The invention provides a preparation method of a 3DIC photoelectric integrated
semiconductor packaging structure, and the method comprises the steps: carrying out the integrated packaging of an optical
chip module, a 3D stacked
chip and a horizontal storage
chip through a TSV substrate, a rewiring layer, a first electric chip, a second electric chip, a
dielectric layer and a conductive column, enabling the optical chip module to be connected with the 3D stacked chip through the first electric chip, enabling the optical chip module to be connected with the 3D stacked chip through the second electric chip, and enabling the optical chip module to be connected with the horizontal storage chip through the second electric chip; and the 3D stacked chip is connected with the horizontal storage chip through the second electric chip, so that short-distance connection between the
optical integrated circuit and the electric
integrated circuit is realized, the transmission distance of photoelectric signals is greatly reduced, the packaging area is reduced, the
power consumption is reduced, and high-density integrated packaging of the photoelectric chip is met.