The invention relates to the technical field of semiconductors, in particular to a luminance build-up method, device and equipment for a
remote plasma source and a storage medium, and the method comprises the steps: obtaining a real-
time pressure value fed back by a vacuum gauge, controlling the
remote plasma source to start working when a preset vacuum condition is met, and controlling a
butterfly valve to be opened at a preset initial opening degree; real-time scanning parameters fed back by the
mass spectrometer are obtained, and the real-time
ionization rate is confirmed based on the real-time scanning parameters; adjusting the opening degree of a
butterfly valve according to the real-time
ionization rate so as to adjust the flow of gas entering a process
system until the luminance build-up is successful; according to the luminance build-up method disclosed by the invention, the opening degree of the
butterfly valve can be adjusted in real time according to the real-time
ionization rate, so that the air inflow entering the air source is adjusted in real time, an ideal environment is created for
plasma generation, and accurate control of the air flow is ensured, so that the success rate and efficiency of luminance build-up are improved, the whole process does not need manual intervention, and the cost is reduced. The operation complexity is greatly reduced, and the stability and reliability of the process are improved.