The invention discloses a device and method for reducing deposition in an
etching machine, and the device comprises an
etching machine body, and also comprises a
cyclone shielding ring which is uniformly provided with a plurality of miniature inclined holes in the inner circumference, and gas discharged from the miniature inclined holes passes through the inner wall of a cavity of the
etching machine body; the self-rotating gas path
distributor can rotate at a
low speed around the central axis of the
cyclone shielding ring, a cavity is formed in the self-rotating gas path
distributor, and a gas path distribution hole is formed in one side, facing the
cyclone shielding ring, of the self-rotating gas path
distributor; the micro-
ablation laser module is composed of a plurality of miniaturized and high-energy pulse
optical fiber lasers and fixedly installed in a top cover of the etching machine
body cavity in an embedded mode at intervals in the circumferential direction of the etching machine
body cavity,
laser heads of the pulse
optical fiber lasers slightly stretch into the cavity, and the emitting directions of the
laser heads point to the surface of the
cavity wall needing to be protected below the cyclone shielding ring; the mode that only passive protection or shutdown cleaning is needed in the prior art is broken through, the fundamental innovation of'prevention 'and'treatment' integration is achieved, and the
continuous production period is greatly prolonged.