497 results about "Hydrogen halide" patented technology

A method is provided for depositing a dielectric film on a substrate. According to one embodiment, the method includes providing the substrate in a process chamber, exposing the substrate to a gaseous precursor to form an adsorbed layer on the substrate, exposing the adsorbed layer to an oxygen-containing gas, a nitrogen-containing gas, or an oxygen- and nitrogen-containing gas, or a combination thereof, to form the dielectric film on the substrate, generating a hydrogen halide gas in the process chamber by a decomposition reaction of a hydrogen halide precursor gas, and exposing the dielectric film to the hydrogen halide gas to remove contaminants from the dielectric film.

The present methods provide tools for growing conformal metal thin films, including metal nitride, metal carbide and metal nitride carbide thin films. In particular, methods are provided for growing such films from aggressive chemicals. The amount of corrosive chemical compounds, such as hydrogen halides, is reduced during the deposition of transition metal, transition metal carbide, transition metal nitride and transition metal nitride carbide thin films on various surfaces, such as metals and oxides. Getter compounds protect surfaces sensitive to hydrogen halides and ammonium halides, such as aluminum, copper, silicon oxide and the layers being deposited, against corrosion. Nanolaminate structures incorporating metallic thin films, and methods for forming the same, are also disclosed.

A method for etching a target layer on a substrate by a dry etching process includes at least one etching cycle, wherein an etching cycle includes: depositing a carbon halide film using reactive species on the target layer on the substrate; and etching the carbon halide film using a plasma of a non-halogen hydrogen-containing etching gas, which plasma alone does not substantially etch the target layer, thereby generating a hydrogen halide as etchant species at a boundary region of the carbon halide film and the target layer, thereby etching a portion of the target layer in the boundary region.

A method of making a metal nitride is provided. The method may include introducing a metal in a chamber. A nitrogen-containing material may be flowed into the chamber. Further, a hydrogen halide may be introduced. The nitrogen-containing material may react with the metal in the chamber to form the metal nitride.

The present method provides tools for growing conformal metal nitride, metal carbide and metal thin films, and nanolaminate structures incorporating these films, from aggressive chemicals. The amount of corrosive chemical compounds, such as hydrogen halides, is reduced during the deposition of transition metal, transition metal carbide and transition metal nitride thin films on various surfaces, such as metals and oxides. Getter compounds protect surfaces sensitive to hydrogen halides and ammonium halides, such as aluminum, copper, silicon oxide and the layers being deposited, against corrosion. Nanolaminate structures (20) incorporating metal nitrides, such as titanium nitride (30) and tungsten nitride (40), and metal carbides, and methods for forming the same, are also disclosed.

A method of synthesizing hydrocarbons from smaller hydrocarbons includes the steps of hydrocarbon halogenation, simultaneous oligomerization and hydrogen halide neutralization, and product recovery, with a metal-oxygen cataloreactant used to facilitate carbon-carbon coupling. Treatment with air or oxygen liberates halogen and regenerates the cataloreactant.

Alcohols, ethers, aldehydes, and olefins are manufactured from alkanes by mixing an alkane and a halogen selected from the group including chlorine, bromine, and iodine in a reactor to form alkyl halide and hydrogen halide. The alkyl halide only or the alkyl halide and the hydrogen halide are directed into contact with metal oxide to form an alcohol and/or an ether, or an olefin and metal halide. The metal halide is oxidized to form original metal oxide and halogen, both of which are recycled.

The invention relates to a purification process of liquefied gas and particularly provides a high-temperature hydrogenation and purification process for liquefied gas materials. The high-temperature hydrogenation and purification process is characterized by comprising the following steps: (1) carrying out heat exchange on raw material liquefied gas and a reactor outlet product in a heat exchanger, heating by a heating furnace to a reaction temperature, then feeding the material into a reactor from the top, carrying out saturation hydrogenation on olefin in the material to obtain alkane, and respectively hydrogenating and converting sulfide, oxide, nitride and halide into hydrogen sulfide, water, ammonia and hydrogen halide; (2) carrying out sufficient heat exchange on the reactor outlet product and the raw material by an efficient heat exchanger, carrying out water cooling by a water cooler and enabling the material to enter a gas-liquid separation tank, compressing a flashing gas phase and fresh hydrogen by a compressor and circulating to the raw material liquefied gas; (3) enabling the flashing liquid phase to enter an alkali washing deposition tank and carrying out fiber membrane alkali washing to remove hydrogen sulfide, ammonia and hydrogen halide; (4) enabling the material which is subjected to the alkali washing to enter a dearsenicator, and removing arsenic and metal to obtain refined liquefied gas. The high-temperature hydrogenation and purification process mainly aims at a project which is very strict in requirement on the impurity content of a catalyst, and is short in flow, small in investment, low in cost and less in solid wastes.

Disclosed is a carbonylation process for the production of carboxylic acids, carboxylic acid esters and/or carboxylic acid anhydrides wherein a carbonylation feedstock compound selected from one or more organic oxygenates such as alcohols, ethers, and esters is contacted with carbon monoxide in the presence of a carbonylation catalyst and one or more onium compounds. The carbonylation process differs from known carbonylation processes in that a halide compound such as a hydrogen halide, typically hydrogen iodide, and/or alkyl halide, typically methyl iodide, extraneous or exogenous to the carbonylation process is not fed or supplied separately to the process.

A method for growing a crystal of an Al-containing III-V group compound semiconductor by the conventional HVPE method, characterized in that it comprises a step of reacting Al with hydrogen halide at a temperature of 700° C. or lower to form a halide of Al. The method has allowed the suppression of the formation of aluminum chloride (AlCl) or aluminum bromide (AlBr) reacting violently with quartz, which is the material of a reaction vessel for the growth, resulting in the achievement of the vapor phase growth of an Al-containing III-V group compound semiconductor at a rate of 100 microns/hr or more, which has lead to the mass-production of a substrate and a semiconductor element having satisfactory resistance to adverse environment.

The invention discloses a short-procedure, less-investment and simple-operation hydrolysis method for a material containing hydrolysable halogen atom. The method is characterized in that: a material containing hydrolysable halogen atom and a material containing water are subjected to mixing and reacting in a mixing and reaction unit; at least one reactant reacts as completely as possible through controlling reaction conditions, in particular, a key point is that the resulting reaction products are dried solid oxide and gaseous hydrogen halide, then the solid oxide is removed from a gas-solid separation and purification unit, and the gaseous hydrogen halide is processed through a gas product cleaning unit. The solid oxide and the gaseous hydrogen halide prepared through the method are valuable commodities, and the gaseous hydrogen halide further can be applicable for a synthesis process of halide. In addition, the method can be applicable for processing industrial waste containing the hydrolysable halogen atom, and producing solid oxides and hydrogen halide through adopting compounds containing the hydrolysable halogen atom.

A method comprising: providing an alkyl halide stream; contacting at least some of the alkyl halides with a coupling catalyst to form a product stream comprising higher hydrocarbons and hydrogen halide; contacting the product stream with a solid reactant to remove at least a portion of the hydrogen halide from the product stream; and reacting the solid reactant with a source of oxygen to generate a corresponding halogen.

A polyol pre-mix composition includes a blowing agent having a halogenated hydroolefin, a polyol, a catalyst composition, and an antioxidant. The antioxidant may be, for example, a benzene diol or a benzene triol or other polyhydroxy-substituted aromatic compound, which is optionally substituted with one or more substituents such as alkyl groups. A two-part system for producing a thermosetting foam blend includes (a) a polyisocyanate and, optionally, one or more isocyanate compatible raw materials; and (b) the polyol pre-mix composition. A method for producing a thermosetting foam blend includes combining: (a) a polyisocyanate; and (b) the polyol pre-mix composition.

The invention discloses a preparation method of a catalyst for preparing propylene by virtue of propane dehydrogenation. The catalyst comprises an aluminum oxide carrier and active components with the following contents in percentage by mass calculated based on the carrier: 1-3% of calcium silicate salt, 1-3% of cerium oxide, 0.1-2.0% of a platinum group metal, 0.5-5.0% of potassium, 0.2-5.0% of cerium or samarium, 0.3-10% of halogen, 1-5% of a pore forming agent and the balance of impurities, wherein the molar ratio of cerium or samarium to the platinum group metal is 7:8; the platinum group metal is platinum; and halogen is chlorine. The preparation method comprises the following steps: soaking, drying and roasting the aluminum oxide carrier by using a soluble compound solution of cerium or samarium and a calcium silicate salt solution, then soaking, drying and roasting by using a solution containing compounds of the platinum group metal and hydrogen halide, and then soaking, drying and roasting by using a potassium salt solution; and then mixing cerium oxide and the pore forming agent with corresponding amounts, and roasting for 3 hours at 600 DEG C to obtain the catalyst for preparing propylene by virtue of propane dehydrogenation.

The invention discloses a polymeric phosphorus-containing flame retardant with 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide as a lateral group and a preparation method thereof. The preparation method is characterized by comprising the following steps: placing aromatic dihydric phenol and pentaerythritol diphosphate diphosphoryl chloride (or bromine) which are modified by the 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide in an anhydrous acetonitrile solvent based on reaction mol ratio, heating the obtained mixture to 80 DEG C in an inert atmosphere, agitating and reacting until no halogen hydride is released, cooling the obtained mixture to the room temperature, and depressurizing the mixture to remove the solvent. The obtained product has high phosphorus content, very good expansibility and char formation, and good flame retardation effect. When flame retardation is performed on epoxy resin, the limiting oxygen index of the obtained product is greatly improved and the vertical burning scale reaches V-0 level; and the polymeric phosphorus-containing flame retardant has the advantage of overcoming the disadvantages of low thermal decomposition temperature, poor compatibility with polymer matrix and easy migration in the existing micromolecular phosphorus flame retardants. The preparation method has the advantages of being simple and feasible, using no catalyst and simple post-treatment process.

The invention discloses a method for preparing a graphene film on the surface of titanium alloy. The method specifically comprises the following steps of putting a medical titanium alloy into a piranha solution and carrying out hydroxylation treatment, and then putting into an amino silane solution, and self-assembling a silane film; carrying out ultrasonic treatment on graphene oxide powder to obtain a stable graphene oxide colloid; immersing the titanium alloy of which the surface is attached with the silane film in the graphene oxide colloid to prepare a silane-graphene oxide film; and finally, reducing the graphene oxide film with hydrogen halide acid, and drying to obtain the reduced graphene oxide composite film. The method disclosed by the invention is simple and causes no harm to experiment operators, and the obtained film has the advantages of good integrity, high strength, low coefficient of friction and excellent wear resistance and is expected to become a medical joint material.

The invention discloses a fluoradene derivative and a preparation method thereof. The preparation method comprises the following steps of: introducing fluoradene rings into compounds, namely carbazole, hexyl carbazole, triphenylamine and hexyl triindole; and catalyzing intramolecular carbon-hydrogen bond activation and hydrogen halide elimination reaction through palladium and efficiently constructing a carbon ring or a heterocyclic compound, particularly constructing the carbon ring with a novel structure. The invention aims to synthesize and characterize a fluoradene structural unit-containing large-tension cyclic compound; and the novel fluoradene structural unit-containing compound is expected to be used in the field of organic photoelectric materials.

A flame-retardant reinforced polyamide resin composition comprising (a) a half-aromatic polyamide resin having a hexamethylene adipamide unit and a hexamethylene isophthalamide unit, (b) a melamine polyphosphate and (c) an inorganic reinforcing material, and, if necessary, (d) a polyalkylene polyhydric alcohol and/or a fatty acid ester derivative thereof, (e) a bisamide compound, and (f) a metal oxide and/or a molybdate. According to the composition of the present invention, molding materials can be provided which are very high in flame retardancy even when they are molded into thin-wall moldings, do not generate corrosive hydrogen halide gases during burning and, furthermore, have both excellent electric characteristics and excellent molding processability. <IMAGE>