System and method for analyzing wavefront aberrations

Inactive Publication Date: 2005-09-15
OPHTHONIX
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Benefits of technology

[0008] The invention relates to correlating or establishing a relationship between objectively measured values or

Problems solved by technology

The human eye, namely the cornea and lens, can exhibit a variety of optical aberrations that diminish the optical performance of the eye, resulting in blurred vision.
The correction of blurred vision by lenses has typically been limited to correction of low order aberrations only, such as defocus and astigmatism.
Traditionally, high order aberrations, e.g. those describable with Zernike polynomials of the th

Method used

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Embodiment Construction

[0025] The following detailed description is directed to certain specific embodiments of the invention. However, the invention can be embodied in a multitude of different ways as defined and covered by the claims. In this description, reference is made to the drawings wherein like parts are designated with like numerals throughout.

[0026] One practical disadvantage of the objective wavefront aberration measurements, expressed in terms of Zernike polynomials, is that these polynomials may be difficult to correlate with a subjective refraction measurement made by a eye care professional, such as from using a phoropter, a Snellen chart, and a patient's feedback. This tends to make it difficult for the eye care professional to make an informed recommendation to the patient of a course of action for correcting the patient's vision.

[0027] Theoretically, wavefront aberrometry measurements of low-order aberrations in a patient's eyes should correspond to the traditional prescription of sph...

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Abstract

A system and method for specifying a vision correction prescription for a patient's eye, wherein in one embodiment, the method includes obtaining a wavefront aberration measurement of the patient's eye, applying at least one value from the wavefront aberration measurement to a statistical model trained using a plurality of objectively measured aberration values and a plurality subjectively measured visual acuity values as training data; and predicting a vision correction prescription for the patient's eye based on the at least one value and the statistical model.

Description

RELATED APPLICATIONS [0001] The present application claims the benefit of priority under 35 U.S.C. § 119(e) to U.S. Provisional Patent Application Ser. No. 60 / 546,378, entitled “SYSTEM AND METHOD FOR ANALYZING WAVEFRONT ABERRATIONS,” filed on Feb. 20, 2004. [0002] This application is related to U.S. patent application Ser. No. 10 / 218049, entitled “Apparatus and Method of Correcting High order Aberrations of the Human Eye,” filed Aug. 12, 2002; U.S. patent application Ser. No. 10 / 076218, entitled “Apparatus and Method for Determining Objective Refraction using Wavefront Sensing,” filed Feb. 13, 2002, issued as U.S. Pat. No. 6,761,454; and U.S. patent application Ser. No. 10 / 014037, entitled “System and Method for Wavefront Measurement,” filed Dec. 10, 2001, issued as U.S. Pat. No. 6,781,681. Each of the foregoing patents and applications is hereby incorporated by reference in its entirety.BACKGROUND OF THE INVENTION [0003] 1. Field of the Invention [0004] The present invention relate...

Claims

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Application Information

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IPC IPC(8): A61B3/00A61B3/10B24B13/00B29D11/00G02C13/00
CPCB29D11/00413B29D11/00442G02C2202/22G02C7/02G02C13/003B29D11/00528G02C7/027A61B3/0025
Inventor DREHER, ANDREAS W.LAI, SHUI T.
Owner OPHTHONIX
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