The invention discloses a
wafer-level heat dissipation structure and a manufacturing method. The
wafer-level heat dissipation structure comprises a heat dissipation substrate, a device
wafer and a bonding layer, the heat dissipation substrate is a first
silicon wafer with
a diamond layer growing on the lower surface, and the upper surface of the heat dissipation substrate is plated with a first
copper layer; the device wafer is a second
silicon wafer of which the upper surface is integrated with an active device, and the lower surface is plated with a second
copper layer; the bonding layer is composed of a Cu-Cu bonding interface formed by the first
copper layer and the second copper layer through
thermocompression bonding. The method comprises the following steps: growing
a diamond layer on the lower surface of a first
silicon wafer through MPCVD, and
sputtering a Cu layer after the upper surface is thinned;
sputtering a Cu layer on the back surface of the second silicon wafer of which the surface is integrated with the active device; and finally realizing
interconnection of the Cu
layers of the two wafers through
thermocompression bonding. The problem of multi-interface
thermal resistance caused by a traditional thermal interface material is avoided, an ultra-low
thermal resistance path from a
chip junction to
a diamond heat dissipation surface is constructed, and the method is particularly suitable for thermal management of a high-power-density
semiconductor device.