The invention discloses a
solar cell and a preparation method thereof, the preparation method comprises the following steps: a
silicon substrate is provided, the
silicon substrate comprises a first surface and a second surface which are oppositely arranged, and the second surface comprises a first area and a second area; sequentially preparing a tunneling layer, a second
doping layer, a
barrier layer and a third
doping layer on the second surface; annealing the
silicon substrate on which the tunneling layer, the second
doping layer, the
barrier layer and the third doping layer are deposited;
processing the third doping layer on the first region by adopting a
laser process, and forming an
oxide layer on the surface of the third doping layer on the first region; removing at least part of the third doped layer on the second region and the
oxide layer on the first region by adopting a chemical
etching process, and reserving the third doped layer on the first region; and preparing a second
electrode in contact with the third doped layer on the first region. The
passivation effect can be considered, parasitic absorption can be reduced, and the
cell efficiency and the double-sided rate are remarkably improved while the
process window is improved.