The invention discloses a preparation method of a high-precision glass through hole based on PTR glass. Comprising the following steps: step 1, carrying out high-temperature melting,
casting molding and annealing treatment on a glass
raw material to obtain a PTR glass substrate; 2,
cutting the PTR glass substrate,
polishing the two surfaces of the PTR glass substrate, and carrying out patterning
exposure by utilizing
ultraviolet light and a
mask to obtain exposed glass; 3, carrying out gradient heat treatment on the exposed glass to obtain
microcrystalline glass; and step 4,
etching the
microcrystalline glass in a
hydrofluoric acid solution to obtain the glass through hole with the high depth-
diameter ratio. The method has the beneficial effects that by optimizing the material formula and the technological process, the problems that in a traditional method, the hole
diameter is not uniform, the inner wall is rough and the
machining cost is high are solved, and the through hole
machining precision, stability and the depth-
diameter ratio are remarkably improved. The method is suitable for the fields of microelectronic packaging,
optical connectors, high-frequency devices, microfluidic chips and the like, and has a wide industrial application prospect.