A manufacturing method for an
optical integrated circuit including a spatial reflection type structure having a perpendicular end surface and an inclined surface formed in an optical
waveguide layer. The manufacturing method includes the steps of applying a first
photoresist to the upper surface of the optical
waveguide layer, removing the first
photoresist except a portion corresponding to the inclined surface, and heating the first preferred embodiment to a given temperature to melt the first
photoresist at least partially and deform the first photoresist by
surface tension, thereby forming a first
mask having an inclined shape. The manufacturing method further includes the steps of applying a second photoresist to the upper surfaces of the optical
waveguide layer and the first
mask, removing the second photoresist at a portion
ranging from a position corresponding to the perpendicular end surface to a position corresponding to the upper end of the inclined surface to form a second
mask, and
etching the first mask, the second mask, and the optical waveguide layer by RIE to thereby simultaneously form the perpendicular end surface and the inclined surface.