The invention relates to an optical
system, in particular for microlithography, comprising at least one optical element (100, 200, 300, 400) which has a substrate (105, 205, 305, 405) and at least one
optically active layer
system (110, 210, 310, 311, 410) located on this substrate (105, 205, 305, 405), and at least one monitoring unit (120, 220, 240, 320, 340) for monitoring a degradation state of this layer
system (110, 210, 310, 311, 410), wherein the monitoring unit (120, 220, 240, 320, 340) has a
detector (121, 221, 241, 321, 341) for detecting non-directional
radiation (130, 230, 330, 430) which is emitted by the optical element (100, 200, 300, 400) during the operation of the optical system.