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797 results about "Vacuum ultraviolet" patented technology
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Vacuum ultraviolet energy is often used in medical devices, because the waves are converted so quickly by oxygen in the air. Current equipment to produce vacuum-ultraviolet radiation is large and prohibitively expensive. Manufacture of the devices also requires the use of hazardous materials, which can harm the environment.
Optical fiber for transmitting ultraviolet ray, optical fiber probe, and method of manufacturing the optical fiber probe
InactiveUS6944380B1High light transmittanceResistant to deteriorationGlass optical fibreGlass making apparatusFiberHydrogen
It is an object of the present invention to provide an optical fiber for transmitting ultraviolet ray which has an improve transmittance and is prevented from deterioration by ultraviolet ray with which it is irradiated. It is another object of the present invention to provide an optical fiber probe which can propagate vacuum ultraviolet ray and deep ultraviolet ray at a high transmittance, is deteriorated only to a limited extent when irradiated with ultraviolet ray and can be etched to have a desired shape of the sharpened section at the fiber end.The present invention provides the optical fiber for transmitting ultraviolet ray which has a core 5 of silica glass containing a given content of fluorine and a clad 6a of silica glass containing a given content of fluorine or boron, a clad 6b of a resin which transmits ultraviolet ray or a clad 6c having air holes H. The clad may be coated with a protective layer and further with a covered layer for protection. In particular, the core, clad and protective layer have a high transmittance for ultraviolet ray and resistance to ultraviolet ray with which they are irradiated, when treated with hydrogen.An optical fiber probe 1 has an optical fiber 2 provided with a sharpened section 3 at the end, which is sharpened with an etchant solution, the sharpened section 3 being coated with a light-shielding metallic film 4.
Owner:JAPAN SCI & TECH CORP
Systems and methods for measurement or analysis of a specimen using separated spectral peaks in light
ActiveUS7067819B2Improve accuracyRadiation pyrometrySpectrum investigationSoft x rayProgram instruction
Owner:KLA TENCOR TECH CORP
Optical system for measuring samples using short wavelength radiation
ActiveUS7369233B2Reduce decreaseImprove system throughputOptically investigating flaws/contaminationUsing optical meansUltrasound attenuationLength wave
In an optical system measuring sample characteristics, by reducing the amount of ambient absorbing gas or gases and moisture present in at least a portion of the illumination and detection paths experienced by vacuum ultraviolet (VUV) radiation used in the measurement process, the attenuation of such wavelength components can be reduced. Such reduction can be accomplished by a process without requiring the evacuation of all gases and moisture from the measurement system. In one embodiment, the reduction can be accomplished by displacing at least some of the absorbing gas(es) and moisture present in at least a portion of the measuring paths so as to reduce the attenuation of VUV radiation. In this manner, the sample does not need to be placed in a vacuum, thereby enhancing system throughput.
Owner:KLA TENCOR TECH CORP
Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
InactiveUS20010040722A1Increase spectral bandwidthRelaxed manufacturing toleranceMirrorsSemiconductor/solid-state device testing/measurementMangin mirrorUltraviolet
A design for inspecting specimens, such as photomasks, for unwanted particles and features such as pattern defects is provided. The system provides no central obscuration, an external pupil for aperturing and Fourier filtering, and relatively relaxed manufacturing tolerances, and is suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths below 365 nm. In many instances, the lenses used may be fashioned or fabricated using a single material. Multiple embodiments of the objective lensing arrangement are disclosed, all including at least one small fold mirror and a Mangin mirror. The system is implemented off axis such that the returning second image is displaced laterally from the first image so that the lateral separation permits optical receipt and manipulation of each image separately. The objective designs presented have the optical axis of the Mangin mirror image relay at ninety degrees to the optical axis defined by the focusing lenses, or an in-line or straight objective having one ninety degree bend of light rays.
Owner:KLA TENCOR TECH CORP
Vacuumeultraviolet lamp ionization device in time-of-flight mass spectrometer
ActiveCN101063673AImprove utilization efficiencyHigh sensitivityComponent separationTube electron sourcesMass analyzerTime of flight
This invention relates to one fly time mass spectrum vacuum ultraviolet isolation device, which comprises the following parts: one ionization chamber fixed with vacuum ultraviolet lamp as ion source; one ion repel electrode in one to four mm to the lamp window and earth electrode at ten to fifteen mm to the dispel electrode; ion repel electrode and earth connection electrode weak field acceleration ion electron for isolation; light exit hole with diameter as two to 8mm down the electrodes; one capillary to lead vacuum ultraviolet lamp front end with light axis vertical to gas sample in direction.
Owner:DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
Method and device for generating and analyzing ions
ActiveCN102221576AEffective after ionizationEffective combinationMaterial analysis by electric/magnetic meansIon sources/gunsSpectrographMass analyzer
Owner:SHIMADZU RES LAB SHANGHAI
Laser architectures for coherent short-wavelength light generation
InactiveUS20050169326A1Increase power levelMaximize efficiencyLaser using scattering effectsLaser arrangementsPoynting vectorRare earth
Several methods are disclosed for the generation of coherent short-wavelength electromagnetic radiation through optical nonlinear frequency mixing means. The invention involves several stages of efficient nonlinear frequency conversion to shift the output of high-power infra-red fiber-lasers into the vacuum ultraviolet (VUV). The described laser source architecture is designed around non-critically phase-matched (NCPM) sum-frequency mixing (SFM) interactions in the nonlinear crystal CLBO. The NCPM interaction is an optimum condition for bulk frequency conversion of cw radiation because it allows tight focusing of the input laser radiation without Poynting vector walk-off, thereby increasing the non-linear drive significantly. The sub-200-nm output wave is generated from SFM of a long-wave IR laser field and a short-wave UV laser field. The long-wave laser beam may be derived directly from a rare-earth-doped fiber laser, whereas the short-wavelength UV beam is provided as the fourth frequency harmonic of a second rare-earth-doped fiber laser system.
Owner:JACOB JAMES JEFFREY +1
Optical semiconductor device and manufacturing method thereof
InactiveUS20120248422A1Reduce reflectivityLight extraction efficiency can be improvedElectroluminescent light sourcesSolid-state devicesRemote plasmaDevice material
In a device having an anode electrode, an organic EL layer, and a cathode electrode formed on a substrate in this order from a main surface side of the substrate, and an encapsulating film provided on the substrate so as to cover the emission layer, the encapsulating film includes a laminated film obtained by alternately laminating buffer films serving as flattening films and barrier films having high moisture barrier property, and the flattening film and the barrier film include a silicon oxynitride film. In the manufacturing process of the device, the buffer film including silicon oxynitride is formed by an optical CVD method using vacuum ultraviolet light, and in this process, radical irradiation by remote plasma is performed during the irradiation of the vacuum ultraviolet light.
Owner:HITACHI HIGH-TECH CORP +1
Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation
InactiveUS20060055300A1Discharge tube luminescnet screensBeam/ray focussing/reflecting arrangementsUltravioletQuartz
An electrodeless lamp and process for emitting ultraviolet and / or vacuum ultraviolet radiation comprises an envelope formed of an ultra-pure and / or low-defect quartz material and an ultraviolet and / or vacuum ultraviolet emissive material disposed in the interior region of the envelope. The electrodeless lamp formed of the ultra-pure and / or low-defect quartz material minimizes degradation during use.
Owner:AXCELIS TECHNOLOGIES
Systems and methods for measurement of a specimen with vacuum ultraviolet light
ActiveUS20050252752A1Improve accuracyMaintain calibrationElectric switchesPhotomechanical exposure apparatusWavelengthVacuum ultraviolet
Various systems for measurement of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment. The purged environment may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.
Owner:KLA TENCOR TECH CORP
Systems and methods for measurement of a specimen with vacuum ultraviolet light
ActiveUS7359052B2Improve accuracyRadiation pyrometrySpectrum investigationEngineeringVacuum ultraviolet
Various systems for measurement of a specimen are provided. One system includes an optical subsystem configured to perform measurements of a specimen using vacuum ultraviolet light and non-vacuum ultraviolet light. This system also includes a purging subsystem that is configured to maintain a purged environment around the optical subsystem during the measurements. Another system includes a cleaning subsystem configured to remove contaminants from a specimen prior to measurement. In one embodiment, the cleaning subsystem may be a laser-based cleaning subsystem that is configured to remove contaminants from a localized area on the specimen. The system also includes an optical subsystem that is configured to perform measurements of the specimen using vacuum ultraviolet light. The optical subsystem is disposed within a purged environment. In some embodiments, the system may include a differential purging subsystem that is configured to provide the purged environment for the optical subsystem.
Owner:KLA TENCOR TECH CORP
Storing type photo-ionisation ion migration mass spectrum
InactiveCN1544931AWith ion storage functionHigh sensitivityMaterial analysis by electric/magnetic meansRadioactive decayIon migration
The invention relates to a storage photoionization ion migration mass spectrum, mainly solving the problems of the complex line spectrum measured and weaker signals obtained by adopting radioactive component as ionization source. It includes acceleration grid electrode, ionization light source, sampling mouth, ionization region, drift region and ion collecting plate, and its character: the ionization light source is vacuum ultraviolet lamp, it sets an ion storage region structure between the ionization and drift regions to replace the ion gate. It has ion storing function, largely enhances monitoring sensitivity, clear migration mass spectrum chart of the matter to be measured, reduces influence of noise and enhances collecting efficiency.
Owner:ANHUI INST OF OPTICS & FINE MECHANICS - CHINESE ACAD OF SCI
Use of highly purified hydrocarbons in vacuum ultraviolet applications
The present invention is drawn to the use of alkanes that are highly transparent to UV wavelengths ranging from about 170 nm to 260 nm in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography, particularly at 193 and 248 nm exposure wavelength.
Owner:EI DU PONT DE NEMOURS & CO
High resolution, high pressure xenon gamma ray spectroscopy using primary and stimulated light emission
InactiveUS6486468B1Particle separator tubesMaterial analysis by optical meansPhoton detectionSpectroscopy
A design and readout of a xenon detection medium based device, which provides improved spectroscopic performance compared to currently commercially available devices. To achieve energy resolution improvement, a method to accurately measure radial spatial position for interacting events within a HPXe cylindrical detector is described using the plan as shown in FIG. 4. This is accomplished by utilization of light generated both at the gamma interaction site and at the collection point near the anode wire of the cylindrical detector. These light flashes are detected by a VUV photon detector. Light transmission is facilitated by incorporating a vacuum ultraviolet (VUV) light transparent window at least one end of the cylindrical ionization detector. With the known electron drift velocity in HPXe, the time between these two photopulses is sufficient to accurately determine the radial coordinate. Consequently, correction by electronic means for the electrostatic pulse dispersion using the expression graphed in FIG. 2 can be achieved in order to approach the true intrinsic energy resolution limit for HPXe.
Owner:PROPORTIONAL TECH
Systems and methods for measurement of a specimen with vacuum ultraviolet light
ActiveUS20050254050A1Improve accuracyMaintain calibrationRadiation pyrometrySpectrum investigationEngineeringVacuum ultraviolet
Various systems for measurement of a specimen are provided. One system includes an optical subsystem configured to perform measurements of a specimen using vacuum ultraviolet light and non-vacuum ultraviolet light. This system also includes a purging subsystem that is configured to maintain a purged environment around the optical subsystem during the measurements. Another system includes a cleaning subsystem configured to remove contaminants from a specimen prior to measurement. In one embodiment, the cleaning subsystem may be a laser-based cleaning subsystem that is configured to remove contaminants from a localized area on the specimen. The system also includes an optical subsystem that is configured to perform measurements of the specimen using vacuum ultraviolet light. The optical subsystem is disposed within a purged environment. In some embodiments, the system may include a differential purging subsystem that is configured to provide the purged environment for the optical subsystem.
Owner:KLA TENCOR TECH CORP
Method and device for cleaning tokamak first mirror by vacuum ultraviolet laser
InactiveCN102218415ANo surface scratchesRealize the cleaning workCleaning processes and apparatusLength waveLaser beams
The invention discloses a method and a device for cleaning a tokamak first mirror by vacuum ultraviolet laser. A dust impurity deposit layer on the first mirror is cleaned by adopting a laser ablation method; through controlling the output energy of a laser device, the energy density of an excimer laser bundle on the surface of a first mirror surface is at a cleaning threshold of the impurity deposition layer and the damages threshold of first mirror metal, and the first mirror metal material can not be damaged when the impurity is cleaned simultaneously. A laser with 193nm wavelength is adopted for the method and the device for cleaning the tokamak first mirror by the vacuum ultraviolet laser, in the mutual effect process of the laser and the material, the ablation effect is less, the surface uniformity is good, the dust is cleaned, and the effect is ideal.
Owner:DALIAN UNIV OF TECH
Exposure apparatus and exposure method
InactiveUS7050149B2Maintain original performanceGood optical performanceInvestigating moving sheetsPhotomechanical exposure apparatusHydrogenNoble gas
Owner:NIKON CORP
Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses
InactiveUS6824930B1Originals for photomechanical treatmentPhotosensitive materials for photomechanical apparatusLength waveVacuum ultraviolet
Disclosed are partially fluorinated and fully fluorinated polymers that are substantially transparent to ultraviolet radiation at wavelengths from 140 to 186 nanometers.
Owner:EI DU PONT DE NEMOURS & CO
Low outgassing photo or electron beam curable rubbery polymer material, preparation thereof and device comprising same
ActiveUS7256221B2Reduce outgassingLow outgassing of the adhesiveRubber derivative coatingsNon-macromolecular adhesive additivesPolymer scienceAdhesive
Disclosed are photo or electron beam polymerizable compositions, and preparation thereof and devices containing them. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 157 nm lithographic tools.
Owner:CORNING INC
Fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same
InactiveUS6908724B2Adjust solubilityHigh transparencyPhotosensitive materialsRadiation applicationsResistFluoropolymer
There is provided a novel fluorine-containing polymer having an acid-reactive group which has a high transparency against energy rays (radioactive rays) in a vacuum ultraviolet region (157 nm), and further there are provided a material for fluorine-containing base polymer prepared from the polymer and suitable for a photoresist and a chemically amplifying type resist composition obtained therefrom.The polymer has a number average molecular weight of from 1,000 to 1,000,000 and represented by the formula: —(M1)—(M2)—(A)—, wherein M1 is a structural unit having an acid-labile or acid-degradable functional group, M2 is a structural unit of fluorine-containing acryl ester, A is a structural unit derived from other copolymerizable monomer, the percent by mole ratio M1 / M2 is 1 to 99 / 99 to 1 and the polymer comprises from 1 to 99% by mole of the structural unit M1, from 1 to 99% by mole of the structural unit M2 and from 0 to 98% by mole of the structural unit A1. The material for fluorine-containing base polymer comprises a fluorine-containing polymer having an acid-reactive group such as the above-mentioned polymer and is suitable for a photoresist, and the chemically amplifying type resist composition is obtained from those polymer and material.
Owner:DAIKIN IND LTD
Prism spectrometer
ActiveUS7485869B2Easy alignmentSpectrum investigationSpectrum generation using refracting elementsImage resolutionHigh flux
An optical spectroscopy tool is provided. In one embodiment a highly efficient means by which moderate resolution spectroscopy may be performed in the vacuum ultraviolet (VUV) is described. In one embodiment the techniques can be used as a high throughput spectrometer to spatially disperse wavelengths in and around the VUV in such a manner as to generate a substantially flat field focal plane, suitable for use in combination with an array detector. Some embodiments utilize prism based spectrometers. Some embodiments utilize detector elements that may be movable and / or located within the spectrometer. In some embodiments, collimated light may be provided as an input to the spectrometer.
Owner:BRUKER TECH LTD
Device comprising low outgassing photo or electron beam cured rubbery polymer material
Owner:CORNING INC
Radiation durable organic compounds with high transparency in the vaccum ultraviolet, and method for preparing
InactiveUS20050145821A1Reduce light reflectionHigh refractive indexOrganic chemistryHeat-exchange elementsSimple Organic CompoundsUltraviolet
This invention concerns radiation durable organic compositions which are well-suited for use in 157 nm lithography by virtue of their high transparency and excellent radiation durability, and to a process for the preparation thereof.
Owner:EI DU PONT DE NEMOURS & CO
Systems and methods for measurement or analysis of a specimen using separated spectral peaks in light
ActiveUS20050253080A1Improve accuracyMaintain calibrationRadiation pyrometrySpectrum investigationSoft x rayProgram instruction
A system configured for measurement of a specimen is provided. The system includes an optical subsystem configured to perform measurements of the specimen. The optical subsystem includes a light source that is configured to generate light having a relatively large number of separated spectral peaks with substantially no continuous background. In some embodiments, the light may include vacuum ultraviolet light, extreme ultraviolet light, and / or soft x-rays. A carrier medium is also provided that includes program instructions executable on a computer system to analyze data generated by a detector of an optical subsystem by partitioning the data into individual peaks spaced apart across a wavelength spectrum. Partitioning the data preferably corrects for spectrum shift, drift, stretching, shrinking, or a combination thereof at the detector. The individual peaks correspond to separated spectral peaks in light generated by a light source of the optical subsystem.
Owner:KLA TENCOR TECH CORP
Film coated optical lithography elements and method of making
The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.
Owner:CORNING INC
Waste gas processing method and device collaborating vacuum ultraviolet light catalysis and ozone catalytic oxidation
ActiveCN104857824AAvoid wastingHigh mineralization rateDispersed particle filtrationParticulatesCompound a
The invention discloses a waste gas processing method and device collaborating vacuum ultraviolet light catalysis with ozone catalytic oxidation. The waste gas processing method comprises the following steps: after particulate impurities in waste gas are removed, the waster gas enters a vacuum ultraviolet light catalysis chamber; a pollutant is directly split by the ultraviolet light emitted by an ultraviolet lamp, and free radicals with high oxidizability and ozone substances are generated at the same time so as to further oxidize the pollutant; in a composite catalyst structure formed by compounding a photocatalyst layer and an ozone catalyst layer, the residual pollutant is further purified through the collaboration of vacuum ultraviolet light catalysis and ozone catalytic oxidation, and the ozone is totally utilized and eliminated at the same time. The waste gas processing device comprises a reactor, wherein an efficient filter and the composite catalyst structure are arranged in the reactor; the composite catalyst structure is formed by compounding the photocatalyst layer and the ozone catalyst layer; the light catalysis chamber is formed at the inner cavity zone between the efficient filter and the composite catalyst structure, and the ultraviolet lamp is arranged in the light catalysis chamber. The waste gas is purified by utilizing the collaboration of vacuum ultraviolet light catalysis and ozone catalytic oxidation.
Owner:深圳科莱环保科技有限公司
Desorption ionization device used in mass spectrometer
ActiveCN101520432AAtmospheric pressure direct analysis technology is perfectImprove the ionization effectMaterial analysis by electric/magnetic meansMass spectrometersDesorptionUltraviolet
The invention relates to a desorption ionization device which carries out desorption to a measured object with a solid surface at atmospheric pressure by laser and then carries out ionization to the object after desorption by utilizing vacuum-ultraviolet light. The device comprises a laser generating laser beams, an optical laser system used for converging the laser beams on the surface of the measured object so as to lead the measured object in the sample to be desorbed or gasified, and an ultraviolet lamp which is arranged near the desorbed or gasified part and gives off ultraviolet rays soas to lead molecules of at least one part of the desorbed or gasified object to be ionized. Being combined with a spraying apparatus, the desorption ionization device has higher ionization efficiencyto nonpolar or low-polar micromolecules. The desorption ionization device can be applicable to fast sync analysis of complex mixtures with different polarities and molecular weights by utilizing vacuum-ultraviolet light / electron spray. Meanwhile, the design of the multichannel chamber structural keeps the local concentration of each component in an ion source effectively when a test is carried out, thereby improving the ionization efficiency.
Owner:SHIMADZU RES LAB SHANGHAI
Light promoting dehalogenation compound medicament/light combined method for removing halogenated organic matters in water
InactiveCN101708883AQuick removalImprove utilization efficiencyWater/sewage treatment by irradiationWater contaminantsOptical radiationHigh energy
Owner:HARBIN INST OF TECH
Device for analyzing gas phase chemical components of cigarette smoke on line
ActiveCN102192950AEliminates the effects of breakthrough Cambridge filtersEliminate interference effectsMaterial analysis by electric/magnetic meansChemical compositionGas phase
The invention discloses a device for analyzing gas phase chemical components of cigarette smoke on line, which is characterized in that: a smoke-transmitting quartz capillary is arranged between the sucking barrel of a smoking machine and an on-line analytical mass spectrometer; two openings are formed on the end faces of the sucking barrel; one opening is a smoke analysis sampling opening; the other opening is a smoke importing and exporting opening which is connected with a three-way pipe; the three-way pipe is communicated with a cigarette holder which can continuously switch and a pipeline vacuum extracting opening at the same time; a vacuum ultraviolet ionization area is formed in the on-line analytical mass spectrometer; one port of the smoke-transmitting quartz capillary is connected with the smoke sampling opening on the sucking barrel; and the other port of the smoke-transmitting quartz capillary passes through the cavity wall of the on-line analytical mass spectrometer and enters the vacuum ultraviolet ionization area. By using the device for analyzing the gas phase chemical components of the cigarette smoke on line, the influence of the smoke of a last toke on the analysis result of the gas phase components of the smoke of a next toke can be effectively eliminated in the process of sucking a cigarette toke by toke, and the gas phase components of a single toke of the cigarette smoke can be automatically and continuously analyzed on line.
Owner:CHINA TOBACCO ANHUI IND CO LTD +1
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