The present invention provides a multi-
quantum-well
superluminescent diode. It is characterized by that it adopts AlGaInAs / InP materials, the luminescent
wavelength range of its active region is 1.25 micrometers to 1.65 micrometers, and on the n-type InP substrate successively are set lower clad, upper and lower respective limiting
layers and multi-
quantum-well active region positioned in them, in which the thickness of the well is 5-10 nm, and the
total thickness of active region well barrier is 10-500 nm. On the upper limiting layer are successively set upper clad,
etching cut-off layer,
optical limiting layer and
ohmic contact layer. It adopts an inverted mesa
ridge waveguide structure, its two sides are equipped with
polymer plane buried layer respectively, and its upper surface is equipped with plane
electrode, in which the included angle theta of
waveguide direction and light-outgoing end face of SLED is 75-85 deg.