The invention discloses a preparation method and structure of an
interposer embedded with a
silicon bridge and a high-density
silicon capacitor, and belongs to the field of advanced packaging of integrated circuits. The method can be used for 2.5 D advanced packaging high-density
interconnection; the
interposer structure comprises an
interposer back RDL rewiring layer, an intermediate layer which is formed by embedding a
silicon bridge and a high-density silicon
capacitor by using a high-molecular
epoxy resin material EMC, and an RDL rewiring layer on the front side of the interposer. High-density vertical
interconnection between the upper RDL layer and the lower RDL layer is achieved through an
electroplating ultrahigh
copper column penetrating through the resin material, micron-level and submicron-level ultrahigh-density
interconnection can be achieved through a silicon bridge embedded in the EMC resin, and high-performance packaging-level power supply decoupling can be achieved through a high-density silicon
capacitor embedded in the resin. The preparation method of the structure is easy to implement, the cost is greatly reduced compared with that of the TSV silicon adapter plate interposer, and the method can be used for large-scale
mass production of 2.5 D interposers.