508 results about "Waveguide array" patented technology

Chemically or biochemically active agents or other species are patterned on a substrate surface by providing a micromold having a contoured surface and forming, on a substrate surface, a chemically or biochemically active agent or fluid precursor of a structure. A chemically or biochemically active agent or fluid precursor also can be transferred from indentations in an applicator to a substrate surface. The substrate surface can be planar or non-planar. Fluid precursors of polymeric structures, inorganic ceramics and salts, and the like can be used to form patterned polymeric articles, inorganic salts and ceramics, reactive ion etch masks, etc. at the surface. The articles can be formed in a pattern including a portion having a lateral dimension of less than about 1 millimeter or smaller. The indentation pattern of the applicator can be used to transfer separate, distinct chemically or biochemically active agents or fluid precursors to separate, isolated regions of a substrate surface. Waveguide arrays, combinatorial chemical or biochemical libraris, etc. can be made. Differences in refractive index of waveguide and cladding can be created by subjecting the waveguide and cladding, made of indentical prepolymeric material, to different polymerization or cross-linking conditions. Interferometers are defined by coupling arrays of waveguides, where coupling can be controlled by altering the difference in refractive index between cladding and waveguide at any desired location of the array. Alteration and refractive index can be created photochemically, chemically, or the like. Sensors also are disclosed, including biochemical sensors.

The multichannel waveguide device includes an array of waveguides located in a plane. Each waveguide channel has a redirecting element for redirecting a guided wave out of said plane, or vice versa. The redirecting elements are staggered in the direction of the waveguides so as to transform a one-dimensional array of in-plane waves into a two-dimensional array of out-of-plane waves, or vice versa.

A fully integrated microelectromechanical (MEMS) lxK wavelength selective switch (WSS) includes an array of N solid-immersion micromirrors (SIMs) and a K+1 dispersion waveguide arrays that are integrally fabricated together. In one embodiment, the WSS is fabricated in Silicon. In another embodiment, the N actuators of the SIMs are etched in the Silicon layer of a Silicon-on Insulator (SOI) wafer. Thereafter, a Silica layer is deposited on the Silicon layer and the K+1 waveguide arrays and the mirrors for the N SIMs are etched in that Silica layer. In yet another embodiment, the K+1 dispersion waveguide arrays, except for a small portion of the common confocal coupler, are fabricated using a material selected from a group including Silica, sol-gel, polymers, that is deposited on a first wafer selected from a group including Silicon, Saphire, or other glass insulator material and the remaining portion of the common confocal coupler and the N SIMs are fabricated in a Silicon wafer, and the first wafer and Silicon wafer are then butt-coupled together.

In the optical connection between multi-layered optical waveguides and photoelectric converting elements or optical waveguide array connectors formed on a substrate, the optical coupling efficiency is to be prevented from degrading due to deviation of the optical axis positions between optical elements and the optical waveguide layers that is caused by a radiation due to a beam expansion or by a deviation of positioning layers in producing the optical waveguides. There are stacked, on a substrate, optical waveguide layers, each of which comprises a clad layer and a core having a higher refractive index than the clad layer, and optical elements formed on the uppermost optical waveguide layer. The optical elements are positioned such that they correspond to the optical path conversion mirrors of the cores of the underlaying optical waveguide layer. The light transmission / reception between the optical elements and the optical path conversion mirrors of the cores of the underlaying optical waveguide layer is performed via the cores of overlying optical waveguide layer.

A waveguide array is fabricated by providing a photoreactive material and generating an optical intensity pattern corresponding to a geometry of the waveguide array. A relative translation of the photoreactive material is effected through the optical intensity pattern. Thereafter, the photoreactive material is rendered substantially unreactive to light at at least a wavelength of the optical intensity pattern.

An arrayed waveguide grating including a waveguide array extending between two free propagation regions is disclosed. One free propagation region is coupled to an input waveguide, and the other free propagation region is coupled to output waveguides. In an example, the input-side free propagation region has two sections that are moveable relative to one another. Movement is achieved by using, for example, a thermally responsive actuator that moves the input waveguide a desired distance to compensate for a temperature change. An arm formed of a low thermal expansion coefficient metal may be used as a thermally responsive actuator moving a substrate. In another example, both the input side and the output side free propagation regions have sections moveable relative to one another and, therefore, less movement is required to correct for thermal variations. An N×N arrayed waveguide grating may also be formed.

A small variable demultiplexer capable of improving yield and stabilizing characteristics can be obtained. The small variable demultiplexer includes an SiO2 layer serving as a base medium, a waveguide array, a heater serving as an external refractive index modulating unit and a heat sink serving as the external refractive index modulating unit. The waveguide array is arranged on the SiO2 layer. The waveguide array is formed of the plurality of Si photonic wire waveguides serving as waveguides. The heater and the heat sink provide a refractive index gradient which is formed in the direction perpendicular to the extension direction of the Si photonic wire waveguide, and is variable depending on the plurality of Si photonic wire waveguides. The Si photonic wire waveguide has a one-dimensional photonic crystal structure in the extension direction of the Si photonic wire waveguide.