Methods to pattern substrates with dense
periodic nanostructures that combine top-down lithographic tools and self-assembling block
copolymer materials are provided. According to various embodiments, the methods involve chemically patterning a substrate, depositing a block
copolymer film on the chemically patterned imaging layer, and allowing the block
copolymer to self-assemble in the presence of the chemically
patterned substrate, thereby producing a pattern in the block copolymer film that is improved over the substrate pattern in terms feature size, shape, and uniformity, as well as regular spacing between arrays of features and between the features within each array compared to the substrate pattern. In certain embodiments, the density and total number of pattern features in the block copolymer film is also increased.
High density and quality nanoimprint templates and other nanopatterned structures are also provided.