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106 results about "Quadrupole field" patented technology

Quadrupole Magnetic Field. Two properly spaced coils with currents in the same direction can produce a useful magnetic field geometry in the Helmholtz coil arrangement. Also useful is the arrangement obtained by reversing one of the coils to produce a magnetic quadrupole field.

Correction device for correcting the lens defects in particle-optical apparatus

InactiveUS6329659B1Significant manufacturingSignificant organizational advantageThermometer detailsStability-of-path spectrometersQuadrupole fieldImage resolution
Electron-optical rotationally symmetrical lenses inevitably suffer from spherical and chromatic aberration which often impose a limit on the resolution. These lens defects cannot be eliminated by compensation by means of rotationally symmetrical fields. In order to enhance the resolution nevertheless, it has already been proposed to correct the spherical aberration by means of a correction device provided with two hexapoles (24, 26) and two rotationally symmetrical transmission lens systems (28, 30). Each transmission lens system in the known correction device consists of two lenses. According to the invention, one or both transmission lens systems can be replaced by a respective system (46) of four quadrupoles (48, 50, 52, 54), without the correction capability being reduced or only hardly so. If the two central quadrupoles (50, 52) of the quadrupole system (46) forming part of the correction device (22) are also arranged to produce electric quadrupole fields, the chromatic aberration of the lens to be corrected can also be corrected.
Owner:FEI COMPANY

Methods and systems for providing a substantially quadrupole field with significant hexapole and octapole components

A system and method involving processing ions in a linear ion trap are provided, involving a two-dimensional asymmetric substantially quadrupole field having a hexapole and octopole component.
Owner:DH TECH DEVMENT PTE

Corrector for axial and off-axial beam paths

A corrector (1) for the axial and off-axial beam path of a particle-optical system, comprises a first (10) and a second (20) correction piece, which are disposed one behind the other in the beam path (2) on an optical axis (3). Each correction piece (10, 20) comprises four successive multipole elements (11, 12, 13, 14; 24, 23, 22, 21) disposed symmetrically with respect to a center plane (5) and with the following fields: wherein the first (11; 24) and the fourth (14; 21) multipole elements of the multipole elements (11, 12, 13, 14; 24, 23, 22, 21) are used to generate quadrupole fields (11′, 14′; 24′, 21′) and the second (12; 23) and third (13; 22) are used to generate octupole fields (12′″, 13′″; 23′″,22′″) and quadrupole fields (12′, 13′; 23′,22′), wherein the latter are superposed magnetic (12′, 13′; 23′, 22′) and electric fields (12″, 13″; 23″, 22″), wherein the quadrupole fields (11′, 12′, 13′, 14′; 24′, 23′, 22′, 21′) of all four multipole elements (11, 12, 13, 14; 24, 23, 22,21) are rotated from one to the next through 90°. An astigmatism of third order is corrected by a central multipole element disposed in the center plane and generating an octupole field.
Owner:CEOS CORRECTED ELECTRON OPTICAL SYST

Optical particle corrector

An optical particle corrector with a straight optical axis for eliminating color and aperture aberrations in optical particle lenses includes multipole elements in the form of electric and/or magnetic quadrupole and octupole elements. There are at least twelve quadrupole elements and ten octupole elements, in which three quadrupole elements and two octupole elements are assembled into a group. These groups are arranged successively along the straight optical axis, in which a first symmetrical plane is defined between the first and second groups, a second symmetrical plane is defined between the second and third groups and a third symmetrical plane is defined between the third and fourth groups. The multipole elements from one group to another correspond to each other in pairs, in which the multipole elements of the corresponding following group are positioned in reverse order along the straight optical axis in comparison with the corresponding multipole elements of the preceding group. The structure and refractive powers of the multipole elements that correspond to each other are mirror-symmetrically configured relative to the corresponding symmetrical plane between the groups. At least two of the quadrupole elements generate electric-magnetic quadrupole fields, in which the quadrupole element are, preferably, arranged in a mirror-symmetrical manner relative to the second, or to all, symmetrical planes. An additional octupole element is arranged in the first and third symmetrical planes. The corrector enables the transmission of extremely large image fields, while the optical quality remains the same due to the fact image aberrations outside the axis can be corrected.
Owner:CEOS CORRECTED ELECTRON OPTICAL SYST

Liner ion beam bonding apparatus and array structure thereof

A linear ion beam bonding apparatus and an array structure thereof, comprising a pair of primary radiofrequency electrodes (501 and 502) extending along the axial direction and oppositely arranged on two sides of the central axis of the linear ion beam bonding apparatus. Section patterns on different section planes of each of the primary radiofrequency electrodes (501 and 502) and perpendicular to the central axis are all kept symmetric via a primary symmetric plane (506) of the central axis. Radiofrequency voltages attached to the primary radiofrequency electrodes (501 and 502) are of identical phases. An ion extraction groove (84) is arranged on at least one of the primary radiofrequency electrodes (501 and 502), while at least one pair of auxiliary electrodes (503 and 505) are arranged on two sides of the pair of primary radiofrequency electrodes (501 and 502). The auxiliary electrodes (503 and 505) are arranged in duality to the primary symmetric plane (506). At least one of the auxiliary electrodes (503 and 505) is provided with a finite number of symmetric planes (507), while a minimal angle greater than 0 degrees and less than 90 degrees is provided between each symmetric plane (507) and the symmetric plane (506) of the primary radiofrequency electrodes (501 and 502). By means of this, a quadrupole field component of an ion beam bonding radiofrequency electric field within the ion beam bonding apparatus is strengthened.
Owner:SHIMADZU RES LAB SHANGHAI
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