87 results about "Vacuum ultraviolet" patented technology

The invention relates to the technical field of metal wire processing, and discloses a high-performance metal wire plastic coating process for aerospace engineering, which comprises the following steps: carrying out base material type selection on a metal wire, and carrying out surface treatment of precise cleaning, etching and depth gradient activation; a Ti-Cr alloy and graphene-copper composite transition layer is deposited through a magnetron sputtering technology, and a multi-layer coating structure is formed through electrostatic spraying of a base coating, a fluidized bed dipping function layer and high velocity oxy-fuel spraying of a nano composite coating in sequence; the molybdenum-gold composite sealing layer is prepared by adopting an electric arc spraying technology, and is subjected to vacuum ultraviolet curing enhancement, high-temperature gradient annealing, gradient sintering and vacuum curing treatment; and heat radiation on the surface of the coating is enhanced through laser-induced micro-nano structure regulation and silicon nitride film sputtering. Through collaborative optimization of base material treatment, coating construction, function strengthening and quality control, the interface bonding strength, the comprehensive performance and the environmental adaptability of the spaceflight metal wire coating are remarkably improved, and the service life of the spaceflight metal wire coating is remarkably prolonged.

The invention relates to a vacuum ultraviolet detector based on aluminum nitride and a preparation method thereof. The vacuum ultraviolet detector comprises a bottom electrode, a substrate, an aluminum nitride layer, a two-dimensional semiconductor material layer and a top electrode, the bottom electrode is arranged below the substrate, the aluminum nitride layer is arranged above the substrate, the bottom end of the two-dimensional semiconductor material layer is connected with the aluminum nitride layer, and the top end of the two-dimensional semiconductor material layer is connected with the top electrode; the aluminum nitride layer is formed by depositing an amorphous or polycrystalline aluminum nitride film on the upper surface of the substrate through a magnetron sputtering method or depositing a single crystal aluminum nitride film on the upper surface of the substrate through an atomic layer deposition method or a physical vapor transport method. Compared with the prior art, the p-Si / n-AlN / p-2DMs vacuum ultraviolet detector constructed by the invention can be used for detecting laser with wide spectral wavelength and obtaining extremely fast transient response current in a VUV wave band.

This invention relates to the field of industrial wastewater treatment technology, and discloses an electrocatalytic oxidation device and its operating method for treating saline industrial organic wastewater. Wastewater enters the reaction chamber through the bottom inlet, is forced through the anode channels, and undergoes an electrochemical oxidation reaction on the anode surface to convert chloride ions into hypochlorous acid. A vacuum ultraviolet light source performs in-situ photolysis of water molecules and hypochlorous acid, exciting various active species, including strongly reducing hydrated electrons, strongly oxidizing hydroxyl radicals, and chloride radicals. This device, through the construction of a reduction-oxidation system, can efficiently degrade various pollutants with both electron-rich and electron-deficient characteristics. This invention utilizes the synergistic coupling of electrochemical generation and photochemical conversion to convert high-concentration chloride ions into active precursors, effectively overcoming the bottlenecks of low degradation efficiency and poor selectivity in traditional technologies for high-salt and complex water quality, and significantly improving the system's mineralization efficiency and energy utilization rate.

A method of filling a gap or a feature is provided. The method may comprise introducing a substrate provided with a gap of a feature into a process system; executing one or more cycles, a cycle comprising a deposition step and a curing step, the deposition step comprising: providing a 1st precursor and a 2nd precursor, the 1st precursor comprising a Si-containing precursor; providing a process gas, wherein the process gas comprises at least one of Ar, H2, N2, He, O2, NH3, or a combination thereof and; generating a plasma, wherein the plasma causes the precursors and the process gas to react to form a gap filling fluid; the curing step comprising: simultaneously exposing the substrate to a vacuum ultraviolet radiation and to an ambient gas, thereby curing the gap filling fluid and forming a film in the gap or the feature.

The application provides a method for measuring material ionization potential based on ultraviolet photoelectron yield spectrum, and relates to the technical field of material analysis, and comprises the following steps: monochromatic light in a vacuum ultraviolet band is divided into a main light path for transmission and a reference light path for reflection at a target wavelength; the number of incident photons of the reference light path at the target wavelength is measured, and the number of incident photons of the main light path at the target wavelength is measured; the light splitting ratio at the target wavelength is calculated according to the number of incident photons of the main light path and the number of incident photons of the reference light path at the target wavelength; the number of photoelectrons excited by the main light path from the surface of a sample to be measured at the target wavelength is measured; the ultraviolet photoelectron yield spectrum of the sample to be measured is determined according to the light splitting ratio, the number of incident photons of the main light path and the number of photoelectrons at multiple wavelengths, and the ionization potential of the sample to be measured is determined based on the ultraviolet photoelectron yield spectrum. The application not only simplifies the measurement process of the ionization potential, but also improves the accuracy and stability of the experiment.

The invention relates to the technical field of semiconductor device photoelectric detection, in particular to a silicon carbide-based ultraviolet position sensitive detector based on a thin Schottky metal material and a preparation method thereof, and the silicon carbide-based ultraviolet position sensitive detector comprises an N-type ohmic contact lower electrode, an N-type silicon carbide substrate and an N-type silicon carbide low-doped epitaxial layer which are sequentially connected from bottom to top; the N-type silicon carbide low-doped epitaxial layer is provided with a Schottky metal film with the thickness lower than 4 nm, and the Schottky metal film is used for forming a photosensitive area. A plurality of metal conductive electrodes are arranged at the edge of the top of the Schottky metal film, are electrically connected with the Schottky metal film and are used for leading out position-related electric signals. The problems that an existing pn junction type position sensitive detector is limited in response speed and insufficient in time resolution are effectively solved, and the detection efficiency and the position resolution capacity of the detector in the vacuum ultraviolet band are effectively improved.

The present application belongs to the technical field of energy dissipation dam, and particularly relates to an energy dissipation dam with pollutant removal capacity and an energy dissipation purification method. The present application comprises a plurality of energy dissipation steps, and a box with an open upper end is arranged on the energy dissipation steps. A filter energy dissipation pool is connected in the box and is inclined towards the upper energy dissipation step. A plurality of filter materials with gradually decreasing particle sizes are sequentially arranged in the filter energy dissipation pool from the upper end to the lower end. An ozone aeration unit is arranged at the lower end of the filter energy dissipation pool. An inclined photocatalysis generating plate and a vacuum ultraviolet LED unit are further arranged in the box. The photocatalysis generating plate is located between the vacuum ultraviolet LED unit and the filter energy dissipation pool. The photocatalysis generating plate is provided with photocatalysis materials on the surface and is embedded with filter materials. An outflow port is arranged on the box. A biological contactor is arranged at the outflow port. An air blowing aeration unit is connected to the biological contactor. The present application provides an energy dissipation dam with pollutant removal capacity and an energy dissipation purification method.

This invention discloses a miniaturized portable mass spectrometer based on a vacuum ultraviolet photoionization source and its analytical method, relating to the field of mass spectrometry analysis technology. The mass spectrometer includes: a sample introduction and pre-screening module, consisting of a sample introduction system and an intelligent sample pre-screening unit. The sample introduction system enables gas-liquid sample switching. The pre-screening unit collects data through physical and chemical characteristic detection subunits, and outputs target compound type and parameter adjustment instructions after processing by a data analysis subunit. This invention, through the intelligent sample pre-screening unit in the sample introduction and pre-screening module, utilizes physical and chemical characteristic detection subunits to quickly acquire physicochemical characteristic data such as the color spectrum, volatile components, and pH value of the sample. The compound type recognition model built into the data analysis subunit can automatically compare with the sample characteristic database, quickly identify the target compound type, and generate ionization source parameter adjustment instructions, greatly simplifying the operation process and reducing detection time.

A method is provided for producing a modified polysilazane-cured coating that densifies a coating made of a polysilazane compound in a short period of time. This method provides a coating having a sufficiently low water vapor transmission rate in a short period of time. Additionally, this method provides a modified polysilazane-cured coating. To cure the coating containing polysilazane, it is irradiated with vacuum ultraviolet (VUV) light at an intensity within a specific range. The method includes a step of applying a base material containing the polysilazane compound represented by formula (1) to form a coating and irradiating the coating with Xe excimer light to modify the polysilazane compound and form a cured coating of the modified polysilazane compound. The illuminance of the Xe excimer light in the curing step is set to a range of 280 to 450 mW / cm2.

The invention discloses a spiral pipeline device of an integrated automobile seat ventilation system, and relates to the technical field of seat ventilation systems, the spiral pipeline device comprises a box body, a spiral air pipe is mounted at the output end of the back surface of the box body, a sealing block is movably mounted on the right side of the box body in a penetrating manner, and an adsorption mechanism is mounted on the left side of the sealing block; the adsorption mechanism comprises a second grid frame and activated carbon particles, the second grid frame is installed on the left side of the sealing block, and the activated carbon particles are installed in the second grid frame; a water accumulation box is installed at the bottom of the box body, a plurality of first air boxes are installed at the bottom of the water accumulation box, and first fans are installed in the first air boxes. According to the vehicle-mounted air purifier, the vacuum ultraviolet lamp generates ultraviolet rays to photodecompose air to generate ozone, the ozone and the ultraviolet rays are combined to decompose organic matters entering the box body to generate water and carbon dioxide, and then the residual organic matters in the air are absorbed by the activated carbon particles, so that air purification is realized, and the air quality in a vehicle is improved.

This invention relates to the field of photoelectric detection technology, specifically to a diamond immersion detector. The invention utilizes ultra-wide bandgap boron-doped p-type diamond single crystal (PDSC) as the photoelectrode to construct a vacuum ultraviolet immersion photodetector with a PDSC-ultrapure water-Pt structure. The PDSC immersion photodetector prepared by this invention exhibits a responsivity as high as 87.8 mA / W under zero bias and 193 nm excitation wavelength conditions, which is close to the photoresponsivity shown by standard commercial Si detectors; furthermore, under low optical power excitation, the responsivity of the PDSC immersion detector can reach as high as 670 mA / W. The immersion detector of this invention is a low-cost, self-powered, and highly sensitive vacuum ultraviolet photodetector with good stability, showing promising application prospects for 193 nm power monitoring in deep ultraviolet light source lithography machines.

The application relates to an instrument and method of extreme ultraviolet photodissociation spectroscopy mass spectrum integration spectrum, wherein a through hole is arranged on a mass spectrum system, a first on-off control valve is arranged on the through hole, a vacuum connection pipeline system comprises a five-way joint, and each interface of the five-way joint is connected with a joint assembly, a second on-off control valve, an observation window, a laser high-transparency window and a mirror system; the lower end of the joint assembly is connected with a vacuum pump through a pipeline; the second on-off control valve is connected with an ultraviolet laser pipeline; laser is transmitted through a laser transmission pipeline and is shot into the laser high-transparency window; and the mirror in the mirror system is adjustably arranged in the five-way joint. The application can couple the functions of vacuum ultraviolet laser and atmospheric pressure ultraviolet laser under the condition that the mass spectrum does not stop, can introduce adjustable wavelength extreme ultraviolet laser into a mass spectrum dissociation ion trap to realize the ultrafast photodissociation of biological molecules such as proteins, and further realizes a multi-dimensional spectrum technology.

The application discloses a frozen mass spectrum imaging ion source and a mass spectrometer, and relates to the technical field of mass spectrum imaging. The mass spectrum imaging ion source comprises a freezing table and a laser source. The freezing table is used for freezing a sample to be measured in situ, so as to keep the real topographic features of the sample to be measured. The laser source is used for generating laser. The laser is incident on the sample to be measured and interacts with the sample to generate ions to be analyzed. The laser source selects a vacuum ultraviolet to extreme ultraviolet wave band. The laser of the wave band can be strongly absorbed by endogenous water molecules / solution of the frozen biological tissue. On one hand, local micro area thermal desorption generates neutral molecules / ions. On the other hand, the endogenous water molecules / solution releases enough H + and Na + / K + , so that the ionization efficiency of the neutral molecules is greatly improved. Since the laser of the vacuum ultraviolet to extreme ultraviolet wave band can obtain a nanometer scale focusing size, the mass spectrum imaging ion source can be used to obtain mass spectrum imaging information with a submicron to nanometer spatial resolution.

The application discloses a device and method for generating 193nm waveband ultraviolet laser, which comprises a near-infrared laser driving unit 1, a nonlinear frequency conversion system 2 and an ultraviolet laser generating system 3 connected in sequence. The near-infrared laser driving unit is a high-power picosecond laser for generating near-infrared laser with a wavelength of 1064nm. The near-infrared laser is divided into two parts by a beam splitter, one part of which is used as pump light of a first optical parametric oscillator (OPO1) and generates 840nm laser, and the 840nm laser is converted into 210nm laser through four frequency doubling; the other part is directly used as pump light of a second optical parametric oscillator (OPO2) and generates 2380nm laser. In the last ultraviolet laser generating system, the 210nm laser and the 2380nm laser are combined through sum frequency mixing to finally realize the output of 193nm waveband ultraviolet laser. The application provides a new idea and technical route for the development of vacuum ultraviolet 193nm waveband solid-state laser by using mature nonlinear crystal and nonlinear frequency conversion process.

This invention provides a method for measuring the work function of metallic materials based on ultraviolet photoelectron yield spectra, belonging to the field of materials analysis technology. The method includes: determining the actual number of incident photons in the main optical path at a target wavelength, where the target wavelength belongs to the vacuum ultraviolet and near-ultraviolet bands; measuring the number of photoelectrons excited by the main optical path on the surface of the metal sample under test at the target wavelength; determining the ultraviolet photoelectron yield spectrum of the metal sample under test based on the actual number of incident photons and photoelectrons in the main optical path at multiple wavelengths; fitting the ultraviolet photoelectron yield spectrum of the metal sample under test based on the Fowler photoelectron emission theory model, and determining the value of the work function of the metallic material based on the fitting results. This invention can accurately analyze the nonlinear variation law of photoelectron yield near a threshold through a nonlinear fitting process, improving the accuracy of work function measurement, especially in complex material systems, exhibiting stronger adaptability and higher measurement accuracy.

The invention discloses a high-flux vacuum ultraviolet light source device, which belongs to the technical field of high-end analytical instrument components, and comprises a radio frequency power amplification excitation mechanism, a heat dissipation mechanism, a discharge medium gas circuit mechanism, a vacuum sealing mechanism and a light emitting mechanism, one end of the light-emitting mechanism is connected with the discharge medium gas circuit mechanism, the other end of the light-emitting mechanism is connected with the vacuum sealing mechanism, and a gas inlet pipe and a gas outlet pipe of the discharge medium gas circuit mechanism penetrate through the heat dissipation mechanism. The high-flux vacuum ultraviolet light source device has the advantages of being small in size, high in luminous flux, stable in output, long in service life and the like, and can be widely applied to the fields of mass spectrometry, spectral analysis, photoelectron spectroscopy analysis, chromatographic photoionization detectors, basic physical research and the like; and the requirement of a high-end analysis instrument on a high-performance vacuum ultraviolet light source is met.

This invention discloses an electrospray extraction / photoionization composite ion source for atmospheric pressure interface mass spectrometry, belonging to the field of mass spectrometry detection. It includes a sample transport and ionization mechanism, an extraction electrospray mechanism, and a vacuum ultraviolet light source mechanism. The extraction electrospray mechanism is fixedly connected to the sample transport and ionization mechanism, and the sample transport and ionization mechanism is fixedly connected to the vacuum ultraviolet light source mechanism. This invention utilizes the aforementioned electrospray extraction / photoionization composite ion source for atmospheric pressure interface mass spectrometry, enabling efficient ionization of gaseous and particulate organic components of different polarities, volatility, and molecular weights in the air. Through a reasonable structural design, it can operate under atmospheric pressure conditions, achieving the purpose of coupling with atmospheric pressure interface mass spectrometry.

The invention discloses a thorium-doped strontium tetraborate crystal as well as a preparation method and application thereof, the chemical formula of the thorium-doped strontium tetraborate crystal is ThxSr1-xB4 + yO7 (Th SBO), and the thorium-doped strontium tetraborate crystal grows by adopting a solution method. The Th: SBO crystal disclosed by the invention is low in melting point, simple in component and beneficial to realizing high-quality crystal growth; the material has a wide band gap, has high transmittance in a vacuum ultraviolet band, is beneficial to reduction of absorption loss in a nuclear transition luminescence band, and is beneficial to excitation and detection of a nuclear transition signal; the SBO crystal is a random quasi-phase matching (RQPM) nonlinear optical crystal, 296.76 nm narrow linewidth laser 148.38 nm frequency doubling light can be used as an excitation source of the nuclear light clock through frequency doubling, and a Th host crystal and a frequency doubling crystal are combined, so that the complexity of a system is remarkably simplified, and a core material is provided for miniaturization of the nuclear light clock.

The invention relates to a vacuum ultraviolet combined ultrafiltration water treatment method and device, and the method comprises the following steps: carrying out radiation treatment on to-be-treated water: simultaneously emitting dual-wavelength ultraviolet rays of 185 nm and 254 nm through a single-ended vacuum ultraviolet lamp (3), and generating hydroxyl radicals through the ultraviolet rays of 185 nm to degrade organic matters in the to-be-treated water, the water to be treated is disinfected through 254 nm ultraviolet rays; and performing ultrafiltration: filtering the water subjected to radiation treatment in the step S1 through an ultrafiltration membrane assembly (5). Compared with the prior art, the method can solve the problems of disinfection by-products, water toxicity, membrane pollution and the like caused by organic matters in the water and wastewater treatment or disinfection process, and can be used in the field of advanced treatment of drinking water and sewage.

The present disclosure in various embodiments provides a hardened resist layer that can reduce resist scum defects in a resist layer. In one embodiment, a lithography method is provided. The method includes forming a resist layer over a substrate, performing an exposure process on the resist layer, performing a developing process on the resist layer to form a patterned resist layer having a plurality resist segments, exposing the patterned resist layer to a vacuum ultraviolet (VUV) radiation, and subjecting the resist pattern to a de-scum process.

The invention belongs to the field of photoelectric detectors, and discloses a flexible vacuum ultraviolet photoelectric detector and a preparation method thereof, and the preparation method comprises the steps: enabling a hexagonal boron nitride nanosheet dispersion liquid to form a self-assembly layer through an oil-water self-assembly mode; transferring the self-assembly layer to the flexible substrate; performing radio frequency magnetron sputtering on the hexagonal boron nitride nanosheet dispersion liquid to form a layer of hexagonal boron nitride film on the self-assembly layer to form a sputtering layer; and photoetching an interdigital electrode pattern on the sputtering layer, and evaporating a Ni electrode pattern on the sputtering layer to obtain the flexible vacuum ultraviolet photoelectric detector. The detector has excellent response to deep ultraviolet light with the wavelength smaller than 200 nm, the light-dark current ratio reaches 655 under illumination of 185 nm, good flexibility is achieved, and the typical attenuation rate of light current is smaller than or equal to 10% when the detector is bent. The method solves the problem that the thin film is difficult to directly grow on the flexible substrate, and has the characteristics of simplicity and easiness in large-scale preparation.

Provided are: a method for producing a modified polysilazane cured coating film, with which it is possible to densify a film comprising a polysilazane compound in a short period of time; and a modified polysilazane cured coating film obtained by means of the method for producing the modified polysilazane cured coating film. A film having a sufficiently low water vapor transmission rate is produced in a short period of time. When curing the polysilazane compound, a coating material containing the polysilazane compound is irradiated with vacuum ultraviolet light (VUV) at an irradiation intensity within a specific range. Specifically, the method comprises: a coating step for coating a substrate with a solution containing a polysilazane compound represented by general formula (1) to form a coated article; and a curing step in which the coating material is irradiated with Xe excimer light to modify the polysilazane compound to form a cured film of the modified polysilazane compound, the illumination of the Xe excimer light in the curing step being in the range of 280-450 mW / cm2. General formula 1

The invention discloses a data correction processing method of a vacuum ultraviolet light ionization source time-of-flight mass spectrometer, which comprises the following steps: acquiring continuously monitored data points including horizontal axis time t and intensity values a1, b1, c1... of each substance along with the time t, calculating attenuation coefficients lambda1, lambda2, lambda3... of each substance along with the time, finding a substance with the attenuation coefficient closest to that of the target monitoring substance as a correction substance, obtaining each intensity value of the correction substance, dividing the intensity value by the first intensity value to generate a column of new data, and dividing each intensity value of the target substance by a column of data points newly generated by the corresponding correction substance to obtain corrected data points of the target substance. According to the method, the problem of signal attenuation caused by long-time working of the vacuum ultraviolet lamp can be effectively corrected.

The application belongs to the technical field of analysis and detection, and relates to a photochemical ionization device for mass spectrometry for real-time online detection of glyoxal in the atmosphere. The photochemical ionization device sequentially arranges a vacuum ultraviolet light source, an oxygen negative reagent ion generation zone and an ion molecule reaction zone according to the emission direction of the vacuum ultraviolet light. The oxygen negative reagent ion generation zone is a straight channel, bias electrodes, a first partial pressure electrode and a second partial pressure electrode are sequentially arranged in the wall of the straight channel according to the emission direction of the vacuum ultraviolet light, the direction of the electric field formed between the bias electrodes, the first partial pressure electrode and the second partial pressure electrode is opposite to the emission direction of the vacuum ultraviolet light, a pump is arranged between the bias electrodes and the first partial pressure electrode, an air source and a reagent auxiliary gas source are connected between the first partial pressure electrode and the second partial pressure electrode, and a gas source containing a target molecule to be detected is connected between the second partial pressure electrode and the ion molecule reaction zone. The application can effectively remove O3 generated by the vacuum ultraviolet light, thereby improving the sensitivity of glyoxal detection.

The invention relates to the technical field of mass spectrometry instruments, in particular to an oxygen atom induced dissociation device and method based on a photoionization source. The device comprises a sample introduction capillary tube, an ionization source cavity, a repulsion electrode, a vacuum ultraviolet deuterium lamp, a transmission electrode group and a differential electrode, the repulsion electrode, the transmission electrode group and the differential electrode are sequentially arranged in the ionization source cavity in parallel at intervals, and the vacuum ultraviolet deuterium lamp penetrates through the ionization source cavity and then extends into an area between the repulsion electrode and the transmission electrode group; the sample introduction capillary tube sequentially penetrates through the left side wall of the ionization source cavity and a center hole of the repulsion electrode, and the outlet end of the sample introduction capillary tube is located in an area between the repulsion electrode and the transmission electrode group; and direct-current voltage is applied to the repulsion electrode, the transmission electrode group and the differential electrode. By utilizing the characteristics of vacuum ultraviolet light, the photoionization source can generate oxygen atom-induced dissociation reaction in situ, so that the technical threshold and cost are reduced, and convenient switching between two modes of soft ionization and rich structure information is realized.

The invention discloses a three-resonance enhanced four-wave mixing VUV light source, which comprises a light splitting module, an optical parametric oscillation module and a mixing module, and is characterized in that the light splitting module utilizes a half-wave plate and a Glan prism to flexibly adjust to enter the Glan prism so as to divide incident light into two beams, and the two beams are respectively transmitted to the next Glan prism and the optical parametric oscillation module; the first half-wave plate is used for changing the polarization state of the incident light so as to adjust the light splitting ratio of the two beams of light; the optical parametric oscillation module comprises a first oscillation unit, a second oscillation unit and a third oscillation unit, and is used for performing a nonlinear process on the multiple beams of incident light split by the light splitting module so as to output multiple pieces of frequency mixing light with specific frequencies; and the frequency mixing module comprises a frequency mixing pool, the frequency mixing pool is filled with mercury vapor, the first frequency mixing light, the second frequency mixing light and the third frequency mixing light enter the frequency mixing pool through beam combination for four-wave mixing so as to obtain vacuum ultraviolet light, the adjustability is high, and the frequency mixing light energy output by each oscillation unit can be flexibly regulated and controlled.

The application discloses a vacuum ultraviolet high-power deuterium lamp light source, which comprises a light-emitting anode and a light-emitting cathode, the light-emitting anode is a light-emitting double anode, the light-emitting double anode comprises a main anode and a secondary anode, the secondary anode is a light-emitting grating tube with a small transmission aperture, and the main anode is a metal cylinder with a large size; primary breakdown is realized through the gas between the secondary anode and the light-emitting cathode, then secondary breakdown is realized through the main anode, and vacuum ultraviolet radiation light is output. The application solves the problem of low light power of the existing vacuum ultraviolet deuterium lamp light source, greatly improves the electron current density of the deuterium arc, and improves the light-emitting efficiency.

Provided is a method capable of effectively performing a desmear treatment. The glue residue removing method comprises the following steps: irradiating a substrate with holes and glue residues in the holes with vacuum ultraviolet light in a manner that the water contact angle of the substrate is 40-70 degrees; a swelling solution for swelling the glue residue is supplied to the substrate irradiated with the vacuum ultraviolet light; and supplying a removal liquid for removing the glue residue from the substrate to the substrate after the glue residue is swelled.

The utility model relates to the technical field of detection instruments, in particular to a vacuum ultraviolet parallel beam instrument which comprises a beam instrument body, and a radiation cavity and a parallel light channel cavity arranged on one side of the radiation cavity are arranged in the beam instrument body. A light output port communicated with the parallel light channel cavity is formed in the radiation cavity, an ultraviolet lamp tube is arranged above the light output port, and the axial direction of the ultraviolet lamp tube is perpendicular to the axial direction of the parallel light channel cavity; a gas inlet is formed in one side of the radiation cavity, and a gas outlet is formed in one side of the parallel light channel cavity, so that the radiation cavity and the parallel light channel cavity are filled with gas which does not react with ultraviolet rays. The structure of the vacuum ultraviolet parallel beam instrument is simplified, multiple radiation cavities are not needed during detection, the sealing degree in the detection process is ensured, it can be ensured that ultraviolet parallel light is emitted without multiple adjustment, and the detection accuracy is improved.

This invention discloses a novel electrostatic elimination device for an ion beam repair machine. The device includes: a vacuum ultraviolet lamp, generally T-shaped, with a vertical section and a horizontal section, wherein the diameter of the vertical section is smaller than the diameter of the horizontal section, and the vacuum ultraviolet lamp is hollow; a support assembly disposed at the bottom of the vacuum ultraviolet lamp, the support assembly having a translational section and a rotating section, the translational section consisting of a moving lead screw slide and a fixed lead screw slide placed at the bottom of the moving lead screw slide, and the bottom end of the rotating section disposed on the top surface of the moving lead screw slide, wherein the moving lead screw slide moves along the Y-axis on the fixed lead screw slide; this invention utilizes vacuum ultraviolet light to ionize a large number of gas molecules, thereby effectively removing static charge in a vacuum and solving the problem of static electricity affecting the repair accuracy of the ion beam repair machine.