This invention discloses an electro-optic modulator and its manufacturing method, belonging to the field of
silicon photonics technology. The manufacturing method of the electro-optic modulator includes: providing a substrate; forming a first device pattern on the substrate; forming a protective layer flush with the top surface on the first device pattern and the substrate, wherein the first device pattern has a first region for
ion implantation and a second region for
ion implantation; forming a blocking pattern on the protective layer outside the first region, at least covering the second region; forming a first
photoresist pattern on the protective layer for
ion implantation of the first region, forming a first
ion implantation region; removing the first
photoresist pattern; forming a
dielectric layer on the protective layer; and removing the
dielectric layer on top of the blocking pattern; forming a second
photoresist pattern on the
dielectric layer, wherein the opening area of the second photoresist pattern is not smaller than that of the blocking pattern; removing the blocking pattern; and performing
ion implantation on the second region, forming a second
ion implantation region. By setting the blocking pattern as an ion implantation
mask and removing the blocking pattern in subsequent implantation, and then performing ion implantation again, two ion implantation regions with controllable spacing are formed, enabling the formation of a stable lateral PN junction structure.