162 results about "Surface plasmon" patented technology

The present invention discloses a terahertz three-dimensional unidirectional transmission waveguide based on magnetic surface plasmons, which is composed of a unidirectional transmission region and two artificial magnetic conductor layers with the same structure and opposite directions spliced on the left and right sides of the unidirectional transmission region; the unidirectional transmission region is an electrically opaque medium-magnetized semiconductor structure, and the artificial magnetic conductor is composed of a structure in which square metal rods are periodically extended in a dielectric background and placed on a metal floor; the artificial magnetic conductor can replace the ideal magnetic conductor boundary condition to support three-dimensional unidirectional transmission; the waveguide structure provided by the present invention realizes three-dimensional unidirectional transmission based on magnetic surface plasmons in the terahertz band, provides a solution for expanding such two-dimensional unidirectional waveguides to three-dimensional unidirectional waveguides, and has great application prospects in the miniaturization of non-reciprocal devices.

The invention discloses a metasurface structure for realizing terahertz up-conversion luminescence, and belongs to the technical field of optics, the metasurface structure comprises a silicon dioxide substrate, a metal microstructure unit and a quantum dot luminescent material, and is innovatively provided with a dielectric isolation layer and a surface plasma enhancement layer, the dielectric isolation layer reduces the quenching effect of metal on quantum dots, and the surface plasma enhancement layer enhances the surface plasma on the quantum dots. The surface plasma enhancement layer enhances a local electric field. The metasurface structure for realizing terahertz up-conversion luminescence can effectively improve the terahertz visible light up-conversion efficiency, realizes high-sensitivity and quick-response terahertz detection at room temperature, improves the detection sensitivity, simplifies a detection system, has a wide application prospect in the fields of biomedicine, security inspection, communication and the like, and has a wide application prospect in the fields of biomedicine, security inspection, communication and the like. And the practical application development of the terahertz technology is promoted.

The invention provides a high-stability single-mode semiconductor laser based on dynamic wavefront shaping and a control system, and relates to the technical field of semiconductor lasers, comprising a semiconductor laser gain module, a dynamic wavefront shaping module, a single-mode screening module and a laser output module which are optically coupled in sequence, wherein the semiconductor laser gain module is composed of a quantum well structure gain chip, a distributed feedback grating and a surface plasma structure are integrated on the surface of an active area of the gain chip, and the distributed feedback grating and the surface plasma structure are combined on the surface of the active area through a surface etching process. According to the invention, through the dynamic wavefront shaping module and the multi-parameter closed-loop control system, real-time adaptive regulation and control of the whole laser output process are realized. According to the system, wavefront distortion can be rapidly detected and compensated in a complex disturbance environment, and response delay and manual intervention of traditional static correction are remarkably reduced.

This invention discloses a core-shell structured lithium-rich manganese-based cathode material with the general formula Li. 1+a Mn x Co y Ni z O 2‑b‑d (XO c ) b X d It has a core-shell structure, with the core being a disordered polyanion-doped lithium-rich manganese-based material, Li. 1+a Mn x Co y Ni z O 2‑b (XO c ) b The outer shell is made of lithium-rich manganese-based material Li, which is doped with gradient non-metallic ions. 1+ a Mn x Co y Ni z O 2‑d X d This application also provides a method for preparing a core-shell structured lithium-rich manganese-based cathode material. The method employs a combination of rapid Joule heating and surface plasma cleaning to prepare the aforementioned core-shell structured lithium-rich manganese-based cathode material, achieving a bulk disordered structure design with polyanion doping and a core-shell structure with surface gradient non-metallic ion doping. Specifically, the bulk polyanions can immobilize transition metal elements to suppress their migration to the lithium layer, reducing harmful consumption of active sites and stabilizing the crystal structure. Furthermore, the strong bond energy between the surface non-metallic elements and the transition metal elements can suppress transition metal dissolution during cycling, reducing irreversible oxygen oxidation and inhibiting harmful phase transitions.

The invention provides an optical fiber biosensor, a preparation method thereof and an optical fiber sensing system.The optical fiber biosensor comprises an optical fiber microstructure with an optical fiber sensing part and a surface plasma resonance layer, and the outer surface of the optical fiber sensing part is coated with the surface plasma resonance layer; the surface plasma resonance layer is used for exciting the optical fiber sensing part to generate surface plasma waves and combining or adsorbing a sensing target, and the surface plasma resonance layer is an AuNPs (at) MOF composite film; the AuNPs (at) MOF composite film is combined on the outer surface of the optical fiber sensing part through a chemical modification method, the optical fiber sensing part can be excited to generate surface plasma waves, and a sensing target is combined or adsorbed, so that a sensing film corresponding to a target detection object does not need to be coated during follow-up biological sensing, and the cost is reduced. And the manufacturing cost of the optical fiber biosensor based on the LSPR effect is further reduced.

The invention discloses a plasma processing device and a working method thereof, and the plasma processing device comprises a vacuum reaction chamber which is internally provided with a lower electrode assembly; the direct current power supply and the first bias radio frequency power supply are electrically connected with the lower electrode assembly; the controller is used for controlling the direct-current power supply to provide a first pulse voltage for the lower electrode assembly, controlling the first bias radio frequency power supply to provide a first bias radio frequency voltage for the lower electrode assembly, and adjusting the phase difference between the first pulse voltage and the first bias radio frequency voltage to change the voltage of a plasma sheath layer on the surface of the substrate, the frequency of the first pulse voltage is consistent with the frequency of the first bias radio frequency voltage. The device has the advantages that the direct-current power supply, the first bias radio-frequency power supply and the controller are combined, the frequencies of voltages output by the direct-current power supply, the first bias radio-frequency power supply and the controller are controlled to be consistent through the controller, richer bias voltage waveforms are obtained under the condition that clutters are not introduced, and then accurate control over the substrate etching process is achieved.

The invention relates to the technical field of detection, and discloses an MCP image enhancement high-sensitivity detection system, which comprises a photoelectric cathode, which adopts a multi-quantum well structure and a surface plasma enhancement technology, is used for converting incident photons into primary electrons, and comprises a quantum well formed by gallium arsenide and gallium aluminum arsenide; a microchannel plate for amplifying primary electrons generated from the photocathode; the microchannel plate is coated with a superconducting thin film so as to reduce noise and improve electronic gain; various types of sensors include optical sensors, thermal imaging sensors, acoustic sensors, and chemical sensors. By adopting a multi-quantum well structure and a surface plasma enhanced photoelectric cathode, the spectral response and photoelectric conversion efficiency are remarkably improved, and the sensitivity and response speed of the system to non-specific wavelengths are enhanced. Meanwhile, the microchannel plate coated with the superconducting thin film effectively reduces the noise level, improves the signal definition and the image quality, and solves the high-gain limitation of a traditional system.

According to the band-pass filter provided by the invention, a first metal layer of a quarter-mode substrate integrated waveguide comprises a circular quarter-mode waveguide pattern which is used for forming artificial surface plasmon polaritons; the first surface of the dielectric substrate is also provided with an input structure and an output structure which are symmetrically arranged, and a first transition structure and a second transition structure which are symmetrically arranged, and the first transition structure is connected between the input structure and the circular quarter-mode waveguide pattern. The first transition structure is connected between the input structure and the circular quarter-mode waveguide pattern to enable smooth transition between the input structure and the circular quarter-mode waveguide pattern, and the second transition structure is connected between the output structure and the circular quarter-mode waveguide pattern to enable smooth transition between the input structure and the circular quarter-mode waveguide pattern. And the first transition structure and the second transition structure are matched with the artificial surface plasmon polaritons. The SSPP band-pass filter is realized in the quarter-mode substrate integrated waveguide, and has the advantages of ultra-wide stop band, easy integration, compact structure and low cost.

The invention discloses a high-speed photoelectric detector based on a mixed surface plasma slit waveguide and a preparation method of the high-speed photoelectric detector, and belongs to the technical field of integrated optoelectronic devices. Comprising a substrate, a mixed surface plasma slit waveguide, metal gates on the two sides, a Van der Waals heterostructure and metal source and drain electrodes on the two sides. The Van der Waals heterojunction is composed of an upper hexagonal boron nitride layer, a lower hexagonal boron nitride layer and a middle two-dimensional material. According to the invention, the hexagonal boron nitride is used for packaging the two-dimensional material, so that the carrier mobility of the two-dimensional material can be improved, and the photoelectric response of the detector is enhanced; according to the invention, the distance between the metal gate and the optical waveguide is shortened, a transverse electric mode transmitted in the waveguide is regulated and controlled, a hybrid surface plasma slit mode with a strong local area is formed, the interaction between an optical field and a two-dimensional material layer is enhanced, and the responsivity of the detector is remarkably improved; the Fermi level of the two-dimensional material can be dynamically regulated and controlled by introducing the grid bias voltage, the photo-generated current separation efficiency is enhanced, and the responsivity and the signal-to-noise ratio of the detector can be improved.

The invention provides a surface plasma imaging method and a surface plasma imaging device, which are used for imaging surface plasma signals caused by interaction of biomolecules. More specifically, the invention provides a method and a device capable of imaging a surface plasmon resonance mode in a frequency domain through tiny change by comparing the light intensity in two sections of surface plasmon frequency domains.

The invention discloses an on-chip spectrum sensing structure, a pixel unit and a preparation method and application thereof. The on-chip spectrum sensing structure comprises a metal layer, a dielectric layer and a detector, nano-pore channels are formed in the metal layer and the dielectric layer, and the nano-pore channels extend into the dielectric layer from the surface of the metal layer; near-infrared light forms surface plasmon resonance at the interface of the metal layer and the dielectric layer in the nanopore channel, so that part of near-infrared light in a selected narrow wavelength range is transmitted to the detector, and a corresponding electric signal is formed. According to the on-chip spectrum sensing structure provided by the invention, near-infrared broadband calculation spectrum sensing with high spectral fidelity can be realized, radiation and ohmic loss are effectively inhibited by a nonlinear parameterized design framework, and high transmission efficiency is ensured; the multi-channel super-pixel system structure generated by the method realizes simultaneous point spectrum and snapshot hyperspectral imaging, and shows the potential of the compact platform for field deployment and chip spectrum sensing application.

The invention discloses a split-band synthetic electromagnetic wave coupling device based on Rydberg atoms. The split-band synthetic electromagnetic wave coupling device comprises an energy collecting and processing case, a millimeter wave local oscillator source, a coaxial switch matrix, a surface plasma transmission line, a microwave local oscillator source, a laser generator and a photoelectric detector. The energy collecting and processing case comprises a plurality of frequency band antennas, a waveguide magic T, a waveguide adapter, a waveguide probe and a parabolic mirror, the frequency band antennas are connected with the corresponding coaxial switch matrix and the waveguide magic T after receiving incoming wave signals, and the coaxial switch matrix is connected to a plasma transmission line channel of the surface plasma transmission line; and the waveguide magic T is connected to the waveguide adapter, and is irradiated to the atomic gas chamber above the plasma transmission line channel through the waveguide probe and the parabolic reflector. And the laser generator irradiates the atomic gas chamber and then outputs to the photoelectric detector for detection. According to the invention, the problem of integration of a plurality of coupling channels is effectively solved, and meanwhile, efficient coupling of local oscillator signals, received incoming wave signals and the atomic gas chamber is met.

The invention discloses a high-luminous-efficiency diffraction optical waveguide, which belongs to the technical field of diffraction optical waveguides and comprises a substrate, a grating and a film unit, the grating is arranged on the substrate, the film unit covers the ridge top and the groove bottom of the grating and is used for forming a surface plasmon effect, and the film unit comprises at least two metal layers and at least one dielectric layer which are alternately stacked. And the outermost layers are metal layers. According to the diffraction optical waveguide, the optical transmission efficiency of the diffraction optical waveguide can be greatly improved, and power consumption can be reduced.

The invention discloses a surface plasma-based reverse Cherenkov medium laser accelerator, which is characterized in that a silicon medium prism, a first silver metal film, a first silicon medium film, a high-vacuum particle channel, a second silicon medium film, a second silver metal film and a silicon medium substrate are sequentially arranged from top to bottom to form a seven-layer metal-medium alternating structure; single-side incident laser excites surface plasma to realize particle acceleration. Incident electromagnetic waves are subjected to total internal reflection at the bevel edge of the prism, evanescent waves are generated, the longitudinal wave vector component of the evanescent waves meets the excitation condition of SPPs at the medium-metal layer interface, then the SPPs are excited on the metal-medium interface, and a remarkably enhanced near field is generated. The enhanced electric field forms longitudinal accelerating fields which are symmetrically distributed in the high-vacuum particle channel, and energy gain is continuously provided for electrons; meanwhile, the transverse electric field component is minimized in the central area of the channel due to mutual offset of upper and lower components, so that particle deflection is effectively inhibited.

An surface plasmon microscope includes a light source, a polarization element, a beam splitter, an objective lens, a photodetector, an operation unit, and the like. An illumination optical system including lenses, the polarization element, the beam splitter, and the objective lens guides light output from the light source to converge the light by the objective lens, and illuminates a metal thin film with the light from a lower surface side of a transparent substrate and focuses the light on the metal thin film to generate a surface plasmon resonance. A detection optical system including the objective lens, the beam splitter, and a lens guides reflected light generated by the focused illumination on the metal thin film to the photodetector. The operation unit acquires refractive index information of a sample disposed in contact with the metal thin film based on the reflected light intensity detected by the photodetector.

A spherical designer electromagnetic surface plasmon open resonator is provided. The open resonator includes a resonator inner core and a resonator outer shell. The resonator inner core is located in an inner center of the resonator outer shell, and the resonator inner core and the resonator outer shell are coaxial. The disclosure provides a device that implements the superscattering function for incident waves in all incident directions and in all polarization directions, and a spherical open resonator is implemented. The scattering cross section of the disclosure can be more than five times greater than that of a metal sphere of the same size, and the operating frequency can be flexibly designed. By utilizing the characteristic that the scattering cross section of the spherical designer electromagnetic surface plasmon resonator is much greater than its own geometric cross section, the electromagnetic super-scattering device can be implemented.

This application relates to surface plasmon pumped light emitting devices. Apparatus and techniques are provided for implementing an OLED device including one or more plasmonic materials exhibiting surface plasmon resonance and one or more outcoupling layers.

The invention provides an all-dielectric grating quasi-BIC up-conversion luminescence enhancement structure and application thereof. The all-dielectric grating quasi-BIC up-conversion luminescence enhancement structure comprises a substrate; wherein a plurality of silicon nitride gratings are arranged on the upper surface of the substrate at equal intervals, interval grooves are formed between the adjacent silicon nitride gratings, and conversion nanoparticles are arranged in the interval grooves. The in-plane symmetry is destroyed by introducing perturbation, so that SP-BIC can be converted into qBIC, a local electric field in a grating gap is remarkably enhanced, the up-conversion nanoparticles are arranged in the grating gap, the up-conversion emission intensity is enhanced, and compared with traditional surface plasma up-conversion enhancement, the theoretical luminescence enhancement factor reaches 1.58 * 10 < 15 >.

The invention discloses a dual-polarization microwave energy efficient receiving composite metasurface array and a receiving method, and the method comprises the steps: enabling different polarization plane waves to irradiate a polarization selective waveform conversion function region composed of biaxial symmetric split-ring resonators, and carrying out the unit differential response and reflection phase gradient arrangement, converting the x-polarized plane wave and the y-polarized plane wave into surface waves propagating in the-x direction and the y direction respectively; the square ring-shaped artificial surface plasmon polariton structure is used for receiving the surface wave, and the surface wave is stably guided to the waveform focusing and energy extraction functional area through momentum matching; by means of gradient refractive index distribution focusing surface waves of a planar semi-Maxwell fisheye lens, an equiphase surface is bent into a spherical surface shape, and energy is converged to a focus; energy is led out through the microstrip line structure at the focus, efficient transmission is achieved through impedance matching, and collection and conversion of different polarization microwave energy are completed. The polarization sensitivity problem of a traditional scheme is solved, and the microwave energy collection efficiency is improved.

The present invention discloses a nanoparticle composite magneto-optical film, its preparation method, and its application, belonging to the technical field of magneto-optical film preparation and sensing applications. A CoFeB / W film is prepared on a silicon wafer using magnetron sputtering as a substrate. A gold-platinum nanoparticle layer, or a gold nanoparticle layer and a covering tungsten layer, is then spin-coated on the film. This method enhances the longitudinal magneto-optical Kerr effect of the CoFeB film by combining gold, which exhibits a surface plasmon effect, with platinum and tungsten, which exhibit a high spin-orbit coupling effect. This method utilizes the synergistic effect of these two effects to enhance the CoFeB film's longitudinal magneto-optical Kerr effect. As a sensitive element, the film has broad application potential in biomolecular sensors, as well as in the detection of viruses, bacteria, biofunctional molecules, and biological weapons.

The application discloses a kind of low reflection high adhesive photo surface treatment method, successively contain photo surface plasma treatment, UV film solution coating solidification, film outer surface plasma treatment etc., core is in UV film solution adding silane coupling agent type passivator;Photo surface uses atmospheric pressure plasma treatment, film outer surface uses low temperature plasma treatment, by controlling plasma treatment power, speed, working gas etc., realize the micro-nano rough structure construction of photo and film outer surface.The application utilizes double plasma treatment to realize physical roughening and reduce reflection, realizes the stability and chemical coupling of plasma activated surface by passivator, greatly improves the bonding strength of photo and film layer, and finally prepared film encapsulation photo film layer transmittance is greater than or equal to 90%, 60 degree glossiness is 10~30GU, while realizing low reflection effect without losing transparency, also has excellent wear resistance, bending performance.

The present application relates to a kind of multi-wavelength surface plasmon hot electron photodetector and its preparation method and application, its structure includes substrate, two-dimensional material layer, vanadium dioxide micro-nano structure, graphene layer and top driving electrode.The detector realized by the present application not only has the characteristics such as wide spectrum, real-time tuning, room temperature operation and wavelength selectivity, and the detection performance is significantly improved.

A spherical designer electromagnetic surface plasmon open resonator is provided. The open resonator includes a resonator inner core and a resonator outer shell. The resonator inner core is located in an inner center of the resonator outer shell, and the resonator inner core and the resonator outer shell are coaxial. The disclosure provides a device that implements the superscattering function for incident waves in all incident directions and in all polarization directions, and a spherical open resonator is implemented. The scattering cross section of the disclosure can be more than five times greater than that of a metal sphere of the same size, and the operating frequency can be flexibly designed. By utilizing the characteristic that the scattering cross section of the spherical designer electromagnetic surface plasmon resonator is much greater than its own geometric cross section, the electromagnetic super-scattering device can be implemented.

The application provides a surface plasmon photolithography device and a preparation method for improving imaging aspect ratio, which can be applied to the fields of integrated circuit manufacturing and photolithography technology. The surface plasmon photolithography device comprises a metal reflection layer, an optical metamaterial photoresist layer and a mask layer which are sequentially stacked from bottom to top; wherein the optical metamaterial photoresist layer comprises a photoresist and a metal nanoparticle array embedded in the photoresist, the metal nanoparticle array comprises at least one metal nanoparticle layer, and the metal nanoparticle layer is composed of metal nanoparticles arranged periodically; the metal nanoparticle layer is arranged in parallel to the mask layer, wherein when the metal nanoparticle layer comprises a plurality of metal nanoparticle layers, the different metal nanoparticle layers are located in different planes. The application further provides a preparation method of the surface plasmon photolithography device for improving imaging aspect ratio.

The invention belongs to the technical field of environmental photocatalytic environmental governance, and particularly relates to a plasma enhanced magnetic nano composite photocatalyst with a memory catalysis effect, a preparation method and application, and the nano composite photocatalyst is a NaYF4: Yb, Tm-coated TiO2 / Fe3O4 core-shell structure nano composite material deposited by plasma enhanced magnetic Au. According to the nano composite photocatalyst, TiO2 is used as a matrix, and efficient conversion from visible light to ultraviolet light is realized by coating NaYF4: Yb, Tm up-conversion nanoparticles capable of being excited by near-infrared light; fe3O4 is compounded to endow the material with magnetic recovery performance; au nano-particles deposited on the surface of the core shell enhance the surface plasma effect and carrier separation, and the photocatalytic activity is further improved. The plasma enhanced magnetic nano-composite photocatalyst with the memory catalysis effect can efficiently degrade organic pollutants under the illumination condition, can perform continuous catalytic degradation after illumination is stopped, and provides a breakthrough technical path for solving the problem of sustainable degradation of the current photocatalysis technology under the complex environment condition.

The present application discloses a method and device for correcting optical proximity effects based on modulation of evanescent wave field intensity attenuation characteristics, relating to the field of photolithography resolution enhancement technology. The method comprises: determining the effective range of action of the near-field optical proximity effect on a target pattern by modeling and analyzing the field intensity attenuation characteristics of the evanescent wave within a photoresist; using the target pattern as an input image for surface plasmon lithography, and determining the accuracy and target compensation exposure dose of a target exposure pattern within the photoresist corresponding to the target pattern under preset exposure conditions; determining an area on the target pattern requiring compensation modulation, and compensating and correcting the near-field optical proximity effect within the effective range based on the target compensation exposure dose to obtain a corrected pattern; using the corrected pattern as an input image, and comparing the contour of the corrected exposure pattern within the photoresist extracted under the preset exposure conditions to determine the accuracy and cost function curve data of the corrected exposure pattern.

Semiconductor devices and methods of forming heat spreaders with surface plasma treatment for FCBGA-H packages. A semiconductor device has a substrate and an electrical component disposed over the substrate. A heat sink having a plasma enhanced surface is disposed over the electrical component. The TIM is disposed between the electrical component and the plasma enhanced surface of the heat sink. The TIM may be deposited on an electrical component or a plasma enhanced surface. The plasma enhanced surface comprises argon ions and oxygen ions. A heat sink is disposed in the reaction chamber. Reactant gases, such as argon and oxygen, are introduced into the reaction chamber. An electric field is formed within the reaction chamber to ionize argon and oxygen and form a plasma enhanced surface. The plasma enhanced surface has characteristics of roughness and tackiness or adhesion as the properties of the surface exhibit chemically bonded groups. An underfill material is deposited between the electrical component and the substrate. The electrical component may be a flip-chip type semiconductor die.

The invention discloses a Ce-doped Co-MOF derived CuO composite oxide catalyst and a preparation method thereof, and belongs to the technical field of catalytic materials. The preparation method comprises the following steps that S1, rare earth waste residues containing Ce elements and Co elements are obtained and treated, and a cerium salt solution and a cobalt salt solution are obtained; s2, the cerium salt solution and the cobalt salt solution are mixed with an organic ligand, and a Ce-Co-MOF precursor is prepared; s3, carrying out calcining and annealing treatment to obtain a Ce-Co-O porous composite oxide carrier; s4, preparing a copper salt solution, impregnating the Ce-Co-O porous composite oxide carrier with the copper salt solution, and then performing drying and calcining treatment to obtain a CuO-coated Ce-Co-O composite oxide; and S5, carrying out surface plasma activation treatment to obtain the Ce-doped Co-MOF derived CuO composite oxide catalyst. According to the invention, high-valued utilization of rare earth resources and precise structural regulation and control of catalytic materials can be realized, and the prepared catalyst can show excellent activity and stability in low-temperature CO oxidation reaction.

The application provides a surface plasmon lithography imaging structure, a method and a computer readable medium, comprising: a reflective layer, a photoresist, a first resonant cavity structure and a mask layer; the reflective layer is arranged on one side of a structure to be etched; the photoresist is arranged on the side of the reflective layer away from the structure to be etched; the first resonant cavity structure is arranged on the side of the photoresist away from the structure to be etched; and the mask layer is arranged on the side of the first resonant cavity structure away from the structure to be etched; by arranging the first resonant cavity structure between the mask layer and the photoresist of the surface plasmon lithography imaging structure, the localization effect of the light field is enhanced, the diffraction limit is further broken, the imaging performance is optimized, and the resolution is improved.

The present invention discloses a method for correcting surface plasma lithography patterns, comprising: forming a plurality of test patterns on a test mask, each test pattern being characterized by at least a first test parameter and a second test parameter related to the first test parameter; exposing a photoresist layer using the test mask containing the test patterns to form a plurality of photoresist patterns, each photoresist pattern being characterized by at least a first exposure parameter and a second exposure parameter related to the first exposure parameter; establishing a first data table based on the correspondence between the first and second test parameters of the test patterns and the first and second exposure parameters of the photoresist patterns; processing the first data table according to the first exposure parameter to obtain a second data table; correcting the second test parameters of a plurality of design patterns based on the second data table to obtain corrected design patterns, and using the corrected design patterns to manufacture a mask for exposure.