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41 results about "Plasmonic nanostructures" patented technology

Plasmonic nanostructures have rapidly emerged as a type of optical material possessing many novel physical properties and holding great promise for a wide range of applications. One of the key challenges in this area lies in the bottom-up construction of precise plasmonic nanostructures with novel optical properties.

Plasma nano-structure assisted femtosecond laser nano-manufacturing method and system

InactiveCN109848565AEnhanced near-field damage effectWide range of machinable materialsLaser beam welding apparatusOptical diffractionNano structuring
The invention provides a plasma nano-structure assisted femtosecond laser nano-manufacturing method and system and belongs to the field of laser micronano-structure processing. Through the plasma nano-structure assisted femtosecond laser nano-manufacturing method and system, the problems that the optical diffraction limit is hard to break through during conventional laser precision machining, a hard and brittle material is hard to machine, the requirements for the machining environment are high, the cost is high and machining is hard to implement in the air environment are solved. According tothe method, through LSPR enhancement of a plasma nano-structure is motivated through femtosecond laser to generate a space height localized patterning optical near field beyond the optical diffraction limit on the surface of the material to be machined, and the material is subjected to area arrayed and patterned ultrahigh resolution nano-machining. Through the method, the limitation of the optical diffraction limit of a traditional machining method can broken through, and wide-range and high-precision parallel machining is realized. The method has the characteristics that the range of the machining material is wide, free special machining is realized, the cost is low, and the method is simple and easy to implement.
Owner:XI AN JIAOTONG UNIV

Dynamically tunable, single pixel full-color plasmonic display, method and applications

Dynamic, color-changing surfaces have many applications including but not limited to displays, wearables, and active camouflage. Plasmonic nanostructures can fill this role with the advantages of ultra-small pixels, high reflectivity, and post-fabrication tuning through control of the surrounding media. However, while post-fabrication tuning have yet to cover a full red-green-blue (RGB) color basis set with a single nanostructure of singular dimensions, the present invention contemplates a novel LC-based apparatus and methods that enable such tuning and demonstrates a liquid crystal-plasmonic system that covers the full red/green/blue (RGB) color basis set, as a function only of voltage. This is accomplished through a surface morphology-induced, polarization dependent, plasmonic resonance and a combination of bulk and surface liquid crystal effects that manifest at different voltages. The resulting LC-plasmonic system provides an unprecedented color range for a single plasmonic nanostructure, eliminating the need for the three spatially static sub-pixels of current displays. The system's compatibility with existing LCD technology is possible by integrating it with a commercially available thin-film-transistor (TFT) array. The imprinted surface readily interfaces with computers to display images as well as video.
Owner:UNIV OF CENT FLORIDA RES FOUND INC

Infrared detector of micro electro mechanical system and manufacturing method thereof

PendingCN110790217AEnhanced electromagnetic field concentrationAchieve ultra-high absorptionTelevision system detailsImpedence networksMetallic electrodePlasmonic nanostructures
The invention provides a structure of an infrared detector. The structure comprises an interdigital electrode structure which is used for inputting and outputting frequency signals and is provided with at least two electrodes; a piezoelectric vibration structure used for generating a frequency signal and positioned on the upper layer of the interdigital electrode structure; and a plasma metasurface structure used for realizing ultrahigh absorption of infrared radiation and positioned on the upper layer of the piezoelectric vibration structure. A plasma metasurface structure made of a gold filmis adopted so that a series of sub-wavelength structures are patterned in a top metal electrode. The plasma nanostructure is properly patterned in the top metal layer, so that the invention becomes an infrared ultrathin absorber with spectral selectivity and irrelevance to polarization, ultrahigh absorption of long-wave infrared light can be realized, high-speed and high-sensitivity infrared detection can be realized, and the defects existing in a traditional infrared detector are avoided. On the basis, the invention further provides a manufacturing method of the infrared detector of the microelectro mechanical system.
Owner:NANTONG UNIVERSITY
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