The invention discloses a magnetized CCP source driven by RF and DC mixedly. The magnetized CCP source comprises a
plasma discharge cavity, a gas inlet, a gas outlet, a first pole plate, a second pole plate, a substrate, a
DC source, an RF power supply and a
magnetic field generator, the first and second pole plates are arranged in the
plasma discharge cavity in parallel, one end of the DC power supply is connected to the first pole plate, the other end of the DC power supply is grounded, one end of the RF power supply is connected to the second pole plate, the other end of the RF power supply is grounded, the substrate is arranged on the second pole plate and positioned in the surface opposite to the first pole plate, the gas inlet is arranged in one side of the
plasma discharge cavity, the gas outlet is arranged in the other side of the plasma discharge cavity, the
magnetic field generator is arranged outside the plasma discharge cavity, and a
magnetic field generated by the magnetic field generator is parallel with the first pole plate and the second pole plate. Due to influence of the magnetic field, high-energy
secondary electrons and thermions are limited in a main plasma area, the
ionization degree is improved, and the
plasma density is increased greatly.