfaces of PET layers; and positioning a target on each PET layer, and by means of an optically clear adhesive, bonding onto glass the PET layers with the metal layers, so as to manufacture a transparent transmission unit. The embodiments of the present application can achieve high transmittance of electromagnetic waves and achieve easy deployment on existing windows, and extend the wireless-signal reception range in specific areas. The Huygens-metasurface-based transparent transmission unit and the manufacturing method therefor, and the Huygens-metasurface-based transparent transmission array, as provided in the present application, can be widely applied in the technical field of electromagnetic metasurfaces.

The application provides a receiving end filter and a preparation method thereof, and a combined filter, and belongs to the field of coating technology. The application solves the problem that the existing receiving end filter is relatively single. The receiving end filter comprises a glass substrate, a narrow-band pass film system and an anti-reflection film system. The narrow-band pass film system comprises silicon oxide film layers and hydrogenated silicon / hydroxylated silicon / nitrogen hydrogenated silicon film layers which are alternately deposited layer by layer, and a silicon oxide film layer as an outermost layer. The anti-reflection film system comprises silicon oxide film layers and hydrogenated silicon / hydroxylated silicon / nitrogen hydrogenated silicon film layers which are alternately deposited layer by layer, and a silicon oxide film layer as an outermost layer. The receiving end filter has the advantages that the overlapping high transmittance is achieved within an angle range of 0°-60° of an incident angle, and the demand cut-off spectrum band has the effect of inhibiting the transmission of light signals within the angle range of 0°-60° of the incident angle.

The invention discloses transparent conducting layer glass, a preparation method thereof, a perovskite solar cell and application. The transparent conducting layer glass comprises a glass substrate, a GZO layer and an ITZO layer, wherein the GZO layer and the ITZO layer are sequentially deposited on the glass substrate; wherein the GZO layer comprises a zinc oxide layer doped with at least one of aluminum, gallium, boron or indium; the ITZO layer is an indium tin zinc oxide layer; and the number of the ITZO layers is greater than or equal to 1. The transparent conducting layer glass has both high light transmittance and high conductivity. The GZO layer and the ITZO layer are combined, the GZO layer and the ITZO layer are combined, the GZO layer and the ITZO layer are combined, interface energy level matching with a hole transport layer is effectively optimized, interface carrier recombination is reduced, and open-circuit voltage (Voc) and short-circuit current density (Jsc) of the perovskite solar cell are greatly improved. Therefore, the efficiency of the perovskite solar cell is improved.