8results about How to "Uniform surface" patented technology

The present application belongs to the technical field of model surface finishing, and particularly relates to a surface finishing device for environmental design models, which comprises a base, a lifting frame, a veneer type grinding mechanism and a surface type speed control mechanism, the lifting frame is arranged on the upper wall of one end of the base, the veneer type grinding mechanism comprises a reversing assembly, a lifting assembly, a driving assembly, a surface finishing assembly and a positioning assembly, the reversing assembly is arranged on the base, the lifting assembly is arranged on the lifting frame, the driving assembly is arranged on the lifting assembly, the surface finishing assembly is arranged on one end of the driving assembly away from the lifting assembly, and the positioning assembly is arranged in the driving assembly. The surface finishing device for environmental design models can monitor the roughness of the surface of the model during the polishing process, and the grinding layer speed is reduced synchronously as the surface of the model gradually becomes smooth.

This invention discloses a method for preparing a polyamic acid solution and a polyimide film. The method involves determining the reactivity parameters of the diamine monomer and the dianhydride monomer through quantum chemical calculations. Based on these parameters, a highly reactive diamine monomer is paired with a less reactive dianhydride monomer, or vice versa, to form a complementary reactive monomer combination. This monomer combination is then subjected to prepolymerization, polymerization, and finally end-capping to obtain the polyamic acid solution. By combining theoretical calculations with process design, monomers with different reactivity participate uniformly in chain growth within the reaction system, achieving a uniform distribution and end-capping of the molecular chain sequence. The resulting polyamic acid solution is then cured by heating to obtain a polyimide film with a highly uniform and smooth surface and a dense, intact structure.

The application provides a soybean big cherry yoghourt production process, which comprises the following steps: preparing raw soybean milk and tartary buckwheat bud powder, stress treating big cherries and color protection to prepare fruit pulp, adding the tartary buckwheat bud powder into the raw soybean milk to carry out heat preservation and deodorization treatment, then adding skimmed milk powder, sucrose and glucose, uniformly mixing and sterilizing and cooling, adding the big cherry fruit pulp to homogenize, carrying out pasteurization and cooling, then inoculating bacteria powder, and carrying out fermentation and post-ripening to prepare the soybean big cherry yoghourt. The application adopts the tartary buckwheat bud powder to deodorize soybean, the soybean raw milk has rich soybean flavor, no fishy smell, delicate taste, no bitter and astringent taste, the yoghourt fermented from the big cherry fruit pulp treated by stress and color protection has the special soybean and cherry flavor, no fishy smell, pure lactic acid flavor, and the natural color of the big cherry is well preserved.

The application discloses a preparation method of a multilayer composite crosslinking ceramic flow-casting green tape, which comprises the following steps: inputting slurry into multiple interval-mounted material boxes of a flow-casting machine, making the carrier tape pass through the material boxes and making the slurry in the material boxes be stacked on the carrier tape layer by layer to be flow-cast into a multilayer composite crosslinking flow-casting green tape; the slurry comprises silicon nitride ceramic powder, a sintering aid, a solvent, a binder, a dispersing agent, a plasticizer and a crosslinking agent; the plasticizer is at least one of cashew phenol Mannich tiglic acid ester, dibutyl phthalate, dimethyl phthalate and polyethylene glycol, and the dispersing agent is at least one of fish oil, castor oil and polyvinylpyrrolidone. The obtained green tape is uniform, smooth and flat, free of cracks, wrinkles and bubbles, has good toughness and high strength, is not easy to deform, and has adjustable thickness, and the problem that a crosslinking system ceramic green tape is difficult to flow thick is solved.

The present disclosure relates to the technical field of inorganic material preparation, and particularly relates to a preparation process for preparing aluminum silicon carbide from silicon carbide particles with surface modification. The preparation process comprises the following steps: step 1: providing silicon carbide particles; performing surface hydroxylation treatment on the silicon carbide particles to obtain silicon carbide particles with hydroxylation modification; step 2: performing surface modification treatment on the silicon carbide particles with hydroxylation modification by using a silane coupling agent to obtain silicon carbide particles with amination modification; step 3: preparing a solution containing a first complex; step 4: reacting the silicon carbide particles with amination modification with the solution containing the first complex to obtain a product of step 4; and step 5: performing heat treatment on the product of step 4 to obtain silicon carbide with surface modification.

The application discloses a high-temperature annealing method for reducing surface decomposition of AlN by eliminating surface gap. First, a covering layer material compatible with AlN is completely covered on the surface of an AlN template, and high-purity AlN powder is further inserted when two AlN templates are pasted face to face, so that subsequent high-temperature annealing is carried out in the pasted form. The prepared AlN template has a surface with greatly reduced high-temperature annealing decomposition and a large-area uniform and smooth surface; the process steps adopted by the method are compatible with semiconductor microelectronic technology, and the method is suitable for a process system of high-performance optoelectronic devices related to AlN.

The application discloses a processing method of an upper dielectric layer of a lower electrode and a manufacturing process of the lower electrode. The processing method of the upper dielectric layer comprises the following steps: performing plasma spraying on a surface of an electrode layer to form the upper dielectric layer, wherein the spraying route of the plasma spraying is N scanning paths in S shape, and the starting points of the N scanning paths are staggered by a distance d in the same direction; sealing holes; grinding; and sand blasting, wherein the sand blasting route is the same as the spraying route. In the spraying and sand blasting processes of the upper dielectric layer, a plurality of offset paths are adopted, the uniformity of the superposition area is increased, the wave shape formed on the surface of the upper dielectric layer is reduced, and the uniformity of the surface of the upper dielectric layer is improved. Therefore, the non-uniform cooling of a glass substrate caused by the difference in the dry etching process is reduced, and the generation of mura in the dry etching process is reduced.

The invention discloses a plasma and laser circulation synergistic target material surface treatment method and device. The method comprises the steps that a target material is provided, and no large-area loose attachment exists on the surface of the target material; performing plasma cleaning on the surface of the target material according to a first preset parameter for preset time; performing laser scanning treatment on the surface of the target material subjected to plasma cleaning according to a second preset parameter; plasma cleaning and laser scanning treatment are carried out at least once; and the target material surface state parameters are monitored in real time, a monitoring result is obtained, and the first preset parameter and the second preset parameter are dynamically adjusted based on the monitoring result until the target material surface state parameters meet a preset threshold value. On the basis that the target material is not damaged, integrated treatment from macroscopic cleaning to microcosmic leveling can be achieved step by step in a layered mode, and finally the target material high in cleanliness and uniform in surface is obtained.