1723 results about "Edge region" patented technology

The invention discloses a solar cell and a manufacturing method thereof, and a photovoltaic module, and relates to the field of photovoltaic technology. The solar cell includes: a semiconductor substrate having a first surface including a first region and a second region; the second area comprises an edge area and a middle area, each of the edge area and the middle area comprises a step structure recessed towards the second surface, and the step depth of the step structure of the edge area of the second area is larger than that of the step structure of the middle area of the second area; and the first doping layer is arranged on the first region, and the height of the bottom wall of the step structure in the middle region of the second region is lower than that of the first doping layer. The first passivation layer is arranged on the side, away from the semiconductor substrate, of the first doping layer and arranged on the second area. According to the embodiment of the invention, the thickness along the splitting direction is reduced, so that the splitting difficulty is reduced, meanwhile, the recombination of current carriers is reduced, and the passivation effect is improved.

The embodiment of the invention provides a preparation method of a solar cell and the solar cell, and the method comprises the steps: firstly obtaining a substrate cell piece, forming a passive film layer on the substrate cell piece, then forming a grid line on the passive film layer, and then carrying out the sintering. When the grid line is subjected to laser scanning, reverse bias voltage is applied to the grid line, meanwhile, laser scanning is carried out from the middle area of the passive film layer to the edge area, and the laser power when laser scanning is carried out on the middle area is larger than the laser power when laser scanning is carried out on the edge area. When a passive film is formed, due to the influence of a winding plating phenomenon, the passive film has the characteristics that the middle is thin and the edge is thick. The laser power of the edge area is lower, so that the process strength of the edge area can be reduced, and the temperature generated by the edge area can be reduced. Compared with the prior art, the method has the advantages that the high-temperature phenomenon of the edge area can be relieved, the abnormal black edge phenomenon caused by high process strength at the edge is effectively reduced, and the product yield and quality are improved.

The invention relates to a cuboid membrane stack (9) for an air humidifier (1), which has a stacking direction (S) and four stacking sides (10) transverse to the stacking direction (S), wherein the membrane stack (9) has a vertical direction (Z) parallel to the stacking direction (S), a longitudinal direction (X) perpendicular to the vertical direction (Z), and a transverse direction (Y) perpendicular to both the vertical direction (Z) and the longitudinal direction (X), wherein the four stacking sides (10) form an air supply inlet (ZE) and an air supply outlet (ZA) facing away from each other in the longitudinal direction (X), and an exhaust air inlet (AE) and an exhaust air outlet (AA) facing away from each other in the transverse direction (Y), wherein the membrane stack (9) has several membranes (11) which, within the membrane stack (9), each form an air supply path (ZP) connecting the air supply inlet (ZE) to the air supply outlet (ZA), and an exhaust air path (AP). separate,which connects the exhaust air inlet (AE) with the exhaust air outlet (AA). Improved dimensional stability can be achieved by forming a membrane pair (18) with two membranes (11) that are adjacent in the stacking direction (S) and that define one of the supply air paths (ZP) in the stacking direction (S), by connecting the two membranes (11) of the respective membrane pair (18) airtightly to each other by an adhesive bond (21) in a first edge region (19) adjacent to the exhaust air inlet (AE) and in a second edge region (20) adjacent to the exhaust air outlet (AA), and by having the membrane stack (9) have several spacers (12) that are arranged in the stacking direction (S) between two immediately successive membrane pairs (18) and each of which rests against one of the membranes (11) of the two membrane pairs (18) and separates them from each other in the stacking direction (S), such thatthat the membranes (11) adjacent to and spaced apart from each other on the spacer (12) limit one of the exhaust air paths (AP) in the stacking direction (S).

The invention relates to the technical field of resolution improvement, in particular to a video definition improvement method and system.According to the video definition improvement method and system, through window accumulation of adjacent frame gray difference and coordinate difference, minimum displacement is selected, mapping is updated, boundary neighborhood weighted correction is carried out, cross-frame dislocation is reduced, and motion area connection is guaranteed; capturing a three-frame gray scale sequence to calculate a difference value, writing a replacement value according to a monotone and amplitude condition, inputting the replacement value and an alignment frame difference into Fourier transform, decomposing amplitude and phase distribution in a residual field in a frequency domain, and performing amplitude and phase consistency elimination on an abnormal block during frame-by-frame superposition to obtain an abnormal block; row difference and column difference absolute values of neighborhood blocks in the residual iteration texture matrix are accumulated into energy, the energy and a center difference are combined with a threshold value to output a mark, and a texture region and an edge region are distinguished; the brightness of the low-frequency position is updated according to the weight mean value, the maximum difference and the direction difference are combined for the high-frequency position, the edge gradient is extracted through the convolutional neural network, a correction value is generated, edge steps and fuzziness are suppressed, and high-frequency details are continuously kept.

An acoustic wave device, a radio frequency filter and an electronics module are provided. The acoustic wave device, comprises a layer of piezoelectric material, a pair of interdigital transducer electrodes disposed on an upper surface of the layer of piezoelectric material, each interdigital transducer electrode including a bus bar and a plurality of electrode fingers extending from the bus bar through a central region of the interdigital transducer electrode towards an edge region of the interdigital transducer electrode, each of the plurality of electrode fingers having a width in a direction perpendicular to the extension of the electrode fingers that is smaller in the edge regions than in the central regions, and trench portions located in the upper surface of the layer of piezoelectric material, the trench portions overlapping with the edge regions of the interdigital transducer electrodes. The acoustic wave device provides effective suppression of transverse modes.

A structural component serves as a container for a vehicle. The structural component comprises a trough-shaped container section, an edge region, and fastening elements that are provided in the edge region. The container section forms a compartment and defines a bottom region and two or more wall regions, which are at least sectionally inclined with respect to the bottom region. The two or more wall regions are arranged between the bottom region and the edge region. The fastening elements are arranged and distributed around the container section. The container section and the edge region are formed of an injection moldable fiber reinforced thermoplastic material. The structural component at least sectionally has a porous internal structure that is formed by foaming the thermoplastic material.

A method of manufacturing a display device includes forming a thin film transistor layer in an active area of a substrate, forming a metal layer on an edge area of the substrate, transferring first coating patterns to the edge area, the first coating patterns covering a portion of the metal layer corresponding to shapes of side surface lines, etching the metal layer to form the side surface lines, an upper surface of each of the side surface lines being covered by the first coating patterns, transferring a second coating pattern to the edge area, the second coating pattern covering a side surface of each of the side surface lines and the first coating patterns, and transferring light emitting elements to the thin film transistor layer. The second coating pattern includes openings corresponding to the first coating patterns in a plan view.

The invention relates to the technical field of remote sensing image processing, in particular to a stereo matching method of a high-resolution stereo satellite panchromatic image pair. By comprehensively applying a combined geometric coding convolution and gating iterative optimization mechanism, the capturing capability of the model on a complex geometrical shape is remarkably enhanced; the multi-scale cost volume is aggregated, so that the model can be effectively matched with a ground object on different scales, and meanwhile, shielding and shadow areas are effectively processed, so that the matching accuracy and robustness are improved; the parallax estimation process is further optimized by introducing a gradient consistency constraint loss function, clear distinguishing of the parallax image in an edge region and smooth transition of a weak texture region are ensured, and therefore the overall quality of the parallax image is improved. The objective of the invention is to solve the problem of how to improve the capability of capturing a complex geometrical shape in remote sensing image stereo matching and reduce the dependence on the precision of a data set at the same time.

The invention relates to the technical field of blade contour measurement, and discloses a blade contour measurement method and system for an art knife. The method comprises the steps that after an art knife blade image is preprocessed, segmentation is conducted through an edge intensity weighted improved Otsu algorithm, a blade contour is obtained in combination with morphological operation, pixel-level edges are extracted through a Canny algorithm, and finally sub-pixel accurate positioning is achieved based on Fourier transform and a Zernike moment, and high-precision blade contour coordinates are obtained. According to the method, the defects of low precision and poor noise immunity in the existing art knife blade contour measurement method are overcome, the measurement precision reaches 0.1 pixel or below, meanwhile, the method has the self-adaptive processing capacity for edge areas with different complexities, and it is ensured that high-precision and high-reliability blade contour measurement results are obtained in various complex environments.

The invention discloses a high-temperature test method for a power semiconductor device, and relates to the technical field of quantum thermal control, and the method comprises the steps: collecting a temperature field and surface conductivity data of an edge region of the power semiconductor device in real time, and synchronously applying an electric stress of a specified working voltage to the power semiconductor device; an internal thermal displacement field is reconstructed based on the temperature field, a calibration thermal displacement field is generated, and the topological number of the edge area is calculated in combination with the surface conductivity data; generating a thermal failure risk distribution map according to the spatial position of the peak value of the thermodynamic entropy yield, and locking a high-entropy variable power dense region; and the electric stress applying direction is dynamically adjusted in association with the high-entropy variable power dense area, and a thermal failure diagnosis report is output after a full-period high-temperature test is completed. According to the method, submicron-level real-time positioning of the thermodynamic entropy generation peak value under the high-temperature working condition is achieved through collaborative mapping of the quantized calibration thermal displacement field and the tensor field of the classic temperature gradient.

The invention discloses a universal and efficient panoramic image super-resolution reconstruction method and device, which are applied to a panoramic image super-resolution reconstruction model, and comprises the following steps: obtaining geometric features of a low-resolution image, extracting deep features of the low-resolution image, and modulating and mixing the geometric features and the deep features until a potential code is obtained; and the potential codes are subjected to nearest neighbor sampling on the low-resolution image through the coordinates of the high-resolution image to obtain sampling features, the sampling features are spliced with the coordinates of the high-resolution image, prediction pixel values are obtained through decoding, and the prediction pixel values are recombined to obtain a super-resolution image. According to the method provided by the invention, the geometric consistency of the image and the integrity of spatial information are ensured, the details of the panoramic image can be better recovered in a super-resolution task through the coordinates of the spherical high-resolution image and the reasonable sampling of the low-resolution image, and the super-resolution image can be better recovered in a high-latitude area and an edge area. More accurate and efficient panoramic image super-resolution can also be realized, and the calculation cost can also be remarkably reduced.

The invention provides a reinforced concrete beam global deformation automatic monitoring method and system, and relates to the technical field of engineering structure intelligent monitoring, and the method comprises the steps: obtaining an original image of a reinforced concrete beam; inputting the original image into the image segmentation model, and outputting a binary mask image; determining a center point of a beam body according to a foreground region in the binary mask image; identifying the edge of the foreground region through an edge detection algorithm and a contour extraction algorithm, and extracting an outer contour point set of the beam body; redundant points in the beam body outer contour point set are removed, and a beam body candidate corner point set is obtained; determining a plurality of target beam body angular points in the beam body candidate angular point set through a heuristic optimization algorithm; dividing the binary mask image into a plurality of edge regions through a central radioactive ray division method; dividing each outer contour point in the outer contour point set of the beam body into a corresponding edge area; constructing a linear profile curve; and calculating the vertical global deformation of the reinforced concrete beam according to the linear profile curve.

The invention discloses a processing method and device for an edge area in film layer structure ink-jet printing, and the processing method comprises the steps: determining the edge area of a to-be-printed pattern on a substrate bitmap; the pattern to be printed comprises an edge area and a non-edge area; the edge area is divided into a plurality of edge subareas so that an ink-jet printer can conveniently conduct film layer structure printing on the edge subareas of the to-be-printed pattern; wherein in the direction from the edge area to the non-edge area, the sizes of the multiple edge subareas are sequentially decreased progressively; one size of the edge subarea corresponds to one ink drop extraction rate, the size of the edge subarea is the width of the edge subarea, and the ink drop extraction rate of the edge subarea is the proportion of ink drop points which are prohibited from printing to the total ink drop points in the edge subarea. The edge area of the film layer structure can be flat, and the film thickness is uniform.

The invention discloses a flow uniformizing device, which relates to the technical field of semiconductor processing, is applied to a measuring cavity and comprises a first flow guide part and a second flow guide part, and the first flow guide part is provided with a first flow guide surface for receiving airflow; the second flow guide part is connected to the lower edge area of the first flow guide face and provided with a second flow guide face, and an obtuse-angle flow guide structure is formed by the first flow guide face in the first flow guide part and the second flow guide face, connected to the lower edge area of the first flow guide face, in the second flow guide part. Meanwhile, the extension direction of the second flow guide face faces the side wall of the measuring part, the obtuse angle flow guide structure receives the vertically downward airflow output by the airflow generation device through the first flow guide face, and directional deflection of the airflow is achieved through the second flow guide face, so that the airflow smoothly transits from vertical flowing to adherence flowing along the side wall of the measuring part. Therefore, the uniformity of the flow field near the measurement part is improved, and the measurement accuracy is improved.

A string driver device is described in this disclosure. The string driver device includes a semiconductor channel disposed in an upper portion of a semiconductor substrate and a gate dielectric layer disposed above the semiconductor channel. The string driver device also includes a source region and a drain region disposed at opposite sides of the semiconductor channel, each of the source region and the drain region having a corresponding contact disposed thereon. The string driver device further includes a gate that is disposed above the gate dielectric layer and has a first length, and a field plate layer disposed above the gate, the field plate layer having a second length larger than the first length of the gate, wherein the field plate layer includes one or more edge regions extending across the semiconductor channel edge and toward the source region or the drain region.

The invention discloses a laser-assisted sintering method for a TOPCON solar cell, the TOPCON solar cell and a photovoltaic module. The front surface of the battery is divided into a first edge region, a middle region and a second edge region along a first direction, and grid lines are arranged on the front surface; performing laser-assisted sintering on the first edge region and the second edge region under a first bias voltage U1; performing laser-assisted sintering on the middle region under a second bias voltage U2; wherein U2-U1 is marked as U, 0.5 V < U < = 9V, the length of the battery along the first direction is L, the lengths of the first edge region, the second edge region and the middle region along the first direction are d1, d2 and d3 respectively, d3 = L-d1-d2, 0.02 L < d1 < = 0.25 L, and 0.02 L < d2 < = 0.25 L. A high bias value is used in the middle region, so that high photoelectric conversion efficiency of the battery piece can be kept; the edge area has a proper size, and the edge area is subjected to laser-assisted sintering by using a relatively low bias value, so that the problem of EL edge blackening can be relieved and even solved.

According to the splicing type Ritchey-Common detection method and system based on neural network model training, the sensitivity rules of aberration orders and Ritchey angles are combined, angle differentiation configuration is combined with reconstruction of the marginal area weight through a fusion detection model, and therefore on the premise that no sensitive blind area exists, the detection accuracy is improved, and the detection efficiency is improved. The influence of weak edge aberration signals is counteracted, so that the deviation between the detection precision of the edge region and the central region can be remarkably reduced, full-order high-precision detection of large-aperture plane mirror aberration is realized, particularly, the detection precision of the edge region aberration is remarkably improved, and the detection precision of the large-aperture plane mirror aberration is improved. The problems that in a traditional method, the precision deviation between an edge area and a center area is large, and full-order aberration coverage is insufficient are solved.

The invention relates to the technical field of production of fused zirconia corundum bricks, in particular to a homogenizing and mixing device for fused zirconia corundum bricks, which comprises a mixing box, a hopper, a connecting piece and a mixing cylinder, a feed port and an opening are respectively formed in opposite sides of the outer wall of the mixing cylinder, and a filter screen is mounted on the opening. According to the homogenizing and mixing device for the fused zirconia corundum bricks, raw materials are stirred in all directions through a mixing barrel on a connecting piece, meanwhile, a second driving source drives a supporting frame to rotate around a connecting plate in the axial direction, the connecting piece slides in a center-edge-center reciprocating mode along a curve-shaped limiting sliding rail, and the raw materials are uniformly mixed; the stirring part circulates between the central area of the mixing cavity and the edge area of the inner wall, so that the mixing area of raw materials is increased, and stirring dead angles are avoided.

Provided in the present application are an image processing method and apparatus, and an electronic device, a computer-readable storage medium and a computer program product. The method comprises: acquiring a first image comprising a specific part of a target object, wherein the first image is collected on the basis of a first focusing parameter, and the specific part comprises biometric features of the target object; detecting the state of the specific part when the first image is collected; in response to the state of the specific part being a motion state, performing edge detection on the specific part in the first image, so as to obtain an edge area of the specific part; detecting the definition of the edge area; and adjusting the first focusing parameter on the basis of the definition, so as to obtain a second focusing parameter, wherein the second focusing parameter is used for replacing the first focusing parameter for collecting a second image comprising the specific part of the target object.

Provided herein are methods and apparatuses for controlling uniformity of processing at an edge region of a semiconductor wafer. In some embodiments, the methods include exposing an edge region to treatment gases such as etch gases and / or inhibition gases. Also provided herein are exclusion ring assemblies including multiple rings that may be implemented to provide control of the processing environment at the edge of the wafer.

The invention relates to the technical field of infrared imaging, in particular to an infrared image self-adaptive denoising algorithm and system based on an FPGA (Field Programmable Gate Array), and is characterized in that an adaptive blind pixel searching algorithm module captures data of a certain frame number at an FPGA end, performs multi-directional gradient detection on each pixel point, sets conditions to judge to obtain a blind pixel position, and marks the blind pixel position; the convolution kernel self-adaptive blind pixel replacement module performs self-adaptive blind pixel replacement multi-time module multiplexing at the PL end of the FPGA through a convolution kernel sliding block and gradient comparison to ensure complete coverage of a large blind pixel group, and the self-adaptive median filtering module intelligently selects and replaces pixels meeting requirements through automatic sorting of center pixels and surrounding pixels; according to the method, surface fuzzy filtering is carried out through a surface-blue algorithm module, so that a smooth area in an image is effectively smoothed, details of an edge area are reserved, blind pixels in a video stream can be effectively detected and compensated, and meanwhile traditional noise is suppressed and image details are reserved through multi-stage filtering.

The utility model provides a composite packaging adhesive film and a photovoltaic module, the composite packaging adhesive film comprises a base material adhesive film layer and a blocking layer, the blocking layer comprises edge adhesive film parts at least arranged in edge areas of two opposite sides of the base material adhesive film layer, the outer side edge of the edge adhesive film part is flush with the outer side edge of the base material adhesive film layer; the total area of the orthographic projection of the blocking layer on the plane where the base material adhesive film layer is located is 5%-45% of the area of the base material adhesive film layer. According to the utility model, through the combination of the low-cost base material adhesive film layer and the high-water-vapor-barrier barrier layer, the edge water vapor barrier performance is improved, and the packaging material cost is greatly reduced.

A system for drying a battery electrode coating includes two laser diode arrays and a laser module. Each laser diode array emits multi-beam laser radiation to an edge region including a respective edge of a coating lane deposited on a metal foil. The laser module emits a diverging laser beam to an interior area of the coating lane between the two edges. The intensity distribution of the diverging laser beam at the coating lane spans a gap in the widthwise dimension between respective intensity distributions of the multi-beam laser radiation from the two laser diode arrays. The use of laser diode arrays to perform the edge drying allows for tailoring the intensity distribution of the combined laser irradiation to dry the coating lane without over-drying and delaminating the edges. The use of a single, diverging laser beam in the interior area allows for optimizing affordability and energy efficiency.

The invention provides an overlay precision control method and system for feed-forward etching deviation, and belongs to the field of semiconductors. The overlay precision control method for feed-forward etching deviation comprises the following steps: providing an overlay mark; acquiring line widths Em and Em'of the overlay mark in the edge area of the aligned layer, and calculating to obtain Km = Em / Em '; measuring overlay error data of the alignment layer, and establishing a linear model of the overlay error along with the position of the surface of the wafer; acquiring the line width En and En'of the overlay mark in the edge area of any subsequent aligned layer, and calculating to obtain Kn = En / En '; and on the basis of the Km, the Kn and the linear model, performing pre-compensation correction on any subsequent alignment layer. According to the method, correction feedforward is provided for alignment layer overlay errors after photoetching according to the measurement result of the mark, the influence caused by asymmetry of the wafer edge area overlay mark due to the etching process is reduced, and the stability of the alignment layer overlay errors after photoetching is improved.

The invention relates to a wafer defect detection method, which comprises the following steps of: scanning a wafer at a first detection resolution to perform first defect detection on the wafer to obtain a scanning image of the whole wafer, and generating a first detection report containing size information and position information of defects; filtering the first detection report to obtain size and position information of a first type of defects, and defining an area within a first distance range of the first type of defects as an associated defect area; setting the edge area of the wafer as a special attention area, and setting the associated defect area and the special attention area as a secondary scanning area; scanning the secondary scanning area with a second detection resolution to obtain a secondary scanning image and position information and size information of a second type of defects; and superposing the secondary scanning image and the position information and the size information of the second type of defects with the scanning image of the whole wafer and the size information and the position information of the defects in the first detection report to obtain a final scanning image.

The invention discloses a panoramic image splicing method, system and device, and relates to the technical field of image processing, and the method comprises the steps: collecting images around a vehicle at different visual angles; using the MASK masks to generate overlapping region masks of the different view angle images, and performing local feature detection on the overlapping region masks to generate a transformation matrix; aligning the images of different visual angles according to the transformation matrix; a Canny edge detection operator is fused in splicing seam energy detection, the energy weight of the image edge area of the aligned image is enhanced, and a splicing seam is guided to actively avoid an object with remarkable structural features; b spline interpolation is introduced to optimize an initial splicing seam path; constructing a Laplacian pyramid along Gaussian blur of a splicing seam, and sequentially carrying out gradual fusion to generate a seamless panoramic image; according to the method, the basic function of eliminating the visual blind area is realized, a clear and visual panoramic view can be provided for a driver, and the driving safety is effectively improved.

A semiconductor device may include a substrate including a chip region and an edge region around the chip region, an alignment key disposed in the edge region of the substrate, a stack including conductive patterns and interlayer insulating layers, which are vertically and alternatingly stacked on the chip region of the substrate, the stack having a first staircase structure, and a dummy mold structure including dummy insulating layers and sacrificial patterns, which are vertically and alternatingly stacked on the edge region of the substrate, the dummy mold structure overlapping with the alignment key and having a second staircase structure. The dummy mold structure May have substantially the same height as the stack, when measured from the substrate.

The invention relates to the technical field of semiconductors, in particular to an MEMS micro loudspeaker packaging structure and a preparation method thereof, and the packaging structure comprises a substrate which is provided with a hollow cavity structure, a limiting device and a plurality of vent holes in the bottom; and the MEMS sound production chip is inversely arranged on the substrate, and the edge area of the MEMS sound production chip is bonded with the substrate through the connecting part. According to the packaging structure of the MEMS micro loudspeaker provided by the invention, the MEMS sound production chip is inversely arranged and is in direct contact with the substrate used for packaging, so that the packaging structure has higher impact resistance, the inversely arranged MEMS sound production chip can better dissipate heat, and a double-sound-cavity structure in the packaging structure increases system damping and reduces the quality factor of device resonance; the stability and reliability of the chip can be improved, the design of multiple vent holes is combined with the limiting device, the nonlinear displacement of the MEMS sound production chip under the resonant frequency is effectively inhibited, and the total harmonic distortion is reduced.

The embodiment of the invention relates to the photovoltaic field, and provides a photovoltaic cell and a photovoltaic module, and the photovoltaic cell comprises a cell substrate which is provided with two opposite edge regions along a first direction and a central region located between the two edge regions; the plurality of grid lines are positioned on the battery substrate and are arranged at intervals along a first direction; the first welding spots and the second welding spots are located on at least part of the edge areas, the second welding spots are located on the areas, close to the central area, in the edge areas, the first welding spots are located on the sides, away from the central area, of the second welding spots, and the orthographic projection area of the first welding spots on the battery substrate is smaller than that of the second welding spots on the battery substrate; the first connecting lines are located on at least a part of the edge areas, the first connecting lines are in contact connection with the first welding spots and the second welding spots, and are in contact connection with a plurality of grid lines located on the sides, away from the central area, of the second welding spots, and the transmission efficiency of carriers in the photovoltaic cell is at least improved.

A light emitting element, display device, and method of manufacture of the same are disclosed. In one example, a light emitting element includes a lower layer / interlayer insulation layer; a light reflection layer formed on the lower layer / interlayer insulation layer; an upper layer / interlayer insulation layer; a first electrode formed on the upper layer / interlayer insulation layer; an insulation film formed at least on a region of the upper layer / interlayer insulation layer where the first electrode is not formed; an organic layer formed over the insulation film from above the first electrode, the organic layer having a light emitting layer including an organic light emitting material; and a second electrode formed on the organic layer. A groove is formed in a portion of the upper layer / interlayer insulation layer located in an edge region of the light emitting element, and an upper portion of the groove is closed with the insulation film.