1results about How to "Facilitated ionization" patented technology

The application discloses a low-temperature ion nitriding method and application. The low-temperature ion nitriding method comprises the following steps: under a selected temperature condition, ion etching treatment is performed on the surface of a workpiece by adopting an arc-enhanced glow discharge process, and then plasma nitriding treatment is performed on the workpiece by adopting an arc-enhanced plasma process to obtain a nitriding workpiece; wherein, a positive and negative alternating voltage is applied to the workpiece in the arc-enhanced plasma process. The low-temperature ion nitriding method provided by the application can realize nitriding at a lower temperature, effectively improves the deformation degree of the workpiece, and is widely applicable to surface strengthening of cutters, molds and metal parts.