Synchronous pulse exposure method for maskless lithography equipment and digital laser direct-writing system

Abstract

The invention provides a synchronous pulse exposure method for maskless lithography equipment. The maskless lithography equipment adopts an exposure imaging system consisting of a UV (ultraviolet) laser or UV LED light source, a DMD (digital micro-mirror device) and an optical lens; the synchronous pulse exposure method is characterized in that a series of pulse synchronization signals are generated, the DMD and the UV laser or UV LED light source are triggered to synchronously work, and the pulse interval of the pulse synchronization signals depends on the replacement or refreshing cycle of the DMD to graphs; a digital laser direct-writing system comprises an upper computer in charge of outputting digital lattice patterns and the series of pulse synchronization signals to the exposure imaging systems, and one or more exposure imaging systems arranged side by side. According to the method, a synchronous control problem of parts of the lithography equipment is solved, more effective and reasonable exposure and refreshing time is convenient to design, and the shortcomings of low production capacity and poor system adaptability of a conventional exposure machine are overcome.

Description

technical field [0001] The invention relates to the technical field of planar screen printing, in particular to a synchronous pulse exposure method of a maskless lithography equipment, and a digital laser direct writing system corresponding to the method. Background technique [0002] At present, flat screen printing technology is widely used in PCB industry, flat panel display industry, integrated circuit packaging and other industries. The traditional screen production is to use the film process, to print the problem and graphics on the film negative, and then use the film negative as a mask for the text and pattern, and use the traditional parallel exposure machine to expose and copy the text and pattern on the photosensitive film. Glue on the screen, and then through developing, cleaning and other processes, the characters and patterns for printing masters are formed on the screen. Obviously, the traditional process has inherent shortcomings such as low production capac...

AI Technical Summary

Problems solved by technology

[0004] Based on the problems mentioned in the background technology, the present invention proposes a synchronous pulse exposure method for maskless lithography equipment, which solves the problem of synchronous control of various parts of the equipment, and overcomes the low production capacity and systemic problems commonly found in laser direct writing exposure machines. The disadvantage of weak adaptability, the technical solution adopted is as follows:

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