153 results about "Zernike polynomials" patented technology

The invention discloses an online monitoring method and system for the light transmittance of an optical lens, and relates to the technical field of precise optical detection. The objective of the invention is to solve the problem of large light transmittance calculation error caused by halo scattering noise interference, low optical path calibration precision of a complex curved lens, a measurement blind area of a large-aperture lens and environmental disturbance of a high-reflection / high-light-transmittance lens in the prior art. According to the scheme, a three-dimensional curved surface model is constructed based on Gray code structured light projection and ICP registration, a dynamic partition scanning instruction set is generated through an improved genetic algorithm, and multi-wavelength polarized light is driven to scan and collect multi-dimensional data; specular reflection and scattering noise are suppressed by combining an improved Stokes vector algorithm and an attention mechanism U-Net network, and the data precision of the complex curved surface is improved by adopting Bayesian optimization and Zernike polynomial weighted fusion; constructing a double-loop coupling optimization architecture to realize closed-loop adaptive optimization; according to the invention, the anti-interference capability, the complex lens adaptability and the full-aperture detection precision are obviously improved.

The invention relates to the field of optical system imaging, in particular to an optical system imaging quality prediction model construction method giving consideration to surface shape errors and pose errors, which adopts a Zernike polynomial to perform accurate fitting on mirror surface shape errors caused by bolt pre-tightening force, and adopts a finite element mode to perform simulation on an optical system bolt tightening process. According to the method, Zernike polynomial fitting is taken as a basic parameter, various mirror surface shape errors and assembly pose deviations are fully considered when Zemax is adopted to carry out optical path imaging simulation, and the energy concentration degree is taken as an imaging quality quantitative evaluation index, so that the optical path imaging simulation of the two-mirror optical system is realized. According to the method, an SVR proxy model containing local and global mixed kernel functions is established, sensitivity analysis is performed on mirror surface shape and assembly pose parameters, an assembly data set is obtained through assembly and imaging joint simulation, and the model is trained to obtain an imaging quality prediction model so as to realize rapid and accurate prediction of imaging quality.

The invention provides a device and a method for testing thermal deformation of a reflector, and relates to the technical field of optical assembly, calibration and detection.The testing device comprises an interferometer, a three-comprehensive test box, a standard plane reflector, first window glass, second window glass and a holographic original, firstly, the thermal deformation of the window glass on the two sides in the three-comprehensive test box is measured; measuring the thermal deformation of the reflector to be measured, analyzing and calculating the surface shape error caused by two times of thermal deformation to obtain the Zernike polynomial coefficient value of the reflector to be measured, and obtaining the surface shape value of the reflector to be measured through fitting analysis, namely the thermal deformation of the reflector to be measured. The problems that in the prior art, the surface shape change condition in the actual load working environment is difficult to accurately measure and the influence of window glass on the reflector to be tested is difficult to accurately measure are solved, the testing precision is improved, and in addition, the surface shape error of the reflector to be tested can be quantitatively analyzed through all Zernike polynomial coefficient values in the testing result.

The invention discloses a wafer polishing laser interference closed-loop pressure control method, and relates to the technical field of semiconductor manufacturing, and the method comprises the following steps: S1, triggering an automatic measurement program after a ceramic plate and a wafer are overturned; s2, driving a laser interference measuring head to perform non-contact scanning on T2 / T4 point positions of the wafer through a six-axis mechanical arm positioning system to obtain thickness distribution data; s3, fitting the thickness distribution data by adopting a Zernike polynomial to generate a three-dimensional distribution diagram, and calculating a pressure correction amount based on a process dynamic model and a pressure prediction model constructed by a support vector machine regression algorithm; s4, detecting a data outlier in real time through an exception handling module, and triggering an equipment protection strategy when the deviation exceeds a set threshold value; and S5, a pressure control instruction is transmitted to the polishing head through the PROFINET bus by means of the PLC. Through non-contact laser interference measurement, the laser interference technology is applied to thickness detection of the polished wafer for the first time, the single measurement time is shorter than 20 seconds, and the detection efficiency is remarkably improved.

The invention discloses an optical performance-oriented key geometric error identification method for a large aspheric element multi-axis numerical control machine tool. According to the method, a tool setting point is used as a key node to establish a surface shape error model, geometric errors and surface shape errors of a machine tool are accurately associated, multi-error coupling analysis is simplified, and targeted compensation, online monitoring and real-time correction are achieved. On the basis, a machine tool space error model is constructed in combination with a multi-body system theory, a mapping relation between a surface shape error and wavefront aberration is established by utilizing a ray tracing theory, the wavefront aberration is fitted through a Zernike polynomial, and the contribution degree of each geometric error to the aberration is quantified by means of principal component analysis, so that a key geometric error is identified and compensation is implemented. According to the method, the machining error and the final optical performance are directly associated, and the machining precision and the performance quality of the large aspheric element can be improved. The method is suitable for the manufacturing field of large complex optical elements machined by a multi-axis numerical control machine tool.

The invention relates to the field of mechanical engineering, in particular to an assembly error-based optical system imaging quality prediction method, which comprises the following steps of: firstly, constructing an accurate optical system finite element model, simulating a bolt tightening process, obtaining mirror surface deformation under the action of assembly stress, fitting a mirror surface shape by utilizing a Zernike polynomial, taking the mirror surface shape as an intermediate medium, and predicting the imaging quality of an optical system. The Zemax is adopted to simulate the imaging of the optical system under the conditions of mirror surface deformation and assembly poses, and the influence rule of various assembly errors on the imaging quality of the optical system is explored. Thirdly, an assembly data set is constructed through an integrated simulation method, an MLP-XGBoost combined neural network agent model is established, model training is carried out, and compared with a single MLP model, a single XGBoost model and a traditional regression model, the method has higher superiority and reliability in the prediction precision aspect. And finally, a stochastic gradient descent method is adopted to optimize the pre-tightening force under different primary and secondary mirror assembly pose conditions, the energy concentration ratio is averagely improved by 11.34% compared with the energy concentration ratio before optimization, and the assembly and adjustment efficiency and precision of the double-mirror optical system are improved.

The invention belongs to the technical field of optical design, and particularly relates to a free-form surface optical system design method based on double Zernike aberration. The method comprises the following steps: S1, rewriting an aberration contribution expression of a free-form surface optical system into a first double-Zernike polynomial based on a field-of-view Zernike polynomial and a pupil Zernike polynomial; s2, an offset vector is introduced into a view field vector of the rectangular Zernike polynomial; s3, carrying out the processing of the Zernike aberration of the full view field through employing a least square method, and carrying out the processing of the Zernike aberration of the full view field; and S4, constructing a performance evaluation model, analyzing and calculating the free-form surface component of the optical initial system by using the performance evaluation model, and substituting the free-form surface component into the optical initial system to complete the design of the free-form surface optical system. The free-form surface optical system obtained by the invention has relatively good imaging quality and relatively small free-form surface coefficient.

The invention relates to a multi-spectral wavefront aberration restoration method and system based on double roof prisms, and the method comprises the following steps: taking a sub-pupil image as the input of a classification model, obtaining classification feature data, and carrying out the data expansion of the classification feature data, the sub pupil image is obtained by inputting incident wavefront aberration into a simulation light path of the double-ridge prism wavefront sensor, the double-ridge prism wavefront sensor comprises two groups of double-ridge prisms, each group of double-ridge prisms comprises two ridge prisms which are vertically and oppositely arranged, the characteristics of the ridge prisms are equal, and the characteristics of the double-ridge prisms are equal. The two groups of double-roof prisms are made of a material combination for eliminating chromatic aberration; splicing the sub pupil images and the classification feature data after data expansion to serve as input of a regression model, and obtaining a Zernike coefficient matrix corresponding to incident wavefront aberration; and according to the Zernike coefficient matrix corresponding to the incident wavefront aberration and the Zernike polynomial, obtaining a recovered wavefront aberration. Compared with the prior art, the method has the advantage that the wavefront aberration recovery accuracy is improved.

The invention discloses an underwater vortex optical communication anti-turbulence method based on a photoelectric hybrid deep neural network, and the method comprises the steps: carrying out the all-optical information compression at a front end through the diffraction deep neural network through the fusion of a diffraction deep neural network and a convolutional neural network, and transmitting the processed information to a rear end of the convolutional neural network, a model task is completed through training, a predicted coefficient of a Zernike polynomial is output, prediction and compensation of ocean turbulence are achieved, and the mode purity of vortex beams is improved. The front-end diffraction deep neural network is utilized to effectively improve the problem that the rear-end convolutional neural network is difficult to process massive information, the photoelectric hybrid deep neural network model is high in integration, high in operation speed and accurate in light field signal processing, the power overhead for achieving turbulence resistance through the machine learning technology is saved, operation is easy, implementation is easy, and the method is suitable for popularization and application. The method has a wide application prospect in the aspects of vortex beam underwater communication and the like.

The invention relates to an aspheric wavefront detection device and method based on multi-direction orthogonal lateral shear interference. The device is composed of a laser, a linear polarizer, a light splitting element, a reflector array, a two-dimensional orthogonal grating array, a light splitting system, a polarization phase shifting element and a CMOS camera. The method comprises the following steps: firstly, an antisymmetric continuation method is included, secondly, dynamic phase recovery and distortion compensation are adopted, Zernike polynomial local fitting is introduced, and self-adaptive compensation is carried out on high-order aberration (such as coma aberration and trefoil aberration) of an aspheric surface edge region. According to the method, the multi-direction orthogonal lateral shearing interferogram can be obtained through single measurement, and a high-precision, high-efficiency and high-robustness solution is provided for precise detection of the aspheric optical element through cooperation of an algorithm and hardware. The method is suitable for high-precision phase recovery in the fields of optical detection, microscopic imaging and the like, and is suitable for high-precision dynamic detection of complex optical elements such as off-axis aspheric surfaces, free-form surfaces and the like.

The invention relates to the technical field of coupling alignment of single-mode optical fibers, in particular to an optical fiber coupling alignment method and system based on wavefront aberration and a sensitivity matrix. The system comprises an optical measurement module, a processing and control module and a multi-axis precision adjustment platform, and the alignment method comprises the steps that firstly, an interference fringe image is obtained and processed through an interference light path, continuous wavefront is recovered through Fourier transform and phase unwrapping, and a Zernike coefficient for quantizing wavefront distortion is obtained through Zernike polynomial fitting. A sensitivity matrix representing the linear relation between the degree-of-freedom adjustment amount and Zernike coefficient changes is established and serves as a physical guide item to introduce a speed updating formula of a particle swarm optimization algorithm, an SG-PSO algorithm is formed, a particle swarm is guided to conduct directional intelligent search and rapidly output the optimal adjustment amount, and finally a multi-axis precision adjustment platform is driven to complete alignment. According to the method, optimization of wavefront sensing and physical model guiding is effectively fused, and the convergence speed, the alignment precision and the global search capability are remarkably improved.

According to the out-of-focus holographic measurement method of the radio telescope based on planetary zooming, a planet is used as a source for out-of-focus observation, a beam pattern of an actually observed planet is obtained through deconvolution, a theoretical far-field model of the planet is established, and the theoretical far-field model of the planet is compared with the actually observed beam pattern to calculate a redundancy value. And continuously updating the coefficient of the Zernike polynomial by minimizing the redundancy value and iterating until the optimal phase model is determined, and determining the phase error on the aperture plane according to the phase model. According to the out-of-focus holographic measurement method, the planet is introduced to serve as a radio source, the measurement precision and stability are improved, the real-time measurement effect and the multi-frequency calibration capability are enhanced, the calibration accuracy and the overall performance of the Tianmar radio telescope are remarkably improved, many limitations of a traditional surface type measurement method are solved, and the measurement precision and the measurement stability are improved. For example, the measurement speed is slow, additional hardware equipment is needed, the influence of weather is large, and the application range is limited.

The invention relates to the technical field of optical imaging, and discloses an optical lens splicing imaging method and system, and the system comprises a calibration module, a preprocessing module, a registration module, a correction module, and a fusion module. Through the arrangement of the registration module, the correction module and the fusion module, the problem of registration errors caused by sparse feature points of a low-texture region can be solved through a mixed strategy of global mutual information guidance and local robust matching, the registration precision is effectively improved, the optical aberration of each sub-lens is compensated through a global model based on a Zernike polynomial, and the registration precision is improved. The image quality of the marginal area of the spliced image is effectively improved, a multi-resolution pyramid optimization mode is adopted, the calculation complexity of global registration is reduced, the real-time imaging requirement is met, meanwhile, splicing seams are effectively eliminated, and the overall smoothness of the image is remarkably improved.

The invention relates to the technical field of image processing, and discloses a laser holographic aberration compensation system and method based on deep learning, and the system comprises a first module which determines a phase-to-gray lookup table; the second module is used for calculating to obtain stacking strength; the third module is used for obtaining a Zernike polynomial coefficient through a convolutional neural network regression device; the fourth module is used for calculating to obtain predicted intensity and an aberration estimator; the fifth module is used for outputting two grey-scale maps; and the sixth module outputs two phase diagrams. According to the method, self-supervised training data is constructed through three-plane intensity collection, and an angular spectrum method physical model and Zernike polynomial coefficient low-dimensional representation are combined, so that a convolutional neural network regression device can stably learn aberration mapping, and compensation precision and generalization ability are both considered; double-phase two-frame time division coding is adopted, the output characteristics of a phase type spatial light modulator can be adapted, and cooperative control of aberration compensation and target complex field reproduction is achieved.

A single-frame speckle deflection measurement method based on subarea wavefront correction belongs to the technical field of optical measurement, and comprises the following steps: based on a monocular deflection measurement system, projecting a standard speckle image to a to-be-measured mirror surface from a screen, and collecting a single-frame deformed speckle image reflected by the to-be-measured mirror surface; processing the reflected image by using a Zernike polynomial projection distortion correction method based on a mark point, and correcting the projection distortion of the reflected image caused by a non-orthogonal light path; obtaining sub-pixel mapping of the reflection image and the standard image based on a sub-region wavefront fitting correction and iterative registration algorithm; and based on system calibration and camera calibration, establishing a spatial incident light model and a spatial reflected light model, obtaining surface gradient distribution of the to-be-measured mirror surface, and reconstructing a three-dimensional shape of the to-be-measured mirror surface. According to the method, a reference plane is not needed, high-reflection surface shape measurement of only collecting a single-frame image can be achieved, the dynamic range and precision of speckle deflection measurement are improved through subarea wavefront correction, and the surface reconstruction precision can reach hundreds of nanometers.

The invention belongs to the technical field of short-wave communication channel modeling, and discloses a short-wave channel modeling method and system based on signal wavefront recovery, and the method comprises the steps: projecting standard plane waves to an antenna array from different angles through a cooperative target radiation source, collecting antenna array signals in different directions under the condition of no disturbance, and storing the signals as calibration data; calculating the time delay of each antenna before receiving the wavefront relative to the center of the antenna array, calculating the relative time delay of the time delay and the calibration data, and multiplying the relative time delay by the wavelength to realize the time domain-space domain conversion of wavefront distortion to obtain wavefront slope distribution; and calculating the size of a Zernike polynomial coefficient of each order based on wavefront slope distribution, analyzing specific components of aberration contained in signal wavefront, and performing wavefront fitting reconstruction so as to complete short-wave channel modeling. According to the method, the Zernike polynomial is adopted to fit the wavefront disturbance quantity, the influence of the ionized layer on the wavefront of the short-wave signal is quantified in real time, and a high-precision channel model is constructed.

The invention relates to an optical component, in particular a mirror, comprising: at least one heating structure (25, 25a) that can be subjected to an electric current, in particular a resistance heating structure, for introducing heat into a material of the optical component. In one aspect of the invention, the heating structure (25a) and a further, adjacent heating structure (25b) have interlocking edge structures (30a, 30b), wherein a heating power density (1a) of the edge structures (30a) of the heating structure (25a) on a side (32b) of the edge structures (30a) of the heating structure (25a) facing the further heating structure (25b) is lower than on a side (32a) of the edge structures (30a) of the heating structure (25a) facing away from the further heating structure (25b).In another aspect of the invention, the at least one heating structure (25) extends substantially over the entire optical surface (27) of the optical component and has a locally varying electrical resistance (Ra(x,y)) which preferably approximates a basis function extending substantially over the entire optical surface (27), in particular a Zernike polynomial.

The invention discloses a method for obtaining human eye wavefront aberration and a human eye aberration measuring device, and relates to the technical field of optical instruments.The method for obtaining the human eye wavefront aberration is applied to a Hartmann sensor and comprises the steps that an actual slope matrix is obtained through calculation according to a wavefront light spot diagram obtained by the Hartmann sensor; multiplying the generalized inverse matrix of the standard slope matrix by the actual slope matrix to obtain a Zernike coefficient matrix; subtracting the actual slope matrix from the product of the standard slope matrix and the Zernike coefficient matrix to obtain a residual matrix; and updating the Zernike coefficient matrix according to the residual matrix until the residual matrix of the updated Zernike coefficient matrix is smaller than or equal to a preset value. Wherein the standard slope matrix is a matrix formed by wavefront slope of Zernike polynomial full-term superposition. According to the technical scheme provided by the invention, the accuracy of obtaining the wavefront aberration of the human eye can be improved.

The invention relates to a dynamic light beam shaping system and method based on a spatial light modulator. The system comprises a laser light source module, a beam expanding collimation light path, a light beam modulator, a focusing optical assembly, a detection and feedback module and a control and optimization module. According to the method, the uniformity of the output flat-topped beam can be corrected by virtue of a random parallel gradient descent (SPGD) algorithm and combining a Zernike polynomial as a control variable. Meanwhile, a composite performance index comprehensively considering energy distribution and shape features is constructed, the correction process of the flat-topped beam is accelerated by adopting a mode of gradually improving Zernike polynomial orders in multiple stages, the convergence trend of the performance index is used as a judgment basis of stage switching, stage independent variable dimension expansion is implemented, and the correction precision of the flat-topped beam is improved. And the convergence speed is obviously improved. Besides, adaptive selection of disturbance amplitude and learning rate parameters in the SPGD algorithm is realized by using noise estimation and a local linearity index, and the robustness of the system to noise and environmental disturbance is enhanced.

The invention relates to a rapid tilt compensation method based on a Zernike polynomial. The method comprises the following steps: acquiring a two-dimensional image matrix output by a digital holographic microscope; the two-dimensional image matrix is preprocessed; the preprocessed image intensity matrix is projected to a Zernike polynomial base # imgabs0 #, Zernike fitting is achieved, and a Zernike model of a related sample to be detected is obtained; calculating tilt term coefficients alpha x and alpha y of a first-order polynomial in the Zernike model; and calculating out-of-focus aberration # imgabs1 #, performing tilt compensation on the preprocessed image intensity matrix by adopting tilt term coefficients alpha x and alpha y, and outputting the compensated image intensity matrix. The invention further discloses the corresponding electronic equipment. According to the method, the shot image can be quickly and effectively compensated and corrected, and the robustness and the calculation speed are considerable.

The invention relates to a digital holographic microscopic distortion compensation method and system combined with deep learning. According to the method, a deep learning image segmentation technology and a phase distortion compensation technology are fused, an off-axis transmission-type digital holographic microscopic system is built, a hologram is shot to serve as a data set, then a U-net convolutional neural network is improved, and the improved U-net convolutional neural network is trained by using the data set; and segmenting the tested sample and the background in the hologram, and fitting the unwrapped background phase by using the least square based on the Zernike polynomial so as to realize phase distortion compensation. The invention further provides a digital holographic microscopic distortion compensation system combined with deep learning. The system comprises a module training module, an image processing module and a phase compensation module. Compared with the prior art, the method has the advantages of effectively eliminating distortion generated by the digital holographic system, improving efficiency, improving accuracy, saving calculation cost, improving network training effect and generalization ability and the like.

A film thickness analysis method includes: acquiring film thickness values at a plurality of measurement points different from each other along a radial direction for a target film formed on an analysis target substrate by supplying a processing liquid while rotating the target substrate based on predetermined liquid processing conditions; and creating an approximate expression related to a film thickness distribution of the target film by approximating the film thickness values at the plurality of measurement points with respect to one Zernike polynomial. The approximate expression is created by specifying a coefficient related to the film thickness of the entire target substrate and one or more coefficients related to concentric curvature components, among a plurality of coefficients included in the Zernike polynomial.

The invention relates to an SAR photoelectric processor phase error compensation method based on a Zernike polynomial, and the method comprises the steps: obtaining an SAR photoelectric processor to be subjected to phase error compensation, and employing the Zernike polynomial to express the modulation phase of a spatial light modulator in the SAR photoelectric processor; respectively calculating two-dimensional frequency domain phases of an ideal SAR echo signal and a non-ideal SAR echo signal of the SAR photoelectric processor, determining a focusing phase error, fitting the focusing phase error by adopting a Zernike polynomial, and evaluating focusing phase error (parameter) estimation performance; a plurality of Zernike coefficients are randomly generated for a Zernike polynomial, optimization of the Zernike coefficients is carried out by adopting a genetic algorithm, and the quality of the SAR image is used as a fitness value of the genetic algorithm until the Zernike coefficients meeting optimization conditions of the genetic algorithm are obtained and used for prediction of a modulation phase. Compared with the prior art, the two-dimensional frequency domain phase error can be effectively corrected, and a theoretical foundation is laid for an automatic focusing algorithm special for SAR optical processing.

The invention relates to the technical field of myopia prevention and control lens manufacturing, and discloses a multi-focus out-of-focus myopia prevention and control lens based on a micro-lens array, the multi-focus out-of-focus myopia prevention and control lens comprises a peripheral area and a central area, the central area is used for correcting refraction, and the central area is located in the middle of the peripheral area. The peripheral area uses a Zernike polynomial to construct a dynamic defocusing model, the defocusing amount can be dynamically adjusted, the dynamic defocusing model obtains eyeball movement information through a feedback system, the frequency of real-time adjustment of the defocusing amount along with eyeball movement is larger than or equal to 10 Hz, and the defocusing amount of the peripheral area is changed in a gradient mode from + 2.00 D to + 4.00 D. A dynamic defocusing model is constructed by using a Zernike polynomial, and the model obtains eyeball movement information through a feedback system, so that the problem that the prevention and control effect is reduced due to the fact that the defocusing amount of the peripheral area of a traditional multi-focus defocusing myopia prevention and control lens is mostly fixed and the focus cannot be overlapped with the retina in real time when the eyeball moves is solved.

The invention discloses a lateral shear interference wavefront reconstruction method and device, relates to the technical field of optical measurement, adopts inaccurate shear amount to perform wavefront reconstruction, realizes high-precision wavefront reconstruction, and solves the problem that wavefront reconstruction depends on shear amount calculation precision in the prior art. Comprising the following steps: performing phase unwrapping on an initial lateral shearing interference pattern obtained based on a lateral shearing interference device to obtain an initial phase, and fitting the initial phase and an initial shearing amount through a differential Zernike polynomial to obtain a fitted initial wavefront to be measured; determining an initial error value corresponding to the initial shear amount through an error function based on the initial phase and the simulation phase; determining a plurality of domain error values corresponding to the initial error value based on a neighborhood optimization method, and selecting an initial shearing amount or a domain shearing amount corresponding to a minimum value to update the initial shearing amount; and when the updating error value corresponding to the updating shearing amount is smaller than the threshold value, determining the iteration wavefront to be measured determined by the updating shearing amount corresponding to the updating error value as the accurate reconstruction wavefront.

The invention discloses a novel method for measuring the surface shape of a large-aperture film mirror surface, and the method comprises the steps: obtaining a reflected deformed fringe image based on a four-step phase shift method, and obtaining the wrapped phase distribution of the image after modulation; performing labeling processing on the level of the wrapped phase distribution by using a Gray code to obtain unpacked phase distribution; a camera is used for collecting a film mirror image, center coordinate and radius labeling is carried out on the image, center coordinate symmetry operation is carried out on unpacking phase distribution, and phase change is obtained; obtaining the relation between the phase change and the gradient, obtaining the coefficient matrix of the first 36 constant terms of the zernike polynomial by using the least square method, further obtaining the surface shape data of the thin film mirror surface, and outputting the current surface shape data of the thin film mirror surface when the difference value of the current and later surface shape data of the thin film mirror surface reaches a convergence threshold value, thereby completing the measurement of the surface shape of the thin film mirror surface. According to the invention, the problems of large stripe deformation and discontinuous phase caused by overlarge mirror gradient are solved, and the limitation of film mirror measurement is solved.

The present application relates to the technical field of optical interferometry, and particularly relates to a high-precision phase demodulation method based on a PhaseUnet++ network.The method comprises the following steps:1. Zernike polynomials are used to generate training data and test data for network training;2. a neural network PhaseUnet++ is established and trained;3. normalized cosine interferograms I cos and auxiliary diagrams I sac are input into the trained network, and normalized sinusoidal interferograms I sin are output;4. the wrapped phase distribution is obtained by using an arctangent function, and the unwrapped phase distribution φ(x,y) is obtained by using a phase unwrapping algorithm.The present application has high precision, can process interferograms of different sizes, has strong noise resistance, can realize phase measurement of dynamic samples, has high reconstruction result precision, simple steps, wide application range, and great application prospect in the field of optical interferometry research.

The application discloses a wafer polishing laser interference closed-loop pressure control method, and relates to the technical field of semiconductor manufacturing, and comprises the following steps: S1: a ceramic plate is triggered to automatically measure a program after being turned over with a wafer; S2: a laser interference measurement head is driven by a six-axis mechanical arm positioning system to non-contact scan T2 / T4 points of the wafer, and thickness distribution data is acquired; S3: a Zernike polynomial is adopted to fit the thickness distribution data to generate a three-dimensional distribution graph, and a pressure correction amount is calculated based on a pressure prediction model constructed by a process kinetics model and a support vector machine regression algorithm; S4: an abnormal processing module is used to detect data outliers in real time, and a device protection strategy is triggered when a deviation exceeds a set threshold; and S5: a pressure control instruction is transmitted to a polishing head by a PLC controller through a PROFINET bus. By means of non-contact laser interference measurement, the laser interference technology is applied to wafer thickness detection after polishing for the first time, and single measurement time is less than 20 seconds, so that the detection efficiency is significantly improved.

A ophthalmic laser-assisted corneal lenticule extraction procedure that uses wavefront measurements to guide the formation of the corneal lenticule. The wavefront map measured from a free eye using a wavefront aberrometer is registered to the cornea of a docked eye based on comparisons of iris images and corneal markings. The docked-eye cornea-registered wavefront map is then corrected to be consistent with the Munnerlyn formula for the spherical power, and adjusted for any physician adjustments and / or myopia error due to a flat add in the lenticule, using Zernike polynomials. The corrected and adjusted wavefront map is then used to calculate the profiles of the bottom and top lenticule incisions in the applanated cornea, where higher-order components in the wavefront map are distributed to the bottom lenticule incision alone and lower-order components in the wavefront map are distributed to both the bottom and the top lenticule incision.

The present application relates to the field of optical interferometry, and aims at the phase distortion problem in off-axis interferometric quantitative phase imaging, and provides an interferometric microscopic phase distortion elimination method based on PACUNeXt3+ network. The method comprises the following steps: 1. using Zernike polynomials and test target pictures to simulate and generate a data set; 2. establishing and training a PACUNeXt3+ neural network model; 3. inputting the interference graph I or of the sample to be measured into the trained neural network, and outputting the background interference graph I' r corresponding to the sample without sample information; 4. using the two interference graphs I or and I' r to reconstruct the sample phase distribution φ o (x, y) without phase distortion. The present application has high precision and speed, can eliminate the secondary or high-order phase distortion in interferometric quantitative phase imaging, and has great application prospect in the field of phase imaging.