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Wavefront quality detection device and method for large-aperture collimation system

A collimation and wavefront technology, applied in the field of optical detection, to achieve the effect of large field of view, cost reduction, and high reconstruction accuracy

Active Publication Date: 2011-11-23
BEIJING INSTITUTE OF TECHNOLOGYGY
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Problems solved by technology

[0009] The present invention also aims at the deficiency that the existing Shack-Hartmann detection collimation system cannot be directly used for the detection of the wavefront quality of the large-diameter collimation system, and proposes a wavefront quality detection device suitable for the large-diameter collimation system, and The device applies the above-mentioned mixed-mode reconstruction method, which can improve the reconstruction accuracy

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Embodiment Construction

[0038] The invention provides a large-diameter collimation system wavefront quality detection device, the basic idea of ​​which is: use a beam expander system with a beam expansion ratio <1 to couple the large-diameter wavefront to be measured to a Shaker-Hartmann sensor, and use a computer The light spot array formed by the Shack-Hartmann sensor is solved to obtain the wavefront quality information of the collimation system to be tested. Wherein, the beam expander system adopted in the present invention is not a refraction beam expander system, but a reflective beam expander system (beam expansion ratio<1), which uses two parabolic reflectors to reduce the wavefront aperture.

[0039]It can be seen that the present invention uses a reflective beam expander system, which has a larger field of view, and the use of paraboloids can accurately correct positional chromatic aberration and third-order spherical aberration, and the actual two confocal paraboloids have coma, but the ove...

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Abstract

The invention discloses a wavefront quality detection method for a collimation system and a wavefront quality detection device suitable for a large-aperture collimation system. The method comprises the following steps of: acquiring the wavefront slopes Stest of all sub apertures of a micro lens array according to data acquired by a photoelectric detector; substituting Stest into a model method reconstruction formula by a model method of a wavefront reconstruction algorithm to solve the expansion coefficient of a Zernike polynomial and discrete point wavefront phases Wmodal of all apertures; substituting the expansion coefficient into the model method reconstruction formula to solve a group of wavefront slopes Smodal of all sub apertures; calculating the deference of Stest and Smodal of all apertures to obtain the slop Sleft; substituting Sleft into an area method reconstruction formula by an area method in the wavefront reconstruction algorithm to solve the discrete point wavefront phases Wleft of all apertures; and superposing the Wmodal and Wleft to obtain wavefront phases so as to determine the beam quality of the collimation system to be detected. By the method and the device, reconstruction accuracy can be improved.

Description

technical field [0001] The invention relates to a large-diameter collimation system wavefront quality detection device and method based on a Shack-Hartmann sensor, belonging to the field of optical detection. Background technique [0002] The beam emitted from the laser often has a certain divergence angle. In order to use the focusing mirror to obtain a high power density spot, in the projection system and focusing system, a beam expander system is used to reduce the divergence angle of the laser beam and improve its parallelism. In actual use, due to the influence of error propagation, etc., the wavefront quality of parallel beams will change. In order to ensure a high power density spot, the wavefront quality of the parallel beam of the collimation system must be tested. [0003] At present, there are many methods for testing the wavefront quality of parallel beams, which are roughly divided into self-collimation method, shearing interference method, Talbert self-imagin...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01M11/02G01J9/00
Inventor 李艳秋王建峰刘克
Owner BEIJING INSTITUTE OF TECHNOLOGYGY
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