7 results about "Fine structure" patented technology

The implantable device disclosed by the invention is provided with at least one corrodible zinc-containing part, and the zinc content in the at least one zinc-containing part is within the range of [30,000, 3,000, 3,000]. The zinc content range of at least one of the zinc-containing parts is [50, 70] wt.%, the zinc in the zinc-containing parts is an amorphous structure, or the zinc content range of at least one of the zinc-containing parts is [50, 70] wt.%, and the microstructure of the zinc in the zinc-containing parts is selected from at least one of an amorphous structure, a non-equiaxed structure, an ultra-fine structure or an equiaxed structure with the grain size range of 7-14 grades, or the microstructure of the zinc in the zinc-containing parts is selected from at least one of an amorphous structure, a non-equiaxed structure, an ultra-fine structure or an equiaxed structure with the grain size range of 7-14 grades. The zinc content range of at least one zinc-containing part is (70, 100) wt.%, and the microstructure of zinc in the zinc-containing part is selected from at least one of a non-equiaxed crystal structure, an ultra-fine crystal structure or an equiaxed crystal structure with the grain size range of 7-14 grades. After the implantable instrument is implanted into a body, a zinc corrosion product is generated, and the concentration of the zinc corrosion product in the surrounding tissue of the zinc-containing part of the implantable instrument can inhibit smooth muscle cell proliferation and cannot cause normal tissue cell necrosis.

A preparation and coupling optimization method of bar SOI waveguide using end face coupling belongs to the field of micro-nano fine structure processing and optical precision measurement. Through two-step photoetching and two-step etching, on one hand, the base section plane highly coinciding with the waveguide end face can be etched, and on the other hand, the etching widening of the Si base etching channel cannot cause the waveguide below to be hollowed out. By using the DC magnetron sputtering Cr mask, the waveguide material can be prevented from being etched and damaged in the deep silicon etching process. Through the ion beam etching process, the waveguide end face and the base etching sidewall are completely coincided, so that part of the light spot is avoided from being scattered by the Si base in the optical fiber coupling process, and the coupling efficiency of the waveguide is improved. By combining the FDTD simulation results, the ICP-PECVD is used to deposit the low internal stress SiO2+Si3N4 antireflection film with a suitable thickness on the waveguide end face, the light spot is avoided from being reflected on the waveguide end face, and the light spot coupling efficiency is maximized.

The present application relates to the technical field of additive manufacturing, in particular to a kind of micrometer flow channel's additive manufacturing method and its application.Micrometer flow channel's additive manufacturing method, comprising the following steps: (a) based on the distribution of preset micrometer flow channel in target configuration, configuration main body is split into several mutually parallel solid cylinders, obtain stl model and carry out slicing, obtain slice file;(b) based on the slice file, metal powder is formed by selective laser melting process and is additively manufactured, obtain the target configuration with micrometer flow channel;In step (a), adjacent solid cylinders are tangent or intersect, and the pore surrounded by every 4 solid cylinders corresponds to micrometer flow channel.The additive manufacturing method of the present application, by appropriate micrometer flow channel configuration design, without changing SLM equipment and technology, can realize the controllable preparation of micrometer flow channel, significantly improve the forming precision of extremely fine structure.

[Problem] To provide a technique capable of visualizing, with high spatial resolution in neutron imaging, the internal structure of an object to be inspected, without performing chemical treatment that is required when a nuclear emulsion is used. [Solution] A neutron position recording device 10 is provided with a conversion film 1 and a fluorescent nuclear track detector 2 in order to generate an image representing the fine structure of an object T to be inspected. When each neutron that has passed through the object T to be inspected is incident, the conversion film 1 converts each neutron into a charged particle. The fluorescent nuclear track detector 2 has a surface 2a facing the conversion film 1, and records, due to the incidence of the charged particle from the conversion film 1, the track of the charged particle corresponding to the position of the neutron.

A graphene film in the prior art is poor in structural precision, and an intrinsic structure and mechanical properties are difficult to greatly adjust once the graphene film is formed. The invention provides a reconfigurable graphene oxide sphere fusion membrane which is formed by mutually fusing and assembling a plurality of graphene oxide spheres after the volume of the graphene oxide spheres is contracted synergistically. The graphene oxide ball comprises a core body and a shell, and the shell wraps the core body. The ball melting film can be detached into a plurality of graphene oxide balls in a polar solvent. The number of reconstructions of assembly-disassembly reaches up to 20, and arbitrary mutual conversion of the ball fusion membrane topology, including animal shape, house shape, submarine shape, tree shape and the like, is realized. The elongation at break of the ball melting film is adjustable between 1.5% and 4%. By utilizing the reversible shrinkage-expansion property of the graphene oxide balls, the macroscopic membrane with a fine structure, the reversible disassembly of the macroscopic membrane and the green recovery of the ball elements are realized by mutually fusing and assembling a plurality of balls.

Provided are a master, a transfer object, and a method for manufacturing a master, particularly a master on which a more complex fine structure is formed, a transfer object using the master, and a method for manufacturing the master. A master in which a plurality of concave-convex assemblies composed of a plurality of concave portions or convex portions are disposed separately from each other on a substrate, the average width of the area occupied by the concave portions or convex portions on the surface of the substrate is below the wavelength of the visible light band, and each of the concave portions or convex portions within the concave-convex assembly is in any one of at least two or more groups in which the center value of the formation length from the surface of the substrate is different.

The invention discloses a method for improving the bending resistance of a flexible substrate nanoimprint photoresist, and belongs to the technical field of photoresponse azobenzene polymer materials and nanoimprint. According to the method, the azobenzene polymer with a specific molecular weight range is selected as an imprinting material, and the characteristic that the bending resistance of the obtained microstructure can be effectively improved by utilizing relatively high molecular weight is utilized, so that a fine structure with high mechanical reliability is directly prepared on the flexible substrate. According to the method, a feasible solution is provided for manufacturing devices with extremely high requirements for structural integrity, the core problem that the performance of the devices is degraded due to the fact that patterns are prone to being damaged in the dynamic bending process can be effectively solved, and the method is particularly suitable for manufacturing flexible photoelectric devices with strict requirements for the structural integrity, such as flexible optical waveguides and flexible optical fibers. And the durability of the pattern in a dynamic bending environment can be obviously improved.