High confinement waveguide on an electro-optic substrate
a high confinement waveguide and electro-optic substrate technology, applied in the direction of optical waveguide light guide, optical elements, instruments, etc., can solve the problems of limited electro-optic effect, reduce the mode size of portions, and improve the mode size matching to optical fiber
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[0055]FIGS. 4-31 describe various embodiments of the invention, which consist of a high confinement waveguide, like SiN:Si, formed on top of an electro-optic material, like lithium niobate (LN). FIGS. 4-6 show the cross sections of different types of SiN:Si-on-LN waveguides. The SiN strip 10 is made to be rich in Si, increasing its optical index of refraction to be slightly higher than the optical index of LN 20. A high confinement waveguide must have an index change relative to the electro-optic substrate that is significantly larger than that created in the diffused waveguide. The maximum refractive index in a diffused waveguide in lithium niobate is typically 0.01 to 0.02 higher than the substrate index or said another way, the index change forming the waveguide is less than 1% of the substrate index. Furthermore, the average index change in most of the waveguide is less than the maximum index change as a result of creating a waveguide with a diffusion process, hence the average ...
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