299 results about "Uv laser" patented technology

An apparatus for displaying information within a vehicle interior includes a surface having a coating for emitting visible light when excited by an ultraviolet (UV) light beam, and a laser projection device (LPD) for generating and directing the UV light beam onto the coating to display information on the surface. The LPD generates one or more UV laser beams, and the coating has one or more light-emitting layers each excitable by a different UV wavelength. Each layer emits a different color of light when excited. The surface is a transparent windshield or lens, or an opaque surface. A method for displaying information within a vehicle interior includes applying a light-emitting coating to a surface in at least one layer, and generating and projecting a UV light beam onto the coating to present information in at least as many colors as there are layers.

A method of fabricating a high-density array of holes in glass is provided, comprising providing a glass piece having a front surface, then irradiating the front surface of the glass piece with a UV laser beam focused to a focal point within +/−100 μm of the front surface of the glass piece most desirably within +/−50 μm of the front surface. The lens focusing the laser has a numerical aperture desirably in the range of from 0.1 to 0.4, more desirably in the range of from 0.1 to 0.15 for glass thickness between 0.3 mm and 0.63 mm, even more desirably in the range of from 0.12 to 0.13, so as to produce open holes extending into the glass piece 100 from the front surface 102 of the glass piece, the holes having an diameter the in range of from 5 to 15 μm, and an aspect ratio of at least 20:1. For thinner glass, in the range of from 0.1-0.3 mm, the numerical aperture is desirably from 0.25 to 0.4, more desirably from 0.25 to 0.3, and the beam is preferably focused to within +/−30 μm of the front surface of the glass. The laser is desirable operated at a repetition rate of about 15 kHz or below. An array of holes thus produced may then be enlarged by etching. The front surface may be polished prior to etching, if desired.

Systems and surgical techniques for presbyopia correction by laser removal of the sclera tissue are disclosed. The disclosed preferred embodiments of the system consists of a beam spot controller, a fiber delivery unit and a fiber tip. The basic laser including UV lasers and infrared lasers having wavelength ranges of (0.15-0.36) microns and (1.9-3.2) microns and diode lasers of about 0.98, 1.5 and 1.9 microns. Presbyopia is treated by a system which uses an ablative laser to ablate the sclera tissue outside the limbus to increase the accommodation of the ciliary body of the eye. The sclera tissue may be ablated by the laser with or without the conjunctiva layer open.

A coating removal apparatus removes a coating from a surface. The apparatus has a movable scanning head and scanning optics. The scanning head is movable in one dimension, and the scanning optics adjust in two dimensions to compensate for movement of the scanning head to implement long range scanning with a uniform scanning pattern. Further, a surface roughness is determined by measuring specular and scattered reflections at various angles. For composite surfaces, the apparatus utilizes UV laser radiation and a controlled atmosphere to remove coating and alter the chemical characteristics at the surface.

The invention discloses a method for processing a blind hole by laser. The method combines fixed point UV laser impulse and UV laser spiral line or concentric circle scanning and is used for one-step blind hole processing or multi-step blind hole processing on multilayer circuit board. The method divides the UV laser blind hole drilling process into two parts, namely a part with an area near the circle center of the blind hole not more than UV laser spot diameter and a part with an area more than the UV laser spot diameter. Fixed point UV laser impulse is adopted to drill the blind hole, so as to remove material in the region with an area near the circle center not more than UV laser spot diameter; then UV laser spiral line or centric circle scanning method is adopted to move outside, so as to remove the material in the region with an area near the circle center more than UV laser spot diameter until meeting set blind hole size; and one-step blind hole or multi-step blind hole processing is drilled by UV laser through two steps or more steps. The method can ensure processing quality consistency of each blind hole, can greatly reduce bottom unevenness of the blind hole, and also can improve margin quality of blind hole processing.

Surgical method and apparatus for presbyopia correction and glaucoma by laser removal a portion of the sclera and/or ciliary tissue are disclosed. The disclosed preferred embodiments of the system consists of a beam spot controller, an articulated arm and an attached end-piece. The basic laser beam includes UV laser having wavelength ranges of (0.19-0.36) microns, generated from UV excimer lasers of ArF, XeCl or solid state lasers of Nd:YLF, Nd:YAG, Ti:sapphire with harmonic generation using nonlinear crystals. Presbyopia is treated by ablation of the treated surface tissue in predetermined patterns outside the limbus to increase the accommodation of the eye. Glaucoma is treated by decreasing of intra ocular pressure of the laser surgery.

A method for manufacturing a microstructure, which includes at least one feature having a dimension less than 200 nm, on a work piece. Pulses of UV laser light having a duration of less than about 1 ps and a peak wavelength of less than about 380 nm are generated. These pulses of UV laser light are focused to a substantially diffraction limited beam spot within a target area of the work piece. The fluence of this substantially diffraction limited beam spot in the target area of the work piece is controlled such that the diameter of the section of the target area machined by one of the pulses of UV laser light is less than 200 nm.

Several methods are disclosed for the generation of coherent short-wavelength electromagnetic radiation through optical nonlinear frequency mixing means. The invention involves several stages of efficient nonlinear frequency conversion to shift the output of high-power infra-red fiber-lasers into the vacuum ultraviolet (VUV). The described laser source architecture is designed around non-critically phase-matched (NCPM) sum-frequency mixing (SFM) interactions in the nonlinear crystal CLBO. The NCPM interaction is an optimum condition for bulk frequency conversion of cw radiation because it allows tight focusing of the input laser radiation without Poynting vector walk-off, thereby increasing the non-linear drive significantly. The sub-200-nm output wave is generated from SFM of a long-wave IR laser field and a short-wave UV laser field. The long-wave laser beam may be derived directly from a rare-earth-doped fiber laser, whereas the short-wavelength UV beam is provided as the fourth frequency harmonic of a second rare-earth-doped fiber laser system.

In accordance with the invention, features can be directly imprinted into the surface of a solid substrate. Specifically, a substrate is directly imprinted with a desired pattern by the steps of providing a mold having a molding surface to imprint the pattern, disposing the molding surface adjacent or against the substrate surface to be imprinted, and irradiating the substrate surface with radiation to soften or liquefy the surface. The molding surface is pressed into the softened or liquefied surface to directly imprint the substrate. The substrate can be any one of a wide variety of solid materials such as semiconductors, metals, or polymers. In a preferred embodiment the substrate is silicon, the laser is a UV laser, and the mold is transparent to the UV radiation to permit irradiation of the silicon workpiece through the transparent mold. Using this method, applicants have directly imprinted into silicon large area patterns with sub-10 nanometer resolution in sub-250 nanosecond processing time. The method can also be used with a flat molding surface to planarize the substrate.

A large screen emissive display operating at atmospheric pressure includes pixels, the red, green, and blue subpixels of which are excited by UV laser light scanned onto the subpixels by a pixel activation mechanism. The pixel activation mechanism includes three grating light valves (GLVs) that are controlled by a processor in response to a demanded image to modulate the UV light as appropriate to produce the demanded image.

A UV laser beam is selectively irradiated on an active layer (semiconductor layer) of a second TFT in a pixel, so as to degrade crystallinity of the active layer and thereby execute electrical disconnection. According to this method, dimming out of pixels can be performed without generating undesirable influences in other components. By directing the laser beam to a portion of the active layer located beneath the gate electrode, the laser beam can be reflected by the gate electrode, allowing execution of a more efficient laser irradiation.

An all-solid-state laser system produces coherent DUV radiation through a third or fourth harmonic generation. The fundamental wavelength is generated by a slave laser optically pumped by one or more light source(s) of high density array(s) and is stabilized by injecting optical seeds whose wavelength is rapidly swept to cover the fundamental wavelength. The pump effects are enhanced by a pump chamber that recycles unabsorbed pump light. The present invention enables DUV pulses with a width shorter than 1 ns and a repetition rate higher than 100 kHz. The output DUV wavelength is adjustable by selecting an appropriate seeder.

The invention discloses a portable three-channel near-deep-UV Raman spectrometer. The spectrometer comprises a near-deep-UV laser emitter, a laser spot shaping device, a first beam splitter, a zooming or non-zooming lens, a second beam splitter, a third beam splitter, a relay optical system, a point-to-line optical system, a spectrum forming system, an optical or mechanical sample scanning system and a data processing and wirelessly transmitting-receiving system. After Raman, fluorescent and visible/laser channels are fused in the point-to-point manner in real time, the whole sample is scanned, and data processing such as spectral separation, peak positioning, spectral library establishment and substance identification is carried out. The portable three-channel near-deep-UV Raman spectrometer has the advantages including that the flexibility and resolution are high, illumination points are large, the detection distance is long, rapid onsite non-contact measurement can be implement in the sun, and the spectrometer is relatively safe for the eyes.

The invention provides a synchronous pulse exposure method for maskless lithography equipment. The maskless lithography equipment adopts an exposure imaging system consisting of a UV (ultraviolet) laser or UV LED light source, a DMD (digital micro-mirror device) and an optical lens; the synchronous pulse exposure method is characterized in that a series of pulse synchronization signals are generated, the DMD and the UV laser or UV LED light source are triggered to synchronously work, and the pulse interval of the pulse synchronization signals depends on the replacement or refreshing cycle of the DMD to graphs; a digital laser direct-writing system comprises an upper computer in charge of outputting digital lattice patterns and the series of pulse synchronization signals to the exposure imaging systems, and one or more exposure imaging systems arranged side by side. According to the method, a synchronous control problem of parts of the lithography equipment is solved, more effective and reasonable exposure and refreshing time is convenient to design, and the shortcomings of low production capacity and poor system adaptability of a conventional exposure machine are overcome.