The application discloses a kind of low reflection high
adhesive photo surface treatment method, successively contain photo surface
plasma treatment, UV film solution
coating solidification, film outer surface
plasma treatment etc., core is in UV film solution adding
silane coupling agent type passivator;Photo surface uses
atmospheric pressure plasma treatment, film outer surface uses
low temperature plasma treatment, by controlling
plasma treatment power, speed, working gas etc., realize the micro-nano rough structure construction of photo and film outer surface.The application utilizes double
plasma treatment to realize physical roughening and reduce reflection, realizes the stability and
chemical coupling of plasma activated surface by passivator, greatly improves the
bonding strength of photo and film layer, and finally prepared film encapsulation photo film layer
transmittance is greater than or equal to 90%, 60 degree glossiness is 10~30GU, while realizing low reflection effect without losing transparency, also has excellent
wear resistance, bending performance.