The invention relates to an intensive assembling cabinet for large semiconductor equipment. The intensive assembling cabinet comprises a cabinet frame, an outer shell which is wrapped on the periphery of the cabinet frame, and an internal frame arranged in the cabinet frame. The internal frame divides the cabinet frame into a first radiating channel placed on the upper side, a power supply part and a control cabinet, wherein the power supply part and the control cabinet are placed on the lower side and are distributed left and right. The power supply part is connected with the control cabinet through a cable, the power supply part is placed in a stacking mode, and a maintenance space is reserved between the power supply part and the control cabinet. The control cabinet is in a self-rotating mode. According to the intensive assembling cabinet for the large semiconductor equipment, the front face and the back face of the power supply part are maintained through organization layout and the reserved maintenance space, and the rotating function of the control cabinet in the self-rotating mode is used for maintaining the front face and the back face of the control cabinet. The first radiating channel is used for pumping and draining the heat of the power supply part and the control cabinet. Meanwhile, space units for radiating, maintaining and cable placing are merged, and therefore intensive assembling is achieved.