28 results about "Reference mirror" patented technology

This invention relates to an interferometric measurement method and apparatus for large warp wafers, belonging to the field of optical detection and semiconductor measurement technology. The detection light is polarized and birefringently split to form P-beams and S-beams, which are then further divided into P-reference beams, S-silicon beams, S-reference beams, and P-silicon beams, respectively. By adjusting the spatial orientation of the reference mirror and the wafer under test, and using an aperture for spatial filtering, the P-reference beam and S-silicon beam are allowed to enter the subsequent optical path, while the S-reference beam and P-silicon beam are blocked. The S-silicon beam forms a measurement wavefront carrying information about the surface shape of the wafer under test. The P-reference beam is modulated by a deformable mirror to form a modulated reference wavefront similar to the measurement wavefront. The two form a resolvable interference fringe pattern at the camera. A wavefront sensor measures the surface shape information of the deformable mirror, and a calculation system obtains the surface shape information of the wafer under test based on the deformable mirror surface shape information and the relative surface shape change. This invention can reduce the interference fringe density in the detection of large warp wafers, reduce splicing measurement errors, and improve detection efficiency and accuracy.

This invention relates to a lightweight, miniaturized 3S configuration triaxial integrated fiber-MEMS inertial measurement unit, belonging to the field of measurement devices. It includes a base cover, a power supply and detection board assembly located on the top of the base cover, a light source assembly located above the power supply and detection board assembly, a MEMS assembly mounted above the light source assembly, a base fixed to the base cover, fiber optic ring assemblies fixed to the base, and a reference mirror fixed to the top of the base. The power supply and detection board assembly, the light source assembly, and the MEMS assembly are all arranged inside the base. The three fiber optic ring assemblies are evenly distributed on a conical surface with an outer half-cone angle of 54.74° and a bottom projection of 120°. The light source assembly shares a light source with the three fiber optic ring assemblies via a 1*3 coupler. This invention eliminates the unnecessary space occupied by the traditional three independent light source configuration, reduces the overall volume, and improves optical path consistency and system stability. It can meet the engineering requirements of commercial satellite platforms for the miniaturization and mass production of inertial measurement components.

The present application relates to the technical field of semiconductor detection, and particularly relates to a metrology device and a control method thereof, the metrology device comprising: a detection module and a shell connected with each other, one end of the detection module facing the shell is a reference mirror, and the reference mirror and the shell enclose a detection cavity; a carrier and an air floating table, the carrier and the air floating table are both arranged in the detection cavity, and the carrier is located between the air floating table and the reference mirror, and the carrier is used for carrying a wafer; when the wafer is measured, the carrier clamps the edge of the wafer to fix the wafer in a detection station, one side surface of the wafer faces the reference mirror, another side surface of the wafer faces the air floating table, and the part of the detection cavity between the wafer and the reference mirror forms an air-tight cavity. The present application is at least beneficial to reduce the measurement error.

An OCT system includes a broadband light source, and a beam splitter that splits the broadband light into a reference beam and an illumination beam. A reference mirror reflects the reference beam. Illumination optics passes the illumination beam and has a reflective surface with an optical power. Collection optics has a transparent region and a reflective surface with an optical power. The collection optics is configured so that the illumination beam is reflected from the reflective surface of the collection optics to the reflective surface of the illumination optics such that the illumination beam is redirected to a surface of a sample at an angle that results in scattering from within the sample that forms a sample beam propagating normal to a surface of the sample and through the transparent region of collection optics and through the transparent region of the illumination optics. An interferometric combiner is configured to interferometrically combine light from the sample beam and the reference beam. A spectrometer is configured to receive the interferometrically combined light from the sample beam and the reference beam and to generate spectral interferometric information. A processor processes the spectral interferometric information to determine information about the sample.

The present application belongs to the technical field of natural gas hydrocarbon dew point measurement, and particularly relates to a natural gas hydrocarbon dew point measurement system and method based on double-region reference interferometric distance measurement. The system and method pre-process the sample to be detected, divide the sample into two paths, pass the measurement gas and the remaining reference gas into the measurement mirror surface and the reference mirror surface of the dew point measurement device respectively, and synchronously collect the interference signals of the reflected light of the two regions. The system and method extract the direct current component through low-pass filtering of the cutoff frequency, calculate the phases of the measurement region and the reference region respectively, introduce a temperature-pressure cross compensation model and a quadratic baseline drift compensation model, calculate the dynamic differential phase, calculate the mean value, standard deviation and change rate of the thickness, and determine whether the hydrocarbon dew point is reached by using a multi-condition judgment threshold. The system and method realize the anti-mirror surface pollution and aging in the actual process of hydrocarbon dew point measurement, accurately determine the condensation dew point, and improve the detection sensitivity and precision.

The interference optical module includes: a housing having a first wall portion provided with a mounting structure; a beam splitter that outputs first light and second light by splitting the light, and outputs interference light by combining the first light and the second light; a first objective lens located on a first optical path of the first light; and a reference mirror and a second objective lens located on a second optical path of the second light. The beam splitter, the first objective lens, the reference mirror, and the second objective lens are supported by the first wall section within the housing such that the first optical path and the second optical path extend along a plane that is biased toward the first wall section side with respect to the center of the width of the housing in the thickness direction of the first wall section.

This invention provides an optical phase-shifting interferometry detection device and method, relating to the field of optical detection technology. The optical phase-shifting interferometry detection device includes a phase-shifting interferometry system and a spectral domain interferometry system. A moving platform is used to induce a small random displacement in a reference mirror or sample, introducing a randomly varying phase shift into the reference light and sample light. Simultaneously, the spectral domain interferometry system detects the overall vibration and random phase shift of the reference mirror or sample in the phase-shifting interferometry system. The obtained phase shift is used to calculate the optical path difference on the sample surface, thus obtaining the surface morphology of the sample.

The present application relates to a kind of big warping wafer interference measurement method and device, belong to optical detection and semiconductor measurement technical field.Detection light is converted and diffracted after birefringence, and P light and S light are formed, and P reference light, S silicon light, S reference light and P silicon light are formed respectively;By adjusting the spatial posture of reference mirror and the wafer to be measured, and cooperating with spatial screening of diaphragm, P reference light and S silicon light enter subsequent optical path, while S reference light and P silicon light are blocked;S silicon light forms the measurement wave front carrying the wafer to be measured surface shape information, P reference light is modulated as the modulation reference wave front similar to the measurement wave front by deformable mirror, and the two form analytical interference fringe pattern at camera;Wave front sensor measures deformable mirror surface shape information, and the computing system obtains the surface shape information of the wafer to be measured according to deformable mirror surface shape information and relative surface shape variation amount.The present application can reduce the interference fringe density in the detection of big warping wafer, reduce splicing measurement error, improve detection efficiency and accuracy.

The application provides a full-field OCT system based on orthogonal double liquid crystal phase compensation, an imaging method, equipment and a medium, and comprises the following steps: a broadband light source module is used to provide broadband illumination light with a low coherence length; a light splitting module is used to make the broadband illumination light enter a reference arm and a sample arm according to a predetermined proportion; the reference arm is sequentially provided with a first liquid crystal phase modulation component, a first wave plate, a first microscope objective and a fixed reference mirror; the sample arm is sequentially provided with a second liquid crystal phase modulation component, a second wave plate, a second microscope objective and a sample to be measured; a detection module is used to receive an interference signal of the reference arm reflected light and the sample arm backscattered light and to perform photoelectric conversion; and a control module is used to apply a differential driving voltage to the first liquid crystal phase modulation component and the second liquid crystal phase modulation component and to synchronously control a face array camera to collect, so as to solve the problems of stability and defocusing caused by mechanical phase shifting in the FFOCT system and low light energy utilization and dispersion mismatch caused by liquid crystal polarization dependence.

The application discloses a typical laser communication system Kude optical path installation and adjustment method based on a fast reflecting mirror, and comprises the following steps: reflecting a parallel light pipe light beam to a parallel light pipe camera center position through a reference mirror; a fiber collimator emits laser, an optical antenna azimuth direction is rotated through a control coarse tracking turntable, and a transmission light spot position information is acquired through the parallel light pipe camera; the fast reflecting mirror position is adjusted, a Kude optical path pointing rotation error reduction trend is determined, and an accurate reference is provided for Kude optical path installation and adjustment. The method has the characteristics of controllability and rapidity of the fast reflecting mirror in the typical laser communication system, avoids the shortcomings of uncertain direction and low controllability caused by manual control during the existing Kude optical path installation and adjustment, effectively improves the Kude optical path installation and adjustment effect and efficiency, and can be widely applied to the typical laser communication system.

Device for the relative coarse adjustment of a measuring head of a fiber optic laser interferometer and a reflective object to be measured, comprising: a beam splitter designed to split at least one light beam into a reference beam directed towards a reference mirror and an object beam directed towards the object to be measured, a detection surface that enables detection a) an object reflection beam reflected from the object to the beam splitter and b) of a reference reflective beam and / or the reference beam reflected from the reference mirror to the beam splitter, wherein the detection surface is arranged so that it is opposite either a reference mirror or an object to be measured, but not the measuring head where A) the beam splitter is part of a beam splitter cube and one surface of the beam splitter cube is provided with the detection surface, and / or B) the detection surface is designed to be photoluminescent, in particular fluorescent, and can be excited by the reference reflection beam and the object reference beam to emit light with at least one wavelength in the range of 380 nm to 780 nm from the respective point of impact.

A wafer inspection method and a wafer inspection system, said method comprising: acquiring a first light spot position and a second light spot position that are detected by a detector; on the basis of the first light spot position and the second light spot position, adjusting a first inclination of an auxiliary mirror, such that the first light spot position and the second light spot position coincide; adjusting a first axial distance of the auxiliary mirror by means of Michelson interference fringes detected by the detector; introducing a reference objective lens, a measurement objective lens and a third lens into an optical path, and adjusting a second inclination and a first eccentric distance of the reference objective lens by means of detected Linnik interference fringes; and replacing the auxiliary mirror with a reference mirror, the reference mirror and the reference objective lens being fixed on the same mechanical component. By introducing an additional independent auxiliary mirror, which has a higher degree of freedom in adjustment and is not subjected to interference from the reference objective lens, the decoupling of the alignment dimensions between the reference objective lens and the reference mirror can be realized, thereby improving alignment efficiency and accuracy.

This invention belongs to the field of optical precision measurement technology, specifically a phase deflection calibration method based on shear error matching. In the phase deflection calibration process, this invention constructs a pair of shear wavefronts through the spatial translational motion of a reference mirror. Using the normal vector as the evaluation target, two sets of evaluation functions are designed: normal vector error and shear wavefront matching error. Simultaneously, the principle of normal mapping is utilized to accelerate the iterative process of non-planar tracing. Compared with traditional methods, this invention achieves higher precision optical surface reconstruction with a limited number of calibrations and finite pose changes. This invention simplifies the deflection measurement calibration process and enables high-precision surface measurement; it has broad application prospects in the field of optical measurement.

The application relates to the technical field of semiconductor detection, in particular to a measuring device and a control method thereof. The measuring device comprises a first detection module, a shell and a second detection module arranged in sequence, one end of the first detection module facing the shell is a first reference mirror, one end of the second detection module facing the shell is a second reference mirror, the first reference mirror, the shell and the second reference mirror enclose a detection cavity; a carrier is used for carrying a wafer; when the wafer is measured, the carrier carrying the wafer is placed in the detection cavity, one side surface of the wafer faces the first reference mirror, the other side surface of the wafer faces the second reference mirror, part of the detection cavity between the wafer and the first reference mirror forms a first airtight cavity, and part of the detection cavity between the wafer and the second reference mirror forms a second airtight cavity. The application is at least beneficial to reducing measurement errors.

The application relates to a double-reflection terahertz tight-field assembly error compensation method, which comprises the following steps: assembling a main support structure, removing assembly stress through high-temperature aging; installing a main reflector on the main support structure and calibrating the main reflector; marking the current position of the main reflector on a reference mirror on the side of the main reflector, establishing a test coordinate system based on the reference mirror; installing a secondary reflector mounting bottom plate on the main support structure, installing a secondary reflector on the secondary reflector mounting bottom plate and calibrating the secondary reflector; calculating the offset of the final position of a feed source assembly relative to the theoretical position of the feed source assembly; taking the main reflector as a reference, adjusting the position of the feed source assembly based on the offset by using a high-precision six-degree-of-freedom platform so that the feed source assembly is located at the final position. The application effectively reduces the assembly and calibration difficulty of the secondary reflector, and makes the final assembly and calibration precision of the terahertz tight-field system equivalent to the test precision of an optical test instrument, that is, the highest precision that can be achieved.

In order to solve the technical problems of traditional reflector antenna electric axis pointing calibration method being more complex and having larger error when applied to reflector antenna which is not easy to determine mechanical axis, the present application provides a reflector antenna electric axis pointing calibration method, the reference point tool coordinate system measured by laser tracker and the reference point tool coordinate system tested by photogrammetry camera are used as a relay, the correlation between the antenna coordinate system and the plane scanning frame coordinate system is established, and finally the electric axis pointing under the plane scanning frame coordinate system is combined with the measurement, so that the electric axis pointing under the antenna coordinate system can be obtained. The present application does not need to test the mechanical axis of the antenna, does not need to use the reference mirror, and only needs one laser tracker and one photogrammetry camera for testing, so that the testing method is simpler, the testing efficiency is higher, and for the antenna which is not easy to determine the mechanical axis, the electric axis pointing obtained by the method of the present application is more accurate due to the avoidance of the error caused by fitting the mechanical axis.

The invention discloses an interference measurement system light path structure based on parallel optical flat light beam adjustment, which comprises a light beam generation assembly, a light beam interference assembly and a reference measurement assembly, and is characterized in that a parallel optical flat and a rotation adjustment mechanism thereof are arranged in the light beam interference assembly; a reference light beam and a measurement light beam are split by a light splitting element and respectively enter a reference light path and a measurement light path; the parallel optical flat is arranged on a parallel light propagation section in the measurement light path and / or the reference light path, and the transmission light beam generates controllable transverse translation by adjusting the inclination angle of the parallel optical flat, so that the space convergence of the measurement light beam and the reference light beam is realized on the premise of not changing the light beam propagation direction; the reference mirror assembly and the measuring mirror assembly are kept in a fixed posture in the working process of the system and do not participate in light beam convergence adjustment.

This invention relates to the field of satellite technology, and particularly to a static polarity verification method and system for a fire detection system. The static polarity verification method for a fire detection system includes: establishing a reference mirror coordinate system based on the probe reference mirror of the fire detector; using a fire simulator to output directional thermal radiation to the center point and the four quadrants respectively, observing the vector information of the fire point in the reference mirror coordinate system to determine whether the polarity of the fire detector is correct; installing the fire detector with correct polarity on the satellite; simulating satellite operation under a satellite dynamics model, using the fire simulator to output directional thermal radiation to the center point and the four quadrants respectively, and comparing the latitude and longitude information of the fire point with the latitude and longitude information of the nadir point when the satellite is ascending and descending, respectively, to determine whether the polarity of the fire detection system is correct. This invention provides a static polarity verification method and system for a fire detection system, capable of verifying the correctness of the polarity of the fire detection system.

A dual-axis zero-difference interferometer for synchronously measuring positioning accuracy and motion deflection belongs to the field of optical measurement technology. It addresses the problem of developing a compact and easily integrated dual-axis zero-difference laser interferometer. This invention includes a single-frequency laser source, an interferometer group, a first measuring mirror, a second measuring mirror, and a signal processing board. The interferometer group includes a polarizing beam splitter, a first quarter-wave plate, a first reference mirror, a second quarter-wave plate, a second reference mirror, a first photodetector, a first pyramidal prism, a third quarter-wave plate, a second photodetector, a second pyramidal prism, a fourth quarter-wave plate, and a fifth quarter-wave plate. This invention enables synchronous and dynamic measurement of target displacement and angle. The dual-axis measurement results are based on the same wavelength reference and are highly consistent with the effects of laser frequency and power fluctuations, exhibiting better reliability and consistency.

This application provides a lens matching method, storage medium, and program product based on a CIS sensor. The method calculates the principal angle range of the target lens by analyzing the principal angle of the CIS sensor and the lens's principal angle range. Based on this range, the lens parameter range is determined. Then, for each set of lens parameters within this range, the corresponding comprehensive resolution index, depth of field, and comprehensive aberration index are calculated. A first reference lens focal length is determined based on the comprehensive resolution index, a second reference lens focal length is determined based on the depth of field, and a third reference lens focal length is determined based on the comprehensive aberration index. Finally, the target focal length is obtained from the first, second, and third reference lens focal lengths. Based on the target focal length, the lens selection result is determined. This method solves the problem of low matching accuracy between lenses and CIS sensor-based image acquisition devices.

The application provides a precise assembling and adjusting method of a finite conjugate off-axis four-mirror optical system, which is suitable for solving the problems of the existing off-axis multi-mirror optical system assembling and adjusting method, such as difficult control of high-precision relative positions of multiple mirrors, easy generation of large aberration, and difficult calibration and correction of conjugate image points. The method first completes the assembling of the reference mirror of the off-axis multi-mirror optical system by the multi-sensing cooperative measurement and CGH common reference interference control of M2 and M4 mirrors, combines the measurement target ball to position and mark the coordinate position points of the optical system image points, uses the PSM to calibrate the ball center image position and record, and completes the precise positioning of the spherical mirror. According to the real-time detection of the wave aberration, the M3 mirror position is adjusted until the optical indicators completely meet the requirements, and the precise assembling and adjusting of the finite conjugate off-axis four-mirror optical system is completed. The method realizes the high-precision cooperative assembling and adjusting of the off-axis multi-mirror system, reduces the difficulty of assembling and integrating, and significantly improves the assembling and adjusting efficiency and the image quality control ability.

The present application relates to the technical field of KODAR optical path adjustment, and particularly relates to a kind of adjustment system and method for KODAR optical path in two-axis four-frame;A kind of adjustment system for KODAR optical path in two-axis four-frame, comprising: autocollimator, reference mirror and adjustment platform;It further comprises on the adjustment platform: outer folding light path adjustment structure, based on right triangle structure adjustment;Inner receiving light path adjustment structure, by reference mirror D and theodolite C constitute inner receiving sighting light path;Inner receiving sighting light path and the other side right angle in outer folding light path adjustment structure, constitute parallel structure;Inner folding light path adjustment structure, by theodolite D being arranged in two-axis four-frame and a reference mirror E being mounted on export light path, and further combined with the two sighting light paths being orthogonally arranged with theodolite D.The present application makes full use of the relationship between structures and theodolite mutual sighting principle on the basis of traditional adjustment method, improves the adjustment accuracy, and reduces the cost.

The application discloses a large laser gyroscope and an optical path monitoring system and a monitoring method thereof, and an optical path correction system and a correction method thereof. The optical path monitoring system comprises a light source structure, a plurality of reflecting reference mirrors and a plurality of calibration mechanisms. The plurality of reflecting reference mirrors and the plurality of calibration mechanisms are in one-to-one correspondence with a plurality of corner cavities of the large laser gyroscope. The reflecting reference mirrors are fixed on the corresponding corner cavities. The light source structure is used for emitting positioning light to one of the reflecting reference mirrors. The positioning light is reflected by the plurality of reflecting reference mirrors in sequence, so that the positioning light forms a monitoring light path between the plurality of reflecting reference mirrors. The plurality of calibration mechanisms are located on the monitoring light path. The calibration mechanism is located in front of the corresponding reflecting reference mirror along the monitoring light path. The calibration mechanism can be passed through by the positioning light, and can calibrate the spot position of the positioning light reflected by the corresponding reflecting reference mirror. The application has the advantages of simple structure, controllable cost, intuitive reflection of the corner cavity posture change of the large laser gyroscope and realization of rapid recovery of the optical path.

The present application relates to a kind of double-sided interferometer, the collimating mirror of one side interferometer is provided with first light blocking device between reference mirror, first light blocking device is provided with first through hole, the aperture of first through hole is greater than the outer diameter of the non-transparent substrate to be measured and less than the aperture of the reference mirror of this side interferometer, for blocking the interference of this side interferometer to the opposite side interferometer in the measurement cavity topography.By setting light blocking device, the output light of one side in the measurement cavity topography is prevented from interfering with the other side interferometer, the topography between two reference mirrors can be obtained while measuring the topography of the front and back of non-transparent substrate, especially the first-order tilt information.

Disclosed are a system and method for detecting a workpiece surface. The workpiece can be a packaged die, a processed wafer, or other types of workpieces. The present disclosure has an adaptive Michelson structure that illuminates the workpiece surface with long coherence length illumination light, such as infrared (IR) illumination light, to generate a fringe pattern. The Michelson structure includes a first path of reflected light reflected by a reference mirror and a second path of reflected light reflected by the workpiece surface. The two paths of reflected light are directed to an image acquisition module by a main beam splitter. The reference mirror, the workpiece surface, and the main beam splitter are configured to maintain a constant phase difference between the two paths of reflected light to achieve constructive interference and thereby generate the fringe pattern. The Michelson structure can enable detection of sub-micron cracks as small as 0.2-0.25 µm. The Michelson structure can be integrated into a standalone system or into an integrated detection system for detecting a variety of defects from micron-scale defects or larger defects to sub-micron defects (e.g., as small as 0.2-0.25 µm).

The invention relates to a method and a device (2) for profilometry of an object surface (40) of a flat object (20) having an unknown material, the device comprising: an optical interferometric measuring system (4); an ellipsometric measuring system (5); a beamsplitter (82) for splitting a light beam of a light source (111) into an interferometric measuring light beam (410) and an ellipsometric light beam (420); and an evaluation unit configured to ascertain a profile height in a measurement region on the object surface (40) from an evaluation light beam (490) evaluated in a detector unit (250) of the interferometric measuring system and a sensor light beam (520) received in an ellipsometric sensor (220). The interferometric measuring system (4) comprises a beamsplitter (91), a reference mirror (60) and a detector unit (250). The ellipsometric measuring system (5) comprises: a polarizer (190) for polarizing the ellipsometric light beam (420) and passing it onto the measurement region on the object surface (40); and an ellipsometric sensor (220) with a polarization filter to determine the polarization state of the received sensor light beam.

The application discloses a scanning focusing device, a focusing system, a semiconductor device and a method. The device comprises an interference scanning module, the interference scanning module comprising a measuring objective lens, a reference objective lens and a reference mirror. The measuring objective lens is arranged in a measuring light path and is used for projecting measuring light to a target sample surface and receiving measuring signal light returned after being reflected by the target sample. The reference objective lens is arranged in a reference light path and is used for focusing reference light to the reference mirror and receiving reference signal light returned after being reflected by the reference mirror. The reference light path is parallel to the measuring light path. The reference mirror is arranged at the end of the reference light path and is used for reflecting the reference light back to the reference objective lens. A first adjusting mechanism is used for driving the interference scanning module to scan along the measuring light path and for driving the interference scanning module to move to a target focusing position. The device is beneficial to improving the focusing speed of a semiconductor manufacturing device.