57results about How to "Increased ionization" patented technology

The showerhead for a CVD apparatus can be easily produced and is capable of forming a film efficiently. The showerhead comprises: a shower plate being made of a metal; and a porous plate contacting a rear face of the shower plate. A plurality of gas diffusion holes are formed in a plate section of the shower plate, which faces a workpiece, and penetrate the plate section in the thickness direction, and the porous plate covers all of the gas diffusion holes.

The present invention provides high capacity and high voltage Li-ion batteries that have a carbonaceous cathode and a nonaqueous electrolyte solution comprising LiF salt and an anion receptor that binds the fluoride ion. The batteries can comprise dual intercalating electrode Li ion batteries. Methods of the present invention use a cathode and electrode pair, wherein each of the electrodes reversibly intercalate ions provided by a LiF salt to make a high voltage and high specific capacity dual intercalating electrode Li-ion battery. The present methods and systems provide high-capacity batteries particularly useful in powering devices where minimizing battery mass is important.

Apparatus and process for plasma treatment of moving webs, or films, are disclosed. The apparatus includes magnets and multiple hollow cathodes, which, in the presence of a plasma, magnetically focuses and thereby intensifies the plasma to one side of the film surface. The moving web is positioned either between the hollow cathodes and the magnets or in front of the hollow cathodes and the magnets. The plasma treatment functionalizes the film surface.

A method of operating a combustor (10), to provide intimately mixed hot combusted gas (44) for a gas turbine (46), includes feeding gaseous oxidant (12) and gaseous fuel (16) into the combustor (10) near a combustion flame (28) which has a tip end (39) and a root end (29), where corona discharge occurs through adjustment of an electric field (34), and where the corona discharge causes ionized particles (36) to form and also causes intimate turbulent mixing of the gases.

A system for air ionization utilizing a particle sensor to control ionization such that ionization is increased when the particle sensor detects undesirable levels of particulates. Particle sensors utilized in accordance with the present invention also can be effectively utilized in conjunction with other sensors, such as an oxidizable gas sensors or an ozone sensors. In this manner, ionization can be sensor-controlled in that when the aggregate amount of whatever contaminants are detected by the sensors reaches an undesirable level, ionization is increased. Conversely, when the aggregate amount of contaminants detected by the sensors is low, ionization is decreased.

A thruster (1) has a main chamber (6) defined within a tube (2). The tube has a longitudinal axis which defines an axis (4) of thrust; an injector (8) injects ionizable gas within the tube, at one end of the main chamber. An ionizer (124) is adapted to ionize the injected gas within the main chamber (6). A first magnetic field generator (12, 14) and an electromagnetic field generator (18) are adapted to generate a magnetized ponderomotive accelerating field downstream of said ionizer (124) along the direction of thrust on said axis (4), The thruster (1) ionizes the gas, and subsequently accelerates both electrons and ions by the magnetized ponderomotive force.

Proposed is a showerhead-cooler system of a semiconductor-processing chamber with uniform distribution of plasma density. The showerhead has a plurality of through gas holes that are coaxial with respective channels of the gas-feeding cooler plate. On the gas inlet side, the though passages of the showerhead are provided with unequal conical nozzles characterized by a central angle that decreases from the peripheral part of the showerhead to the showerhead center. Such design provides uniformity of plasma density. Furthermore, in order to protect the walls of the nozzle and the walls of the gas holes from erosion that may be caused by the hollow-cathode phenomenon, these areas are coated with a thin protective coating that is resistant to electrical breakdown and chemical corrosion.

The present invention provides microwave systems and methods for achieving better control of process and film properties by optimizing plasma containment shield shaping around an antenna. By using a containment shield, plasma generated by microwave may become more homogeneous, and the pressure inside a processing chamber may be reduced. By optimizing the shape of the containment shield, the lifetime of metastable radical species may be increased. One aspect of extending the lifetime of metastable radical species is to allow better control of chemical reaction and thus help achieve the desired film properties. For an array of antennas, the containment shield comprises a dielectric coated metal base with dividers between the antennas. The divider comprises a dielectric material or a mixture of a dielectric layer and a dielectric coated metal layer, and allows coupling among the antennas. Such a dielectric coated metal containment shield may be easier to be manufactured at lower cost than a containment shield comprising only dielectric material such as quartz.

Disclosed is an invention that uses a coaxial microwave antenna as a primary plasma source in PVD. The coaxial microwave antenna is positioned inside a sputtering target. Instead of using a cathode assist in sputtering, microwaves generated from the coaxial microwave antenna may leak through the sputtering target that comprises a dielectric material to form microwave plasma outside the sputtering target. To further enhance plasma density, a magnetron or a plurality of magnetrons may be added inside the target to help confine secondary electrons. An electric potential may be formed between adjacent magnetrons and may further enhance ionization. To achieve directional control of the generated microwaves, a shield that comprises a dielectric material or dielectric material coated metal may be added proximate the coaxial microwave antenna. Furthermore, for high utilization of expensive target materials, a target can rotate to improve the utilization efficiency.

A method of operating a combustor (10), to provide intimately mixed hot combusted gas (44) for a gas turbine (46), includes feeding gaseous oxidant (12) and gaseous fuel (16) into the combustor (10) near a combustion flame (28) which has a tip end (39) and a root end (29), where corona discharge occurs through adjustment of an electric field (34), and-where the corona discharge causes ionized particles (36) to form and also causes intimate turbulent mixing of the gases.

This invention relates to ionized PVD processing of semiconductor wafers and provides conditions for highly uniform deposition-etch process sequence and coverage capabilities of high aspect ratio (HAR) features within a single processing chamber. A plasma is generated and maintained by an inductively coupled plasma (ICP) source. A deposition process step is performed in which metal vapor is produced from a target of a PVD source. Location and sputter efficiency at the target surface is enhanced by moving a magnet pack to create a traveling or sweeping magnetic field envelope. The target is energized from a DC power supply and pressures effective for an efficient thermalization of the sputtered atoms (30<p<100 mTorr) are maintained in the chamber during deposition. A uniform thickness of the metal on the wafer is produced within each magnet sweeping cycle. Magnetic field localization using an annular sweeping motion over the entire target surface generates conditions for reasonable deposition rates, high target utilization, high ionization of the metal atoms, uniform flat field deposition and etching, and nearly identical conditions for HAR feature coverage at the center and edge of the wafer.

The present invention provides a method of applying ink containing dyes to fabric composed of synthetic and cellulose fibers using an ink-jet system to print the fabric with high color shade depth and brilliancy and ink-jet printed goods obtained by the ink-jet printing method. The fabric composed of cellulose and synthetic fibers is treated with an acidic aqueous dispersion containing cellulose reactive compound, water-soluble polymer and non-water-soluble inactive organic compound with a melting point of 40° C.-150° C. and the fabric is dried before its ink-jet printing with reactive and disperse dyes.

Provided is a method that achieves both of soft ionization and high ionization efficiency of a substance to be analyzed at each measurement site without impairing a two-dimensional distribution state of the substance to be analyzed in desorption ionization mass spectrometry of a substance to be measured. By applying, to a substance to be analyzed, an ionization assisting reagent including an organic acid including a functional group represented by —(CF2)COOH and having a boiling point of 150° C. or more, and a polyhydric alcohol having a melting point of 20° C. or less and a boiling point of 150° C. or more at normal pressure, the organic acid, which is a component of the ionization assisting reagent, effectively donates a proton to the substance to be analyzed, thereby improving ionization efficiency, and the polyhydric alcohol, which is a component of the ionization assisting reagent, inhibits fragmentation.

A method for analyzing an object by means of TOF-SIMS is adapted to apply an ionization promoter (metal such as silver or gold) to the object and generate secondary ions that correspond to parent molecules and can be used to determine the type of the object. A segregation / refinement technique such as electrophoresis or thin-layer chromatography can be employed for a mixed protein sample by using the method to obtain a two-dimensional image showing a high spatial resolution.

The present invention provides a SWP (surface wave plasma) processing system that does not create underdense conditions when operating at low microwave power and high gas pressure, thereby achieving a larger process window. The DC ring subsystem can be used to adjust the edge to central plasma density ratio to achieve uniformity control in the SWP processing system.

The present invention is improved preparation process of electrolyte for lithium thionyl chloride. The SOCl2 solution is first rectified, then added with LiAlCl4 and metal lithium and heated and reflux purified for at least 12 hr, SO2 gas is injected into the solution, and in dry environment, the solution is filtered to prepare the electrolyte. The electrolyte has raised purity and can improve the voltage lag state of the lithium cell effectively.

A method and an apparatus for collecting ions in which ions are produced from a sample in an ion source. An electric field is provided that is more uniform in an area adjacent the sample than in an area adjacent an inlet to the ion transfer device or that is larger in field strength at the sample than at a point removed from the sample towards the inlet of the ion transfer device. Ions are received into the electric field and transferred through the ion transfer device to a sampling orifice of the mass spectrometer. The apparatus includes an ion transfer device coupled to a sampling orifice of a mass spectrometer. The ion transfer device has an inlet with a surface that extends in a direction from an axis of the ion transfer device. The ion transfer device can extend a distance of at least 10 times an inner diameter of a sampling orifice of the mass spectrometer.

A biological sample solution is ionized by electrospray and the sample solution is irradiated with an infrared laser beam to dissociate biological macromolecules into the constituents thereof. As a result, only non-covalent bonds of the biological macromolecules can be selectively severed and analyzed.

A charged-particle source for emission of electrons or other electrically charged particles comprises, located between the emitter electrode having an emitter surface and a counter electrode, at least two adjustment electrodes; a pressure regulator device is configured to control the gas pressure in the source space at a pre-defined pressure value. In a first cleaning mode of the particle source, applying a voltage between the emitter and counter electrodes directs gas particles towards the counter electrode, generating secondary electrons which ionize particles of the gas in the source space, and electrostatic potentials are applied to at least some of the adjustment electrodes, generating an electric field directing the ionized gas particles onto the emitter surface.

The present invention relates to systems and methods for the analysis of proteins. For example, the present invention provides methods for identifying and characterizing surface membrane proteins. The present invention also provides methods and systems for arraying and analyzing proteins.

Disclosed is an invention that uses a coaxial microwave antenna as a primary plasma source in PVD. The coaxial microwave antenna is positioned inside a sputtering target. Instead of using a cathode assist in sputtering, microwaves generated from the coaxial microwave antenna may leak through the sputtering target that comprises a dielectric material to form microwave plasma outside the sputtering target. To further enhance plasma density, a magnetron or a plurality of magnetrons may be added inside the target to help confine secondary electrons. An electric potential may be formed between adjacent magnetrons and may further enhance ionization. To achieve directional control of the generated microwaves, a shield that comprises a dielectric material or dielectric material coated metal may be added proximate the coaxial microwave antenna. Furthermore, for high utilization of expensive target materials, a target can rotate to improve the utilization efficiency.

This invention relates to ionized PVD processing of semiconductor wafers and provides conditions for highly uniform deposition-etch process sequence and coverage capabilities of high aspect ratio (HAR) features within a single processing chamber. A plasma is generated and maintained by an inductively coupled plasma (ICP) source. A deposition process step is performed in which metal vapor is produced from a target of a PVD source. Location and sputter efficiency at the target surface is enhanced by moving a magnet pack to create a traveling or sweeping magnetic field envelope. The target is energized from a DC power supply and pressures effective for an efficient thermalization of the sputtered atoms (30<p<100 mTorr) are maintained in the chamber during deposition. A uniform thickness of the metal on the wafer is produced within each magnet sweeping cycle. Magnetic field localization using an annular sweeping motion over the entire target surface generates conditions for reasonable deposition rates, high target utilization, high ionization of the metal atoms, uniform flat field deposition and etching, and nearly identical conditions for HAR feature coverage at the center and edge of the wafer.

A gas discharge lamp has a gas and has a cathode, an anode, and an ignition electrode. Individual discharges of a series of lamp discharges are spaced at least one millisecond from each other, and the individual discharges are generated by providing an electrical charge between the cathode and the anode and providing two or more electrical pulses to the ignition electrode. The second and following electrical pulses occur within a predetermined time of the first pulse. The electrical charge between the cathode and anode is of sufficient voltage and current to create an electrical arc between the cathode and the anode with the gas is ionized.