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61 results about "Wavefront aberration" patented technology

A wavefront sensor is a device which measures the wavefront aberration in a coherent signal to describe the optical quality or lack thereof in an optical system. A very common method is to use a Shack-Hartmann lenslet array.

Optical fiber coupling alignment method and system based on wavefront aberration and sensitivity matrix

The invention relates to the technical field of coupling alignment of single-mode optical fibers, in particular to an optical fiber coupling alignment method and system based on wavefront aberration and a sensitivity matrix. The system comprises an optical measurement module, a processing and control module and a multi-axis precision adjustment platform, and the alignment method comprises the steps that firstly, an interference fringe image is obtained and processed through an interference light path, continuous wavefront is recovered through Fourier transform and phase unwrapping, and a Zernike coefficient for quantizing wavefront distortion is obtained through Zernike polynomial fitting. A sensitivity matrix representing the linear relation between the degree-of-freedom adjustment amount and Zernike coefficient changes is established and serves as a physical guide item to introduce a speed updating formula of a particle swarm optimization algorithm, an SG-PSO algorithm is formed, a particle swarm is guided to conduct directional intelligent search and rapidly output the optimal adjustment amount, and finally a multi-axis precision adjustment platform is driven to complete alignment. According to the method, optimization of wavefront sensing and physical model guiding is effectively fused, and the convergence speed, the alignment precision and the global search capability are remarkably improved.
Owner:HUZHOU SAIMI INTEGRATED CIRCUIT CO LTD

Wavefront distortion correction method based on dynamic adaptive MESSA algorithm and coherent free space optical communication system

The invention discloses a wavefront distortion correction method based on a dynamic adaptive MESSA algorithm and a coherent free space optical communication system. The problems that an existing method is prone to falling into a local optimal solution, the correction effect is poor under dynamic turbulence, and the adaptive capacity is weak are solved. According to the method, an individual position is initialized through a Circle chaotic mapping method, iterative optimization is carried out in combination with a Levy flight strategy and a variable spiral search strategy, and a step size control parameter, a safety threshold, spiral strength and a spiral adjustment coefficient are dynamically adjusted through a double-discrimination dynamic adaptive parameter adjustor. And reducing the population scale according to a nonlinear population reduction strategy, finally outputting an optimal individual position, and driving the deformable mirror to perform wavefront correction according to a control voltage vector corresponding to the optimal individual position. According to the invention, the dynamic adjustment of the algorithm parameters and the population structure is realized, and the adaptability, convergence speed and stability of the wavefront distortion correction method in the dynamic turbulence environment are enhanced.
Owner:JILIN UNIVERSITY

Aberration control method for reflective two-beam interference exposure system

An aberration regulation method of a reflective double-beam interference exposure system, comprising: constructing a reflective double-beam interference exposure system, dividing a light beam output by a laser into two double beams with the same intensity, and forming an interference exposure field; constructing an aberration regulation system, testing and recording the aberration of the double-beam light path by using a spherical interferometer, and regulating the wavefront of any light beam in the double beam by using a deformable mirror, so that the aberration of the light beam matches the aberration of the other light beam, and the regulation of the aberration of the interference exposure field is completed. The present application solves the problems of precise assembly and adjustment, wavefront aberration control and the like of the reflective double-beam interference exposure system based on a large-aperture off-axis parabolic mirror, and provides a new solution for the preparation of a meter-level large-aperture, low-aberration diffraction grating.
Owner:SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI

Atmospheric turbulence wavefront reconstruction method based on attention-learnable activation cooperation mechanism

The invention belongs to the field of atmospheric turbulence wavefront aberration detection, and discloses an atmospheric turbulence wavefront reconstruction method based on an attention-learnable activation cooperation mechanism. The objective of the invention is to solve the problems that the modeling of a full connection layer is difficult due to phase high-order nonlinear coupling of an existing end-to-end neural network in wavefront phase reconstruction, the feature extraction capability of a traditional convolution architecture is insufficient, and the reconstruction error of a Zernike coefficient is unbalanced. The method provided by the invention comprises the steps of collecting in-focus and out-of-focus images of light spots and corresponding distortion phases to construct a training data set, constructing high-precision mapping of high-order aberration characteristics based on an attention encoder and a Colmogorov-Anodel network through a learnable activation function, and performing high-precision mapping on the high-order aberration characteristics through a learning activation function. And optimizing network parameters by using an error weighted root mean square loss function, and finally deploying the neural network which is completely trained to realize high-speed reasoning. The method provided by the invention provides a high-precision and high-speed scheme for atmospheric turbulence distortion wavefront aberration detection.
Owner:GUANGDONG UNIV OF TECH

Femtosecond laser inscribing polarization maintaining fiber grating method and system for vector sensing

The invention relates to the technical field of optical fiber sensing and optical fiber device manufacturing, and discloses a femtosecond laser-inscribing polarization-maintaining fiber grating method and system for vector sensing, and the method comprises the following steps: obtaining a stress region image of a polarization-maintaining fiber through a CCD camera, recognizing the slow axis direction of the fiber through image processing, rotating the fiber, and obtaining the stress region image of the polarization-maintaining fiber; an included angle of 45 degrees is formed between the slow axis direction and a preset incident plane of the femtosecond laser; calculating a conjugate phase of wavefront aberration generated when femtosecond laser penetrates through a fiber coating layer and a cladding and is focused to a fiber core, and generating a phase diagram for loading a spatial light modulator; after being modulated by the spatial light modulator, a light beam emitted by the femtosecond laser enters and is focused on the fiber core along the direction of an included angle of 45 degrees, and a grating structure is formed by combining axial scanning and inscribing. Accurate automatic alignment in the fast and slow axis direction and active compensation of transmission aberration are achieved, refractive index modulation birefringence forming a specific included angle with the inherent birefringence axis of the optical fiber can be effectively induced, and therefore the polarization-maintaining fiber grating with the highly controllable reflection spectrum and the asymmetric double-peak characteristic is engraved.
Owner:QINGDAO BINHAI UNIV +1

Laser bonding of glass to material

PendingCN121586697ALaser bondingOblique angle
A method of bonding glass to a material includes contacting a first surface of a glass substrate with a first surface of a layer to form a contact location between the glass substrate and the layer; disposing an optical element optically upstream of the glass substrate; and performing a welding step by directing a laser beam onto the optical element such that the laser beam contacts the optical element, passes through the glass substrate at an oblique angle with respect to the glass substrate, and contacts the contact location to bond the glass substrate with the layer. Directing the laser beam onto the optical element imparts a wavefront aberration effect to the optical element. The laser beam is passed through the glass substrate to impart a wavefront aberration effect to the substrate. The wavefront aberration effect of the optical element counteracts the wavefront aberration effect of the substrate.
Owner:CORNING INC

An imaging system sub-field deconvolution image restoration method based on wave aberration reconstruction

This invention discloses a method for field-of-view deconvolution image restoration of an imaging system based on wavefront aberration reconstruction, belonging to the field of wavefront aberration measurement and computational imaging technology. The method includes: measuring the wavefront aberration of the optical system under test in an imaging system containing detection markers; setting the measured wavefront aberration as the wavefront aberration of the optical system under test in an imaging system containing pinhole arrays, and simulating and generating point spread functions corresponding to different field-of-view blocks; replacing the detection markers with imaging samples, and acquiring the actual image of the imaging samples through the optical system under test as the image to be restored; dividing the image to be restored into field-of-view partitions, performing deconvolution restoration on each block using the corresponding point spread function, and then stitching the restored block images together to obtain a complete restored image. This invention decouples wavefront aberration measurement from image restoration, achieving effective correction of spatially varying aberrations in a large field of view without increasing hardware complexity, significantly improving the restoration accuracy, efficiency, and consistency of the entire field-of-view image.
Owner:ZHEJIANG UNIV

Plane wave based illumination system and exposure apparatus

The application discloses a kind of illumination system and exposure equipment based on plane wave, comprising: first mirror, wavefront aberration detection module is inclined relative to light incidence direction, first mirror is used to receive light from light source and reflect light;Second mirror, for receiving the light reflected by first mirror and expanding the beam of light;Third mirror, for receiving the light reflected by second mirror and collimating the light back to the target object and reflecting light.The application realizes light path folding through the reflection path of first mirror, second mirror and third mirror, significantly shortens the axial length of illumination system, and significantly saves space.The number of structures of the three mirrors is much less than that of the conventional multi-lens group, and the positioning accuracy requirement of the mirrors is lower than the coaxiality requirement of the multi-lens, which simplifies the overall structure design and assembly process of the illumination system, and reduces the system complexity and use cost.
Owner:HYPER-OPTICS (BEIJING) TECH LTD

System and method for measuring wavefront aberration caused by light field waist spot mismatch in cavity enhancement system

The present application belongs to the technical field of wavefront distortion measurement, and particularly relates to a wavefront distortion measurement system and method caused by light field waist spot mismatch in a cavity enhancement system. In order to accurately capture the wavefront distortion signal caused by light field waist spot mismatch, an electro-optic modulator (EOM), a convex lens, a three-mirror ring cavity, a plane mirror, a multi-quadrant detector (MPD) and a frequency mixer are sequentially arranged on the outgoing light path of the laser. Through light field modulation, resonance amplification, phase-locked demodulation and quantitative calculation, an error signal reflecting the distortion degree of two types is extracted, the minimum measurable waist spot size and position change are derived, accurate feedback is provided for long-term stable locking of the optical cavity, additional distortion interference caused by the thermal effect of the laser is compensated, and the measurement accuracy and stability of the system are improved.
Owner:SHANXI UNIV

Illumination system based on plane waves and exposure equipment

The invention discloses a plane wave-based illumination system and exposure equipment, and the system comprises a first reflector, a wavefront aberration detection module is inclined relative to a light incident direction, and the first reflector is used for receiving light from a light source and reflecting the light; the second reflecting mirror is used for receiving the light rays reflected by the first reflecting mirror and expanding the light rays; and the third reflecting mirror is used for receiving the light reflected by the second reflecting mirror, collimating the light and then reflecting the light to a target object. Through reflection paths of the first reflector, the second reflector and the third reflector, light path folding is achieved, the axial length of the illumination system is greatly shortened, and space is remarkably saved. The number of the structures of the three reflectors is far smaller than that of a traditional multi-lens group, the positioning precision requirement of the reflectors is lower than the coaxiality requirement of multiple lenses, the overall structural design and assembly process of the lighting system are simplified, and the system complexity and the use cost are reduced.
Owner:HYPER-OPTICS (BEIJING) TECH LTD

Filtering method and system for low-quality image

The invention discloses a low-quality image filtering method and system, and aims to solve the problems that a conventional filtering method neglects optical characteristics and is insufficient in feature extraction. The method comprises the following steps: acquiring a low-quality image and optical parameters such as aperture shape, focal length and wavelength; a dynamic point spread function is generated based on the improved Fraunhofer diffraction principle, wavefront aberration compensation is achieved through a Zernike coefficient matrix and complex field convolution, and optimization features are obtained; a quality evaluation network including cross-channel convolution, dense convolution and classification sub-networks is used for outputting a quality level, and multi-level filtering is executed in combination with diffraction characteristic optimization and scanning type recognition. The network training adopts a difficult sample sampling and physical constraint confrontation strategy, so that the generalization ability and the physical consistency are improved. The method is suitable for scenes of medical images, security monitoring, industrial detection and the like, and high-quality images can be accurately screened.
Owner:ANHUI JIYUAN SOFTWARE CO LTD +1

A method for high-precision multi-type combination optometry

ActiveCN120732351BRefractometersSkiascopesDouble blindAlgorithm
The application discloses a kind of optometry methods for high-precision multi-type combination, it is characterized in that, including the following steps: S1, by automatic optometry instrument obtains objective refraction parameter set;S2, based on virtual reality interface implements interactive subjective optometry, generates subjective correction parameter set;S3, using wavefront aberration instrument collection high-order aberration data;S4, carries out refraction adaptability test under dynamic visual scene, obtains dynamic compensation parameter;S5, by multimodal data fusion algorithm generates initial optometry scheme;S6, based on genetic algorithm optimization lens parameter combination;S7, implements double-blind verification test and obtains visual quality score;S8, according to verification result iteration optimization final prescription.It is solved that traditional optometry is in the problem of subjective or objective data split, dynamic visual scene is accurately adapted using eye movement tracking and virtual reality verification, and the safety and efficiency of ophthalmic optical optometry are guaranteed.
Owner:LIANYUNGANG TIANNUO OPTICAL INSTR

Optical lens and preparation method and application thereof

PendingCN121432608ALensImage fusion algorithmMicro lens array
The invention discloses an optical lens and a preparation method and application thereof. The optical lens comprises a transparent substrate, a micro-lens array located on the first surface and a super-lens array located on the second surface. The transparent substrate comprises a first surface and a second surface which are oppositely arranged. The microlens array comprises a plurality of microlenses arranged at intervals, each microlens forms a sub-view field, and the plurality of sub-view fields jointly form a total view field. The super lens array comprises super lenses in one-to-one correspondence with the micro lenses, and the super lenses compensate the wavefront difference of the micro lenses through phase distribution. The large field of view is decomposed into a plurality of small sub-fields of view through the micro-lens array, gradient phase distribution is realized through the nano-structure of the super-lens, the residual wavefront difference of the micro-lens is compensated, the aberration generated by the micro-lens is accurately corrected, and after light rays finally reach the imaging sensor array, large FOV seamless imaging can be realized in combination with an image fusion algorithm.
Owner:SHPHOTONICS LTD

Synthetic aperture quantitative phase imaging method based on hybrid of digital holography and fourier ptychography

PCT designated stageWO2026108519A1InstrumentsPtychographyImage resolution
A synthetic aperture quantitative phase imaging method based on a hybrid of digital holography and Fourier ptychography. A programmable LED array which is annularly arranged is mounted on an off-axis digital holographic system for providing oblique illumination at varying angles; accurate noise-containing low-frequency information of an object is obtained by means of digital holography and is used as initial estimation; and then, high-frequency information of the object is reconstructed by means of a Fourier ptychographic algorithm based on intensity measurement, so as to realize synthetic aperture quantitative phase imaging. Using the accurate low frequency provided by holography as initial estimation ensures the accuracy of phase retrieval and wavefront aberration reconstruction, without strictly meeting matching illumination conditions, and reduces the number of intensity graphs required by Fourier ptychography; and a non-interferometric phase retrieval method based on Fourier ptychography improves the imaging resolution to an incoherent diffraction limit, and also effectively solves the problem of inherent speckle noise in digital holography.
Owner:NANJING UNIV OF SCI & TECH

Optical axis marking method and device for holographic lithography illumination system

The invention provides an optical axis marking method and device for a holographic photoetching illumination system, and the method comprises the following steps: carrying out the wavefront measurement of the illumination system through wavefront detection equipment, and obtaining an illumination system transmission wavefront aberration which corresponds to a standard incident optical axis and meets a preset threshold value; an optical axis marking element is arranged at a light inlet of the illumination system and is provided with a central transmission area and a peripheral reflection area; adjusting the pose of the optical axis marking element, so that the center of the optical axis marking element is aligned and calibrated with the standard incident optical axis; replacing wavefront detection equipment with a working light source, and judging the eccentricity and inclination state of an incident light axis of the working light source relative to a standard incident light axis according to the form and position relation of reflected light and incident light of the working light source; and adjusting the pose of the incident optical axis of the working light source to align the incident optical axis of the working light source with the center of the optical axis marking element. The defects of tedious operation and low adjustment efficiency in the adjustment process of the incident optical axis and the optical axis of the illumination system in the prior art are overcome.
Owner:HYPER-OPTICS (BEIJING) TECH LTD

Aberration coefficient inversion method and system for sparse aperture polarization optical system

The invention discloses an aberration coefficient inversion method and system for a sparse aperture polarization optical system, and belongs to the technical field of sparse aperture optical imaging and polarization optical crossing. The method comprises the following steps: firstly, constructing a sub-aperture Jones matrix model containing wavefront aberration, bidirectional attenuation and phase delay parameters, and carrying out coherent synthesis to obtain a system Jones pupil matrix; generating a real point spread function (PSF) in different polarization and defocus states, and establishing a loss function taking PSF difference as a core; local optimization is avoided through multi-starting-point optimization, and fine optimization is realized by combining a dynamic learning rate and gradient cutting; and finally outputting inversion parameters and evaluating precision. Experimental verification shows that according to the method, the absolute error of inversion parameters reaches 10 <-8 >-10 <-7 > lambda magnitude, the PSF matching degree is high, polarization aberration and co-phase error can be accurately obtained, and support is provided for high-resolution imaging.
Owner:SUZHOU CITY UNIV

Human eye wavefront aberration and refractive terrain comprehensive test system and method

The invention provides a human eye wavefront aberration and refractive terrain comprehensive test system and method. The system comprises a head positioning module, an ocular surface positioning system, an optical test link, a motion control module, an image acquisition and processing module and a control module. During testing, human eyes and a system optical axis are aligned through head / ocular surface positioning, and initial refraction data compensation defocus is obtained; laser enters the eye through a link, a wavefront camera collects signals to calculate wavefront aberration, an array light source is matched with an area array detector to obtain large-view-field defocus data, and finally a refractive topographic map and wavefront aberration report is generated. According to the invention, the position of the fixation target and the position of the light source are conjugated, the fixation target and the light source form an inverted image relationship, the fixation target and the fundus are also conjugated, the fixation target and the fundus form an inverted image, and the light source at the light source end is asymmetrically distributed, so that stray light reflected to the fundus by the ocular surface of human eyes can be effectively avoided.
Owner:ZHONGKE SAILBOAT TECH (XIAN) CO LTD

Method for exchanging optical elements of an apparatus for semiconductor technology

The invention relates to a method for exchanging optical elements (25) of an apparatus for semiconductor technology, the optical elements being designed for a productive wavelength and at least one part of the product beam path (40) in the apparatus passing through a region with an artificially generated atmosphere (90), comprising the following steps: a) exchanging at least one optical element (25, 25'); b) positioning and orienting at least the optical element (25') exchanged in the preceding step; c) carrying out a wavefront measurement along a beam path (140) comprising at least one exchanged optical element (25') without an artificially generated atmosphere (90) in the region provided therefor with a predefined wavelength different from the productive wavelength; d) if the wavefront measurement yields a wavefront aberration: adapting the positioning and orientation of at least the exchanged optical element (25') and repeating step (c); and e) if the wavefront measurement does not yield an aberration: producing the artificially generated atmosphere (90) in the region provided therefor.
Owner:CARL ZEISS SMT GMBH

Wavefront sensor parameter configuration method and related equipment

The invention belongs to the technical field of optical measurement, and discloses a wavefront sensor parameter configuration method and related equipment, and the method comprises the steps: obtaining the measurement demand parameters of human eye wavefront aberration, gradually determining the basic size parameters, calculating the focal length upper limit of a micro lens, determining the focal length and the pixel size, and verifying the sensitivity. The configuration of the sensor can be dynamically adjusted according to actual requirements, so that the problem that the measurement precision and the application range are limited due to fixed parameters in the prior art is solved, and the wavefront sensor parameters can be dynamically configured according to actual measurement requirement parameters, so that large-dynamic-range and high-resolution measurement is considered; and the detection precision and the application range of the wavefront sensor are systematically improved.
Owner:JIHUA LAB

Digital simulation platform, method and equipment of wavefront sensor and storage medium

The invention relates to a digital simulation platform, method and device of a wavefront sensor and a storage medium. The system comprises a Zernike polynomial calculation module, a micro-lens array simulation module, a centroid extraction module and a wavefront reconstruction module. The Zernike polynomial calculation module is used for analyzing and generating incident wavefront by adopting a Zernike polynomial, the micro-lens array simulation module is used for simulating a micro-lens array by adopting a mixed diffraction propagation model to segment the incident wavefront to generate a light spot image, and the centroid extraction module is used for extracting the light spot image by adopting a weighted centroid algorithm. The light spot image acquisition module is used for acquiring a light spot image and calculating a mass center position of the light spot image in combination with global and local dynamic threshold mechanisms, and the wavefront reconstruction module is used for establishing a relationship between the mass center position and a wavefront slope, solving a Zernike coefficient by using a numerical optimization algorithm, generating wavefront aberration distribution and outputting a reconstructed wavefront phase. Through the modular design, the independence of each function is ensured, the simulation efficiency is improved, and the data generation capability and the system flexibility are enhanced.
Owner:JIHUA LAB

Method and device for determining wavefront aberrations caused by an optical system

The invention relates to a method and a device for determining wavefront aberrations caused by an optical system. Within the scope of a method according to the invention, in the optical system, an object field that is illuminated by way of an illumination system and situated in an object plane is imaged into an image field that is situated in an image plane by use of a projection lens, wherein, for at least one field point in the image plane, a plurality of measurements of the respective wavefront aberration generated at this field point are taken, with these measurements differing from one another in terms of the respective effective exit pupil of the beam path.
Owner:CARL ZEISS SMT GMBH

Conscope assembly adjusting method and system

The invention discloses a conscope assembly adjusting method and system, and belongs to the technical field of optical assembly and adjustment. The method comprises the following steps: acquiring a geometrical optical model and initial system wavefront aberration distribution data based on a conscope group interference detection light path; fitting the initial data to obtain a characteristic wavefront aberration coefficient; according to the coefficient and a preset quantitative mapping relation, obtaining an adjustment amount; and adjusting the light path based on the adjustment amount, and carrying out iterative adjustment on the conscope group until the wavefront aberration distribution meets the requirement. The system comprises a data acquisition unit, a fitting unit, a calculation unit and an adjustment unit which are respectively used for realizing the corresponding steps. According to the method, efficient and high-precision installation and adjustment of the conscope set are achieved through the quantitative mapping relation and iterative installation and adjustment, complex pre-calibration is not needed, and the method is suitable for batch installation and adjustment scenes and has remarkable engineering application value.
Owner:INST OF MACHINERY MFG TECH CHINA ACAD OF ENG PHYSICS

Method and system for shape and property coordinated control of micro / nano optical elements formed by thermoimprinting

This application provides a method and system for shape and property coordinated control of micro / nano optical elements formed by thermoforming. The method includes: acquiring shape error data and refractive index change data of a first micro / nano optical element generated during thermoforming; compensating the mold geometry model based on the shape error data and refractive index change data; determining whether the shape accuracy of a second micro / nano optical element meets preset shape accuracy requirements and whether the wavefront aberration meets preset wavefront aberration requirements; the second micro / nano optical element is obtained based on the compensated mold geometry model; if the preset shape accuracy requirements and / or preset wavefront aberration requirements are not met, the mold geometry model is compensated again until the shape accuracy and wavefront aberration of the second micro / nano optical element meet the preset shape accuracy requirements and preset wavefront aberration requirements. This application can reduce the impact of shape error and refractive index change on the second micro / nano optical element and reduce mold manufacturing costs.
Owner:SHENZHEN UNIV

Method for measuring wavefront aberration of simplified system of terminal optical component

According to an inverse Hartmann wavefront detection principle, the invention provides a wavefront aberration measurement method for a simplified system of a terminal optical component. According to the method, a wavefront aberration measurement system is formed by a camera and a display, phase shift stripes are displayed on the display to serve as a structured light source, the camera collects stripe patterns modulated and emitted by a to-be-measured system, phase information is obtained based on a phase shift algorithm, and then coordinates of the display are obtained; and the coordinates of the emergent surface of the to-be-measured system are obtained through ray tracing in combination with system calibration parameters, and finally the slope of the actual emergent ray of the to-be-measured optical system can be obtained, so that the wavefront aberration is obtained. The device has the advantages of simple structure, low detection cost, high precision and high resolution.
Owner:SICHUAN UNIV

A method for manufacturing a single-tube semiconductor laser fiber coupling module

The application discloses a preparation method of a single-tube semiconductor laser fiber coupling module, and comprises the following steps: wavefront aberration acquisition: measuring the outgoing light wavefront aberration distribution of a single-tube semiconductor laser chip to be packaged under a preset working current, as an individual optical fingerprint of the chip; individualized inverse design simulation: taking the wavefront aberration distribution as an input boundary condition, taking the maximum fiber coupling efficiency as an objective function, and generating a three-dimensional model of a target micro-nano structure for realizing beam shaping and coupling at the end face of the optical fiber through an electromagnetic field inverse design algorithm; virtual tolerance verification: in a digital twin coupling model containing a chip emission model, the target micro-nano structure model and a preset assembly tolerance range. The application can be individually designed and manufactured according to the individual optical characteristics of the laser chip, so as to overcome the influence of the chip tolerance, and improve the module performance consistency, preparation efficiency and reliability prediction capability.
Owner:南京科天光电工程研究院有限公司

Optical system and optical camera working at far-infrared waveband

ActiveUS12687715B2Optical axisOptic system
An optical system and an optical camera working at a far-infrared waveband are provided, the optical system along the optical axis from the objection side to the image side includes: a metalens and a spherical lens; the metalens is configured to correct higher-order residual wavefront aberrations; the spherical lens is configured to correct lower-order primary wavefront aberrations; the metalens and the spherical lens are configured to correct aberrations; an absolute value of the curvature radius of an objection-side surface towards the objection side for the spherical lens is greater than an absolute value of the curvature radius of an image-side surface towards the image side for the spherical lens; the optical system satisfies the following condition: 0.83≤f / D≤0.92; where f is an effective focal length of the optical system, and D is the entrance pupil diameter of the optical system.
Owner:SHENZHEN METALENX TECH CO LTD

A large target surface shutter front scanning code imaging assembly based on liquid lens focusing

The present application relates to a kind of code scanning imaging components, specifically, a kind of large target surface diaphragm front code scanning imaging component based on liquid lens adjustable focus, comprising: liquid lens, wire, diaphragm, first meniscus lens, first planoconvex lens, double concave lens, planoconcave lens, double convex lens, second planoconvex lens, second meniscus lens, the refractive power between each device meets the following conditions simultaneously:‑3<(φ1+φ3) / (φ2+φ4)<‑1;‑3<(φ3+φ5) / (φ4+φ6)<‑1;‑2<(φ1+φ2+φ5+φ6) / (φ3+φ4+φ7)<‑0.5.Double convex lens, second planoconvex lens, second meniscus lens play a good role in eliminating aberration and correcting field curvature;First meniscus lens and first planoconvex lens are matched to eliminate wavefront aberration generated by liquid lens;Double concave lens and planoconcave lens effectively modulate the dense light at the front diaphragm of imaging component, so that the situation that large-angle light grazing incidence lens does not appear in large target surface imaging imaging component with diaphragm front.
Owner:FUJIAN NEWLAND AUTO ID TECH CO LTD

Light field manipulation method for reflective objective, wavefront aberration detection system and method

PendingCN122652795AGratingImaging processing
The application discloses a light field regulation method, a wave aberration detection system and a method for a reflective objective. It relates to the technical field of image processing and optical engineering. The application designs a two-dimensional Gaussian angular spectrum homogenization phase function and a one-dimensional grating phase function, constructs a total composite phase function through linear weighted fusion. The total composite phase function is iteratively optimized through an optimization objective function, and the phase distribution of the MCGH element is obtained, so that the light field regulation is performed through the MCGH element containing the phase distribution. Further, the wave aberration detection system and the method for the reflective objective containing the MCGH element are also disclosed. The application composites the pupil homogenization and spatial modulation functions on a single microstructure surface, solves the problems of low integration degree, alignment error sensitivity and difficulty in adapting to structured illumination of traditional discrete elements, and realizes high-precision and high-robustness in-situ wave aberration detection for any reflective high-NA optical system.
Owner:INST OF OPTICS & ELECTRONICS CHINESE ACAD OF SCI

Individualized aberration compensation and depth-of-field fusion type implantable contact lens based on calculation of optical wavefront regulation and preparation method thereof

The invention relates to a personalized aberration compensation and depth-of-field fusion type implantable contact lens based on calculation optical wavefront regulation and control, and belongs to the crossing field of ophthalmic medical instruments and calculation optics. A composite wavefront regulation and control structure is formed on at least one optical surface of an optical area of a lens main body of the contact lens; a target phase function corresponding to the composite wavefront regulation and control structure is a two-dimensional function and at least comprises an aberration compensation phase term used for compensating wavefront aberration of a target eyeball and a depth-of-field extension phase term used for generating an extension focal depth; the target phase function is determined through a computational optical reverse optimization method, the optimization process aims at improving the imaging quality of the eyeball-ICL combined optical system under a plurality of preset object distances, and meanwhile, the expected positioning error of the ICL relative to the pupil is used as a robustness constraint condition. The problems of individualized aberration correction and continuous depth-of-field expansion are solved, and a novel ICL solution with high visual quality, high clinical robustness and manufacturability is provided.
Owner:CHONGQING UNIV OF POSTS & TELECOMM

Optical addressing system and method and quantum computer

The invention relates to the technical field of quantum computing, and provides an optical addressing system and method and a quantum computer.The system and method conduct deflection regulation and control on Gaussian laser beams with Doppler frequency shifts.Corresponding diffraction spots with the same Doppler frequency shiftsbetween any positions are obtained, then wavefront aberration of the diffraction spots is measured, and the optical addressing effect is achieved. Aberration compensation is carried out on the diffraction light spot or the Gaussian laser beam according to the detected wavefront aberration, and an addressing light spot is obtained; and focusing the addressing light spot on each target quantum of a one-dimensional ion chain in an ion trap to realize ion addressing. According to the system and the method disclosed by the invention, the wavefront aberration of the diffracted light wave is detected through the light modulation module, aberration compensation is carried out according to the detected wavefront aberration, and then optical independent addressing with excellent image quality, flexibility, controllability and strong expansibility is realized for a plurality of target quantum sites on a one-dimensional ion chain in an ion trap.
Owner:SHENZHEN INT QUANTUM ACAD