Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for preparation of patterning colloid photonic crystal by ink-jet printing

A colloidal photonic crystal and inkjet printing technology, which is applied to the surface coating liquid device, coating, special surface, etc., can solve the problems of poor optical performance and achieve good optical performance and broad application prospects

Inactive Publication Date: 2010-06-30
INST OF CHEM CHINESE ACAD OF SCI
View PDF2 Cites 25 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the optical properties of the prepared films are still poor, and cannot fully meet the needs of real applications.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparation of patterning colloid photonic crystal by ink-jet printing
  • Method for preparation of patterning colloid photonic crystal by ink-jet printing
  • Method for preparation of patterning colloid photonic crystal by ink-jet printing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] The preparation of monodisperse poly(styrene-methyl methacrylate-acrylic acid) latex particles with a particle size of 50nm is as follows:

[0041] The monomer mixture methyl methacrylate (1.2 g), styrene (18 g) and acrylic acid (1.2 g), pH buffer (1.0 g) and emulsifier sodium dodecyl sulfonate (0.0786 mg) were dissolved in In water (100 mL), the resulting mixed system was stirred and mixed at 600 rpm, and heated to 75°C. Add 10 ml of potassium persulfate (0.8 g dissolved in 20 ml of water) aqueous solution to start the reaction, add 5 ml of potassium persulfate aqueous solution after 3.5 hours of reaction, and add the remaining potassium persulfate aqueous solution after the reaction continues for 3 hours. The reaction then continued for 2 hours and then ended. Finally, polystyrene-polymethyl methacrylate-polyacrylic acid triblock monodisperse polymer latex particles (monodisperse poly(styrene-methyl methacrylate-acrylic acid) latex particles) with a particle size of 50 ...

Embodiment 2

[0044] The preparation method of monodisperse poly(methylstyrene-methyl methacrylate-acrylic acid) latex particles with a particle size of 300nm is as follows: the monomer mixture methyl methacrylate (1.2 g), methyl styrene (18 g) ), acrylic acid (1.2 g), and pH buffer (1.0 g) were dissolved in water (100 mL), and the resulting mixed system was stirred and mixed at 600 rpm and heated to 75°C. Add 10 ml of potassium persulfate (0.8 g dissolved in 20 ml of water) aqueous solution to start the reaction, add 5 ml of potassium persulfate aqueous solution after 3.5 hours of reaction, and add the remaining potassium persulfate aqueous solution after the reaction continues for 3 hours. The reaction then continued for 2 hours and then ended. Finally, polymethylstyrene-polymethylmethacrylate-polyacrylic acid triblock monodisperse polymer latex particles with a particle size of 300nm (monodisperse poly(methylstyrene-methylmethacrylate-acrylic acid) latex grain).

[0045] At room temperatu...

Embodiment 3

[0048] At room temperature (20℃~30℃), respectively configure a monodisperse silica latex particle with a surface tension of 60mN / m and a particle size of 215nm with a concentration of 10wt% (purchased from Fujian Fina Materials Co., Ltd.) , 10wt% of glycerol and 80wt% of water composed of monodisperse latex particles; and another surface tension of 45mN / m by a concentration of 10wt% of monodisperse polystyrene latex particles with a particle size of 300nm (Purchased by Zhejiang Yiyi Nano Laboratory), an emulsion of monodisperse latex particles composed of 10 wt% glycerol and 80 wt% water. The above-mentioned two kinds of emulsions containing monodisperse latex particles were respectively installed in two ink cartridges of an inkjet printer; after the inkjet printer, the contact angle of the above-mentioned two kinds of monodisperse latex particle emulsion inks was coated with polycarbonate with a contact angle of 70° After pattern printing and drying on the coated aluminum plat...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the colloid photonic crystal preparation and application technical field, in particular to a method for preparation of high quality extensive patterning colloid photonic crystal by ink-jet printing. Under room temperature and by effective control of the substrate wetting quality and the surface tension of monodisperse emulsion particle emulsion ink for ink-jet printing, two or more types of monodisperse emulsion particle emulsion with the same particle diameter are respectively put into different ink boxes of an ink-jet printer and the concentration of the monodisperse emulsion particles in the emulsion in each ink box is 0.5-20 wt percent; and after monodisperse emulsion particle emulsion ink is used for the ink-jet printer to print patterns and then dried, a high-quality colloid photonic crystal with photon ban gaps in the ultraviolet light region and the visible light region is formed on the substrate surface. The highly-sequentially assembled colloid photonic crystals prepare by the invention has good optical property, realizes control effect of photon ban gaps to light and has wider application prospect in the fields of optical devices and optical integrated circuits.

Description

Technical field [0001] The invention belongs to the technical field of preparation and application of colloidal photonic crystals, and particularly relates to a method for preparing high-quality large-area patterned colloidal photonic crystals through an inkjet printing method. Background technique [0002] Because patterned photonic crystals have broad application prospects in the fields of optical devices, displays, and microfluidics, the preparation of patterned photonic crystals has aroused great interest of researchers. The preparation of patterned photonic crystals is generally obtained by using laser direct writing or template assembly. Laser direct writing requires a special high-cost direct writing device. Although the template assembly method is simple, the resulting pattern is limited by the template, and The template preparation process is also very complicated. It should be a simple and easy method to directly prepare patterned photonic crystals by inkjet printing. ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B05D7/24B05D5/06
Inventor 李志荣王京霞崔丽影李英锋宋延林
Owner INST OF CHEM CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products