The invention discloses a preparation method of a material with a
plasmon array and the material. The method comprises the steps that based on a preset
nickel female template, imprinting is carried out on a pretreated first original
metal sheet; performing
anodic oxidation on the first surface of the first original
metal sheet to prepare an initial
mask plate with an
anodic oxidation layer; performing reprocessing on the initial
mask plate so as to remove redundant materials on the first original
metal sheet under the condition of protecting the
anodic oxide layer, thereby obtaining the
mask plate; and on the basis of a mask plate, imprinting is performed on the preprocessed second original
metal sheet, and the material with the
plasmon array is prepared. The material with the array period distance equivalent to the
resonance wavelength and coupled with the Bloch wave can be prepared in a secondary imprinting mode, it can be guaranteed that the uniformity and stability of the
photon local area are improved under
resonance, in addition, the material can inhibit
radiation damping through
surface plasmon resonance, photons are strongly localized at the nanoscale, and the performance of the material is improved. Therefore, the interaction between the light and the substance is enhanced.