The invention discloses a high-resolution
semiconductor surface and interior flaw detection method and device based on a multi-
photon nonlinear
fluorescence effect, and relates to
nonlinear optics and
optical imaging semiconductor detection. The short-wave
infrared light penetrates through a
semiconductor to be detected, a surface or an internal defect to trigger scattering, the
transmittance /
reflectivity and the power are changed, the thin film containing the high-order nonlinear
fluorescent nanoparticles is excited, the luminance generates magnitude order change, and the defect detection
contrast ratio and the imaging resolution ratio are improved. Full-
automatic control is achieved through an FPGA and LabVIEW, sub-images are automatically collected and spliced, and gray scale abnormal areas are analyzed to judge defect types and distribution. The
optical imaging device comprises an exciting light generation module, a sample scanning module, a nonlinear fluorescent film imaging module and an
intelligent control analysis module, realizes short-wave
infrared light excitation and visible light-near
infrared detection, and has the advantages of intelligence,
high resolution, low cost and large-area full-automatic flaw detection. The method is suitable for large-scale semiconductor efficient flaw detection, gets rid of dependence on an infrared imaging camera, and reduces
system cost.