Patents
Literature
Patsnap Copilot is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Patsnap Copilot

565 results about "Deformable mirror" patented technology

Deformable mirrors (DM) are mirrors whose surface can be deformed, in order to achieve wavefront control and correction of optical aberrations. Deformable mirrors are used in combination with wavefront sensors and real-time control systems in adaptive optics. In 2006 they found a new use in femtosecond pulse shaping.

Ophthalmic instrument with adaptive optic subsystem that measures aberrations (including higher order aberrations) of a human eye and that provides a view of compensation of such aberrations to the human eye

An improved ophthalmic instrument for in-vivo examination of a human eye including a wavefront sensor that estimates aberrations in reflections of the light formed as an image on the retina of the human eye and a phase compensator that spatially modulates the phase of incident light to compensate for the aberrations estimated by the wavefront sensor Optical elements create an image of a fixation target at the phase compensator, which produces a compensated image of the fixation target that compensates for aberrations estimated by the wavefront sensor. The compensated image of the fixation target produced by the phase compensator is recreated at the human eye to thereby provide the human eye with a view of compensation of the aberrations the human eye as estimated by the wavefront sensor. The phase compensator preferably comprises a variable focus lens that compensates for focusing errors and a deformable mirror that compensates for higher order aberrations. The optical elements preferably comprise a plurality of beam splitters and a plurality of lens groups each functioning as an afocal telescope. In addition, instruments and systems are provided that exploit these capabilities to enable efficient prescription and / or dispensing of corrective optics (e.g., contact lens and glasses).
Owner:NORTHROP GRUMMAN SYST CORP +1

Beam director and control system for a high energy laser within a conformal window

A beam control system and method. The system includes an illuminator for providing a first beam of electromagnetic energy at a first wavelength; a source for providing a second beam of electromagnetic energy at a second wavelength; and an arrangement for compensating wavefront errors in the second beam using a bias representative of a comparison between the first wavelength and the second wavelength. In the illustrative embodiment, the arrangement includes a processor which corrects wavefront errors using a bias representative of a difference between said first wavelength and said second wavelength. In the disclosed application, a target wavefront sensor is included and the laser is a high-energy laser beam. The wavefront errors include a chromatic aberration and the errors are compensated using a deformable mirror and a correction algorithm executed by an adaptive optics processor. In one alternative embodiment, the errors are compensated using an optical aberration corrector. The aberration corrector may be a holographic optical element or other suitable device. In another alternative embodiment, the errors are corrected with the above embodiment in combination with the use of “woofer” and “tweeter” correcting elements with the woofer being a long stroke low frequency element and the tweeter being a short stroke high frequency element.
Owner:RAYTHEON CO

Robust infrared countermeasure system and method

A system and method for focusing electromagnetic energy on a moving target. Generally, the inventive system sends a pilot beam to a target and analyzes a return wavefront to ascertain data with respect to any distortions and other phase and/or amplitude information in the wavefront. This information is then used to pre-distort an output beam by so that it is focused on the target by the intervening distortions. In an illustrative embodiment, the pilot beam is provided by a beacon laser mounted off-axis with respect to the output beam. The reflected wavefront is received through a gimbaled telescope. Energy received by the telescope is detected and processed to ascertain wavefront aberrations therein. This data is used to predistort a deformable mirror to create an output beam which is the phase conjugate of the received wavefront. In a first alternative embodiment, a nonlinear optical phase-conjugate mirror is employed to generate the required wavefront-reversed replica of the received wavefront. The system further includes an arrangement for modulating the output beam to confuse the target. In a second alternative embodiment, the system is adapted to examine atmospheric distortions of starlight to predistort the output beam. The alternative embodiment offers a faster response time and a lower susceptibility to detection.
Owner:RAYTHEON CO

System for correcting aberrations and distortions in EUV lithography

A system for correcting aberration and distortion in EUV lithography places a reticle on a deformable reticle chuck, and a reticle height sensor is used to measure the surface height of the reticle placed on the deformable reticle chuck. An optical system projects EUV radiation onto the reticle and collects and projects reflected EUV radiation from the reticle through its exit pupil onto a wafer placed on a wafer chuck. A deformable mirror disposed proximal to the exit pupil may also be controlled for this purpose. The deformable reticle chuck and the deformable mirror are controlled such that aberration and distortion of an image of the reticle formed on the wafer by the optical system are corrected based on the height measured by the reticle height sensor. The deformable reticle chuck includes a supporting structure, a deformable membrane disposed above and being comprised of a dielectric layer and a conductive layer, a voltage source connected to the conductive coating on the reticle and the conductive layer to generate an electrostatic attractive force between them, a plurality of actuator rods each connected to a corresponding one of actuators, and a coolant gas inside a chamber formed between the membrane and the top surface of the supporting structure. A deformable wafer chuck and wafer height sensor may be included to provide further correction of the image.
Owner:NIKON CORP

Beam director and control system for a high energy laser within a conformal window

A beam control system and method. The system includes an illuminator for providing a first beam of electromagnetic energy at a first wavelength; a source for providing a second beam of electromagnetic energy at a second wavelength; and an arrangement for compensating wavefront errors in the second beam using a bias representative of a comparison between the first wavelength and the second wavelength. In the illustrative embodiment, the arrangement includes a processor which corrects wavefront errors using a bias representative of a difference between said first wavelength and said second wavelength. In the disclosed application, a target wavefront sensor is included and the laser is a high-energy laser beam. The wavefront errors include a chromatic aberration and the errors are compensated using a deformable mirror and a correction algorithm executed by an adaptive optics processor. In one alternative embodiment, the errors are compensated using an optical aberration corrector. The aberration corrector may be a holographic optical element or other suitable device. In another alternative embodiment, the errors are corrected with the above embodiment in combination with the use of “woofer” and “tweeter” correcting elements with the woofer being a long stroke low frequency element and the tweeter being a short stroke high frequency element.
Owner:RAYTHEON CO

Heat maps for controlling deformations in optical components

A system (80) for controlling deformations of optical components adapted for use with laser system aperture sharing elements (16) and deformable mirrors. The inventive system (80) includes a control loop (12, 40, 24, 20, 46, 28, 74, 78, 60, 34) for determining a desired temperature pattern. The control loop (12, 40, 24, 46, 28, 74, 78, 60, 34) provides a control signal (45) corresponding to the desired temperature pattern to a heat map applicator (18, 46, 47, 59, 60). The heat map applicator (18, 46, 47, 59, 60) applies the desired temperature pattern to the optical component (16) in response to the control signal and the optical component (16) is selectively deformed in response thereto. In a specific embodiment, the control loop (12, 40, 24, 20, 46, 28, 74, 78, 60, 34) is a closed loop control system that includes an interferometer (74). The interferometer (74) provides a first shape of the optical component (16) to a comparator circuit (20) that compares the first shape to a desired shape corresponding to the desired temperature pattern for determining the control signal. An alternative closed loop control system (12, 40, 24, 20, 46, 28, 74, 78, 60, 34) includes an infrared energy detector (12) that determines a current temperature pattern and generates the control signal in response thereto for converting the current temperature pattern to the desired temperature pattern. The heat map applicator (18, 46, 47, 59, 60) provides an electromagnetic beam (50, 52) that is swept across the optical component (16) to impart the desired temperature pattern on the optical component (16). In another illustrative embodiment, the control loop is an open loop control system that includes a complimentary electromagnetic energy beam that is swept over the optical component to form a heat pattern complimentary to the temperature pattern imparted to the optical component by a high power laser beam such that the total heat deposited on the optical component is uniform.
Owner:RAYTHEON CO
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products