143 results about "Reference mirror" patented technology

The invention relates to the technical field of laser ranging, in particular to a double-optical-comb hybrid ranging device which comprises a signal detection optical path system and a signal demodulation optical path system. Wherein the signal detection optical path system comprises a first optical frequency comb, a first optical isolator, a first optical collimator, a first beam splitter prism, a reference mirror, a Faraday rotator, a convergence mirror and a target reflector; the signal demodulation optical path system comprises a second optical frequency comb, a second optical isolator, a second optical collimator, a half-wave plate, a second beam splitter prism, a third beam splitter prism, a first polarization controller, a first photoelectric detector, a reflector, a polarization beam splitter prism, a second polarization controller and a second photoelectric detector. A third polarization controller; and a third photoelectric detector. According to the invention, three ranging technologies of asynchronous optical sampling ranging, multi-heterodyne interference ranging and synthetic wavelength ranging are fused, and the problem that a large ranging range and high ranging precision cannot be simultaneously considered in the ranging process is solved.

The invention discloses an optical coherence tomography device for optimizing aberration digital compensation and an imaging method, the device comprises an optical coherence tomography device and an image processing module, and the optical coherence tomography device comprises an illumination module, an interference module, an area array detection module and a synchronous control module. The imaging method comprises the following steps: setting device light source parameters according to coherent gating, and determining a sampling matching relation of the area array detection module according to a sampling theorem; selecting a frequency sweeping mode or a time domain mode, electrifying to activate a corresponding light source and a synchronous time sequence, and adjusting the position of a reference mirror; collecting a full-field interference sequence of the area-array camera, performing digital aberration compensation, performing compensation and denoising on volume data of different depths, and exporting a three-dimensional diffraction limit image; and outputting a three-dimensional tomographic image with transverse diffraction limit and axial micron-level resolution. According to the invention, the imaging resolution and the imaging speed of optical coherence tomography are improved under the conditions that the camera specification is reduced, the GPU dependence is reduced and the system cost is reduced.

The invention discloses a coherent interference-based coaxial transceiving line scanning three-dimensional profile measurement system and method. The system comprises a low-coherence light source; the beam splitter is used for collimating light emitted by the low-coherence light source and then dividing the light into two paths; the measuring light is focused into a linear light beam through the cylindrical lens and is emitted to the surface of the to-be-measured sample, and the measuring light reflected by the surface of the to-be-measured sample returns to the beam splitter along the original path; the reference light is emitted to a reference mirror with a certain inclination angle and is reflected back to the beam splitter through the reference mirror; the measuring light reflected by the surface of the sample to be measured and the reference light reflected by the reference mirror are subjected to beam combination interference through a beam splitter and are imaged to enter a camera for interference pattern acquisition; the signal processing system is used for processing the interference patterns to obtain height distribution of the to-be-measured sample on a line field, and three-dimensional profile measurement of the to-be-measured sample is realized by transversely moving or transversely scanning the to-be-measured sample and overlapping the interference patterns measured at different positions. Therefore, high-efficiency measurement can be realized while the micro-nano precision is kept.

The invention relates to the technical field of optical precision measurement, in particular to a rotation and translation absolute calibration method based on a nerve radiation field, a medium and equipment. The method comprises the following steps: acquiring at least three groups of interference measurement data of a measured mirror under original, rotation and translation poses by using an interference measurement system to be calibrated, inputting pixel coordinates and position coding information in the data into a neural radiation field network, optimizing network parameters through a self-supervised training strategy, and completing calibration of a reference mirror surface shape. Compared with a traditional Zernike method, the scheme adopts a neural radiation field to construct a double-branch network, can adaptively learn complex surface shape space distribution, and improves medium-high frequency error separation precision; the error of the reference mirror and the measured mirror is synchronously and directly output by double branches without successive dependence, so that error transmission and accumulation are avoided; the self-supervised training mechanism implicitly compensates pose deviation and noise interference through redundancy constraint, and shows higher engineering robustness.

The application provides a high-precision autocollimator based on the Tyman Green interference principle and an angle measuring method, aiming at solving the problem that the prior art cannot continue to break through the existing angle measuring precision due to the limitation of geometric optical principle and the influence of environmental factors. The autocollimator comprises a laser, a filtering collimation module, a beam splitter, a reference mirror, a plane mirror, a detector and a data acquisition and processing computer. After the autocollimator is leveled, the plane mirror is placed on a turntable to be measured, and the measurement is carried out when the turntable has no rotation angle and has a rotation angle, so that the laser is emitted to the filtering collimation module to be emitted as monochromatic parallel light to the beam splitter and is divided into two paths. One path is reflected by the plane mirror and then passes through the beam splitter to reach the detector again. The other path is reflected by the reference mirror and then reflected by the beam splitter to reach the detector again. The two beams interfere on the target surface of the detector, the detector records the interference image and uploads it to the computer to calculate the interference fringe offset, so that the angle measurement is completed.

In order to solve the technical problems that a conventional reflector antenna electrical axis direction calibration method is relatively complex and the error is relatively large when the conventional reflector antenna electrical axis direction calibration method is applied to a reflector antenna of which a mechanical axis is not easy to determine, the invention provides a reflector antenna electrical axis direction calibration method. A reference point tool coordinate system measured by a laser tracker and a reference point tool coordinate system tested by a photogrammetry camera are used as transfer, an incidence relation between an antenna coordinate system and a plane scanning frame coordinate system is established, and finally, the plane scanning frame coordinate system is obtained by combining the measured electric axis direction under the plane scanning frame coordinate system. And the electric axis direction under the antenna coordinate system can be obtained. The mechanical axis of the antenna does not need to be tested, a reference mirror is not needed, only one laser tracker and one photogrammetry camera are needed for testing, the testing method is simpler, the testing efficiency is higher, for the antenna of which the mechanical axis is not easy to determine, errors caused by fitting of the mechanical axis are avoided, and the testing precision is improved. The electric axis obtained by the method is more accurate in pointing.

The invention relates to a laser interference surface type measurement method using random mechanical disturbance for resolving. The method comprises the following steps: acquiring an interference image of a measured element by using a surface type measurement device based on laser interference; applying random mechanical disturbance to the surface type measuring device to cause the change of the relative pose between the reference mirror and the measured element so as to acquire N frames of interference images in different disturbance states; and processing the acquired interference images through a natural phase decoding algorithm to obtain the surface topography of the measured element. Compared with the prior art, high-precision measurement of the surface type of the measured element can be realized without vibration isolation equipment and a high-precision phase shifter, and the method has the advantages of low cost, low system complexity and high adaptability.

The invention discloses a high-precision guide rail angle swing error measuring device and method based on a pen type interference principle, and relates to the technical field of ultra-precision machining and detection. The beam splitter prism is arranged in front of the monochromatic laser, the linear polarizer is arranged between the beam splitter prism and the monochromatic laser, the two cube-corner prisms are arranged on a reflection light path and a transmission light path of the beam splitter prism, the half-wave plate is arranged on an emergent light path of the beam splitter prism, the polarizing beam splitter is arranged behind a light path of the half-wave plate, and the quarter-wave plates are arranged on the reflection light path and the transmission light path of the polarizing beam splitter respectively. One light path is selected as a laser emergent window direction to arrange the plane optical flat, the reference mirror is arranged on the other light path, the Fourier lens is arranged on an emergent light path of the polarizing beam splitter, and the photoelectric detector is arranged on a focal plane. The angle swing error of the guide rail can be measured in real time in place, the measurement resolution not lower than 5 arc seconds and the RMS repeated measurement precision of 10 nm are achieved, the overall structure is simple, and installation, adjustment and maintenance are convenient.

This invention relates to an interferometric measurement method and apparatus for large warp wafers, belonging to the field of optical detection and semiconductor measurement technology. The detection light is polarized and birefringently split to form P-beams and S-beams, which are then further divided into P-reference beams, S-silicon beams, S-reference beams, and P-silicon beams, respectively. By adjusting the spatial orientation of the reference mirror and the wafer under test, and using an aperture for spatial filtering, the P-reference beam and S-silicon beam are allowed to enter the subsequent optical path, while the S-reference beam and P-silicon beam are blocked. The S-silicon beam forms a measurement wavefront carrying information about the surface shape of the wafer under test. The P-reference beam is modulated by a deformable mirror to form a modulated reference wavefront similar to the measurement wavefront. The two form a resolvable interference fringe pattern at the camera. A wavefront sensor measures the surface shape information of the deformable mirror, and a calculation system obtains the surface shape information of the wafer under test based on the deformable mirror surface shape information and the relative surface shape change. This invention can reduce the interference fringe density in the detection of large warp wafers, reduce splicing measurement errors, and improve detection efficiency and accuracy.

The invention discloses a device and a method for synchronously detecting the focal length and the surface topography of a micro-lens array, which can realize synchronous detection on the focal length and the surface topography of the micro-lens array through a set of system, realize mutual matching between two parts of results and greatly shorten the detection time. The device comprises a first monochromatic laser light source (1), a first collimating lens (2), an attenuation sheet (3), a reflector (4), a microlens array sample (5), a microscope objective (6), a barrel lens (7), a first quarter-wave plate (8), an area array detector (9), a first monochromatic optical filter (10), a second monochromatic laser light source (11), a second collimating lens (12), a linear polarizer (13), a beam splitter prism (14), a polarization beam splitter prism (15), a second quarter-wave plate (16) and a reference lens (17). A third quarter-wave plate (18), a second monochromatic optical filter (19) and a polarization camera (20).

The application discloses a multi-axis laser interferometer optical axis space position positioning system and a positioning method, which comprises XYZ three-axis laser interferometer optical axis perpendicular adjustment and XYZ three-axis laser interferometer optical axis space intersection adjustment; wherein the optical axis perpendicular adjustment is to move a turntable independent measurement frame into a space coordinate system vertical reference mirror, to adjust the Z, Y and X axis laser interferometers of the turntable independent measurement frame in sequence according to displacement information and energy signals displayed on a display terminal until the displacement information is the minimum and the energy signal is the maximum; and the optical axis space intersection adjustment is to move a standard reference sphere above the turntable independent measurement frame, to adjust the Z, Y and X axis laser interferometers of the turntable independent measurement frame in sequence until the displacement information is the minimum and the energy information is the maximum. The application is simple in operation, fast in laser interferometer space position adjustment, and can realize high-precision positioning of multi-axis laser interferometer optical axes in space positions.

The present invention relates to a scanning hologram interferometer using a reference mirror. According to the present invention, provided is a scanning hologram interferometer comprising: a scan beam generation unit which modulates the phase of a first beam in a light source to convert the first beam into a first curvature beam, converts a second beam into a second curvature beam, and then interferes the first and second curvature beams to form a scan beam; a scanning unit which controls the scanning position of the scan beam in the horizontal and vertical directions and transmits the scan beam to a reflective object to scan the object by using the scan beam; a beam splitter which is disposed between the scanning unit and the object and transmits and reflects an incident beam, thereby splitting the beam; a reference mirror which is disposed on the upper side of the beam splitter and reflects an incident beam; a photodetector which is disposed on the lower side of the beam splitter and detects beams that have reflected off the object and the reference mirror and passed through the beam splitter; and an electronic processing unit which processes signals detected by the photodetector, thereby generating a hologram of the object.

This invention discloses an absolute measurement device and method for the second-order term of the surface shape of an X-ray plane mirror. The device includes a clamping platform, an interferometer, and a rotating stage. The rotating stage has a rotatable mounting platform for the mirror under test and a reference mirror mounting plate. The mounting platform is positioned in front of the interferometer's plane lens to fix the X-ray plane mirror under test. The reference mirror mounting plate has a mounting platform for a reference mirror, on which a reference plane mirror is mounted. The reference plane mirror reflects the light reflected from the X-ray plane mirror under test back to the interferometer's plane lens to measure the surface shape of the mirror. This invention aims to achieve high-precision absolute measurement of the second-order term surface shape of an X-ray plane mirror, improve measurement accuracy, and provide guiding surface shape measurement results for the manufacturing of high-precision X-ray plane mirrors.

Provided are an optical inspection device capable of accurately obtaining the film thickness of a film covering a sample even when there is a difference in spatial intensity distribution between irradiation light to the sample and irradiation light to a reference mirror, and a control method therefor. The optical inspection device includes: a light source that emits light; a beam splitter that splits the light emitted from the light source into first irradiation light directed toward a sample and second irradiation light directed toward a reference mirror; an interference light measurement unit that measures interference light due to object light which is reflected light of the first irradiation light from the sample and reference light which is reflected light of the second irradiation light from the reference mirror; and a control unit that controls each unit. The optical inspection device is characterized by further including: an object light measurement unit that measures the intensity of only the object light; and a storage unit that stores the intensity of the object light of a reference sample measured in advance by the object light measurement unit. The control unit is characterized by obtaining the film thickness of a film covering an observation sample on the basis of the intensity of the object light of the reference sample and the intensity of the object light of the observation sample measured by the object light measurement unit.

The invention provides a satellite-borne product installation precision testing device and method. The satellite-borne product installation precision testing device comprises a single-machine product, a reference mirror LJ1 assembly, a satellite platform and a reference mirror LJ2 assembly. According to the invention, the assembly precision test of the satellite product is realized through a high-precision measurement system, and the assembly precision is rapidly calculated, and the adjustment direction and the adjustment amount are directly given in an Euler rotation angle mode, so that rapid calculation and accurate orientation adjustment are realized; a reference mirror is used as a measurement basis, an electronic theodolite is used as test equipment, industrial measurement software (SA) is matched for use, and the size requirement and the use method of the reference mirror are provided. The method has the advantages that the error rate of testing and adjusting is effectively avoided, and the method is simple, easy to understand and high in operation adaptability; the device is suitable for assembly precision test and adjustment of all aerospace products.

This invention relates to a lightweight, miniaturized 3S configuration triaxial integrated fiber-MEMS inertial measurement unit, belonging to the field of measurement devices. It includes a base cover, a power supply and detection board assembly located on the top of the base cover, a light source assembly located above the power supply and detection board assembly, a MEMS assembly mounted above the light source assembly, a base fixed to the base cover, fiber optic ring assemblies fixed to the base, and a reference mirror fixed to the top of the base. The power supply and detection board assembly, the light source assembly, and the MEMS assembly are all arranged inside the base. The three fiber optic ring assemblies are evenly distributed on a conical surface with an outer half-cone angle of 54.74° and a bottom projection of 120°. The light source assembly shares a light source with the three fiber optic ring assemblies via a 1*3 coupler. This invention eliminates the unnecessary space occupied by the traditional three independent light source configuration, reduces the overall volume, and improves optical path consistency and system stability. It can meet the engineering requirements of commercial satellite platforms for the miniaturization and mass production of inertial measurement components.

The invention discloses an antenna reference mirror coordinate system measurement calibration method and an antenna assembly precision measurement method, and the calibration method comprises the steps: 1, determining the normal direction of the mirror surface of each reference mirror through employing the optical imaging principles of reflection and plane mirrors; step 2, carrying out point position measurement on the three orthogonal surfaces of the reference mirror through a laser tracker to obtain a three-dimensional coordinate of the geometric center of the reference mirror; step 3, determining a third axial direction of the reference mirror coordinate system, establishing the reference mirror coordinate system, and establishing conversion parameters of the reference mirror coordinate system; step 4, establishing an antenna coordinate system on the basis of the measurement coordinate system of the laser tracker; determining conversion parameters of an antenna coordinate system relative to a laser tracker measurement coordinate system; and step 5, obtaining calibration parameters of the reference mirror coordinate system relative to the antenna part assembly mechanical structure coordinate system according to the results of the step 3 and the step 4. According to the invention, the precision and reliability of the measurement process are improved on the basis of improving the calibration efficiency and saving resources.

The invention relates to a system (1) for digital holographic imaging, comprising at least the following components: a beam splitter (2) that defines four sides with a beam splitter surface (2a), a retroreflector array (3) that is arranged on the second or the third side (22, 23) and comprises a plurality of retroreflector elements (30), and a reference mirror (4) that is arranged on an adjacent side (23, 22) to the retroreflector array (3), wherein the system (1) is configured to impress wavelength-dependent phase shifts on object light (100) for each retroreflector element (3), said phase shifts being different for a plurality of retroreflector elements (3).

The application discloses a kind of optical synthetic aperture imaging system sub-aperture baseline accurate measurement methods, the method specifically is: first, two femtosecond laser ranging probes are installed on respective miniature adjusting frame in opposite direction, ensure that optical axis is parallel, opposite direction is regarded as sub-aperture baseline measuring instrument, it is placed in the reference mirror of known interval and carries out two probe interval calibration, then it is respectively moved to each sub-aperture primary mirror and the conical lens installed on system optical axis, the distance of each sub-aperture primary mirror and fixed conical lens is measured respectively, then according to the structure parameters of sub-aperture and conical lens, the entrance pupil baseline is calculated.The method solves the problem that the sub-aperture entrance pupil baseline in the optical synthetic aperture imaging system with variable baseline and invariable baseline is difficult to accurately and simply measure, provides technical support for the measurement and control of imaging system pupil mapping error, and further provides technical support for the observation field of view and observation efficiency of imaging system.

The invention relates to the technical field of optical detection, and discloses a self-calibration method, system and equipment for a high-precision spliced interferometer, and the method comprises the steps: obtaining a plurality of sub-aperture measurement data obtained by testing a detected mirror through an interferometer in a random stepping mode; performing first-step calibration according to the measurement data of the plurality of sub-apertures to obtain a first reconstructed surface shape of a reference mirror and a first reconstructed full-aperture surface shape of a measured mirror in the interferometer; and performing second-step calibration according to the first reconstructed surface shape and the first reconstructed full-aperture surface shape to obtain a second reconstructed surface shape of the reference mirror and a second reconstructed full-aperture surface shape of the measured mirror. On the premise that extra hardware is not introduced, absolute surface shape reconstruction of the reference mirror and the measured mirror in splicing interference measurement is achieved only through algorithm innovation, high-precision calibration and elimination of second-order out-of-focus item errors in the meridional direction are achieved, namely absolute calibration can be achieved only through data processing, key second-order errors are calibrated, and the accuracy of calibration is improved. And the detection accuracy of the optical element is improved.

The present application relates to the technical field of semiconductor detection, and particularly relates to a metrology device and a control method thereof, the metrology device comprising: a detection module and a shell connected with each other, one end of the detection module facing the shell is a reference mirror, and the reference mirror and the shell enclose a detection cavity; a carrier and an air floating table, the carrier and the air floating table are both arranged in the detection cavity, and the carrier is located between the air floating table and the reference mirror, and the carrier is used for carrying a wafer; when the wafer is measured, the carrier clamps the edge of the wafer to fix the wafer in a detection station, one side surface of the wafer faces the reference mirror, another side surface of the wafer faces the air floating table, and the part of the detection cavity between the wafer and the reference mirror forms an air-tight cavity. The present application is at least beneficial to reduce the measurement error.

The application belongs to the field of optical precision measurement, and provides a multi-surface phase shift interferometry method and system based on LSTM, which comprises the following steps: placing a test mirror at a distance of alpha from a reference mirror, sampling the interferometer optical path at a preset sampling timing when wavelength tuning is performed, calculating the phases corresponding to the first interference cavity, the second interference cavity and the third interference cavity based on the central wavelength, calculating the light intensity at the receiving end of the interferometer based on the phases, and obtaining a light intensity matrix; inputting the light intensity matrix as a training data set and the phases as labels into a neural network based on LSTM for training, and obtaining a solving network after the training is completed; placing a mirror to be measured at a distance of alpha from the reference mirror, collecting an interference pattern photo and converting it into a gray scale matrix, inputting the gray scale matrix into the solving network, obtaining a phase value, unwrapping the phase value, and obtaining the surface shape of the mirror to be measured. Compared with the prior art, the application provides a method for accurately reconstructing the surface shape under non-ideal phase shift conditions.

An interference measuring device (100) comprises: an optical splitting element (50) that splits light from a light source into measurement light and reference light on a split surface (51) and emits the same; a reference mirror (60) that reflects the reference light (42); and a light-condensing optical system (CS) on which return light of the measurement light (43) irradiated onto a measurement object (W) is incident through the optical splitting element (50). The optical splitting element (50) comprises: a first optical surface (P1) through which passes the measurement light (43) from the split surface (51); and a second optical surface (P2) through which passes the reference light (42) from the split surface (51). The first optical surface (P1) is inclined with respect to a plane (V1) perpendicular to and intersecting an optical axis (I1) of the light-condensing optical system (CS), and the second optical surface (P2) is inclined with respect to a reflecting surface (61) of the reference mirror (60).

The present invention relates to an off-axis scanning hologram interferometer using a reference mirror. According to the present invention, provided is an off-axis scanning hologram interferometer comprising: a scan beam generation unit for modulating a phase of a first beam from a light source to convert the first beam into a first curvature beam, converting a second beam into a second curvature beam, and then interfering the first and second curvature beams to form a scan beam; a scan unit for controlling a scanning position of the scan beam in horizontal and vertical directions and transmitting the scan beam to an object so as to scan the object, which is a reflective object, using the scan beam; a beam splitter disposed between the scan unit and the object to transmit and reflect an incident beam so as to split the beam; a reference mirror installed on the upper side of the beam splitter so as to be inclined at a set angle with respect to a z-axis direction perpendicular to a surface (x, y plane) of the object, and reflecting the incident beam; a photodetector disposed on the lower side of the beam splitter to detect a beam reflected from the object and the reference mirror and passing through the beam splitter; and an electronic processing unit for processing a signal detected by the photodetector to generate a hologram of the object.

An OCT system includes a broadband light source, and a beam splitter that splits the broadband light into a reference beam and an illumination beam. A reference mirror reflects the reference beam. Illumination optics passes the illumination beam and has a reflective surface with an optical power. Collection optics has a transparent region and a reflective surface with an optical power. The collection optics is configured so that the illumination beam is reflected from the reflective surface of the collection optics to the reflective surface of the illumination optics such that the illumination beam is redirected to a surface of a sample at an angle that results in scattering from within the sample that forms a sample beam propagating normal to a surface of the sample and through the transparent region of collection optics and through the transparent region of the illumination optics. An interferometric combiner is configured to interferometrically combine light from the sample beam and the reference beam. A spectrometer is configured to receive the interferometrically combined light from the sample beam and the reference beam and to generate spectral interferometric information. A processor processes the spectral interferometric information to determine information about the sample.

The present application belongs to the technical field of natural gas hydrocarbon dew point measurement, and particularly relates to a natural gas hydrocarbon dew point measurement system and method based on double-region reference interferometric distance measurement. The system and method pre-process the sample to be detected, divide the sample into two paths, pass the measurement gas and the remaining reference gas into the measurement mirror surface and the reference mirror surface of the dew point measurement device respectively, and synchronously collect the interference signals of the reflected light of the two regions. The system and method extract the direct current component through low-pass filtering of the cutoff frequency, calculate the phases of the measurement region and the reference region respectively, introduce a temperature-pressure cross compensation model and a quadratic baseline drift compensation model, calculate the dynamic differential phase, calculate the mean value, standard deviation and change rate of the thickness, and determine whether the hydrocarbon dew point is reached by using a multi-condition judgment threshold. The system and method realize the anti-mirror surface pollution and aging in the actual process of hydrocarbon dew point measurement, accurately determine the condensation dew point, and improve the detection sensitivity and precision.

The system may include an imaging subsystem, a focusing subsystem, and a processor. The imaging subsystem includes a light source configured to emit light, a main objective lens configured to focus the light onto a sample, and a camera configured to generate one or more images of the sample based on the light emitted from the light source reflected by the sample. The focusing subsystem includes a reference objective lens configured to focus a portion of the light onto a reference mirror that is reflected and collocated with the light reflected by the sample, and a spectrometer configured to generate an interference signal based on the collocated light reflected by the sample and the reference mirror. The processor is configured to transform the interference signal from a time-domain signal to a frequency-domain signal and determine a defocus condition of the imaging subsystem based on the frequency-domain signal.

This interference observation device is provided with: a light source; an interference optical system that has a reference mirror, divides the light output from the light source into first light and second light, and outputs interference light of the first light reflected by the object to be observed and the second light reflected by the reference mirror; an imaging element that detects interference light; and a processing unit that acquires an interference image on the basis of the detection result of the imaging element. The interference optical system has a means for changing the focus condition of the optical path of the second light. The processing unit separates the observation surface information from the non-observation surface information on the basis of a plurality of interference images when the focus condition of the optical path of the second light is changed in a state in which the focus of the first light is focused on the observation surface of the object to be observed.

The invention relates to a system (1) for digital holographic imaging, comprising at least the following components: - a beam splitter (2), - a retroreflector array (3) comprising a plurality of retroreflector elements (30), - a reference mirror (4), wherein the system (1) is configured to superimpose the object light (100) reflected off the reference mirror (4) and off the retroreflector array (3) such that a plurality of interference patterns that can be assigned to the respective retroreflector elements (30) are produced, wherein the system (1) has a phase-adapting optical structural component (5) for predefined phase adaptation of the object light (100), characterized in that the phase-adapting optical structural component has an assigned angle-of-incidence / phase relation (1000) for each of a predefined plurality of incidence directions (e) of the object light (100), wherein the phase-adapting optical structural component (5) is configured to impress phases (Φ) on the object light (100) in accordance with the assigned angle-of-incidence / phase relation (1000) for each of said plurality of incidence directions such that the interference patterns comprise information with which a hologram correspondingly reconstructed from said interference patterns has an improved resolution with respect to a system (1) without the predefined phase adaptation.

The present application relates to the technical field of spacecraft attitude control, and particularly relates to a load attitude determination method and device based on an included angle monitoring star sensor, wherein the method comprises: obtaining angle conversion relationships between a reference mirror coordinate system and a star sensor measurement coordinate system, between a central prism coordinate system and the reference mirror coordinate system, and between the central prism coordinate system and a star sensor monitoring coordinate system in a ground phase; obtaining angle conversion relationships between the central prism coordinate system and the star sensor monitoring coordinate system, and between the star sensor measurement coordinate system and a J2000 coordinate system in an on-orbit phase; and combining a corresponding relationship between the star sensor measurement coordinate system and the star sensor monitoring coordinate system to determine an angle conversion relationship between the central prism coordinate system and the J2000 coordinate system in the on-orbit phase. The present application can obtain high-precision load pointing.