13results about How to "Increase ionization rate" patented technology

The invention provides a magnetization capacitance coupling plasma discharge system and a calculation model and a calculation method thereof in the technical field of plasmas, the plasma discharge system comprises a vertical cylindrical hollow closed cavity, and the cavity is filled with argon; a circular driving electrode is coaxially arranged at the top of the cavity, and a circular grounding electrode is coaxially arranged at the bottom of the cavity; three electromagnetic coils are coaxially arranged around the periphery of the chamber at intervals from top to bottom; a radio frequency voltage is applied between the grounding electrode and the driving electrode, so that argon in the chamber can be subjected to discharge ionization to generate plasma; and excitation current is introduced into the three electromagnetic coils for generating an external magnetic field in the chamber, so that the density of plasma generated by argon ionization in the chamber can be improved. The magnetization capacitance coupling plasma discharge system provided by the invention can optimize the property of the plasma, improve the density and performance of the plasma, and better provide a basis for the improvement of a plasma process technology.

The invention belongs to the technical field of plasmas, and particularly relates to a magnetic lens constraint focusing reaction ion beam source which can obtain a focusing ion beam with ion energy in normal distribution and introduce reaction gas to realize rapid removal of a damaged layer on the surface of an optical element. According to the technical scheme, the ion source comprises an anode, an outer cathode arranged above the anode and a center cathode arranged in the middle of the ion source, the anode, the outer cathode and the center cathode are special-shaped circular rings, an ion beam leading-out gap is formed between the outer cathode and the center cathode, an ionization area is arranged among the anode, the outer cathode and the center cathode, and the ionization area is arranged between the anode and the center cathode. An ionization magnetic coil is arranged on the outer side of the anode, a working gas leading-in device is arranged below the center cathode, a magnetic lens center magnetic pole is arranged above the center cathode, a reaction gas leading-out hole is formed in the middle of the magnetic lens center magnetic pole, and reaction gas is led into the magnetic lens center magnetic pole through the center cathode by a gas guide pipe. A magnetic lens coil is arranged on the periphery of the magnetic lens center magnetic pole, and a magnetic lens outer magnetic pole is arranged above the magnetic lens coil.

The invention provides a metal nitride-based composite coating and a preparation method thereof, and relates to the technical field of solid lubricating coatings, the metal nitride-based composite coating is composed of MoN metal nitride as a basic phase, high-entropy alloy (Cr-Al-Ti-Nb-V) doped as a reinforcing phase of MoN, and MoS2 and Ag as a lubricating phase. The preparation method comprises the following steps: depositing the MoN-based composite coating of Cr-Al-Ti-Nb-V compounded MoS2 and Ag on the surface of the substrate by adopting a high-power pulse magnetron sputtering technology. The preparation method has the beneficial effects that the defects that the MoS2-based thin film material is poor in lubricating performance in a high-temperature environment and the MoN coating is high in friction coefficient are overcome.

The invention provides a wear-resistant Cr / CrN nano coating and a preparation method and application thereof.The preparation method of the wear-resistant Cr / CrN nano coating comprises the steps that firstly, a Cr binding force layer is deposited on the surface of a base material through high-power pulse magnetron sputtering, and then the Cr binding force layer is compositely deposited through high-power pulse magnetron sputtering and pulse direct current sputtering; and a CrN layer is compositely deposited on the surface of the Cr binding force layer by adopting high-power pulse magnetron sputtering and pulse direct current sputtering. The nano coating is high in bonding strength with a base material and high in mechanical strength, the preparation method adopts a mode of combining high-power pulse magnetron sputtering and pulse direct-current magnetron sputtering, pulse parameters, deposition conditions and bias voltage are accurately regulated and controlled, the performance of the coating can be accurately controlled, the deposition rate is high, operation is easy and convenient, cost is low, and the method is suitable for batch production.

The utility model discloses a vacuum cavity structure for graphite boat dry etching, which comprises a stainless steel cylindrical vacuum cavity, and a stainless steel support rod is mounted in the vacuum cavity. According to the utility model, the vacuum cavity is cylindrical, the graphite boat is placed at the fixed position of the support rod in the vacuum cavity, the graphite boat is respectively butted with the electrode tube joint in the vacuum cavity, the cavity door mechanism is closed, the heating tube is heated, and the vacuum pump set is started to vacuumize after the set temperature value is reached; after the vacuum degree in the vacuum cavity detected by the vacuum gauge reaches a set vacuum degree, argon is introduced into the remote plasma power supply and ignition is carried out, NF3 is introduced after the remote plasma power supply is successfully ignited, the remote plasma power supply begins to ionize the NF3, formed plasma enters the vacuum cavity, etching cleaning is carried out on the graphite boat, and the graphite boat is obtained. By means of the mode and the cylindrical vacuum cavity, powder generated by corrosion of the cavity wall due to accumulation of etching compounds is effectively reduced.

The application discloses a kind of arc ion plating and high-power pulse magnetron sputtering hybrid coating method and the cutter formed by it, and the hybrid coating method comprises: depositing nitride coating on substrate by arc ion plating;Nitride-boride coating is deposited on the nitride coating by arc ion plating and high-power pulse magnetron sputtering hybrid mode;Boride coating is deposited on the nitride-boride coating by high-power pulse magnetron sputtering.The arc ion plating and high-power pulse magnetron sputtering hybrid coating method of the application can completely break the columnar crystal epitaxial growth through coating, eliminate the columnar crystal through, form a large number of nanometer scale grain boundary and subgrain boundary, so as to significantly improve the fracture toughness of coating;At the same time, due to the elastic strain field at interface impedes the dislocation movement, coating hardness is significantly improved.

The invention discloses a MoNbZr / Zr nano-layered material and a preparation method thereof. The MoNbZr / Zr nano-layered material is prepared by depositing on a clean silicon substrate by a magnetron sputtering deposition method. Ar+ ions bombard a target material to cause elastic collisions with MoNbZr / Zr atoms, further generating a collision cascade, whereby the sample atoms are excited and reversely deposited onto the substrate. MoNbZr atoms and Zr atoms are deposited in sequence to alternately form multilayer nano-layered materials with different modulation periods, different interface structures, and different phase compositions. High-density plasmas such as secondary electrons generated by sputtering circulate in the form of cycloids under the combined action of mutually perpendicular electromagnetic fields, and do not contact the substrate. Therefore, the ionization efficiency is high and the deposition rate is fast. The invention not only successfully prepares nano-layered materials with different phase compositions, but also the obtained nano-layered materials are uniform and dense, with clear interface structures and excellent comprehensive performance.

The invention relates to the technical field of ceramics, provides a preparation method of ultrathin aluminum nitride, and solves the problems that an aluminum nitride film prepared in the prior art is relatively thick and is easy to crack and peel off. Comprising the following steps: 1) preparing raw materials: preparing the following raw materials: a pure metal Al target material and a (0001) surface sapphire substrate; 2) pretreatment; 3) loading a sample and vacuumizing; (4) cleaning the chamber and carrying out reverse sputtering; (5) sputtering; and (6) carrying out step-by-step thermal annealing to obtain the ultrathin aluminum nitride.

The invention discloses a time-of-flight mass analysis device, which comprises an ionization acceleration region for generating ions, screening the ions according to the initial energy and initial position of the ions and accelerating the ions to move towards a field-free region; the field-free region is used for providing free motion space with enough distance for ions; the reflection area is located at the tail end of the field-free area and used for reflecting ions to the signal detection area; and the signal detection area is used for detecting ion types. The ionization acceleration area of the device adopts a voltage driving mode of repulsion pulses and introduction of the pulses to reduce the initial space dispersion and initial energy dispersion of ions, meanwhile, the ionization probability of molecules is increased, and the resolution and sensitivity of time-of-flight mass analysis can be improved.

The invention provides a process gas distribution structure of a flat plate type plasma system applied to peald equipment, and relates to the technical field of plasma equipment. Comprising a vacuum cavity, a medium flat plate, an atmosphere side process pipeline and a vacuum side process pipeline, and the vacuum side process pipeline comprises a plurality of process gas pipe branches parallel to the medium flat plate so that ionized gas can be evenly distributed in the vacuum cavity; a plurality of gas holes with openings facing the medium window are uniformly distributed in each process gas pipe branch along the length direction of the process gas pipe branch, so that gas directly flows to the medium window after coming out of the process gas pipe branch, and continuously flows to the vacuum cavity after being rebounded by the medium window, and a gas rebounding area is just positioned in a high ionization area of plasma; and the ionization rate of the process gas is further improved. According to the scheme, the plasma distribution uniformity of the flat plate type plasma system can be improved.

The invention discloses hollow cathode auxiliary active screen vacuum diffusion coating integrated equipment and an application method thereof. The equipment comprises a vacuum diffusion coating chamber, a vacuum system, a gas control system, an active screen, a hollow cathode system, a workpiece objective table and a power supply control system, the vacuum diffusion coating chamber obtains high vacuum degree and required working atmosphere through a vacuum system and a gas control system; and the power supply control system independently controls the potentials of the active screen, the workpiece objective table and the hollow cathode system. The hollow cathode system not only provides diffusion coating layer sputtering atoms, but also improves the ionization rate of diffusion gas; due to the design of the active screen, elements on the metal surface can be uniformly diffused and permeated, and the utilization rate of sputtering particles is increased; through cooperation of the active screen and the hollow cathode system, the enhanced diffusion coating integrated function is achieved. The method is wide in application range, provides a firm technical support and a reliable solution for the vacuum surface treatment industry, and has huge economic benefits.

The invention discloses a gas and solid dual-mode ion source, which comprises an ECR (electron cyclotron resonance) cavity, a magnet, a cylindrical sample target, a microwave window, a microwave waveguide, a gas inlet, an ion exit slit and a grid, according to the dual-mode ion source, when the positive electrode of a direct-current power supply is connected to an ECR cavity, and the negative electrode of the direct-current power supply is connected to a grid electrode, the dual-mode ion source is in a gas ion source working state; when the positive electrode of a sputtering power supply is connected to the ECR cavity, the negative electrode of the sputtering power supply is connected to the cylindrical sample target, and after stable sputtering is achieved, when the positive electrode of a direct-current power supply is connected to the ECR cavity, and the negative electrode of the direct-current power supply is connected to the grid electrode, the dual-mode ion source is in a solid ion source working state. The dual-mode ion source is compact in structure, reliable and stable in work, low in use cost and high in ionization rate. The ion source can be used as a gas ion source, can also be used as a solid ion source, can be switched in the working process, and can be applied to mass spectrometers, ion injection equipment, etching equipment and the like.

The application discloses a MoCN-Cu self-lubricating composite coating which is composed of a MoN adhesive layer, a MoCN gradient layer and a MoCN-Cu functional layer, and has a phase composition of polycrystal wrapping amorphous carbon structure and free Cu metal composite phase; the composite coating is prepared by arc ion plating deposition on a substrate matrix, and is applied to engine parts, matching parts, servo systems and attitude control systems. In the composite coating, the MoN adhesive layer, the MoCN gradient layer and the MoCN-Cu functional layer are sequentially arranged, and the phase composition is controlled to be polycrystal wrapping amorphous carbon structure and free Cu metal composite phase, so that the wear-resistant high-load-bearing performance of MoN is combined with the excellent self-lubricating performance of amorphous carbon material and soft metal phase Cu, a solid MoCN-Cu self-lubricating composite coating with low friction, low wear and high load-bearing is obtained, and the composite coating is suitable for use in a high friction and wear environment; and the preparation method is suitable for industrial production.