The invention relates to a method for regulating a built-in
electric field in an active region of a deep
ultraviolet light-emitting
diode, belonging to the technical field of
semiconductor photodiodes. The method comprises, from bottom to top, a substrate, a buffer layer, an n-type
semiconductor electron injection layer, a multi-
quantum well
active layer, a p-type
electron blocking layer, a p-type
semiconductor hole injection layer, a p-type
contact layer, a p-type
electrode, and an n-type
electrode. The multi-
quantum well
active layer comprises a plurality of periodically grown units, each unit comprises a
quantum well and quantum barriers on both sides of the
quantum well, Mg is doped on a side close to the
quantum well in the quantum barriers on the upper side of the
quantum well, Si is doped on a side close to the quantum well in the quantum barriers on the lower side of the quantum well, and each quantum barrier is not fully doped. The built-in
electric field of a deep
ultraviolet light-emitting
diode is regulated by a selective
doping method, so as to solve the problems of
wavelength red shift and efficiency attenuation caused by an excessively large built-in
electric field, and at the same time, the
electron and hole injection of the DUV LED is regulated, so as to improve the photoelectric performance of the DUV LED by suppressing
electron leakage and enhancing hole injection.